Abstract: A polyimide precursor having repeating units of the formula: wherein R.sup.1 is a tetravalent organic group; and R.sup.2 is a divalent diphenyl group, is excellent in image formation and particularly suitable for forming a pattern using an i-line stepper, and gives a photosensitive resin composition by imparting photosensitivity to the polyimide precursor, said photosensitive resin composition being suitable for forming surface protective films for semiconductor devices or interlaminar insulating films for multilayer wiring boards.

Abstract: A polyimide precursor having repeating units of the formula: ##STR1## wherein R.sup.1 is a tetravalent organic group having 4 or more carbon atoms; R.sup.2 is a trivalent or tetravalent organic group having one or more aromatic rings; R.sup.3 is a monovalent organic group; A is a monovalent group showing acidity; and n is an integer of 1 or 2, is effective for preparing a highly sensitive negative-working photosensitive material developable with an alkaline aqueous solution in a short time with high resolution.

Abstract: Photoimageable polyquinoline compositions comprise a polyquinoline polymer, a diazonaphthoquinone and optionally a photosensitizer. The composition is prepared by dissolving the polyquinoline polymer, diazonaphthoquinone and photosensitizer in a solvent to form a solution, coating the solution onto a substrate and thereafter removing the solvent to form a film. The film is exposed to light through a photomask and developed by immersion in a selective solvent to yield a photopatterned dielectric film.

Abstract: There are disclosed a photosensitive resin composition which comprises(A) a polyamic acid having recurring units represented by the formula (I): ##STR1## represents a divalent organic group, and (B) an acryl compound having an amino group, and also a photosensitive resin composition for an i-line stepper which further comprises a photoinitiator in addition to the photosensitive resin composition.

Abstract: A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.

Abstract: An N-aryl-.alpha.-amino acid (I), which is a novel compound, is effective as a photoinitiator. The photoinitiator composition including this photoinitiator is effective for improving photosensitive properties of photosensitive materials containing poly(amic acid) and an addition polymerizable compound used for pattern formation. Further, a photoinitiator composition (A) comprising an N-aryl-.alpha.-amino acid (I) or (I'), a 3-substituted coumarin (II) and/or an azabenzalcyclohexanone (III), or a photoinitiator composition (B) comprising an N-aryl-.alpha.-amino acid (I) or (I'), a 3-substituted coumarin (II) and a titanocene (IV), or a photoinitiator composition (C) comprising a 3-substituted coumarin (II), a titanocene (IV) and an oxime ester (V), is effective for improving photosensitive properties of photosensitive materials containing poly(amic acid) and an addition polymerizable compound used for pattern formation.

Abstract: A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.

Abstract: A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: ##STR1## and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion.

Abstract: An organic nonlinear optical single crystal belonging to a rhombic or monoclinic system and having a light absorption wavelength end of 410 nm or less and at least one nonlinear optical coefficient of 30 pm/V or more, and being able to phase match to the light absorption wavelength end, such as a single crystal of 1,4-dioxa-8-aza-8-(4'-acetylphenyl)-spiro[4.5]decane, is effective in nonlinear optical components and light frequency convertors.

Abstract: A steroidal ketone compound having a substituted or unsubstituted aromatic group or heterocyclic aromatic group is useful as a non-linear optical material in a non-linear optical device.

Abstract: Aryl triflate compounds can generate a strong acid when exposed to irradiation of radiation and can be used as an acid generator in a radiologically-acid-producing agent system and a radiosensitive composition.

Abstract: Non-linear optical materials using a 16-benzalandrosta-1,4-diene-3,17-dione compound represented by the formula [I] ##STR1## wherein R is hydrogen, alkyl or other specified substituents, have a high non-linear optical constant, and can provide a non-linear optical device having excellent properties.

Abstract: A non-linear optical material made of a compound represented by the formula: ##STR1## wherein R.sup.1 and R.sup.2 represent independently a hydrogen atom, an alkyl group having 1-22 carbon atoms, a hydroxyalkyl group having 1-22 carbon atoms, a haloalkyl group having 1-22 carbon atoms, a cyanoalkyl group having 1-22 carbon atoms or an aryl group having 6-10 carbon atoms; and R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9 and R.sup.10 represent independently a hydrogen atom, an alkyl group having 1-10 carbon atoms, an alkoxyl group having 1-10 carbon atoms, a halogen atom, a cyano group, a hydroxyl group, an alkoxycarbonyl group having 2-22 carbon atoms, or an acyl group, has a high non-linear optical coefficient and is suitable for use in a non-linear optical device.

Abstract: Aryl triflate compounds can generate a strong acid when exposed to irradiation of radiation and can be used as an acid generator in a radiologically-acid-producing agent system and a radiosensitive composition.

Abstract: A photopolymerizable composition comprising an addition polymerizable compound, an N-aryl-.alpha.-amino acid and a photosensitizer capable of absorbing a light having a wavelength of 300 nm or more such as thioxanthones, isoalloxazines, coumarines, and the like is excellent in sensitivity to irradiated light and is suitable for preparing relief images, photoresists, etc.

Abstract: A photopolymerizable composition comprising (a) an addition polymerizable compound having a boiling point of 100.degree. C. or high under an atmospheric pressure, (b) a photoinitiator, and (c) a benzene derivative can provide a cured film having high strength suitable for producing, e.g. printed circuit boards.

Abstract: A photoinitiator composition comprising (1) an aminobenzylidene carbonyl compound and (2) an N-aryl-.alpha.-amino acid is suitable for use in a photo-polymerizable composition comprising (a) an addition-polymerizable compound having a boiling point of 100.degree. C. or higher at an atmospheric pressure and (b) said photoinitiator composition.