Patents by Inventor Masaru Wada

Masaru Wada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5382690
    Abstract: Disclosed are(1) a method for preparing an aromatic secondary amino compound which comprises reacting an N-cyclohexylideneamino compound in the presence of a hydrogen moving catalyst and a hydrogen acceptor by the use of a sulfur-free polar solvent and/or a cocatalyst, and(2) a method for preparing an aromatic secondary amino compound which comprises reacting cyclohexanone or a nucleus-substituted cyclohexanone, an amine and a nitro compound corresponding to the amine in a sulfur-free polar solvent in the presence of a hydrogen moving catalyst, a cocatalyst being added or not added.
    Type: Grant
    Filed: August 2, 1993
    Date of Patent: January 17, 1995
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Teruyuki Nagata, Chiyuki Kusuda, Masaru Wada, Kenichi Satou
  • Patent number: 5296635
    Abstract: A preparation process of a bis(3-nitrophenoxy) compound represented by the formula: ##STR1## wherein X is a direct bond, divalent hydrocarbon having from 1 to 10 carbon atoms or a divalent group selected from --C(CF.sub.3).sub.2, --CO--, --S--, --SO--, SO.sub.2 --or --O--, which comprises reacting 4,4'-bisphenol with m-dinitrobenzene in the presence of an alkali metal carbonate or alkali metal hydrogen carbonate having a particle size of 250 .mu.m or less while removing generated water from the reaction system during the reaction. In one embodiment of the process, the reaction is carried out while simultaneously adding 4,4'-bisphenol and m-dinitrobenzene to a reaction vessel which was previously charged with the base and an aprotic polar solvent.
    Type: Grant
    Filed: November 13, 1992
    Date of Patent: March 22, 1994
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Motohiro Kase, Hitoshi Nakayama, Masaru Wada, Teruyuki Nagata, Akihiro Yamaguchi
  • Patent number: 5200729
    Abstract: Disclosed is a permanent magnet which is suitable for use for a field system of an electric motor or the like and which is constituted by a single piece of magnetic material in which S and N poles are alternately continuously formed through non-magnetic flux regions or weak magnetic flux regions interposed therebetween, and further disclosed is a magnetization apparatus for magnetizing such a permanent magnet.
    Type: Grant
    Filed: February 7, 1990
    Date of Patent: April 6, 1993
    Assignee: Yamamoto Electric Corporation
    Inventors: Katsuji Soeda, Shuzo Otsuki, Masaru Wada
  • Patent number: 5136086
    Abstract: This invention is an industrially efficient and improved process for the preparation of aliphatic polyisocyanates by using esters as the solvent for converting aliphatic polyamines to isocyanates.
    Type: Grant
    Filed: January 13, 1992
    Date of Patent: August 4, 1992
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Teruyuki Nagata, Masaru Wada, Hideki Mizuta
  • Patent number: 5068866
    Abstract: A laser chip is directly disposed on a support member through a mounting arrangement and a support member, the laser chip, and peripheral parts thereof are integrally sealed within a transparent plastic resin. In this structure, without requiring expensive materials and parts, a semiconductor laser apparatus may be manufactured by using the same materials and process as in the ordinary plastic-sealed LED, so that the cost may be reduced significantly.
    Type: Grant
    Filed: October 30, 1989
    Date of Patent: November 26, 1991
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masaru Wada, Kunio Itoh
  • Patent number: 4970323
    Abstract: N-substituted monochlorosuccinimides e.g., N-phenylmonochlorosuccinimide, can be prepared in a high yield by reacting a maleamic acid, e.g., N-phenylmaleamic acid, with phosgene in the presence of a catalyst, e.g., dimethylformamide.
    Type: Grant
    Filed: June 22, 1989
    Date of Patent: November 13, 1990
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Mihaya Matsukawa, Masaru Wada, Hiroshi Suizu, Masayuki Furuya, Teruyuki Nagata
  • Patent number: 4952731
    Abstract: Diphenylamines or N,N'-diphenyl-phenylenediamines can be obtained by heat-reacting an aniline or a phenylenediamine with preferably an excess of a phenol in an amount of 4 to 20 moles per mole of the aniline or phenylenediamine in th presence of a hydrogen transfer catalyst and a cyclohexanone corresponding to said phenol.The excess phenol used in the reaction undergoes reduction in the reaction system to form a cyclohexanone, which in turn reacts with the aniline or phenylenediamine to form a Schiff base and is thus consumed. The Schiff base forms the intended product by means of a dehydrogenation reaction, and the hydrogen evolved at this time reduces the phenol to form a cyclohexanone.The phenol present in excess thus becomes in the system a solvent, a starting material for the cyclohexanone, and an acceptor of the hydrogen that forms as a by-product at the time of formation of the intended product.
