Patents by Inventor Makoto Muramatsu
Makoto Muramatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7799843Abstract: A file is formed by coating a substrate with a film-forming composition including a compound having an alicyclic hydrocarbon structure and irradiating the coated composition with microwaves having a frequency of 5.8 GHz. An insulating film is formed by irradiating a film including a compound having a siloxane structure with microwave having a frequency of 5.8 GHz. These films possess excellent film properties such as dielectric constant and mechanical strength.Type: GrantFiled: February 25, 2009Date of Patent: September 21, 2010Assignee: FUJIFILM CorporationInventors: Makoto Muramatsu, Akira Asano, Kensuke Morita
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Patent number: 7772690Abstract: An insulating film for semiconductor devices is obtained by curing, on a substrate, a high molecular compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents and having a cyclic siloxane structure, wherein the structure of the cage-type silsesquioxane compound is not broken by curing, and the breakage of the cage structure can be detected by observing a peak at approximately 610 cm?1 in Raman spectrum of the film after curing.Type: GrantFiled: March 3, 2008Date of Patent: August 10, 2010Assignee: FUJIFILM CorporationInventors: Kensuke Morita, Koji Wariishi, Akira Asano, Makoto Muramatsu
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Publication number: 20100158424Abstract: Fitting resistance accompanied by press-fitting of a creep-resistant rolling bearing into a housing is reduced to prevent cutting of a resin band. A projection (7a) of the resin band (7) projects from the ring groove (6) of an outer ring (2), and a lateral cross section of the projection (7a) is formed in a trapezoidal shape having slope surfaces (7b) each with an inward tilt angle ?. The construction reduces fitting resistance accompanied by press-fitting of the creep-resistant rolling bearing into the housing (10), preventing cutting of the resin band (7).Type: ApplicationFiled: May 2, 2008Publication date: June 24, 2010Inventor: Makoto Muramatsu
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Publication number: 20100040316Abstract: The object is to provide a sealed rolling bearing which has high sealability sufficient to substantially completely prevent entry of muddy water. The radially outer portion of the seal member 5 is fitted in each of a pair of seal grooves 7 formed in the radially outer surface of an outer ring 1 at both ends thereof. A seal lip 12 formed at the radially inner portion of each seal member 5 is brought into elastic contact with an inner seal surface 10 of each of annular grooves 9 formed in the radially outer surface of an inner ring 2 at both ends thereof. The contact portion X of the seal surface 10 that is in elastic contact with the seal lip 12 has a circumferential flatness A of 5 to 20 ?m. With this arrangement, it is possible to improve sealability at the contact portions, thereby preventing entry of e.g. muddy water into the bearing.Type: ApplicationFiled: November 12, 2007Publication date: February 18, 2010Inventor: Makoto Muramatsu
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Publication number: 20090221778Abstract: A file is formed by coating a substrate with a film-forming composition including a compound having an alicyclic hydrocarbon structure and irradiating the coated composition with microwaves having a frequency of 5.8 GHz. An insulating film is formed by irradiating a film including a compound having a siloxane structure with microwave having a frequency of 5.8 GHz. These films possess excellent film properties such as dielectric constant and mechanical strength.Type: ApplicationFiled: February 25, 2009Publication date: September 3, 2009Applicant: FUJIFILM CoporationInventors: Makoto MURAMATSU, Akira ASANO, Kensuke MORITA
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Publication number: 20090220898Abstract: The pattern forming method includes forming a catalyst film on a base layer having an uneven surface, wherein the catalyst layer is formed along the uneven surface of the base layer; forming a coating film by coating a fluid material on the catalyst film; forming an insoluble layer which is insoluble in a solvent in the coating film by reacting the coating film along the catalyst film; and maintaining the insoluble layer by removing an unreacted portion of the coating film by using the solvent.Type: ApplicationFiled: February 24, 2009Publication date: September 3, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Kazuyuki MITSUOKA, Makoto MURAMATSU, Mitsuaki IWASHITA
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Publication number: 20090104371Abstract: A film forming composition is provided that includes (A) a radical polymerization initiator, and (B-1) a compound represented by Formula (1) below and/or a polymer polymerized using at least a compound represented by Formula (1) below, and/or (B-2) a compound represented by Formula (2) below and/or a polymer polymerized using at least a compound represented by Formula (2) below (in Formula (1), the two R1s denote groups consisting only of carbon and hydrogen, which may be identical to or different from each other, and may be linked to each other to form a 6- or higher-membered ring structure, and the R2s denote hydrogen atoms or are represented by Formula (3) below and may be identical to or different from each other provided that at least one of the R2s is represented by Formula (3)) (in Formula (2), the two R4s and the two R5s denote groups consisting only of carbon and hydrogen, which may be identical to or different from each other, R4 and R4, and R5 and R5 may be linked to each other to form a 6-Type: ApplicationFiled: September 16, 2008Publication date: April 23, 2009Applicant: FUJIFILM CORPORATIONInventors: Hidetoshi Hiraoka, Makoto Muramatsu
