Abstract: Imaging optics for optical devices, with which reflections of the illumination light, which is guided through the same optical elements as the observation light, are kept from reaching the observation pupil of the imaging beam path. The non-reflective imaging optics include at least two refractive optical elements, which are utilized for illumination as well as observation. The at least two refractive optical elements are designed approximately wedge-shaped and are tilted at a random azimuth angle of at least 5° and/or are positioned off-center in the beam path to block out the single reflections of the illumination, occurring at the optical system surfaces, for the observation. The imaging optics are for optical devices, particularly in ophthalmology thought the invention is applicable to other ophthalmological devices as well as to optical devices outside of this field.

Abstract: A projection system having a first tilting mirror matrix, a second tilting mirror matrix, and an imaging lens, which projects the first tilting mirror matrix onto the second tilting mirror matrix, wherein each tilting mirror matrix has multiple tilting mirrors, the tilting axes of which are positioned in a modulator surface plane. The imaging lens includes a first lens and an imaging mirror, and the imaging mirror forms an aperture stop of the imaging lens, wherein the aperture diaphragm includes an uneven angle of 90° together with the normal of the modulator surface of the first tilting mirror matrix without taking into account any optical path folds.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: An anamorphic imaging objective having multiple effective optical surfaces. One of the effective surfaces is implemented as anamorphic and one of the effective surfaces is implemented as a free-form surface, which has an aspheric contour in at least one of the two main sections and which has precisely two planes of mirror symmetry, the main sections lying in the planes of mirror symmetry.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: In an apparatus for projecting a multi-colored picture on a projection screen (17), having a light source (1) that emits multi-colored light, a color unit (9, 35), a first and a second light modulator (12, 13, 14) arranged following the color unit (9, 35), and a projection optics (16), wherein the color unit (9, 35) is illuminated with light from the light source (1) and separates light in a first and a second color and directs it on the first and second light modulator (12, 13), wherein the light modulators (12, 13, 14) modulate the light shining on them, in order to generate a color frame each of the multi-colored picture, and wherein the modulated light is superimposed to a common luminous beam by means of the color unit (9, 35), where the luminous beam illuminates the projection optics (16), and wherein an optics system (7, 23, 28, 31) that is illuminated by the common luminous beam is provided between the color unit (9, 35) and the projection optics (16) comprising a curved mirror (21, 24, 26), wherein t

Abstract: In an apparatus for projecting a multi-colored picture on a projection screen (17), having a light source (1) that emits multi-colored light, a color unit (9, 35), a first and a second light modulator (12, 13, 14) arranged following the color unit (9, 35), and a projection optics (16), wherein the color unit (9, 35) is illuminated with light from the light source (1) and separates light in a first and a second color and directs it on the first and second light modulator (12, 13), wherein the light modulators (12, 13, 14) modulate the light shining on them, in order to generate a color frame each of the multi-colored picture, and wherein the modulated light is superimposed to a common luminous beam by means of the color unit (9, 35), where the luminous beam illuminates the projection optics (16), and wherein an optics system (7, 23, 28, 31) that is illuminated by the common luminous beam is provided between the color unit (9, 35) and the projection optics (16) comprising a curved mirror (21, 24, 26), wherein t