Patents by Inventor Lin Cheng
Lin Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240150192Abstract: A semiconductor device with different configurations of gate structures and a method of fabricating the same are disclosed. The method includes forming a fin structure on a substrate, forming a gate opening on the fin structure, forming a metallic oxide layer within the gate opening, forming a first dielectric layer on the metallic oxide layer, forming a second dielectric layer on the first dielectric layer, forming a work function metal (WFM) layer on the second dielectric layer, and forming a gate metal fill layer on the WFM layer. The forming the first dielectric layer includes depositing an oxide material with an oxygen areal density less than an oxygen areal density of the metallic oxide layer.Type: ApplicationFiled: January 12, 2024Publication date: May 9, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsiang-Pi CHANG, Chung-Liang Cheng, I-Ming Chang, Yao-Sheng Huang, Huang-Lin Chao
-
Patent number: 11978674Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a first source/drain epitaxial feature formed over a substrate, a second source/drain epitaxial feature formed over the substrate, two or more semiconductor layers disposed between the first source/drain epitaxial feature and the second source/drain epitaxial feature, a gate electrode layer surrounding a portion of one of the two or more semiconductor layers, a first dielectric region disposed in the substrate and in contact with a first side of the first source/drain epitaxial feature, and a second dielectric region disposed in the substrate and in contact with a first side of the second source/drain epitaxial feature, the second dielectric region being separated from the first dielectric region by a substrate.Type: GrantFiled: October 8, 2021Date of Patent: May 7, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: I-Ming Chang, Jung-Hung Chang, Chung-Liang Cheng, Hsiang-Pi Chang, Yao-Sheng Huang, Huang-Lin Chao
-
Patent number: 11979971Abstract: An extreme ultra violet (EUV) radiation source apparatus includes a collector mirror, a target droplet generator for generating a tin (Sn) droplet, a rotatable debris collection device, one or more coils for generating an inductively coupled plasma (ICP), a gas inlet for providing a source gas for the ICP, and a chamber enclosing at least the collector mirror and the rotatable debris collection device. The gas inlet and the one or more coils are configured such that the ICP is spaced apart from the collector mirror.Type: GrantFiled: April 10, 2019Date of Patent: May 7, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yen-Shuo Su, Chun-Lin Chang, Han-Lung Chang, Li-Jui Chen, Po-Chung Cheng
-
Publication number: 20240143651Abstract: The present disclosure relates to the field of image definition recognition, and discloses a logging image definition recognition method and device, medium and electronic equipment. The method comprises: establishing a logging image sample library comprising a plurality of logging images; acquiring actual definition information corresponding to the respective logging images; acquiring a plurality of definitions corresponding to the respective logging images; determining target weights corresponding to the respective target image definition determination algorithms according to the plurality of definitions and the actual definition information corresponding to the respective logging images; and determining a definition of a target logging image by the respective target image definition determination algorithms and the target weights corresponding to the respective target image definition determination algorithms.Type: ApplicationFiled: October 19, 2021Publication date: May 2, 2024Applicant: China Oilfield Services Ltd.Inventors: Lin Huang, Shusheng Guo, Zhenxue Hou, Chuan Fan, Danian Xu, Da Sheng, Wei Long, Guohua Zhang, Jiajie Cheng, Dong Li, Zhang Zhang, Lu Yin, Chaohua Zhang, Guibin Zhang
-
Patent number: 11974410Abstract: Aspects discussed herein include an electronic device and an associated connector interface. The electronic device comprises an enclosure that defines an internal volume, a plurality of external surfaces, and a recess from an external surface of the plurality of external surfaces. The recess has circumferential slot(s) extending to the external surface and that receive flange(s) of an external connector. The electronic device further comprises a connector interface connected with one or more electronic components disposed in the internal volume. The connector interface comprises first conductor(s) that are exposed at the recess. While the flange(s) are received in the circumferential slot(s), rotation of the external connector causes the flange(s) to slide within the circumferential slot(s) into a retained position, in which second conductor(s) of the external connector, having a fixed disposition relative to the flange(s), are connected to the first conductor(s).Type: GrantFiled: August 5, 2022Date of Patent: April 30, 2024Assignee: Samsara, Inc.Inventors: Jennifer Lin, Christian Almer, Somasundara Pandian, Li-Wei Cheng, David Gal