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Patent number: 7497630Abstract: A sealed rolling bearing has sealing devices with both the functions of high sealing ability and small sliding resistance, which are antipodal to each other. The sealed rolling bearing has an outer member (1, 30) formed with an outer raceway surface (8, 29) on its inner circumferential surface. An inner member (4, 5, 32) is formed with an inner raceway surface (9a, 9b, 31) on its outer circumferential surface. The inner raceway surface (9a, 9b, 31) is arranged opposite to the outer raceway surface (8, 29). Rolling elements (10, 34) are freely rollably contained between the outer and inner raceway surfaces. Sealing devices (12, 13, 35) are arranged in an annular space formed between the outer and inner members (1, 30 and 4, 5, 32). Each of the sealing devices (12, 13; 35) has elastic sealing lips (27a˜27c, 23˜25, 37a, 37b).Type: GrantFiled: October 22, 2004Date of Patent: March 3, 2009Assignee: NTN CorporationInventors: Makoto Muramatsu, Daisuke Kunimatsu
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Publication number: 20090053904Abstract: In the present invention, a coating solution containing polysilazane is applied to a substrate to form a coating film. Thereafter, an ultraviolet ray is applied to the coating film formed on the substrate to cut a molecular bond of polysilazane in the coating film. Then, the coating film in which the molecular bond of polysilazane has been cut is oxidized while the coating film is being heated. Then, the oxidized coating film is baked at a baking temperature equal to or higher than a heating temperature when the coating film is oxidized.Type: ApplicationFiled: August 15, 2008Publication date: February 26, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Gen You, Makoto Muramatsu, Hiroyuki Fujii, Shouichi Terada, Takanori Nishi
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Patent number: 7471198Abstract: To provide a machine component with an IC tag affixed thereto, in which with the IC tag having an increased storage capacity, the IC tag can be mounted with no difficulty and, also, reading or writing of information from or in the IC tag, respectively, can be facilitated. A plurality of IC tags 2 are attached to a machine component, which forms a part of a rolling bearing assembly 1, or to a machine component and an accessory with division made therebetween. Those plural IC tags 2 have different information stored therein. Where the machine component is a retainer incorporated rolling bearing assembly 1, those plural IC tags are attached to a roller retainer 5 at respective locations symmetrical with each other about the axis O of rotation thereof.Type: GrantFiled: September 7, 2004Date of Patent: December 30, 2008Assignee: NTN CorporationInventors: Naota Yamamoto, Ken Horiuchi, Koushirou Fujimoto, Yoshihisa Shibuya, Makoto Muramatsu
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Publication number: 20080217746Abstract: An insulating film for semiconductor devices is obtained by curing, on a substrate, a high molecular compound obtained by polymerizing a cage-type silsesquioxane compound having two or more unsaturated groups as substituents and having a cyclic siloxane structure, wherein the structure of the cage-type silsesquioxane compound is not broken by curing, and the breakage of the cage structure can be detected by observing a peak at approximately 610 cm?1 in Raman spectrum of the film after curing.Type: ApplicationFiled: March 3, 2008Publication date: September 11, 2008Applicant: FUJIFILM CORPORATIONInventors: Kensuke MORITA, Koji WARIISHI, Akira ASANO, Makoto MURAMATSU
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Publication number: 20080214761Abstract: An insulating film forming composition, includes: a polymerized substance obtained by dissolving a cage-type silsesquioxane compound having two or more unsaturated groups as substituents in an organic solvent to give a concentration of 12 mass % or less, and polymerizing the cage-type silsesquioxane compound in presence of a polymerization initiator, wherein the polymerized substance obtained by reacting the cage-type silsesquioxane compound having two or more unsaturated groups as substituents totally amounts to 70 mass % or greater of a solid component contained in the insulating film forming composition.Type: ApplicationFiled: March 3, 2008Publication date: September 4, 2008Applicant: FUJIFILM CORPORATIONInventors: Kensuke MORITA, Makoto MURAMATSU
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Publication number: 20080213602Abstract: An antireflection film forming composition, includes: a polymerized product of Compound (I) having m number of RSi(O0.5)3 units, in which m stands for an integer of from 8 to 16, and Rs each independently represents a non-hydrolyzable group, with the proviso that at least two of Rs each represents a vinyl- or ethynyl-containing group, wherein each of the RSi(O0.5)3 units is linked to another RSi(O0.5)3 unit while having an oxygen atom in common and constitutes a cage structure, and wherein, of solids contained in the composition, the polymerized product obtained by a polymerization reaction of Compound (I) amounts to 60 mass % or greater and Compound (I) amounts to 15 mass % or less.Type: ApplicationFiled: March 3, 2008Publication date: September 4, 2008Applicant: FUJIFILM CORPORATIONInventors: Kensuke MORITA, Makoto MURAMATSU, Kouji TONOHARA
