Patents by Inventor Michael Geisler
Michael Geisler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 5399254Abstract: The invention concerns an apparatus for the plasma treatment of substrates in a plasma discharge excited by a high frequency between two electrodes 3, 8 to which power is supplied by a high frequency source, where the first electrode is configured as a hollow electrode 3 and the second one as an electrode 8 holding a substrate 7 and situated upstream of the hollow chamber 10 of the first electrode which it also passes. The hollow electrode is enclosed by a dark space shield and has an edge pointing in direction of the second electrode and also has projection located between the edge. These projections are on the same potential as the second electrode. The radio frequency power is thus decoupled from the substrate bias voltage (selfbias) and the distance between the first and the second electrode can be changed.Type: GrantFiled: February 22, 1991Date of Patent: March 21, 1995Assignee: Leybold AGInventors: Michael Geisler, Michael Jung
-
Patent number: 5378284Abstract: An apparatus and a method for producing layers on the surfaces of workpieces, preferably on spotlight, or headlight, reflector inserts formed of plastic, includes an apparatus having a vacuum chamber that can be operated as a batch system with a PCVD coating process, where a microwave ECR plasma coating source is used, and the workpieces to be coated are secured to a rotary cage arranged in the vacuum chamber. The rotary cage can be conducted past a microwave coating source with a frequency-matched and phase-matched planetary motion. Such a coating process can be used in a vacuum chamber, under plasma, and at pressures below 2.times.10.sup.-2 mbar.Type: GrantFiled: June 30, 1992Date of Patent: January 3, 1995Assignee: Leybold AktiengesellschaftInventors: Michael Geisler, Rudolf Koetter-Faulhaber, Michael Jung
-
Patent number: 5296784Abstract: Apparatus for the production of glow discharge, preferably for a large-area plasma CVD process, including a vacuum coating chamber (K) and a microwave waveguide resonator with one or more coupling points, wherein the resonator is made in the form of a microwave waveguide ring resonator (13, 13'), reaction zones (R) are formed at the coupling points between the microwave waveguide ring resonator (13, 13') and the vacuum chamber (K), and in each case a series of magnets (5, 5', . . . ; 6, 6', . . . ) of different polarity are provided, so that in front of the reaction zone (R) individual tunnels of magnetic field lines (16, 16') running parallel thereto are formed and each magnetic field (16, 16') encloses a spatially uniform plasma tube (17) in the reaction zone (R).Type: GrantFiled: November 22, 1991Date of Patent: March 22, 1994Assignee: Leybold AktiengesllschaftInventors: Michael Geisler, Michael Jung, Rudolf Koetter-Faulhaber
-
Patent number: 5294464Abstract: A process gas atmosphere consisting essentially of (a) organosiloxanes and inert gas, or (b) pure silane or (c) silane plus inert gas is introduced into a vacuum chamber and exposed to microwaves to produce an electro-cyclotron resonance in a plasma for coating substrates. The process is useful for producing an adherent coating on a plastic substrate, especially an intermediate coating for a reflective coating in an automotive headlamp.Type: GrantFiled: February 11, 1993Date of Patent: March 15, 1994Assignee: Leybold AktiengesellschaftInventors: Michael Geisler, Rudolf Koetter-Faulhaber, Susanne Wuerz
-
Patent number: 5283538Abstract: The invention relates to a device for coupling microwave power out of a first chamber (21) into a second chamber (22). For this purpose a primary antenna (2) and a secondary antenna (3) are provided, the primary antenna (2) reaching into the first chamber (21), while the secondary antenna (3) reaches into the second chamber (22). Between the first chamber (21) and the second chamber (22) there is provided a dividing wall (20) through which a current-carrying means (11) is brought, which joins together the primary antenna (2) and the secondary antenna (3).Type: GrantFiled: March 8, 1993Date of Patent: February 1, 1994Assignee: Leybold AktiengesellschaftInventors: Michael Geisler, Michael Jung, Bernhard Kessler
-
