Patents by Inventor Masayuki Suda

Masayuki Suda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5344539
    Abstract: An electrochemical fine processing apparatus for electrochemically performing an adding processing and a removing processing of a substance such as a metal or a polymer in a solution in order to produce a structure having a high aspect ratio. Removing electrodes for applying an electric potential opposite to that applied to an addition electrode are disposed around the addition electrode, whereby an excess portion of metal or polymer film pattern can be scraped electrochemically. In addition, alternate electric potential pulses are applied successively to the addition electrode and then to the removing electrodes. It becomes possible to form on the support a structure with sharp pattern edge portions and a high aspect ratio.
    Type: Grant
    Filed: March 29, 1993
    Date of Patent: September 6, 1994
    Assignee: Seiko Instruments Inc.
    Inventors: Masataka Shinogi, Toshihiko Sakuhara, Masayuki Suda, Fumiharu Iwasaki, Akito Ando
  • Patent number: 5288382
    Abstract: An optical fine processing apparatus for forming a structure having a high aspect ratio even on a workpiece having high heat conductivity. Light, such as a laser beam, is irradiated onto the workpiece in an electrolytic solution through a light guide to deposit a substance such as a metal or a polymer. A plurality of removal electrodes are allowed to have an electric potential for removing a part of the deposited substance. The removal electrodes are disposed in a rotation ring which is rotatable about the optical axis of the irradiating light onto the sample so as to adjust the width of a predetermined pattern to be scraped by changing the rotation angle of the removal electrodes with respect to the optical axis. By scanning the light guide and the removing electrodes above the workpiece surface, it is possible to form any desired pattern on the workpiece.
    Type: Grant
    Filed: March 29, 1993
    Date of Patent: February 22, 1994
    Assignee: Seiko Instruments, Inc.
    Inventors: Masataka Shinogi, Toshihiko Sakuhara, Masayuki Suda, Fumiharu Iwasaki, Akito Ando
  • Patent number: 5250259
    Abstract: A chemiluminescent detector is formed on a single crystal silicon substrate. A reaction unit is formed on and integral with a substrate. The reaction unit is for mixing a test sample with a chemiluminescent reagent and is formed on the substrate by anisotropic etching. The reaction unit includes a plurality of through-holes interconnected with grooves formed in the substrate. A detection unit, including a silicon photodetector, is also formed on and integral with the substrate and detects chemiluminescent light generated by a chemiluminescent reaction between the test sample and the chemiluminescent reagent. Introducing ports introduce the test sample and the chemiluminescent reagent into the reaction unit. A pair of glass plates sandwich the substrate.
    Type: Grant
    Filed: April 15, 1992
    Date of Patent: October 5, 1993
    Assignee: Seiko Instruments Inc.
    Inventor: Masayuki Suda