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Publication number: 20080176004Abstract: In the present invention, a spin chuck which horizontally holds a substrate by vacuum suction is provided inside a treatment container of a coating treatment apparatus. Above the spin chuck, a coating nozzle is located for applying a coating solution containing a coating film forming component in the liquid state onto the central portion of the surface of the substrate. In an upper portion of the treatment container, an irradiation unit is provided which applies ultraviolet rays to the substrate on the spin chuck. After applying the coating solution onto the pattern on the substrate from the coating nozzle, ultraviolet rays are applied from the irradiation unit to the applied coating solution to form a coating film.Type: ApplicationFiled: January 11, 2008Publication date: July 24, 2008Applicant: TOKYO ELECTRON LIMITEDInventor: Makoto MURAMATSU
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Publication number: 20080081131Abstract: A production method of an insulating film includes (1) a process of applying, onto a substrate, a film forming composition comprising a compound having a cage structure to form a film and then drying the film; and (2) a process of irradiating the film with an electron beam or an electromagnetic wave having a wavelength greater than 200 nm.Type: ApplicationFiled: October 1, 2007Publication date: April 3, 2008Applicant: FUJIFILM CORPORATIONInventor: Makoto MURAMATSU
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Patent number: 7326299Abstract: A process liquid supply nozzle comprises a substantially tubular main nozzle provided with a discharge port for discharging a coating liquid, a substantially bowl-shaped nozzle holder provided with a through-hole into which the main nozzle can be inserted, and a free space formed between the inner circumferential surface of the nozzle holder and the outer circumferential surface of the main nozzle, at least a prescribed cleaning liquid being supplied into the free space. The nozzle holder or the nozzle is relatively movable in the vertical direction such that the coating liquid is discharged from the discharge port under the state that the discharge port of the main nozzle projects downward from the through-hole, and the nozzle is cleaned with the cleaning liquid under the state that the nozzle is housed in the nozzle holder.Type: GrantFiled: February 24, 2004Date of Patent: February 5, 2008Assignee: Tokyo Electron LimitedInventors: Makoto Muramatsu, Hitoshi Hashima, Norihiko Sasagawa, Takeshi Hirao
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Patent number: 7205024Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.Type: GrantFiled: February 5, 2004Date of Patent: April 17, 2007Assignee: Tokyo Electron LimitedInventors: Kazuhiro Takeshita, Shinji Nagashima, Makoto Muramatsu, Yoji Mizutani, Kazutoshi Yano, Kyoshige Katayama
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Publication number: 20070054135Abstract: A composition comprising: a polymerized substance of a compound (I) that contains m numbers of RSi(O0.5)3 units, wherein m represents an integer of from 8 to 16; and R's each independently represents a non-hydrolysable group, provided that at least two among R's represent groups containing a vinyl group or an ethynyl group, and wherein each one of the RSi(O0.5)3 units is connected to another one of the RSi(O0.5)3 units by sharing an oxygen atom in each one of the RSi(O0.5)3 units, so as to form a cage structure, and wherein within a solid component contained in the composition, a polymerized substance formed by a reaction of the compound (I) represents 60 mass % or more.Type: ApplicationFiled: September 5, 2006Publication date: March 8, 2007Inventors: Kensuke Morita, Koji Wariishi, Kazutaka Takahashi, Makoto Muramatsu
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Publication number: 20070031077Abstract: A sealed rolling bearing has sealing devices with both the functions of high sealing ability and small sliding resistance, which are antipodal to each other. The sealed rolling bearing has an outer member (1, 30) formed with an outer raceway surface (8, 29) on its inner circumferential surface. An inner member (4, 5, 32) is formed with an inner raceway surface (9a, 9b, 31) on its outer circumferential surface. The inner raceway surface (9a, 9b, 31) is arranged opposite to the outer raceway surface (8, 29). Rolling elements (10, 34) are freely rollably contained between the outer and inner raceway surfaces. Sealing devices (12, 13, 35) are arranged in an annular space formed between the outer and inner members (1, 30 and 4, 5, 32). Each of the sealing devices (12, 13; 35) has elastic sealing lips (27a˜27c, 23˜25, 37a, 37b).Type: ApplicationFiled: October 22, 2004Publication date: February 8, 2007Applicant: NTN CorporationInventors: Makoto Muramatsu, Daisuke Kunimatsu
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Publication number: 20060292298Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.Type: ApplicationFiled: August 30, 2006Publication date: December 28, 2006Applicant: TOKYO ELECTRON LIMITEDInventors: Kazuhiro Takeshita, Shinji Nagashima, Makoto Muramatsu, Yoji Mizutani, Kazutoshi Yano, Kyoshige Katayama