Patent number: 5259603Abstract: Device for mounting thin, preferably flat substrates (11, 11', . . . ) and for the transport of these substrates (11, 11'. . . ) in treatment apparatus, for example vacuum coating and etching apparatus, the device being formed by a frame (1), preferably in a rectangular shape, which is of such size that in the area surrounded by the frame (1) a support, e.g., a support formed of spoke-like round rods (6, 6', . . . ). can be inserted, and on this support fastening means for mounting the substrates (11, 11', . . . ) are provided, which hold the substrates (11, 11', . . . ) such that their substantially planar lateral surfaces run approximately parallel to the plane of the frame.Type: GrantFiled: January 30, 1992Date of Patent: November 9, 1993Assignee: Leybold AktiengesellschaftInventors: Michael Geisler, Michael Jung
-
Patent number: 5173640Abstract: The invention relates to an apparatus for the production of a regular microwave field over a comparatively great area. This apparatus has a cavity resonator into which microwaves are put. Electromagnetic energy is coupled by special couplers, inductively or capacitively, out of the standing waves forming in the cavity resonator into a chamber in which preferably a plasma is contained.Type: GrantFiled: November 15, 1991Date of Patent: December 22, 1992Assignee: Leybold AktiengesellschaftInventors: Michael Geisler, Michael Jung, Bernhard Kessler
-
Patent number: 5118549Abstract: An optical recording medium for an audio-video or ROM compact disc comprises a pitted translucent base material and a layer of a corrosion resistant metal or combination of metals from the group consisting of tantalum, chromium, cobalt, and nickel. For example, TaNi or CrCo can be applied to the surface, providing good adhesion, reflecting light, providing a printable surface, and not requiring any further coating such as a protective lacquer.Type: GrantFiled: July 17, 1990Date of Patent: June 2, 1992Assignee: Leybold AktiengesellschaftInventors: Alfons Hausler, Rainer Ludwig, Michael Geisler, Michael Jung
-
Patent number: 5113790Abstract: The invention relates to an apparatus for the plasma treatment of substrates in a plasma discharge excited by radiofrequency between two electrodes 3, 8, supplied by a radiofrequency source, of which the first is configured as a hollow electrode 3 and the second an electrode 8 bearing a substrate 7 is placed in front of the cavity (10) of the first electrode and can be moved past the latter, the hollow electrode being surrounded by a dark-space shielding (14) and has a margin 9 pointing toward the second electrode 8 and projections 12 lying between the margins at the same potential as the first electrode 3. Between the projections 12 permanent magnets 34 are provided by which the substrate bias (self-bias) is adjustable independently of the discharge geometry, the discharge pressure and the radiofrequency power.Type: GrantFiled: July 11, 1991Date of Patent: May 19, 1992Assignee: Leybold AGInventors: Michael Geisler, Michael Jung, Rudolf K. Faulhaber
-
Patent number: 5102523Abstract: The invention relates to an arrangement for the production of a plasma as well as for applying charged and uncharged particles onto a substrate. Two areal electrodes connected to a voltage source are provided between which a plasma volume excited by high-frequency energy is ignited. The areal ratio of the two electrodes is variable in order to influence the energy of the ions impinging on a substrate. Furthermore, supplying of process gas distributed over the entire substrate area is possible.Type: GrantFiled: October 25, 1990Date of Patent: April 7, 1992Assignee: Leybold AktiengesellschaftInventors: Siegfried Beisswenger, Barbara Beichler, Michael Geisler, Stefan Reineck
-
Patent number: 5053244Abstract: The invention relates to an apparatus for producing a plasma and treating substrates therein. The plasma produced by means of microwaves serves to coat a substrate which is situated in a chamber (5) having metal walls (6,7,12,13). The microwaves are repeatedly reflected at the metal walls (6,7,12,13), so that the chamber (5) has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber (5) or outside the chamber (5) in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber (5) an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.Type: GrantFiled: February 19, 1988Date of Patent: October 1, 1991Assignee: Leybold AktiengesellschaftInventors: Jorg Kieser, Michael Geisler, Rolf Wilhelm, Eberhard Rauchle