-
Patent number: 11973302Abstract: The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.Type: GrantFiled: February 20, 2023Date of Patent: April 30, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chun-Lin Louis Chang, Henry Tong Yee Shian, Alan Tu, Han-Lung Chang, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
-
Patent number: 11972935Abstract: The present disclosure relates to methods of processing a semiconductor substrate in a processing chamber, such as a chemical vapor deposition chamber. The chemical vapor deposition chamber includes a spindle mechanism that cooperates with one or more carrier ring forks to move the semiconductor substrate from one station to another station. The methods include monitoring one or more spindle operation parameters and carrying out one or more maintenance steps on the spindle mechanism based on the results of monitoring the one or more spindle operation parameters. The monitored spindle operation parameters provide an indication of undesirable vibration of the semiconductor substrates in the processing chamber. The vibration of the semiconductor substrates in the processing chamber is undesirable because it promotes generation of unwanted particles that deposit onto a surface of the semiconductor substrate.Type: GrantFiled: August 27, 2021Date of Patent: April 30, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Yu-Hsiang Cheng, Bo-Lin Wu
-
Publication number: 20240135659Abstract: The present disclosure provides a display method and apparatus and an electronic device. The method includes: acquiring a virtual image, configuration information of the virtual image, and environment information of a current environment; wherein the virtual image comprises at least one virtual object and virtual feature point information of the at least one virtual object in an extended reality space coordinate system, and the environment information comprises point cloud information of at least one real object; determining a position relation between the real object and the virtual object, based on the virtual feature point information of the virtual object in the extended reality space coordinate system and the point cloud information; rendering the virtual object in accordance with one or more of the position relation, the configuration information, and the environment information, to determine a rendered image; and displaying the rendered image.Type: ApplicationFiled: September 11, 2023Publication date: April 25, 2024Inventor: Lin CHENG
-
Publication number: 20240123434Abstract: A multifunctional catalyst, a method for producing the same, and a method for using the same are provided. The multifunctional catalyst is applicable for recycling a polyester fabric. The multifunctional catalyst includes a carrier, and a first functional ionic liquid and a second functional ionic liquid that are grafted on the carrier. The carrier is an inorganic composite powder material, and is composed of following chemical components: C: Na—Ni/Al2O3. In a process of recycling the polyester fabric, the multifunctional catalyst simultaneously decolorizes and depolymerizes the polyester fabric. The first functional ionic liquid is used to decolorize the polyester fabric, and the second functional ionic liquid is used to depolymerize the polyester fabric.Type: ApplicationFiled: December 12, 2022Publication date: April 18, 2024Inventors: TE-CHAO LIAO, WEI-SHENG CHENG, YU-LIN LI
-
Publication number: 20240130156Abstract: A light-emitting element includes a pair of electrodes, a first light-emitting unit, a second light-emitting unit, and a charge generation layer. The first light-emitting unit, between the pair of electrodes, and the first light-emitting unit, includes a first light-emitting layer. The second light-emitting unit, between the pair of electrodes, includes a second light-emitting layer. A first luminescent layer includes a first main body material, a second main body material, a first guest material, and a first auxiliary material, and the first main body material forms a first excimer complex with the second main body material. A first excited triplet state energy level of the first auxiliary material is lower than a first excited triplet state energy level of the first excimer complex, and the first excited triplet state energy level of the first auxiliary material is higher than that of the first guest material.Type: ApplicationFiled: September 26, 2023Publication date: April 18, 2024Applicant: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.Inventors: Yu ZHANG, Li YUAN, Munjae LEE, Wenxu XIANYU, Jie YANG, Huizhen PIAO, Mugyeom KIM, Xianjie LI, Jing HUANG, Fang WANG, Kailong WU, Lin YANG, Yu GU, Mingzhou WU, Jingyao SONG, Danhua SHEN, Guo CHENG
