Patents by Inventor Michael J. Wodjenski
Michael J. Wodjenski has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8555705Abstract: A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.Type: GrantFiled: June 28, 2011Date of Patent: October 15, 2013Assignee: Advanced Technology Materials, Inc.Inventors: James Dietz, Steven E. Bishop, James V. McManus, Steven M. Lurcott, Michael J. Wodjenski, Robert Kaim, Frank Dimeo, Jr.
-
Patent number: 8506689Abstract: A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.Type: GrantFiled: June 26, 2011Date of Patent: August 13, 2013Assignee: Advanced Technology Mateials, Inc.Inventors: Dennis Brestovansky, Michael J. Wodjenski, Jose I. Arno, J. Donald Carruthers, Judith A. Moroco
-
Publication number: 20130125999Abstract: Apparatus and method for determining endpoint of a fluid supply vessel in which fluid flow is controlled through a flow passage disposed in an interior volume of the fluid supply vessel with a static flow restricting device and a selectively actuatable valve element upon establishing fluid flow. The endpoint determination can be employed to terminate fluid supply from the fluid supply vessel and/or to switch from a fluid-depleted supply vessel to a fresh vessel for continuity or renewal of fluid supply operation. The apparatus and method are suitable for use with fluidutilizing apparatus such as ion implanters.Type: ApplicationFiled: June 18, 2011Publication date: May 23, 2013Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Joseph D. Sweeney, Anthony M. Avila, Michael J. Wodjenski, Joseph R. Despres, Thomas H. Baum
-
Publication number: 20120111374Abstract: Apparatus and methods for cleaning ion implanters and/or components thereof are described, utilizing cleaning agents reacted with residue deposits to effect removal thereof. An endpoint detection apparatus and method are also disclosed, which may be integrated in the cleaning apparatus and methods to provide highly efficient utilization of the cleaning agent and avoidance of deleterious effects that otherwise can occur when cleaning agents are continued to be exposed to an implanter or components thereof after cleaning has been completed.Type: ApplicationFiled: November 8, 2011Publication date: May 10, 2012Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Joseph R. Despres, James V. McManus, Richard D. Chism, Edward E. Jones, Joseph D. Sweeney, Steven G. Sergi, Ying Tang, Michael J. Wodjenski, Richard S. Ray, Barry Lewis Chambers
-
Publication number: 20110277846Abstract: A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.Type: ApplicationFiled: June 26, 2011Publication date: November 17, 2011Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Dennis Brestovansky, Michael J. Wodjenski, Jose I. Arno, J. Donald Carruthers, Philip A. Moroco, Judith A. Moroco
-
Publication number: 20110252883Abstract: A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.Type: ApplicationFiled: June 28, 2011Publication date: October 20, 2011Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: James Dietz, Steven E. Bishop, James V. McManus, Steven M. Lurcott, Michael J. Wodjenski, Robert Kaim, Frank Dimeo, JR.
-
Patent number: 7972421Abstract: A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.Type: GrantFiled: March 10, 2009Date of Patent: July 5, 2011Assignee: Advanced Technology Materials, Inc.Inventors: Dennis Brestovansky, Michael J. Wodjenski, Jose I. Arno, J. Donald Carruthers, Phillip A. Moroco, Judith A. Moroco, legal representative
-
Patent number: 7966879Abstract: A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.Type: GrantFiled: October 24, 2005Date of Patent: June 28, 2011Assignee: Advanced Technology Materials, Inc.Inventors: James Dietz, Steven E. Bishop, James V. McManus, Steven M. Lurcott, Michael J. Wodjenski, Robert Kaim, Frank Dimeo, Jr.
