Patents by Inventor Lin Dong

Lin Dong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11658218
    Abstract: Methods of forming and processing semiconductor devices are described. Certain embodiments related to electronic devices which comprise a dipole region having an interlayer dielectric, a high-? dielectric material, and a dipole layer. The dipole layer comprises one or more of titanium aluminum nitride (TiAlN), titanium tantalum nitride (TiTaN), titanium oxide (TiO), tantalum oxide (TaO), and titanium aluminum carbide (TiAlC).
    Type: Grant
    Filed: February 10, 2022
    Date of Patent: May 23, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Yongjing Lin, Karla M Bernal Ramos, Shih Chung Chen, Yixiong Yang, Lin Dong, Steven C. H. Hung, Srinivas Gandikota
  • Patent number: 11645300
    Abstract: Provided is a method and system for normalizing catalog item data to create higher quality search results. In one example, the method may include receiving a record comprising an unstructured description of an object, identifying a type of the object from among a plurality of object types and identifying a predefined attribute of the identified type of object, extracting a value from the unstructured description corresponding to the predefined attribute and modifying the extracted value to generate a normalized attribute value, and storing a structured record of the object in a structured format comprising a plurality of values of a plurality of attributes of the object from the unstructured description including the normalized attribute value for the predefined attribute of the object.
    Type: Grant
    Filed: October 29, 2021
    Date of Patent: May 9, 2023
    Assignee: SAP SE
    Inventors: Sudhir Bhojwani, Sudha Lakshman, Quan Zhang, Sandeep Chakravarty, Tu Truong, Fuming Wu, Yue Li, Lin Dong, Richa Namballa
  • Patent number: 11623913
    Abstract: Disclosed is a method of synthesizing a (1R,2R)-nitroalcohol compound of formula (I), as shown in the following reaction scheme, including: subjecting a compound of formula (II) and a compound of formula (III) to a condensation reaction in an organic solvent in the presence of a copper complex generated in situ from a chiral (1S,2R)-amino alcohol ligand and a cupric salt to produce the (1R,2R)-nitroalcohol compound of formula (I), where R1 and R2 are defined in the same manner as that in the specification. The method involves mild reaction conditions, excellent diastereoselectivity and high chemical yield, and thus it is suitable for industrial applications.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: April 11, 2023
    Assignee: Sichuan University
    Inventors: Fener Chen, Lin Dong, Yingqi Xia, Pei Tang, Youcai Xiao
  • Publication number: 20230031636
    Abstract: Aspects of the invention include systems and methods configured to provide simplified and efficient artificial intelligence (AI) model deployment. A non-limiting example computer-implemented method includes receiving an AI model deployment input having pre-process code, inference model code, and post-process code. The pre-process code is converted to a pre-process graph. The inference model and the post-process model are similarly converted to an inference graph and a post-process graph, respectively. A pipeline path is generated by connecting nodes in the pre-process graph, the inference graph, and the post-process graph. The pipeline path is deployed as a service for inference.
    Type: Application
    Filed: July 28, 2021
    Publication date: February 2, 2023
    Inventors: Lin Dong, Dong Xie, Jing Li, Guang Han Sui, Xiao Tian Xu
  • Publication number: 20220270871
    Abstract: Methods for pre-cleaning substrates having metal and dielectric surfaces are described. The substrate is exposed to a strong reductant to remove contaminants from the metal surface and damage the dielectric surface. The substrate is then exposed to an oxidation process to repair the damage to the dielectric surface and oxidize the metal surface. The substrate is then exposed to a weak reductant to reduce the metal oxide to a pure metal surface without substantially affecting the dielectric surface. Processing tools and computer readable media for practicing the method are also described.
    Type: Application
    Filed: May 12, 2022
    Publication date: August 25, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Xi Cen, Yakuan Yao, Yiming Lai, Kai Wu, Avgerinos V. Gelatos, David T. Or, Kevin Kashefi, Yu Lei, Lin Dong, He Ren, Yi Xu, Mehul Naik, Hao Chen, Mang-Mang Ling
  • Patent number: 11380536
    Abstract: Methods for pre-cleaning substrates having metal and dielectric surfaces are described. The substrate is exposed to a strong reductant to remove contaminants from the metal surface and damage the dielectric surface. The substrate is then exposed to an oxidation process to repair the damage to the dielectric surface and oxidize the metal surface. The substrate is then exposed to a weak reductant to reduce the metal oxide to a pure metal surface without substantially affecting the dielectric surface. Processing tools and computer readable media for practicing the method are also described.
    Type: Grant
    Filed: May 5, 2020
    Date of Patent: July 5, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Xi Cen, Yakuan Yao, Yiming Lai, Kai Wu, Avgerinos V. Gelatos, David T. Or, Kevin Kashefi, Yu Lei, Lin Dong, He Ren, Yi Xu, Mehul Naik, Hao Chen, Mang-Mang Ling
  • Publication number: 20220198260
    Abstract: Multi-level objectives improve efficiency of multi-objective automated machine learning. A hyperband framework is established with a kernel density estimator to shrink the search space based on evaluation of lower-level objectives. A Gaussian prior assumption directly shrinks the search space to find a main objective.