-
Publication number: 20240130088Abstract: A fluid cooling system for computer cabinets includes a frame, a fluid circulation device, a chassis distributor, at least one mainboard end module, a cold fluid channel and a hot fluid channel. The frame is installed in the accommodation space in a movable pulling manner; the chassis distributor is installed on an outer side of the frame and connected to the fluid circulation device; the cold fluid channel and the hot fluid channel are provided for connecting the chassis distributor to the mainboard end module; and the chassis distributor includes a chassis cold exhaust pipe and a chassis heat pipe, such that a working fluid flowing through the mainboard end module can have a hot and cold separation, and finally return to the fluid circulation device to form a circulating flow.Type: ApplicationFiled: October 13, 2022Publication date: April 18, 2024Inventor: CHUN-LIN CHENG
-
Patent number: 11960879Abstract: A local apparatus is configured to perform resolution on a conflict field generated by code files of a plurality of versions, and send a conflict resolution result to the service apparatus. The conflict field includes at least one conflict block, and the conflict resolution result includes at least one of a resolution result of a local resolvable conflict block and an identifier of a local irresolvable conflict block. The remote apparatus is configured to obtain the conflict resolution result from the service apparatus, generate a collaborative processing window based on the conflict resolution result, and receive a result of processing the conflict resolution result by a remote user based on the collaborative processing window.Type: GrantFiled: April 18, 2022Date of Patent: April 16, 2024Assignee: HUAWEI CLOUD COMPUTING TECHNOLOGIES CO., LTD.Inventors: Guangtai Liang, Zhao Wei, Lin Li, Anqi Yu, Shanbin Cheng, Qianxiang Wang
-
Patent number: 11956541Abstract: A control method of a driving mechanism is provided, including: the driving mechanism provides a first electrical signal from a control assembly to the driving mechanism to move the movable portion into an initial position relative to the fixed portion, wherein the control assembly includes a control unit and a position sensing unit; the status signal of an inertia sensing unit is read; the control unit sends the status signal to the control unit to calculate a target position; the control unit provides a second electrical signal to the driving assembly according to the target position for driving the driving assembly; a position signal is sent from the position sensing unit to the control unit; the control unit provides a third electric signal to the driving assembly to drive the driving assembly according the position signal.Type: GrantFiled: January 26, 2023Date of Patent: April 9, 2024Assignee: TDK TAIWAN CORP.Inventors: Chao-Chang Hu, Chen-Hsien Fan, Sung-Mao Tsai, Yueh-Lin Lee, Yu-Chiao Lo, Mao-Kuo Hsu, Ching-Chieh Huan, Yi-Chun Cheng
-
Patent number: 11955960Abstract: The invention uses the control circuit formed on the silicon wafer to detect the leakage current of transistor formed on the depletion mode GaN wafer and then adjust the gate voltage of the depletion mode GaN transistor according to the detected leakage current. Essentially, the gate voltage is reduced or viewed as made more negative when the detected leakage current is larger a specific value. Thus, the gate voltage can be gradually adjusted to approach a specific threshold voltage that right block the leakage current. In other words, by making the gate voltage more negative when non-zero leakage current is detected and even by making the gate voltage more positive when zero leakage current is detected, the depletion mode GaN transistor can be adjusted to have an acceptable or even zero leakage current, a high reaction rate and an optimized efficiency.Type: GrantFiled: August 23, 2022Date of Patent: April 9, 2024Assignee: CHIP-GAN POWER SEMICONDUCTOR CORPORATIONInventors: Ke-Horng Chen, Tzu-Hsien Yang, Yong-Hwa Wen, Kuo-Lin Cheng
-
Patent number: 11947153Abstract: A backlight module and a display device are provided, and the backlight module includes a light guide plate, a plurality of light-emitting components, and a frame. The light guide plate includes a first side, a second side, and two third sides. The light-emitting components are disposed on the first side, and light generated from the light-emitting components enters the light guide plate from the first side. The frame covers the second side and the third sides and includes an opening and at least one buffer portion. The light-emitting components are disposed in the opening, and the buffer portion is disposed on a side of the opening and contacts the light guide plate.Type: GrantFiled: May 4, 2023Date of Patent: April 2, 2024Assignee: Radiant Opto-Electronics CorporationInventors: Hung-Pin Cheng, Shih-Fan Liu, Chien-Yu Ko, Jui-Lin Chen
