Patents by Inventor Martin J. Goldberg

Martin J. Goldberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6239273
    Abstract: A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
    Type: Grant
    Filed: October 26, 1999
    Date of Patent: May 29, 2001
    Assignee: Affymetrix, Inc.
    Inventors: R. Fabian Pease, Glenn McGall, Martin J. Goldberg, Richard P. Rava, Stephen P. A. Fodor, Virginia Goss, Lubert Stryer, James L. Winkler
  • Patent number: 6203989
    Abstract: Methods and compounds are provided for detecting target molecules in a sample using specific binding assays. In particular, methods are provided for detecting a nucleic acid target in a sample. In one embodiment, the method comprises hybridizing a nucleic acid target, comprising a target nucleic acid sequence, to a nucleic acid probe, comprising a probe nucleic acid sequence, wherein the target comprises a binding ligand. The hydridized target is contacted with a receptor comprising multiple sites capable of binding the binding ligand to complex the receptor to the binding ligand, and the receptor is contacted with an amplification reagent, comprising a plurality of the binding ligands, to complex the amplification reagent to the receptor. The presence of the complexed amplification reagent then is detected, for example, by detecting the presence of a detectable label, such as a fluorescent label, for example, on the receptor or the amplification reagent.
    Type: Grant
    Filed: March 25, 1999
    Date of Patent: March 20, 2001
    Assignee: Affymetrix, Inc.
    Inventors: Martin J. Goldberg, Govinda Rao S. Yelagalawadi, Eugene Yuji Tanimoto, Huu Minh Tran, Helin Dong, David Lockhart, Thomas B. Ryder, Janet A. Warrington, Jody Beecher
  • Patent number: 6150147
    Abstract: The present invention provides modified methods and apparatus for the preparation of arrays of material wherein each array includes a preselected collection of polymers, small molecules or inorganic materials associated with a surface of a substrate. The methods of the invention provide for modifications to general apparatus, flow cell geometries and solutions used in array fabrication.
    Type: Grant
    Filed: February 6, 1998
    Date of Patent: November 21, 2000
    Assignee: Affymetrix, Inc.
    Inventors: Martin J. Goldberg, Mel Yamamoto, Glenn H. McGall, Steven J. Woodman, Eric Spence, Lisa T. Kajisa
  • Patent number: 6083697
    Abstract: Radiation-activated catalysts (RACs), autocatalytic reactions, and protective groups are employed to achieve a highly sensitive, high resolution, radiation directed combinatorial synthesis of pattern arrays of diverse polymers. When irradiated, RACs produce catalysts that can react with enhancers, such as those involved in autocatalytic reactions. The autocatalytic reactions produce at least one product that removes protecting groups from synthesis intermediates. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: November 13, 1997
    Date of Patent: July 4, 2000
    Assignee: Affymetrix, Inc.
    Inventors: Jody E. Beecher, Martin J. Goldberg, Glenn H. McGall
  • Patent number: 5831070
    Abstract: A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
    Type: Grant
    Filed: April 19, 1996
    Date of Patent: November 3, 1998
    Assignee: Affymetrix, Inc.
    Inventors: R. Fabian Pease, Glenn McGall, Martin J. Goldberg, Richard P. Rava, Stephen P. A. Fodor, Virginia Goss, Lubert Stryer, James L. Winkler
  • Patent number: 5599695
    Abstract: A method and apparatus for selectively applying a print material onto a substrate for the synthesis of an array of oligonucleotides at selected regions of a substrate. The print material includes a barrier material, a monomer sequence, a nucleoside, a deprotection agent, a carrier material, among other materials. The method and apparatus also relies upon standard DMT based chemistry, and a vapor phase deprotection agent such as solid TCA and the like.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: February 4, 1997
    Assignee: Affymetrix, Inc.
    Inventors: R. Fabian Pease, Glenn McGall, Martin J. Goldberg, Richard P. Rava, Stephen P. A. Fodor, Virginia Goss, Lubert Stryer, James L. Winkler
  • Patent number: 5563273
    Abstract: An electrochemical color change cell incorporating as a color changing agent intramolecular charge transfer salt or an intermolecular charge transfer salt. The intermolecular charge transfer salts and the intramolecular charge transfer salts have a plurality of oxidation states and a wide variation in color change. The intermolecular and intramolecular charge transfer salts preferably contain a violene moiety and a moiety having a carbonyl group conjugated to an aromatic moiety. The intramolecular charge transfer salts have a stable covalent radical-anion/radical-cation configuration. The intermolecular charge transfer salts have a stable ionic radical-anion/radical-cation configuration.
    Type: Grant
    Filed: February 9, 1994
    Date of Patent: October 8, 1996
    Assignee: International Business Machines Corporation
    Inventors: Stephen L. Buchwalter, Martin J. Goldberg, Revathi Iyengar, Terrence R. O'Toole, Alfred Viehbeck
  • Patent number: 5503698
    Abstract: A chemical solder is described that includes an organometallic complex or compound which thermally degrades within a predetermined temperature range to a metal and volatile compounds. The solder also includes a polymeric matrix that decomposes within the same temperature range to volatile fractions, thereby leaving only the metal. A method for bonding first and second bodies is disclosed wherein a chemical solder, as above-described, is disposed between the first and second bodies and heat is applied to elevate the solder to the predetermined temperature range to thermally degrade the organometallic compound and to decompose the polymeric matrix. The remaining metal bonds the first and second bodies.
