Patents by Inventor Martin Jacobus Johan Jak

Martin Jacobus Johan Jak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130010363
    Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 ?m.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Andrey Mikhailovich Yakunin, Martin Jacobus Johan Jak
  • Patent number: 8263950
    Abstract: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: September 11, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Kurt Gielissen, Martin Jacobus Johan Jak
  • Patent number: 8248393
    Abstract: A color display device, a drive circuit for a color display device, a method, a signal and a computer-readable medium for reducing electro-optical cross talk that occurs in a display that is operated in Spectrum Sequential mode is disclosed. The invention eliminates annoying visible artifacts, such as contouring, noise, or color deviation, which normally are introduced by this cross talk by compensating for the cross talk. According to embodiments of the invention, a drive signal (R?,G?,B?) to drive picture elements of the display is altered in video processing circuitry (MPC, XTC, SC) and/or software, in dependence on one or more properties of different spectra from a light source (23, 24) in the display. The invention is implemented with little extra effort and cost in known LCD displays.
    Type: Grant
    Filed: May 9, 2006
    Date of Patent: August 21, 2012
    Assignee: TP Vision Holding B.V.
    Inventors: Gerben Johan Hekstra, Nalliah Raman, Claus Nico Cordes, Martin Jacobus Johan Jak, Jurgen Jean Louis Hoppenbrouwers, Oleg Belik
  • Publication number: 20120182537
    Abstract: A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.
    Type: Application
    Filed: August 2, 2010
    Publication date: July 19, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Martin Jacobus Johan Jak
  • Publication number: 20120154778
    Abstract: A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures.
    Type: Application
    Filed: July 21, 2010
    Publication date: June 21, 2012
    Applicants: KONINKLIJKE PHILIPS ELECTRONICS N.V., ASML NETHERLANDS B.V.
    Inventors: Wouter Anthon Soer, Martin Jacobus Johan Jak, Ronald Dekker
  • Publication number: 20120154779
    Abstract: A method for manufacturing a spectral purity filter is provided in which openings in a first surface of a base material, corresponding to a plurality of apertures of the spectral purity filter, are formed. At least the surfaces of the base material surrounding the openings in the first surface are chemically treated to form a layer of a second material, and the base material is etched from the second surface such that the openings extend from the first surface of the base material to the second surface of the base material.
    Type: Application
    Filed: July 16, 2010
    Publication date: June 21, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wouter Anthon Soer, Martin Jacobus Johan Jak
  • Publication number: 20120147351
    Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation (?<20 nm). The filter comprises a grid-like structure comprising a plurality of microscopic apertures fabricated in a carrier material such as silicon. The grid-like structure in at least part of its area is formed so as to have, within an expected range of operating conditions, a negative Poisson's ratio. By forming the grid of a material that likes to expand or contract simultaneously in orthogonal directions, the management of differential thermal expansion is improved. Various geometries are possible to achieve a negative Poisson's ratio. The aperture geometry may that of a re-entrant polygon or re-entrant shape having curved sides. Examples include a so-called re-entrant or auxetic honeycomb, in which each aperture is hexagonal, as in the regular honeycomb, but the form is a re-entrant hexagon rather than a regular hexagon.
    Type: Application
    Filed: July 14, 2010
    Publication date: June 14, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Wouter Anthon Soer
  • Patent number: 8189011
    Abstract: A light panel (115, 215, 403, 503, 513, 603, 605) having a predetermined number of emitted color options and a processor (113, 213) operably coupled to the light panel (115, 215, 403, 503, 513, 603, 605). The processor (113, 213) responds to a first color selection actuation by controlling the light panel (115, 215, 403, 503, 513, 603, 605) to display each of the predetermined emitted light options within different portions of the light panel (115, 215, 403, 503, 513, 603, 605). Thereafter, the processor (113, 213) responds to a second color selection actuation by controlling the light panel (115, 215, 403, 503, 513, 603, 605) to display a selected one of the predetermined emitted light options substantially over the light panel (115, 215, 403, 503, 513, 603, 605), wherein the selected one of the predetermined emitted light options is indicated by the second color selection actuation.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: May 29, 2012
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Bartel Marinus Van de Sluis, Galileo June Destura, Martin Jacobus Johan Jak
  • Publication number: 20120127368
    Abstract: A display control apparatus comprises a video source(105) which provides a video signal comprising frames. The video source (105) is coupled to a compensation processor (107) which filters at least part of a first frame to provide a compensation for perceived motion blur. A display output (109) feeds the compensated video signal to a display (103) which presents the frame. A controller (111) is arranged to control the display (103) such that it radiates light in a sequence of light pulses for each frame where the sequence of light pulses comprising at least some light pulses having different durations. A motion blur processor (113) determines a suitable compensation filter for the perceived motion blur compensation as one that corresponds to an inverse filter of the sequence of light pulses. The use of pulsed light radiation modifies the hold effect filtering such that it can be better and more easily compensated by pre-filtering.