    Type: Grant
    Filed: August 15, 1988
    Date of Patent: August 28, 1990
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Teruyuki Nagata, Akihiro Tamaki, Nobuyuki Kajimoto, Masaru Wada
  • Patent number: 4918186
    Abstract: A process for producing a cyclic urea is provided. The process comprises reacting a diamine expressed by the formula (II)R-HN-R'-NH-R (II)wherein R represents hydrogen atom or a lower alkyl group and R' represent dimethylene group, a lower alkyl group-substituted dimethylene group, trimethylene group, a lower alkyl group-substituted trimethylene group, tetramethylene group, a lower alkyl group-substituted tetramethylene group, but a case where R represents hydrogen atom and R' represent dimethylene group, a case where R represents hydrogen atom and R' represents a lower alkyl group-substituted dimethylene group and a case where R represent methyl group and R' represents dimethylene group are excluded, with phosgene in the presence of a dehydrochlorinating agent. In the process, the diamine is first converted to its hydrochloride, followed by reacting the hydrochloride with phosgene in water solvent while maintaining a pH of the reaction liquid in the range of 5.0 to 8.
    Type: Grant
    Filed: March 7, 1989
    Date of Patent: April 17, 1990
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Nobuyuki Kajimoto, Teruyuki Nagata, Masaru Wada
  • Patent number: 4900820
    Abstract: A process for producing a cyclic diamine which comprises reacting a diamine of the formulaR--HN--R'--NH--R (II)wherein R represents a lower alkyl group and R' represents a lower alkyl group-substituted dimethylene group, trimethylene group, a lower alkyl group-substituted trimethylene group, tetramethylene group or a lower alkyl group-substituted tetramethylene group with urea in the presence of a polar solvent and at 180.degree. C. or higher, to obtain a cyclic urea ##STR1## wherein R and R' are each as defined above, the production yield being more improved by carrying out the initial period reaction at 140.degree. C. or lower.
    Type: Grant
    Filed: May 22, 1987
    Date of Patent: February 13, 1990
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Nobuyuki Kajimoto, Teruyuki Nagata, Masaru Wada
  • Patent number: 4871875
    Abstract: Diphenylamines or N,N'-diphenyl-phenylenediamines can be obtained by heat-reacting an aniline or a phenylenediamine with preferably an excess of a phenol in an amount of 4 to 20 moles per mole of the aniline or phenylenediamine in the presence of a hydrogen transfer catalyst and a cyclohexanone corresponding to said phenol.The excess phenol used in the reaction undergoes reduction in the reaction system to form a cyclohexanone, which in turn reacts with the aniline or phenylenediamine to form a Schiff base and is thus consumed. The Schiff base forms the intended product by means of a dehydrogenation reaction, and the hydrogen evolved at this time reduces the phenol to form a cyclohexanone.The phenol present in excess thus becomes in the system a solvent, a starting material for the cyclohexanone, and an acceptor of the hydrogen that forms as a by-product at the time of formation of the intended product.
    Type: Grant
    Filed: September 14, 1988
    Date of Patent: October 3, 1989
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Teruyuki Nagata, Akihiro Tamaki, Nobuyuki Kajimoto, Masaru Wada
  • Patent number: 4804783
    Abstract: Diphenylamines or N,N'-diphenyl-phenylenediamines can be obtained by heat-reacting an aniline or a phenylenediamine with preferably an excess of a phenol in an amount of 4 to 20 moles per mole of the aniline or phenylenediamine in the presence of a hydrogen transfer catalyst and a cyclohexanone corresponding to said phenol.The excess phenol used in the reaction undergoes reduction in the reaction system to form a cyclohexanone, which in turn reacts with the aniline or phenylenediamine to form a Schiff base and is thus consumed. The Schiff base forms the intended product by means of a dehydrogenation reaction, and the hydrogen evolved at this time reduces the phenol to form a cyclohexanone.The phenol present in excess thus becomes in the system a solvent, a starting material for the cyclohexanone, and an acceptor of the hydrogen that forms as a by-product at the time of formation of the intended product.
    Type: Grant
    Filed: July 31, 1987
    Date of Patent: February 14, 1989
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Teruyuki Nagata, Akihiro Tamaki, Nobuyuki Kajimoto, Masaru Wada
  • Patent number: 4783521
    Abstract: Disclosed herein are novel linear copolymers having weight average molecular weight of 500-30,000 and comprising structural units represented by the following formulae (I), (II), (III) and (IV): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 mean individually an alkyl group having 4 or fewer carbon atoms and R.sub.4 denotes an alkyl, cycloalkyl, aralkyl or phenyl group, and multivalent metal salts thereof in each of which the multivalent metal forms the multivalent metal salt between carboxyl groups within the same molecule of the copolymer or between different molecules of the copolymer; color-developing agents comprising multivalent metal-modified resins of the copolymers; and color-developing sheets obtained by coating the color-developing agents on their surfaces.