    Type: Application
    Filed: December 22, 2020
    Publication date: June 23, 2022
    Inventors: Chao Xue, Lin Dong, Xi Xia, Zhi Hu Wang
  • Publication number: 20220198217
    Abstract: A model parallel training technique for neural architecture search including the following operations: (i) receiving a plurality of ML (machine learning) models that can be substantially interchangeably applied to a computing task; (ii) for each given ML model of the plurality of ML models: (a) determining how the given ML model should be split for model parallel processing operations, and (b) computing a model parallelism score (MPS) for the given ML model, with the MPS being based on an assumption that the split for the given ML model will be used at runtime; and (iii) selecting a selected ML model based, at least in part, on the MPS scores of the ML models of the plurality of ML models.
    Type: Application
    Filed: December 22, 2020
    Publication date: June 23, 2022
    Inventors: Lin Dong, Chao Xue, Jing Li, Bin Xu
  • Publication number: 20220188620
    Abstract: A method for optimizing a neural network architecture by estimating an inference time for each operator in the neural network architecture is provided. The method may include determining a benchmark time for at least one single-path architecture out of a plurality of single-path architectures associated with the neural network by sampling the at least one single-path architecture from the neural network, wherein the at least one single-path architecture comprises one or more operators. The method may further include, based on the benchmark time for the at least one single-path architecture, determining an estimated inference time for an operator, wherein determining the estimated inference time for the operator comprises, applying an operator function, wherein the operator function comprises a function based on a difference between the benchmark time associated with the at least one single-path architecture and the estimated latency of the neural network.
    Type: Application
    Filed: December 10, 2020
    Publication date: June 16, 2022
    Inventors: Chao Xue, Lin Dong, Xi Xia, Zhi Hu Wang
  • Publication number: 20220165854
    Abstract: Methods of forming and processing semiconductor devices are described. Certain embodiments related to electronic devices which comprise a dipole region having an interlayer dielectric, a high-K dielectric material, and a dipole layer. The dipole layer comprises one or more of titanium aluminum nitride (TiAIN), titanium tantalum nitride (TiTaN), titanium oxide (TiO), tantalum oxide (TaO), and titanium aluminum carbide (TiAIC).
    Type: Application
    Filed: February 10, 2022
    Publication date: May 26, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Yongjing Lin, Karla M. Bernal Ramos, Shih Chung Chen, Yixiong Yang, Lin Dong, Steven C.H. Hung, Srinivas Gandikota
  • Publication number: 20220115516
    Abstract: Methods of forming and processing semiconductor devices are described. Certain embodiments related to electronic devices which comprise a dipole region having an interlayer dielectric, a high-? dielectric material, and a dipole layer. The dipole layer comprises one or more of titanium lanthanum nitride (TiLaN), titanium yttrium nitride (TiYN), titanium strontium nitride (TiSrN), titanium magnesium nitride (TiMgN, titanium aluminum nitride (TiAlN), titanium tantalum nitride (TiTaN), hafnium carbide (HfC), hafnium nitride (HfN), hafnium oxynitride (HfON), hafnium oxycarbide (HfOC), hafnium carbide aluminum (HfCAl), hafnium aluminum nitride (HfAlN), or hafnium carbonitride (HfCN).
    Type: Application
    Filed: December 21, 2021
    Publication date: April 14, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Yongjing Lin, Karla M. Bernal Ramos, Luping Li, Shih Chung Chen, Jacqueline S. Wrench, Yixiong Yang, Steven C.H. Hung, Srinivas Gandikota, Naomi Yoshida, Lin Dong
  • Patent number: 11289579
    Abstract: Methods of forming and processing semiconductor devices are described. Certain embodiments related to electronic devices which comprise a dipole region having an interlayer dielectric, a high-? dielectric material, and a dipole layer. The dipole layer comprises one or more of titanium aluminum nitride (TiAlN), titanium tantalum nitride (TiTaN), titanium oxide (TiO), tantalum oxide (TaO), and titanium aluminum carbide (TiAlC).
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: March 29, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Yongjing Lin, Karla M Bernal Ramos, Shih Chung Chen, Yixiong Yang, Lin Dong, Steven C. H. Hung, Srinivas Gandikota
  • Publication number: 20220050854
    Abstract: Provided is a method and system for normalizing catalog item data to create higher quality search results. In one example, the method may include receiving a record comprising an unstructured description of an object, identifying a type of the object from among a plurality of object types and identifying a predefined attribute of the identified type of object, extracting a value from the unstructured description corresponding to the predefined attribute and modifying the extracted value to generate a normalized attribute value, and storing a structured record of the object in a structured format comprising a plurality of values of a plurality of attributes of the object from the unstructured description including the normalized attribute value for the predefined attribute of the object.