    Type: Application
    Filed: March 2, 2010
    Publication date: May 24, 2012
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Martin Jacobus Johan Jak, Gerben Johan Hekstra, Michiel Adriaanszoon Klompenhouwer
  • Publication number: 20110228555
    Abstract: A lighting device (1600, 1700, 1800, 1900) is disclosed, comprising a plurality of light sources (102, 111, 119, 120, 1403,1408, 1410, 1410, 1508, 1510, 1512) providing light in different wavelengths, a first collimating means (104, 1400, 1500) having a receiving end (103, 1402) and an output end (114, 1404) wherein said light sources are arranged at said receiving end, and said collimating means comprising a set of dichroic filters (109, 110, 115, 116, 117, 118, 1409, 1411, 1413, 1509, 1511, 1513) arranged as sub-collimators (106, 107, 108) to each of said plurality of light sources such that, for each light source, said sub-collimator collimates the light from its light source, and said dichroic filter of said each light source is translucent for light from adjacent light sources of different wavelength such that mixed and collimated light is outputtable at said output end; and a mixing rod (1604, 1704, 1804, 1904) having a receiving end (1805) and an output end (1806), wherein said first collimating means
    Type: Application
    Filed: August 4, 2008
    Publication date: September 22, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Ramon Pascal Van Gorkom, Martin Jacobus Johan Jak, Gilbert Martinus Verbeek, Marcellinus Petrus Carolus Michael Krijn
  • Publication number: 20110211185
    Abstract: A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.
    Type: Application
    Filed: July 9, 2009
    Publication date: September 1, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Andrei Mikhailovich Yakunin
  • Publication number: 20110164237
    Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.
    Type: Application
    Filed: August 26, 2009
    Publication date: July 7, 2011
    Applicants: ASML NETHERLANDS B.V., KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Wouter Anthon Soer, Andrei Mikhailovich Yakunin, Martin Jacobus Johan Jak, Denny Mathew, Hendrik Jan Kettelarij, Fredericus Christiaan Van Den Heuvel, Elizabeth Maria Kuijpers
  • Publication number: 20110157573
    Abstract: A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first wavelength and allow at least a portion of radiation of a second wavelength to transmit through the aperture. The first wavelength is larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.
    Type: Application
    Filed: July 29, 2009
    Publication date: June 30, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Martin Jacobus Johan Jak
  • Publication number: 20110128519
    Abstract: A radiation source may include a radiation emitter for emitting radiation, a collector for collecting radiation emitted by the radiation emitter, and an outlet configured, in use, to introduce a cooled gas into the radiation source.
    Type: Application
    Filed: May 27, 2010
    Publication date: June 2, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Wouter Anthon SOÉR, Maarten Marinus Johannes Wilhelmus VAN HERPEN, Kurt GIELISSEN, Martin Jacobus Johan JAK
  • Patent number: 7952084
    Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: May 31, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Martin Jacobus Johan Jak
  • Publication number: 20110117504
    Abstract: A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2 and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.
    Type: Application
    Filed: June 9, 2009
    Publication date: May 19, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Martin Jacobus Johan Jak
  • Publication number: 20110116520
    Abstract: The invention relates to a laser-based light source comprising a laser device (1) adapted for generating laser light of a predetermined laser wavelength and emitting this laser light as a laser beam; a light-conversion device (2) for converting at least part of the laser light into converted light; a laser-output sensor (7) for determining a laser-output signal proportional to the output of laser light emitted by the laser device (1); a converted-light sensor (6) for determining a converted-light signal proportional to the output of converted light emitted by the light-conversion device (7); and a controller (9) which is adapted for receiving the laser-output signal and the converted-light signal, for determining a safe-to-operate parameter, based on the laser-output signal and the converted-light signal, and for controlling the operation of the laser-based light source, based on a comparison of the safe-to-operate parameter with a at least one predefined threshold.
    Type: Application
    Filed: July 7, 2008
    Publication date: May 19, 2011
    Applicant: Koninklijke Philips Electronics N.V.
    Inventors: Marcellinus Petrus Carolus Michael Krijn, Martin Jacobus Johan Jak
  • Publication number: 20110075420
    Abstract: The present invention relates to a light output device (10, 50, 70), comprising: a first light source (12a, 52a, 72a); a second light source (12b, 52b, 72b); and a partly transparent mirror (16, 56, 76). The device is characterized in that the partly transparent mirror, during operation, receives substantially all light emitted by the first and second light sources, and reflects part of the light emitted by the first light source and transmits part of the light emitted by the second light source, and vice versa, such that the light from the first light source is completely superimposed onto the light from the second light source following reflection/transmission at the partly transparent mirror. The present invention also relates to a light output method.
    Type: Application
    Filed: June 5, 2009
    Publication date: March 31, 2011
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Ramon Pascal Van Gorkom, Arij Jonathan Rijke, Martin Jacobus Johan Jak
  • Publication number: 20110044425
    Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The apertures extend though the member in different directions in order to be substantially in alignment with radiation constituting a non-parallel beam of radiation.
    Type: Application
    Filed: August 20, 2010
    Publication date: February 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martin Jacobus Johan Jak, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Wouter Anthon Soer, Andrey Mikhailovich Yakunin
  • Publication number: 20110043782
    Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength.
    Type: Application
    Filed: August 20, 2010
    Publication date: February 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Wouter Anthon Soer, Vadim Yevgenyevich Banine, Maarten Marinus Johannes Wilhelmus Van Herpen, Andrei Mikhailovich Yakunin, Martin Jacobus Johan Jak