-
Patent number: 5006219Abstract: The invention relates to a microwave cathode sputtering arrangement in which a cathode is disposed opposite a substrate. In the immediate vicinity of the substrate is located at least one magnetic field whose strength leads to an electron cyclotron resonance.Type: GrantFiled: September 28, 1989Date of Patent: April 9, 1991Assignee: Leybold AktiengesellschaftInventors: Rudolf Latz, Michael Scherer, Michael Geisler, Michael Jung
-
Patent number: 4987346Abstract: The invention relates to a particle source with which positive, negative, and neutral particles can be generated and applied on a substrate. The particle source comprises a container (26) in which a gas or gas mixture to be ionized is held. Into this container (26) an electromagnetic wave irradiates which preferably is a microwave. A torus-shaped magnetic field, which is generated with the aid of permanent magnets (32, 33) or electromagnets, simultaneously projects into the container (26). With the aid of a special control grid configuration (38, 39, 40) it becomes possible to draw off positive, negative or neutral particles from the container (26).Type: GrantFiled: January 18, 1989Date of Patent: January 22, 1991Assignee: Leybold AGInventors: Werner Katzschner, Stefan Eichholz, Michael Geisler, Michael Jung
-
Patent number: 4939424Abstract: The plasma produced by means of microwaves in the presence of a magnetic field and a gas serves to coat a substrate which is situated in a chamber having metal walls. The microwaves are repeatedly reflected at the metal walls, so that the chamber has numerous microwave modes. By means of permanent magnets, which are placed either inside the chamber or outside the chamber in the vicinity of the substrate that is to be coated, it is possible to produce within this chamber an electron-cyclotron resonance which permits a locally controlled ignition of the plasma.Type: GrantFiled: May 23, 1989Date of Patent: July 3, 1990Assignee: Leybold AktiengesellschaftInventors: Jorg Kieser, Michael Geisler, Rolf Wilhelm, Eberhard Rauchle
-
Patent number: 4933064Abstract: A sputtering cathode for the coating of substrates. The cathode has a base, a target of nonmagnetic material, and a magnet system having exposed pole faces for the production of a tunnel of magnetic lines of force overarching the sputtering surface. The target is provided with at least two continuous projections lying one inside the other, which contain at least one sputtering surface between them, and have confronting wall surfaces. The pole faces are located on both sides of the projections and sputtering surface between them such that magnetic lines of force issue perpendicularly from the one wall surface and, after crossing the sputtering surface, re-enter perpendicularly the opposite wall surface.Type: GrantFiled: November 30, 1987Date of Patent: June 12, 1990Assignee: Leybold-Heraeus GmbHInventors: Michael Geisler, Jorg Kieser, Reiner Kukla
-
Patent number: 4767641Abstract: Device for the plasma treatment of substrates (7) in a high frequency-excited plasma discharge between two electrodes (3, 8), supplied by a high-frequency source (6). The first electrode is constructed as a hollow anode (3) and the second electrode (8), which carries the substrate (7), is deposited in front of the hollow space (10) of the hollow anode or can be passed by this. Moreover, the hollow anode (3) has an edge (9), which is drawn out in the direction of the second electrode (8) and which, relative to the second electrode, forms a gap s.sub.1 all around that does not exceed 10 mm in width. In order to form the electrode so that the gap width is not a critical feature, projections (12) are disposed in the hollow space (10) of the hollow anode (3), said projections increasing the internal surface area (11) of the hollow anode (3). Preferably, these projections (12) are constructed as rib structures, which may also assume a honeycomb form.Type: GrantFiled: July 3, 1986Date of Patent: August 30, 1988Assignee: Leybold-Heraeus GmbHInventors: Jorg Kieser, Michael Sellschopp, Michael Geisler