    Type: Application
    Filed: October 29, 2021
    Publication date: February 17, 2022
    Inventors: Sudhir Bhojwani, Sudha Lakshman, Quan Zhang, Sandeep Chakravarty, Tu Truong, Fuming Wu, Yue Li, Lin Dong, Richa Namballa
  • Patent number: 11245022
    Abstract: Methods of forming and processing semiconductor devices are described. Certain embodiments related to electronic devices which comprise a dipole region having an interlayer dielectric, a high-? dielectric material, and a dipole layer. The dipole layer comprises one or more of titanium lanthanum nitride (TiLaN), titanium yttrium nitride (TiYN), titanium strontium nitride (TiSrN), titanium magnesium nitride (TiMgN, titanium aluminum nitride (TiAlN), titanium tantalum nitride (TiTaN), hafnium carbide (HfC), hafnium nitride (HfN), hafnium oxynitride (HfON), hafnium oxycarbide (HfOC), hafnium carbide aluminum (HfCAl), hafnium aluminum nitride (HfAlN), or hafnium carbonitride (HfCN).
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: February 8, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Yongjing Lin, Karla M. Bernal Ramos, Luping Li, Shih Chung Chen, Jacqueline S. Wrench, Yixiong Yang, Steven C. H. Hung, Srinivas Gandikota, Naomi Yoshida, Lin Dong
  • Publication number: 20220027739
    Abstract: Aspects of the invention include systems and methods to obtain meta features of a dataset for training in a deep learning application. A method includes selecting an initial search space that defines a type of deep learning architecture representation that specifies hyperparameters for two or more neural network architectures. The method also includes applying a search strategy to the initial search space. One of the two or more neural network architectures are selected based on a result of an evaluation according to the search strategy. A new search space is generated with new hyperparameters using an evolutionary algorithm and a mutation type that defines one or more changes in the hyperparameters specified by the initial search space, and, based on the mutation type, the new hyperparameters are applied to the one of the two or more neural networks or the search strategy is applied to the new search space.
    Type: Application
    Filed: July 22, 2020
    Publication date: January 27, 2022
    Inventors: Chao Xue, Yonggang Hu, Lin Dong, Ke Wei Sun
  • Patent number: 11194832
    Abstract: Provided is a method and system for normalizing catalog item data to create higher quality search results. In one example, the method may include receiving a record comprising an unstructured description of an object, identifying a type of the object from among a plurality of object types and identifying a predefined attribute of the identified type of object, extracting a value from the unstructured description corresponding to the predefined attribute and modifying the extracted value to generate a normalized attribute value, and storing a structured record of the object in a structured format comprising a plurality of values of a plurality of attributes of the object from the unstructured description including the normalized attribute value for the predefined attribute of the object.
    Type: Grant
    Filed: September 13, 2018
    Date of Patent: December 7, 2021
    Assignee: SAP SE
    Inventors: Sudhir Bhojwani, Sudha Lakshman, Quan Zhang, Sandeep Chakravarty, Tu Truong, Fuming Wu, Yue Li, Lin Dong, Richa Namballa
  • Publication number: 20210351032
    Abstract: Methods for pre-cleaning substrates having metal and dielectric surfaces are described. The substrate is exposed to a strong reductant to remove contaminants from the metal surface and damage the dielectric surface. The substrate is then exposed to an oxidation process to repair the damage to the dielectric surface and oxidize the metal surface. The substrate is then exposed to a weak reductant to reduce the metal oxide to a pure metal surface without substantially affecting the dielectric surface. Processing tools and computer readable media for practicing the method are also described.
    Type: Application
    Filed: May 5, 2020
    Publication date: November 11, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Xi Cen, Yakuan Yao, Yiming Lai, Kai Wu, Avgerinos V. Gelatos, David T. Or, Keyvan Kashefi, Yu Lei, Lin Dong, He Ren, Yi Xu, Mehul Naik, Hao Chen, Mang-Mang Ling
  • Patent number: 11075276
    Abstract: Methods and apparatus for forming a semiconductor structure such as an NMOS gate electrode are described. Methods may include depositing a first capping layer having a first surface atop a first surface of a high-k dielectric layer; and depositing at least one metal layer having a first surface atop the first surface of the first capping layer, wherein the at least one metal layer includes titanium aluminum silicide material. Some methods include removing an oxide layer from the first surface of the first capping layer by contacting the first capping layer with metal chloride in an amount sufficient to remove an oxide layer. Some methods for depositing a titanium aluminum silicide material are performed by an atomic layer deposition process performed at a temperature of 350 to 400 degrees Celsius.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: July 27, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Yongjing Lin, Shih Chung Chen, Naomi Yoshida, Lin Dong, Liqi Wu, Rongjun Wang, Steven Hung, Karla Bernal Ramos, Yixiong Yang, Wei Tang, Sang-Ho Yu
  • Patent number: D965383
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: October 4, 2022
    Inventor: Lin Dong
  • Patent number: D965384
    Type: Grant
    Filed: March 26, 2021
    Date of Patent: October 4, 2022
    Inventor: Lin Dong