    Type: Grant
    Filed: July 9, 1991
    Date of Patent: April 2, 1996
    Assignee: International Business Machines Corporation
    Inventors: Martin J. Goldberg, Hiroshi Ito, Caroline A. Kovac, Michael J. Palmer, Roger A. Pollak, Paige A. Poore
  • Patent number: 5374454
    Abstract: A halogenated polymeric material is exposed to a reducing agent and/or an electrolyte and applied voltage to render exposed portions capable of being metallized and of being etched. The exposed portions can also be doped to thereby induce electrical conductivity therein. Also, new structures containing a free standing halogenated polymeric-containing layer and electrical conductive pattern thereon are provided.
    Type: Grant
    Filed: February 4, 1993
    Date of Patent: December 20, 1994
    Assignee: International Business Machines Incorporated
    Inventors: Harry R. Bickford, Peter J. Duke, Elizabeth Foster, Martin J. Goldberg, Voya R. Markovich, Linda C. Matthew, Donald G. McBride, Terrence R. O'Toole, Stephen L. Tisdale, Alfred Viehbeck
  • Patent number: 5281447
    Abstract: The invention is directed to a method for forming a metal coating on a substrate by applying an oxalate of a Group VIII element from the Periodic Table of the Elements to the substrate. The oxalate is selected so that it will decompose to a complex of a zero valent Group VIII element or a Group VIII element on exposure to an energy source. Microelectronic circuits, etch masks or metal contacts on superconductors can be formed by the method when the oxalate coating is exposed to an energy source through a mask or the energy source beamed at the oxalate to trace a pattern on it.The metal thus obtained can be subsequently coated by electroless compositions especially where the Group VIII element is a catalyst for electroless coatings such as palladium. Additionally, the metal coating may be coated by an electrolytic composition.
    Type: Grant
    Filed: October 25, 1991
    Date of Patent: January 25, 1994
    Assignee: International Business Machines Corporation
    Inventors: Michael J. Brady, Stephen L. Buchwalter, Richard J. Gambino, Martin J. Goldberg, Kam L. Lee, Alfred Viehbeck
  • Patent number: 5242713
    Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons.
    Type: Grant
    Filed: December 23, 1988
    Date of Patent: September 7, 1993
    Assignee: International Business Machines Corporation
    Inventors: Alfred Viehbeck, Stephen L. Buchwalter, William A. Donson, John J. Glenning, Martin J. Goldberg, Kurt R. Grebe, Caroline A. Kovac, Linda C. Matthew, Walter P. Pawlowski, Mark J. Schadt, Michael R. Scheuermann, Stephen L. Tisdale
  • Patent number: 5203955
    Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons.
    Type: Grant
    Filed: May 24, 1991
    Date of Patent: April 20, 1993
    Assignee: International Business Machines Corporation
    Inventors: Aldred Viehbeck, Stephen L. Buchwalter, John J. Glenning, Martin J. Goldberg, Caroline A. Kovac, Linda C. Matthew, Walter P. Pawlowski, Stephen L. Tisdale
  • Patent number: 5179467
    Abstract: An electrochemical color change cell incorporating as a color changing agent intramolecular charge transfer salt or an intermolecular charge transfer salt. The intermolecular charge transfer salts and the intramolecular charge transfer salts have a plurality of oxidation states and a wide variation in color change. The intermolecular and intramolecular charge transfer salts preferably contain a violene moiety and a moiety having a carbonyl group conjugated to an aromatic moiety. The intramolecular charge transfer salts have a stable covalent radical-anion/radical-cation configuration. The intermolecular charge transfer salts have a stable ionic radical-anion/radical-cation configuration.
    Type: Grant
    Filed: September 17, 1990
    Date of Patent: January 12, 1993
    Assignee: International Business Machines Corporation
    Inventors: Stephen L. Buchwalter, Martin J. Goldberg, Revathi Iyengar, Terrence R. O'Toole, Alfred Viehbeck
  • Patent number: 5135779
    Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons.
    Type: Grant
    Filed: May 24, 1991
    Date of Patent: August 4, 1992
    Assignee: International Business Machines Corporation
    Inventors: Alfred Viehbeck, Stephen L. Buchwalter, Martin J. Goldberg, Caroline A. Kovac, Stephen L. Tisdale
  • Patent number: 5132351
    Abstract: A chemical solder is described that includes an organometallic which thermally degrades within a predetermined temperature range to a metal and volatile compounds. The solder also includes a polymeric matrix that decomposes within the same temperature range to volatile fractions, thereby leaving only the metal.A method for bonding first and second bodies is disclosed wherein a chemical solder, as above-described, is disposed between the first and second bodies and heat is applied to elevate the solder to the predetermined temperature range to thermally degrade the organometallic compound and to decompose the polymeric matrix. The remaining metal bonds the first and second bodies.
    Type: Grant
    Filed: July 11, 1991
    Date of Patent: July 21, 1992
    Assignee: International Business Machines Corporation
    Inventors: Martin J. Goldberg, Hiroshi Ito, Caroline A. Kovac, Michael J. Palmer, Roger A. Pollak, Paige A. Poore
  • Patent number: 5104944
    Abstract: A process for the synthesis of derivatives of materials containing an imide group conjugated to an aromatic moiety to form an ester, a thioester, an amide, a ketone, and silylesters. Electrons are supplied to redox sites to form a reduced imide material. The reduced imide material is contacted with a nucleophile which opens the imide ring of the reduced imide and chemically combines with a carbonyl carbon atom of the open imide ring to form an imide derivative.
    Type: Grant
    Filed: July 18, 1989
    Date of Patent: April 14, 1992
    Assignee: International Business Machines Corporation
    Inventors: Martin J. Goldberg, Daniel P. Morris, Alfred Viehbeck
  • Patent number: 5045159
    Abstract: Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.
    Type: Grant
    Filed: July 18, 1989
    Date of Patent: September 3, 1991
    Assignee: International Business Machines Corporation
    Inventors: Martin J. Goldberg, Daniel P. Morris, Alfred Viehbeck