-
Publication number: 20100255198Abstract: Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.Type: ApplicationFiled: August 31, 2007Publication date: October 7, 2010Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: John M. Cleary, Jose I. Arno, Bryan C. Hendrix, Donn Naito, Scott Battle, John N. Gregg, Michael J. Wodjenski, Chongying Xu
-
Patent number: 7798168Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: GrantFiled: November 10, 2009Date of Patent: September 21, 2010Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
-
Publication number: 20100180955Abstract: A gas cabinet including an enclosure containing at least one gas supply vessel and flow circuitry coupled to the gas supply vessel(s). The flow circuitry is constructed and arranged to flow dispensed gas from an on-stream gas supply vessel to multiple sticks of the flow circuitry, with each of the multiple sticks being joined in gas flow communication to a respective gas-utilizing process unit. The flow circuitry is valved to enable sections of the flow circuitry associated with respective ones of the multiple sticks to be isolated from other sections of the flow circuitry, so that process gas can be flowed to one or more of the sticks, while other sticks are being evacuated and purged, or otherwise are closed to dispensed gas flow therethrough.Type: ApplicationFiled: March 30, 2010Publication date: July 22, 2010Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Michael J. Wodjenski, James Dietz
-
Patent number: 7694691Abstract: A gas cabinet including an enclosure containing at least one gas supply vessel and flow circuitry coupled to the gas supply vessel(s). The flow circuitry is constructed and arranged to flow dispensed gas from an on-stream gas supply vessel to multiple sticks of the flow circuitry, with each of the multiple sticks being joined in gas flow communication to a respective gas-utilizing process unit. The flow circuitry is valved to enable sections of the flow circuitry associated with respective ones of the multiple sticks to be isolated from other sections of the flow circuitry, so that process gas can be flowed to one or more of the sticks, while other sticks are being evacuated and purged, or otherwise are closed to dispensed gas flow therethrough.Type: GrantFiled: August 5, 2008Date of Patent: April 13, 2010Assignee: Advanced Technology Materials, Inc.Inventors: Michael J. Wodjenski, James Dietz
-
Publication number: 20100059694Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: ApplicationFiled: November 10, 2009Publication date: March 11, 2010Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
-
Patent number: 7614421Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: GrantFiled: February 23, 2006Date of Patent: November 10, 2009Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Matthew B. Donatucci, Luping Wang, Michael J. Wodjenski
-
Publication number: 20090173225Abstract: A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.Type: ApplicationFiled: March 10, 2009Publication date: July 9, 2009Applicant: Advanced Technology Materials, Inc.Inventors: Dennis Brestovansky, Michael J. Wodjenski, Jose I. Arno, J. Donald Carruthers, Philip A. Moroco, Judith A. Moroco
-
Patent number: 7501010Abstract: A fluid storage and dispensing apparatus including a fluid storage and dispensing vessel having a rectangular parallelepiped shape, and an integrated gas cabinet assembly including such fluid storage and dispensing apparatus and/or a point-of-use ventilation gas scrubber in the vented gas cabinet. By the use of physical adsorbent and chemical sorbent media, the gas cabinet can be enhanced in safety of operation, e.g., where the process gas supplied from the gas cabinet is of a toxic or otherwise hazardous character.Type: GrantFiled: September 15, 2005Date of Patent: March 10, 2009Assignee: Advanced Technology Materials, Inc.Inventors: Dennis Brestovansky, Michael J. Wodjenski, Jose I. Arno, J. Donald Carruthers, Judith A. Moroco, legal representative, Philip A. Moroco
-
Publication number: 20080289712Abstract: A gas cabinet including an enclosure containing at least one gas supply vessel and flow circuitry coupled to the gas supply vessel(s). The flow circuitry is constructed and arranged to flow dispensed gas from an on-stream gas supply vessel to multiple sticks of the flow circuitry, with each of the multiple sticks being joined in gas flow communication to a respective gas-utilizing process unit. The flow circuitry is valved to enable sections of the flow circuitry associated with respective ones of the multiple sticks to be isolated from other sections of the flow circuitry, so that process gas can be flowed to one or more of the sticks, while other sticks are being evacuated and purged, or otherwise are closed to dispensed gas flow therethrough.Type: ApplicationFiled: August 5, 2008Publication date: November 27, 2008Applicant: Advanced Technology Materials, Inc.Inventors: Michael J. WODJENSKI, James DIETZ
-
Publication number: 20080280380Abstract: A monitoring system (100) for monitoring fluid in a fluid supply vessel (22, 24, 26, 28, 108) during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors (114, 126) for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module (40, 132, 146) operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor (50, 150) and display (52, 150) operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.Type: ApplicationFiled: October 24, 2005Publication date: November 13, 2008Applicant: Advanced Technology Materials, Inc.Inventors: James Dietz, Steven E. Bishop, James V. McManus, Steven M. Lurcott, Michael J. Wodjenski, Robert Kaim, Frank Dimeo, JR.
-
Patent number: 7406979Abstract: A gas cabinet including an enclosure containing at least one gas supply vessel and flow circuitry coupled to the gas supply vessel(s). The flow circuitry is constructed and arranged to flow dispensed gas from an on-stream gas supply vessel to multiple sticks of the flow circuitry, with each of the multiple sticks being joined in gas flow communication to a respective gas-utilizing process unit. The flow circuitry is valved to enable sections of the flow circuitry associated with respective ones of the multiple sticks to be isolated from other sections of the flow circuitry, so that process gas can be flowed to one or more of the sticks, while other sticks are being evacuated and purged, or otherwise are closed to dispensed gas flow therethrough.Type: GrantFiled: May 30, 2006Date of Patent: August 5, 2008Assignee: Advanced Technology Materials, Inc.Inventors: Michael J. Wodjenski, James Dietz
-
Patent number: 7328716Abstract: Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.Type: GrantFiled: February 22, 2005Date of Patent: February 12, 2008Assignee: Advanced Technology Materials, Inc.Inventors: W. Karl Olander, Matthew B Donatucci, Luping Wang, Michael J. Wodjenski