Abstract: A control unit of an image reading device is configured to execute image correction control after performing a first reading operation of reading a medium while transporting the medium in a first direction, and the image correction control includes a second reading operation of reading the medium while transporting the medium in a second direction opposite to the first direction, and a combination process for combining a first area serving as a part of image data acquired through the first reading operation with a second area serving as a part of image data acquired through the second reading operation to acquire image data of one page.

Abstract: There is provided a processing apparatus for forming a film with a plasma. The processing apparatus comprises: a processing container, having a ceramic sprayed coating on an inner wall on which an antenna that radiates microwaves is arranged, configured to accommodate a substrate; a mounting table configured to mount the substrate in the processing container; and a controller configured to perform a precoating process of coating a surface of the ceramic sprayed coating with a first carbon film with a plasma of a first carbon-containing gas at a first pressure and a film forming process of forming a second carbon film on the substrate with a plasma of a second carbon-containing gas at a second pressure.

Abstract: A normalization unit acquires a normalized reference value being a value obtained from normalization of a reference value according to a predetermined normalization rule, the reference value being a status value acquired from an air conditioner during a normal estimation period during which the air conditioner is estimated to operate normally, the status value indicating an operational status of the air conditioner. An acquiring unit acquires from the air conditioner, the status value as a diagnosis value during a diagnosis period during which it is not clear whether or not the air conditioner operates normally and which is after the normal estimation period. The normalization unit normalizes the diagnosis value according to the normalization rule.

Abstract: A substrate processing method of processing a substrate includes: a carry-in process of carrying the substrate into a processing container; a first process of forming a first carbon film on the substrate with plasma of a first mixture gas containing a carbon-containing gas in a state in which interior of the processing container is maintained at a first pressure; and a second process of changing a pressure in the processing container to a second pressure higher than the first pressure.

Abstract: A filament winding device includes a fiber bundle retainer that temporarily retains fiber bundles. The fiber bundle retainer includes: a reel member including an outer peripheral portion having pins movable in the axial direction relative to the fiber bundles supplied through fiber bundle guides and rotatable about the axis of the liner, the reel member capable of winding the fiber bundles onto the outer peripheral portion; a first cutting unit configured to cut a part of each of the fiber bundles in the circumferential direction, the part being between a part of the fiber bundle wound on the outer peripheral portion and a part of the fiber bundle wound on the liner; and a second cutting unit different from the first cutting unit and configured to cut a part of each of the fiber bundles in the axial direction, the part being wound on the outer peripheral portion.

Abstract: A filament winding apparatus includes a rail extending in a first direction, a core material support device that supports a core material, and a winding device that winds a fiber bundle onto an outer peripheral surface of the core material, the winding device including: a guide unit having an opening through which the core material passes, and guiding the fiber bundle; and a main frame on which the guide unit is mounted; wherein the main frame is movable relative to the core material in the first direction, the main frame is movable in a second direction orthogonal to the first direction, and the main frame is rotatable around a first rotational axis extending in a third direction orthogonal to each of the first direction and the second direction.

Abstract: An anomaly determination device, an anomaly determination method, and a memory medium for a water pump are provided. An acquisition process acquires an input variable of a map from image data obtained by capturing an outer surface of the water pump. Execution circuitry obtains provisional determination results from maps, respectively. The provisional determination results are respectively obtained by executing the provisional determination processes for output variables output from the maps. A determination finalizing process treats, as a majority of the provisional determination results, a final determination result indicating whether coolant has leaked out of the water pump.

Abstract: A substrate processing method of processing a substrate having a base film includes a loading process of loading the substrate into a processing container, a first process of performing a first plasma process in a state where the loaded substrate is held at a first position by raising substrate support pins of a stage arranged in the processing container, and a second process of performing a second plasma process while holding the substrate at a second position by lowering the substrate support pins.

Abstract: There is provided a mobile terminal and an IC chip management method that make it possible to protect an IC chip from unauthorized access. An IC chip of a device includes a memory forming a protection-target region that is a storage region for predetermined information targeted for protection and a specific-state region that is a storage region for state information representing a specific state of a user. The device includes the IC chip and a control section that performs control so as to bring the protection-target region to a usage-unpermitted state in the case where, in the IC chip, the state information is changed to information representing a state in which the predetermined information is not used. The present technology can be applied to a near-field wireless communication system.

Abstract: A control device controls a plurality of air conditioners that are placed in a space so as to adjoin. A designation unit designates an air conditioner being placed in an area in the space where presence of any person is detected, as a first air conditioner, and designates an air conditioner being placed adjacent to the first air conditioner, as a second air conditioner, among the plurality of air conditioners. A control unit causes the first air conditioner to carry out either of cooling operation and heating operation as air conditioning operation, and causes the second air conditioner to carry out air blowing operation with an air volume and a wind direction that are equivalent to an air volume and a wind direction of the air conditioning operation by the first air conditioner.

Abstract: A method of pre-coating a carbon film by plasma in a processing container, includes: pre-coating an inner wall of the processing container with a first carbon film by plasma of a first carbon-containing gas under a first pressure; and processing the first carbon film with the plasma under a second pressure.

