Patents by Inventor Masaki Takeuchi

Masaki Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240147858
    Abstract: The thermoelectric module includes a first thermoelectric element including a first thermoelectric conversion layer and a first electrolyte layer stacked each other along a stacked direction, a second thermoelectric element stacking the first thermoelectric element in the stacked direction and including a second thermoelectric conversion layer and a second electrolyte layer stacked each other along the stacked direction, a first current collector located on a side of one edge in the stacked direction, a second current collector located on a side of another edge in the stacked direction, and an electron transmission layer located between the first thermoelectric element and the second thermoelectric element in the stacked direction.
    Type: Application
    Filed: January 4, 2024
    Publication date: May 2, 2024
    Inventors: Biao MEI, Naoya GOTO, Masaki TAKEUCHI
  • Patent number: 11954546
    Abstract: Provided is a structure for individual authentication in which a pillar pattern region including a plurality of nanopillars formed of synthetic quartz glass is formed on at least a part of a surface portion of a synthetic quartz glass substrate. In the pillar pattern region, the nanopillars have an indentation elastic modulus of 35 to 100 GPa as measured by a nanoindentation method, and the nanopillars are plastically deformed.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: April 9, 2024
    Assignees: SHIN-ETSU CHEMICAL CO., LTD., TOHOKU UNIVERSITY
    Inventors: Masao Ando, Hiroyuki Yamazaki, Masaki Takeuchi, Masaru Nakagawa, Shunya Ito
  • Patent number: 11939267
    Abstract: A method and apparatus for producing AlN whiskers includes reduced incorporation of metal particles, an AlN whisker body, AlN whiskers, a resin molded body, and a method for producing the resin molded body. The method for producing AlN whiskers includes heating an Al-containing material in a material accommodation unit to thereby generate Al gas; and introducing the Al gas into a reaction chamber through a communication portion while introducing nitrogen gas into the reaction chamber through a gas inlet port, to thereby grow AlN whiskers on the surface of an Al2O3 substrate placed in the reaction chamber.
    Type: Grant
    Filed: May 2, 2022
    Date of Patent: March 26, 2024
    Assignee: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Toru Ujihara, Yukihisa Takeuchi, Daishi Shiojiri, Masaki Matsumoto, Hiroshi Saito, Ikuo Hayashi
  • Patent number: 11915555
    Abstract: A first lottery section performs a first lottery for specifying at least one presentation element among a plurality of presentation elements respectively associated with a plurality of content groups. A presentation section presents the presentation element specified by the first lottery, to a user. A second lottery section performs, in accordance with a user's instruction, a second lottery for specifying at least one content from the content group associated with the presentation element presented by the presentation section. A providing section provides the content drawn by the second lottery, to the user.
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: February 27, 2024
    Assignees: NINTENDO CO., LTD., DeNA Co., Ltd.
    Inventors: Kazuyoshi Sensui, Masaki Yasuhara, Ai Takeuchi
  • Patent number: 11904521
    Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.
    Type: Grant
    Filed: September 26, 2017
    Date of Patent: February 20, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
  • Publication number: 20240053675
    Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.
    Type: Application
    Filed: October 26, 2023
    Publication date: February 15, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki YARITA, Daijitsu HARADA, Masaki TAKEUCHI
  • Patent number: 11901401
    Abstract: A semiconductor device that includes a semiconductor substrate; a first capacitance section on the semiconductor substrate, the first capacitance section including a first electrode layer, a first dielectric layer, and a second electrode layer; a second capacitance section on the semiconductor substrate, the second capacitance section including a third electrode layer, a second dielectric layer, and a fourth electrode layer; a first external electrode; a second external electrode; a first lead wire led out from the first capacitance section to the first external electrode and having an inductance L1; and a second lead wire led out from the second capacitance section to the second external electrode and having an inductance L2, wherein an electrostatic capacity C1 of the first capacitance section and an electrostatic capacity C2 of the second capacitance section are different, and L1/L2=0.8 to 1.2.
    Type: Grant
    Filed: October 8, 2020
    Date of Patent: February 13, 2024
    Assignee: MURATA MANUFACTURING CO., LTD.