-
Patent number: 11940060Abstract: The present invention provides a seal ring structure, which comprises a seal ring member. The seal ring member includes a first ring opening on one side and a second ring opening on the other. A periphery of the first ring opening includes a plurality of leak grooves. When the seal ring member and the valve ball squeeze each other, the plurality of leak grooves can reduce the torque required to rotate the valve ball. A leak-groove length of the plurality of leak grooves is smaller than a seal-ring-member length of the seal ring member. The plurality of leak grooves do not penetrate the seal ring member for avoiding leakage of fluid.Type: GrantFiled: August 5, 2022Date of Patent: March 26, 2024Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTREInventors: Ching-An Lin, Chin-Kang Chen, Chia-Ho Cheng
-
Publication number: 20240096942Abstract: Semiconductor structures and the manufacturing method thereof are disclosed. An exemplary semiconductor structure according to the present disclosure includes a substrate having a p-type well or an n-type well, a first base portion over the p-type well, a second base portion over the n-type well, a first plurality of channel members over the first base portion, a second plurality of channel members over the second base portion, an isolation feature disposed between the first base portion and the second base portion, and a deep isolation structure in the substrate disposed below the isolation feature.Type: ApplicationFiled: November 27, 2023Publication date: March 21, 2024Inventors: Jung-Chien Cheng, Kuo-Cheng Chiang, Shi Ning Ju, Guan-Lin Chen, Chih-Hao Wang, Kuan-Lun Cheng
-
Publication number: 20240097888Abstract: In a file sharing system, a key manager unit realizes a correspondence between the first user identifier and the first public key in response to a registration request of the first user, generates a first key material for encrypting the first file into a first encrypted file, and generates a first credential according to the first user identifier, the first file identifier, the first public key and the first key material after receiving an access-right claim request to the first file from the first user. A file storage unit stores the first encrypted file and the first credential. The first user uses the first user identifier, the first file identifier and the first private key to retrieve the first key material out of the first credential, and uses the first key material to decrypt the first encrypted file into the first file.Type: ApplicationFiled: September 18, 2023Publication date: March 21, 2024Inventors: CHIA-JUNG LIANG, CHIHHUNG LIN, CHIH-PING HSIAO, YU-JIE SU, CHIA-HSIN CHENG, TUN-HOU WANG, MENG-CHAO TSAI, YUEH-CHIN LIN
-
Publication number: 20240096997Abstract: Embodiments of the present disclosure provide semiconductor device structures and methods of forming the same. The structure includes a first source/drain region disposed in a PFET region and a second source/drain region disposed in an NFET region. The second source/drain region comprises a dipole region. The structure further includes a first silicide layer disposed on and in contact with the first source/drain region, a second silicide layer disposed on and in contact with the first silicide layer, and a third silicide layer disposed on and in contact with the dipole region of the second source/drain region. The first, second, and third silicide layers include different materials. The structure further includes a first conductive feature disposed over the first source/drain region, a second conductive feature disposed over the second source/drain region, and an interconnect structure disposed on the first and second conductive features.Type: ApplicationFiled: January 15, 2023Publication date: March 21, 2024Inventors: Po-Chin Chang, Lin-Yu Huang, Li-Zhen Yu, Yuting Cheng, Sung-Li Wang, Pinyen Lin
-
Patent number: RE49913Abstract: A power metal-oxide-semiconductor field-effect transistor (MOSFET) includes a substrate, a drift layer over the substrate, and a spreading layer over the drift layer. The spreading layer includes a pair of junction implants separated by a junction gate field effect (JFET) region. A gate oxide layer is on top of the spreading layer. The gate contact is on top of the gate oxide layer. Each one of the source contacts are on a portion of the spreading layer separate from the gate oxide layer and the gate contact. The drain contact is on the surface of the substrate opposite the drift layer.Type: GrantFiled: October 26, 2020Date of Patent: April 9, 2024Assignee: Wolfspeed, Inc.Inventors: Vipindas Pala, Anant Kumar Agarwal, Lin Cheng, Daniel Jenner Lichtenwalner, John Williams Palmour