Abstract: A composition includes metal particles capable of transient liquid phase sintering and a thermoplastic resin having a softening point that is lower than the liquid phase transition temperature of the metal particles.

Abstract: A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.

Abstract: An information processing apparatus transmits a task executing request to a first control node to execute a task including multiple processes among multiple control nodes; and stores management information associating the task executing request transmitted to the first control node with a response result received from the first control node. The task executing request includes: a command to execute the task; a command to respond with a first notification indicating normal completion of the plurality of processes; a command to execute, when execution of at least one of the processes fails, a regaining process that regains statuses of one or more remaining processes successfully executed to statuses before being executed; and a command to response, when the regaining process is normally completed, a second notification indicating normal completion of the regaining process. Accordingly, the load on a control node managing multiple control nodes can be reduced.

Abstract: An information processing apparatus includes a memory; a processor coupled to the memory; and one or more resources, the processor being configured to allow a plurality of the processes to be performed on one of the one or more resources to obtain the exclusion in parallel by optimistic locking control in a first phase, and execute one of the plurality of processes on the resource in a state where the exclusion is obtained by pessimistic locking control in a second phase.

Abstract: The present invention relates to a method for producing a composite molded article having a flexural modulus at 150° C. of 25% or more of a flexural modulus at 23° C., including the steps of (1) placing glass fibers in a mold; (2) impregnating glass fibers with a polymerizable composition containing a cycloolefin monomer, a metathesis polymerization catalyst, a radical generator, and a compound represented by the general formula (I); (3) subjecting the above polymerizable composition with which the glass fibers are impregnated to a bulk polymerization to provide a composite molded article; and (4) demolding the composite molded article; and a composite molded article obtained by the above method. According to the method of the present invention, a composite molded article containing glass fibers, the composite molded article having excellent mechanical strength can be produced.

Abstract: A method for producing a composite material molded article, including laminating a fibrous filler on a mold; pressure-reducing inside an airproof space, the airproof space being formed with the mold laminated with the fibrous filler and an airproof film covering thereon; and impregnating a resin material in the fibrous filler, the formation of the airproof space including bonding the mold and the airproof film with a seal material containing a (meth)acrylic polymer as an adhesive. The composite resin molded article obtained by the method of the present invention can be suitably used in fields in which composite materials of fibrous fillers such as glass fibers and carbon fibers are generally used, for example, housings, structural members, and the like for moving objects or movable objects.

Abstract: A synthetic quartz glass substrate having front and back surfaces is worked by lapping, etching, mirror polishing, and cleaning steps for thereby polishing the front surface of the substrate to a mirror-like surface. The etching step is carried out using a hydrofluoric acid solution at pH 4-7.

Abstract: A capacitor that includes a substrate; a capacitor formation region in which one or more trenches are formed; a dummy region located between the capacitor formation region and an end of the substrate; a first electrode formed inside the one or more trenches to cover the capacitor formation region, and a dielectric film; a second electrode that covers the capacitor formation region and has a different potential from the first electrode; and an extended portion that formed in the dummy region. Moreover, the extended portion forms a recess or a protrusion on the substrate in a path from the second electrode to the end portion of the substrate.

Abstract: A bonding material disclosed in this specification contains high melting point metal particles, low melting point metal particles, and a thermosetting flux resin. A mass proportion of the high melting point metal particles with respect to a total mass of the high melting point metal particles and the low melting point metal particles is 55% to 75%.

Abstract: Provided herein is a network system that includes: a first terminal that includes a speaker; a second terminal that includes a display; and a server that causes the first terminal to output an audio, and that causes the second terminal to display an image concerning the audio.

Abstract: The present invention relates to polymerizable composition containing a cycloolefin monomer, a metathesis polymerization catalyst, a radical generator, a diisocyanate compound, and a polyfunctional (meth)acrylate compound. The composite material produced by using a polymerizable composition of the present invention has excellent mechanical strength and does not cause odor.

Abstract: A large-size synthetic quartz glass substrate has a diagonal length of at least 1,000 mm. Provided that an effective range is defined on the substrate surface, and the effective range is partitioned into a plurality of evaluation regions such that the evaluation regions partly overlap each other, a flatness in each evaluation region is up to 3 ?m. From the quartz glass substrate having a high flatness and a minimal local gradient within the substrate surface, a large-size photomask is prepared.

Abstract: A polishing composition comprising a colloidal dispersion of spherical silica particles and associated silica particles as abrasive is provided. When used in the step of polishing synthetic quartz glass substrates, the polishing composition ensures a higher polishing rate than conventional colloidal silica and is effective for preventing any microscopic defects on the substrate surface, thus providing the substrate with a high smoothness. The polishing composition can be used as the ceria replacement polishing composition for polishing a lapped surface.

Abstract: Proposed herein is a method for producing substrates, particularly those of synthetic quartz glass, while saving the substrate surface from killer defects without resorting to any large-scale apparatus and precision polishing plate, thereby reducing defects and improving yields more than in production with conventional facilities. The method for producing substrates by polishing, includes steps of placing substrate stocks individually in work holes formed in a carrier on a lower polishing plate, bringing an upper polishing plate into contact with the surface of the substrate stocks, with the surface of the substrate stocks being coated with an impact-absorbing liquid and the lower polishing plate being rotated, and rotating the upper and lower polishing plates, with the surface of the substrate stocks being accompanied by a polishing slurry.

Abstract: A substrate is prepared by polishing a surface of the substrate using a polishing pad while feeding a slurry. The polishing pad has a porous nap layer which comes in contact with the substrate surface and is made of a base resin comprising at least three resins, typically an ether resin, ester resin, and polycarbonate resin. The polished substrate has a highly flat surface with a minimal number of defects.

Abstract: A synthetic quartz glass lid for use in optical device packages is prepared by furnishing a synthetic quartz glass lid precursor comprising a synthetic quartz glass substrate (1) and a metal or metal compound film (2), and forming a metal base adhesive layer (3) on the metal or metal compound film (2). The metal or metal compound film contains Ag, Bi, and at least one element selected from P, Sb, Sn and In.

Abstract: In polishing of synthetic quartz glass substrates, a polishing slurry is used comprising (i) an oligopeptide comprising recurring units of pentapeptide: -[valine-proline-glycine-valine-glycine]- and having a molecular weight of 800-150,000 or a copolymer of the pentapeptide with another monomer, and (ii) a colloidal solution.

Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.

Abstract: Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

Abstract: A rectangular glass substrate has a front surface, a back surface, four side surfaces, and eight chamfered surfaces, and a thickness of at least 6 mm. A first curved surface along the edge line between the front surface and the chamfered surface disposed adjacent thereto has an average gradient of up to 25% in a range from the front surface to a position of 50 ?m below the front surface when the substrate is rested horizontal with the front surface facing upward. A second curved surface along the edge line between at least one of four side surfaces and the chamfered surface disposed adjacent to the front surface has an average gradient of at least 30% in a range from the at least one side surface to a position of 50 ?m below the at least one side surface when the substrate is rested horizontal with the at least one side surface facing upward.