    Inventors: Koichi Nishita, Masaki Takeuchi, Yutaka Takeshima, Kazuhiro Inoue
  • Patent number: 11903315
    Abstract: The thermoelectric module includes a first thermoelectric element including a first thermoelectric conversion layer and a first electrolyte layer stacked each other along a stacked direction, a second thermoelectric element stacking the first thermoelectric element in the stacked direction and including a second thermoelectric conversion layer and a second electrolyte layer stacked each other along the stacked direction, a first current collector located on a side of one edge in the stacked direction, a second current collector located on a side of another edge in the stacked direction, and an electron transmission layer located between the first thermoelectric element and the second thermoelectric element in the stacked direction.
    Type: Grant
    Filed: June 17, 2020
    Date of Patent: February 13, 2024
    Assignees: Sanoh Industrial Co., Ltd., TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Biao Mei, Naoya Goto, Masaki Takeuchi, Sachiko Matsushita
  • Publication number: 20230418149
    Abstract: A substrate for mask blanks having first and second main surfaces of 152 mm×152 mm square and a thickness of 6.35 mm, wherein: when a range of 132 mm×132 mm square centered on an intersection of diagonal lines is defined as a calculation region in each of the first and second main surfaces, on a substrate surface of the calculation region of at least one of the first and second main surfaces, flatness of the substrate surface of the calculation region based on a least square plane is 100 nm or less, and a difference (PV) between a highest value and a lowest value of a height of a calculation surface represented by a difference between shapes of the substrate surfaces before and after smoothing processing with a Gaussian filter (10 mm×10 mm) based on the least square plane is 20 nm or less.
    Type: Application
    Filed: June 1, 2023
    Publication date: December 28, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomoaki SUGIYAMA, Daijitsu HARADA, Harunobu MATSUI, Naoki YARITA, Masaki TAKEUCHI
  • Patent number: 11851364
    Abstract: A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.
    Type: Grant
    Filed: January 22, 2019
    Date of Patent: December 26, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Junichiro Nishida, Kazuo Shirota, Hisashi Yagi, Masaki Takeuchi
  • Publication number: 20230398655
    Abstract: Proposed herein is a method for producing a substrate suitable for mask blanks for EUVL and the method being capable of suppressing a concave defect having a depth of less than 5 nm. The present invention provides a method for producing a substrate in which final polishing is performed by a polishing apparatus having an upper polishing plate equipped with a polishing pad, the method comprising the steps of placing a substrate stock in the polishing apparatus so that the main surface of the substrate stock face toward the upper polishing plate; rotating the upper polishing plate and polishing the substrate stock concomitantly with a polishing slurry on the main surface of the substrate stock; and raising the upper polishing plate which is kept being rotated to separate it from the main surface of the polished substrate stock.
    Type: Application
    Filed: June 12, 2023
    Publication date: December 14, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Yarita, Daijitsu HARADA, Harunobu MATSUI, Masaki TAKEUCHI
  • Patent number: 11835853
    Abstract: A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm4 or less at a spatial frequency of 0.1 ?m?1 or more and 20 ?m?1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 ?m×10 ?m with an atomic force microscope.
    Type: Grant
    Filed: May 28, 2021
    Date of Patent: December 5, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Naoki Yarita, Daijitsu Harada, Masaki Takeuchi
  • Publication number: 20230289960
    Abstract: A storage medium storing an image diagnosis support program for causing a computer to execute process that includes inputting input images to a first model that outputs, according to input images obtained by imaging a subject under the plurality of imaging conditions, an estimation result of a disease name of the, and a degree of contribution to estimation of each of input images for each of the imaging conditions; selecting, among input images, an image imaged under an imaging condition for estimation selected based on the degree of contribution; inputting the image imaged under the imaging condition for estimation to a second model that outputs an estimation result of a lesion part in the image according to the input image; and outputting the estimation result of the lesion part specified based on an output result of the second model.
    Type: Application
    Filed: January 11, 2023
    Publication date: September 14, 2023
    Applicant: Fujitsu Limited
    Inventors: Masaki TAKEUCHI, Yoshimasa MISHUKU, Masataka UMEDA
  • Patent number: 11757067
    Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.