    Type: Grant
    Filed: January 16, 1987
    Date of Patent: November 8, 1988
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Akihiro Yamaguchi, Keizaburo Yamaguchi, Yoshimitsu Tanabe, Makoto Asano, Masaru Wada
  • Patent number: 4731453
    Abstract: An improved process of producing 1, 3-dialkyl-2-imidazolidinones directly from N, N'-dialkylethylenediamine and urea with a high yield is provided, which process comprises reacting a N, N'-dialkylethylenediamine of the formula ##STR1## wherein R represents --CH.sub.3, --C.sub.2 H.sub.5, --C.sub.3 H.sub.7 or --C.sub.4 H.sub.9, with urea at 180.degree. C. or higher in the presence of a polar solvent, to obtain a 1, 3-dialkyl-2-imidazolidinone of the formula ##STR2## and preferably comprises carrying out the reaction at two stages, that is, the initial period reaction being carried out at 140.degree. C. or lower to from a 1, 1'-dialkyl-1 1'-dimethylenebisurea and successively the latter reaction being carried out at 180.degree. C. or higher.
    Type: Grant
    Filed: March 31, 1986
    Date of Patent: March 15, 1988
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Teruyuki Nagata, Nobuyuki Kajimoto, Masaru Wada, Hideki Mizuta, Akihiro Tamaki
  • Patent number: 4716571
    Abstract: A semiconductor substrate having a groove with a dove-tail-shaped cross section is used as a substrate and thereon, several epitaxial layers including an active layer are formed and a current injection region is formed immediately above the groove; the semiconductor laser attains a high power lasing with the fundamental transverse mode.
    Type: Grant
    Filed: July 16, 1986
    Date of Patent: December 29, 1987
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Ken Hamada, Masaru Wada, Kunio Itoh
  • Patent number: 4698122
    Abstract: A method for selectively diffusing impurities such as zinc into the substrate of a compound semiconductor such as gallium arsenide (GaAs). The method makes use of a diffusion mask in such a manner that the thickness of the oxygen-containing layer at the interface between the diffusion mask and the semiconductor substrate is less than 20.ANG. so that the abnormal transverse diffusion that would otherwise occur at the interface in the vicinity of the opening of the diffusion mask on the semiconductor surface is suppressed. The result is an increased accuracy in the diffusion pattern of the impurities.
    Type: Grant
    Filed: November 27, 1985
    Date of Patent: October 6, 1987
    Assignee: Sony Corporation
    Inventors: Masaru Wada, Yoji Kato
  • Patent number: 4695862
    Abstract: A semiconductor apparatus which includes a semiconductor substrate with semi-insulating properties and with a first region of a first conductivity type which will become the emitter region and a second region of the same first conductivity type which will become a collector region with the first and second regions formed in the semi-insulating semiconductor substrate and spaced apart from each other and a third region of a second conductivity type formed in the semi-insulating conductor substrate between the first and second regions and with forward biasing voltage applied between the third and first regions so as to form an imaginary base region in the semi-insulating semiconductor substrate beneath the third region due to implanted majority carriers from the third region so that the semiconductor apparatus operates as a bipolar transistor and wherein at least the first and/or the third regions consist of a plurality of regions.
    Type: Grant
    Filed: September 20, 1985
    Date of Patent: September 22, 1987
    Assignee: Sony Corporation
    Inventors: Yoji Kato, Seiichi Watanabe, Masaru Wada
  • Patent number: D291920
    Type: Grant
    Filed: April 23, 1985
    Date of Patent: September 15, 1987
    Assignee: Terumo Corporation
    Inventors: Takashi Monzen, Masaru Wada
  • Patent number: D303428
    Type: Grant
    Filed: February 18, 1987
    Date of Patent: September 12, 1989
    Assignee: Terumo Kabushiki Kaisha
    Inventors: Masaru Wada, Atsushi Shimizu
  • Patent number: D309011
    Type: Grant
    Filed: September 30, 1987
    Date of Patent: July 3, 1990
    Assignee: Terumo Kabushiki Kaisha
    Inventors: Tetsuya Arioka, Masaru Wada
  • Patent number: D320275
    Type: Grant
    Filed: January 9, 1989
    Date of Patent: September 24, 1991
    Assignee: Terumo Kabushiki Kaisha
    Inventors: Masaru Wada, Junji Kimura, Zensho Kanda