Patents by Inventor Madhukar Bhaskara Rao

Madhukar Bhaskara Rao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050120581
    Abstract: This invention relates to an improvement in a process for removing water from a hydride gas, and particularly ammonia, by contacting the hydride gas with a drying agent under conditions for effecting removal of the water. The improvement for significantly reducing the water content to trace levels in said hydride gas resides in the use of at least Group 1 metal oxide and at least one Group 2 metal oxide as a drying agent.
    Type: Application
    Filed: December 8, 2003
    Publication date: June 9, 2005
    Inventors: Robert Ling Chiang, Roger Dean Whitley, Dingjun Wu, Chun Christine Dong, Madhukar Bhaskara Rao
  • Patent number: 6892473
    Abstract: This invention relates to an improvement in a process for removing water from a hydride gas, and particularly ammonia, by contacting the hydride gas with a drying agent under conditions for effecting removal of the water. The improvement for significantly reducing the water content to trace levels in said hydride gas resides in the use of at least Group 1 metal oxide and at least one Group 2 metal oxide as a drying agent.
    Type: Grant
    Filed: December 8, 2003
    Date of Patent: May 17, 2005
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Robert Ling Chiang, Roger Dean Whitley, Dingiun Wu, Chun Christine Dong, Madhukar Bhaskara Rao
  • Patent number: 6838066
    Abstract: A method and system for the purification and recycle of impure argon is disclosed. The system and process of the present invention can produce very high purity argon, i.e., about 1 ppb or less of impurities. In one embodiment of the invention, a cryogenic separation apparatus is used to remove the nitrogen, hydrocarbon, and hydrogen impurities from the argon stream. A catalyst bed is then operated at ambient temperature to remove hydrogen, oxygen, and carbon monoxide impurities to provide the purified argon product. Also disclosed is a method to minimize to loss of the purified argon product during regeneration of the catalyst bed.
    Type: Grant
    Filed: September 13, 2002
    Date of Patent: January 4, 2005
    Assignee: Air Products and Chemicals, Inc.
    Inventor: Madhukar Bhaskara Rao
  • Patent number: 6709487
    Abstract: An adsorbent, method, and apparatus involving same for the removal of moisture from a fluoride-containing fluid such as gaseous nitrogen trifluoride are disclosed herein. In certain preferred embodiments, the adsorbent of the present invention comprises an organic support having a porosity of 30% or greater and a pore size of 2 &mgr;m or less; and at least one metal fluoride disposed within at least a portion of the organic substrate.
    Type: Grant
    Filed: October 22, 2002
    Date of Patent: March 23, 2004
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Chun Christine Dong, Madhukar Bhaskara Rao, Dingjun Wu
  • Publication number: 20040052708
    Abstract: A method and system for the purification and recycle of impure argon is disclosed. The system and process of the present invention can produce very high purity argon, i.e., about 1 ppb or less of impurities. In one embodiment of the invention, a cryogenic separation apparatus is used to remove the nitrogen, hydrocarbon, and hydrogen impurities from the argon stream. A catalyst bed is then operated at ambient temperature to remove hydrogen, oxygen, and carbon monoxide impurities to provide the purified argon product. Also disclosed is a method to minimize to loss of the purified argon product during regeneration of the catalyst bed.
    Type: Application
    Filed: September 13, 2002
    Publication date: March 18, 2004
    Inventor: Madhukar Bhaskara Rao
  • Publication number: 20040009873
    Abstract: The present invention provides an adsorbent for removing water and/or other oxygen-containing impurities from a fluid comprising ammonia to the ppb level and methods for making and using same. The adsorbent preferably comprises a substrate having a plurality of pores and a surface area that ranges from about 100 to about 2,500 m2/g and a compound disposed within a least a portion of the substrate. In certain preferred embodiments, the compound comprises at least one cation from the group consisting of ammonium (I), lithium (I), sodium (I), potassium (I), cesium (I); magnesium (II), calcium (II), strontium (II), barium (II), manganese (II), nickel (II), iron (II), zinc (II); aluminum (III), indium (III), iron (III), and zirconium (IV) or combinations thereof that is ionically associated with an anion from the group consisting of halide, sulfide, sulfite, or sulfate.
    Type: Application
    Filed: July 9, 2002
    Publication date: January 15, 2004
    Inventors: Chun Christine Dong, Madhukar Bhaskara Rao, Dingjun Wu
  • Patent number: 6004374
    Abstract: A carbonaceous adsorbent membrane is prepared by contacting a hydrophobic carbonaceous adsorbent membrane with an aqueous solution of one or more oxidizing acids and one or more metals selected from the group consisting of copper (+2), chromium (+3), and nickel (+2). The treated membrane is rinsed and dried to yield a hydrophilic carbonaceous adsorbent membrane which is useful for removing water from water-containing gas mixtures.
    Type: Grant
    Filed: October 10, 1997
    Date of Patent: December 21, 1999
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Madhukar Bhaskara Rao, Shivaji Sircar, Timothy Christopher Golden
  • Patent number: 5912048
    Abstract: Porous carbonaceous adsorptive membranes are protected or passivated from surface degradation in moist air by oxidizing the surface at relatively mild conditions after initial preparation of the membrane by pyrolysis. Carbon dioxide is a preferred passivating gas. Contact of passivated membranes with moist air at ambient conditions unexpectedly improves membrane effectiveness in separating gas mixtures containing hydrogen and light hydrocarbons.
    Type: Grant
    Filed: August 25, 1997
    Date of Patent: June 15, 1999
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Madhukar Bhaskara Rao, Madhu Anand
  • Patent number: 5753010
    Abstract: A method for increasing product recovery or reducing the size of steam methane reformer and pressure swing adsorption systems utilized for hydrogen production. A significant portion of the hydrogen in the PSA depressurization and purge effluent gas, which is otherwise burned as fuel in the reformer, is recovered and recycled to the PSA system to provide additional high purity hydrogen product. This is accomplished by processing selected portions of the depressurization and purge effluent gas in adsorbent membrane separators to increase hydrogen content for recycle to the PSA system. Remaining portions of the depressurization and purge effluent gas which contain lower concentrations of hydrogen are utilized for fuel value in the reformer.
    Type: Grant
    Filed: October 28, 1996
    Date of Patent: May 19, 1998
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Shivaji Sircar, William Emil Waldron, Madhu Anand, Madhukar Bhaskara Rao