    Type: Grant
    Filed: July 15, 2022
    Date of Patent: September 12, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
  • Patent number: 11710590
    Abstract: A superconducting coil device (10) includes: a coil case (20) housing a superconducting coil (30); a superconducting coil (30) housed in the coil case (20); and a resin part (50) formed of a polymer (51) filled in a gap between an inner wall of the coil case (20) and the superconducting coil (30). The resin part (50) is formed of a polymer (51) obtained by polymerizing a polymerizable composition containing a first monomer having a norbornene ring structure.
    Type: Grant
    Filed: May 10, 2018
    Date of Patent: July 25, 2023
    Assignees: RAILWAY TECHNICAL RESEARCH INSTITUTE, RIMTEC CORPORATION
    Inventors: Katsutoshi Mizuno, Minoru Tanaka, Masaki Takeuchi
  • Publication number: 20230191397
    Abstract: Provided is a synthetic quartz glass substrate for use in a microfluidic device to which bonding by optical contact can be applied in manufacturing a microfluidic device, and which has high adhesion in a bonded interface and does not cause defects such as non-bonding and breakage of the substrate and a defect in which air bubbles are sandwiched at the bonded interface. A synthetic quartz glass substrate for use in a microfluidic device, wherein a maximum value of a cyclic average power spectral density at a spatial frequency of 0.4 mm?1 or more and 100 mm?1 or less is 5.0×1015 nm4 or less, the maximum value being obtained by measuring any given region of 6.0 mm×6.0 mm on a surface of the synthetic quartz glass substrate with a white interferometer.
    Type: Application
    Filed: December 16, 2022
    Publication date: June 22, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masao ANDO, Hiroyuki YAMAZAKI, Masaki TAKEUCHI
  • Publication number: 20230148016
    Abstract: The window material for an optical element of the present invention is formed of synthetic quartz glass that is likely to be subjected to shape processing, can be manufactured at low cost, and has a flat plate shape. Even if the window material for an optical element has a flat plate shape, for example, in a window material of a UV-LED such as a UVC-LED sealed with a surface mount package (SMD PKG), light emitted from the optical element, in particular, light having a light distribution angle can be efficiently collected when passing through the window material, and light collection equal to that of a window material having a lens shape such as a conventional convex shape can be achieved. Furthermore, light distribution without irradiation unevenness such as Lambertian reflection can also be achieved.
    Type: Application
    Filed: October 19, 2022
    Publication date: May 11, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Harunobu MATSUI, Daijitsu HARADA, Masao ANDO, Masaki TAKEUCHI
  • Patent number: 11591260
    Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.
    Type: Grant
    Filed: July 20, 2020
    Date of Patent: February 28, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoko Ishitsuka, Atsushi Watabe, Daijitsu Harada, Masaki Takeuchi
  • Publication number: 20230037856
    Abstract: A mask blanks substrate having a flatness of a calculation surface of 100 nm or less when a calculation region passing through central portions of first and second main surfaces and extending in a horizontal direction is set, a first region surface is cut out, a second region surface is cut out by setting a reference plane and a rotation axis and rotating the substrate by 180°, least square planes are calculated, the first and second region surfaces are converted into height maps to positions on the least square planes, the height map of the to second region surface is set as a reverse height map by symmetrically moving the height map, and a map of a calculated height obtained by adding heights of the height map of the first region surface and the reverse height map of the second region surface is set as the calculation surface.
    Type: Application
    Filed: July 1, 2022
    Publication date: February 9, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomoaki SUGIYAMA, Daijitsu HARADA, Harunobu MATSUI, Naoki YARITA, Masaki TAKEUCHI
  • Publication number: 20230027061
    Abstract: An imprint mold having a synthetic quartz glass substrate having a transfer fine pattern formed on a surface thereof; and a coating layer formed on at least a part of the fine pattern by at least one of materials different from the substrate.
    Type: Application
    Filed: July 5, 2022
    Publication date: January 26, 2023
    Applicants: Shin-Etsu Chemical Co., Ltd., TOHOKU UNIVERSITY
    Inventors: Hiroyuki YAMAZAKI, Masao ANDO, Masaki TAKEUCHI, Masaru NAKAGAWA, Shunya ITO