Abstract: A film forming method includes: a loading process of loading a substrate into a processing container; a first process of forming an interface layer having an amorphous structure or a microcrystalline structure on the substrate by plasma of a first mixed gas including a carbon-containing gas; and a second process of forming a graphene film on the interface layer by plasma of a second mixed gas including the carbon-containing gas.

Abstract: When a refrigerant leakage sensor detects a leakage of refrigerant from a refrigeration cycle apparatus having an indoor unit and an outdoor unit, a refrigerant recovery operation is started. In the refrigerant recovery operation, refrigerant is recovered in an accumulator and afterward a pump down operation is performed. In recovery of refrigerant in the accumulator, refrigerant in a liquid phase is accumulated in the accumulator as a result of circulation of refrigerant by operating a compressor in the state where a liquid shut-off valve and a gas shut-off valve are opened. After recovery of refrigerant in the accumulator is ended, the refrigerant in a liquid phase is accumulated in an outdoor heat exchanger by the pump down operation for operating the compressor in the state where the liquid shut-off valve is closed.

Abstract: A substrate processing method includes: a carry-in step of carrying a substrate having a silicon-containing film on a surface of the substrate into a processing container; a first step of forming an adsorption layer by supplying an oxygen-containing gas into the processing container and causing the oxygen-containing gas to be adsorbed on a surface of the silicon-containing film; a second step of forming a silicon oxide layer by supplying an argon-containing gas into the processing container and causing the adsorption layer and the surface of the silicon-containing film to react with each other with plasma of the argon-containing gas; and a third step of forming a graphene film on the silicon oxide layer by supplying a carbon-containing gas into the processing container with plasma of the carbon-containing gas.

Abstract: A film forming method of forming a film on a substrate by using a film forming apparatus including a processing container, and a stage provided in an interior of the processing container to place the substrate thereon and in which aluminum is contained, includes: forming a film continuously on one substrate or on a plurality of substrates by supplying a gas for film formation to the interior of the processing container while heating the substrate placed on the stage; cleaning the interior of the processing container with a fluorine-containing gas in a state in which the substrate is unloaded from the processing container; and performing a post-process by generating plasma of an oxygen- and hydrogen-containing-gas in the interior of the processing container, wherein the forming the film, the cleaning the interior of the processing container, and the performing the post-process are repeatedly performed.

Abstract: A film forming method includes repeatedly performing: forming a film on one substrate or consecutively on a plurality of substrates by supplying a film formation gas into a processing container while heating the substrate on a stage; cleaning an interior of the processing container by a fluorine-containing gas by setting a temperature of the stage to a first temperature at which a vapor pressure of an aluminum fluoride becomes lower than a control pressure in the processing container in a state in which the substrate is unloaded from the processing container; and performing a precoating continuously to the cleaning the interior of the processing container such that a precoat film is formed on at least a surface of the stage by setting the temperature of the stage to a second temperature at which the vapor pressure of the aluminum fluoride becomes lower than the control pressure in the processing container.

Abstract: A battery mount portion includes a recessed portion into which a portion of a battery enters, a coupling terminal provided inside the recessed portion and configured to be electrically coupled to the battery, and a covering portion that covers the coupling terminal and that constitutes a portion of the housing. In a state in which the battery is unmounted, a cover that covers an area in the battery mount portion other than the covering portion is detachably attachable, and a portion where the cover and the housing overlap each other in a depth direction of the recessed portion is located outside a path of a liquid heading towards the coupling terminal after entering the recessed portion through a portion where the cover and the covering portion oppose each other.

Abstract: A film forming method of forming a carbon film includes: cleaning an interior of a processing container by using oxygen-containing plasma in a state in which no substrate is present inside the processing container; subsequently, extracting and removing oxygen inside the processing container by using plasma in the state in which no substrate is present inside the processing container; and subsequently, loading a substrate into the processing container and forming the carbon film on the substrate through plasma CVD using a processing gas including a carbon-containing gas, wherein the cleaning, the extracting and removing the oxygen, and the forming the carbon film are repeatedly performed.

Abstract: Upon detection of a leakage of refrigerant, a refrigerant recovery operation is performed for operating a compressor in a state where an outdoor expansion valve is closed. The refrigerant suctioned from an indoor unit passes through an outdoor heat exchanger so as to be liquefied and accumulated in an outdoor unit. When a low-pressure detection value by a pressure sensor decreases below a reference value, a termination condition for the refrigerant recovery operation is satisfied, and the compressor is stopped. Furthermore, when an abnormality in the refrigerant recovery operation is detected based on a behavior of the low-pressure detection value obtained until the termination condition is satisfied, the compressor is stopped to thereby end the refrigerant recovery operation. Also, guidance information for notification about an abnormality is output to a user.

Abstract: There is provided a processing apparatus for forming a film with a plasma. The processing apparatus comprises: a processing container, having a ceramic sprayed coating on an inner wall on which an antenna that radiates microwaves is arranged, configured to accommodate a substrate; a mounting table configured to mount the substrate in the processing container; and a controller configured to perform a precoating process of coating a surface of the ceramic sprayed coating with a first carbon film with a plasma of a first carbon-containing gas at a first pressure and a film forming process of forming a second carbon film on the substrate with a plasma of a second carbon-containing gas at a second pressure.