Abstract: A method for detecting substrate damage in a flip chip die, having a back side and a circuit side, that uses magnetic resonance imaging. The back side of the die is first globally thinned down and a region for examination is selected. A magnetic field is applied to the selected region and then the region is scanned with a magnetic resonance imaging arrangement. A plurality of perturbations are measured to generate an array of perturbation signals, which are then converted to a local susceptibility map of the selected region of the die. The susceptibility map of the selected region is then examined to determine if there is any substrate damage.

Abstract: According to an example embodiment of the present invention, a semiconductor die having a buried insulator layer between a circuit side and a back side is selectively thinned. During thinning, a selected portion of the bulk silicon layer on the back side is removed and a void created. A circuit is formed in the void and is coupled to the existing circuitry on the circuit side of the die. The new circuit is used to analyze the die during operation, testing, or other conditions. The newly formed circuit enhances the ability to analyze the semiconductor die by adding flexibility to the traditional analysis methods used for integrated circuit dice. The newly formed circuit enables many new ways of interactively using the existing circuitry some of which include replacement of defective circuitry, modification of existing circuit operations, and stimulation of existing circuitry for testing.

Abstract: According to one aspect of the disclosure, the present invention provides methods and arrangements for testing a flip chip SOI semiconductor device after the back side of the chip has been thinned to expose a selected region in the substrate. For some chips, thinning removes substrate material useful for drawing heat away from the internal circuitry when the circuitry is running at high speeds. To compensate for this material loss, a special test fixture having a passive, corrosion-resistant heat-dissipating device is arranged to draw heat from the device.

Abstract: A method and system providing spatial and timing resolution for photoemission microscopy of an integrated circuit. A microscope having an objective lens forming a focal plane is arranged to view the integrated circuit, and an aperture element having an aperture is optically aligned in the back focal plane of the microscope. The aperture element is positioned for viewing a selected area of the integrated circuit. A position-sensitive avalanche photo-diode is optically aligned with the aperture to detect photoemissions when test signals are applied to the integrated circuit.

Abstract: According to an example embodiment, a method for testing a semiconductor die is provided. The semiconductor die has circuitry on one side and silicon on an opposite side, and the opposite side may be AR coated. The opposite side is thinned, the die is powered, and a portion of the circuitry is heated to cause a reaction (e.g., a circuit failure or recovery) in a target region. The circuitry is monitored, and the circuit that reacts to the heat is detected and analyzed.

Abstract: The present invention is directed to enhancing the analysis and modification of a flip chip integrated circuit die having silicon on insulator (SOI) structure. According to one example embodiment, an optical nanomachining arrangement is adapted to direct an optical beam, such as a laser, at a selected portion of the flip chip SOI structure. The optical beam performs device edits to modify the circuitry contained in the SOI selected portion without necessarily damaging surrounding circuitry. The ability to make such device edits is advantageous for various applications, such as in dies of complex, circuitry containing multiple stacked layers of components, and for dies having densely packed circuitry.

Abstract: Integrated circuit devices are analyzed using an integrated system adapted to obtain time-resolved information from the back side of a silicon based semiconductor chip using hot carrier emissions. According to an example embodiment of the present invention, a system is adapted to analyze a semiconductor device under test (DUT) using a plurality of sensors mounted to a microscope having an objective lens. The plurality of sensors include a global acquisition sensor, a single-point acquisition sensor, and a navigation sensor. The integrated system is adapted to use the plurality of sensors individually and simultaneously. The integrated system improves the analysis of the DUT for reasons including that it makes possible the performance of more than one type of analysis simultaneously using a single test arrangement.

Abstract: The ability to monitor virtually any portion of semiconductor device is enhanced via a grid formed for analyzing circuitry in the semiconductor device. According to an example embodiment of the present invention, a grid having a plurality of narrow probe points is formed extending over target circuitry in a semiconductor device. The grid is accessed and used for monitoring various target circuitry within the device by accessing the part of the grid that corresponds to the portion of the target circuitry to which access is desired.

Abstract: Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without necessarily breaching the insulator layer of the SOI structure. According to an example embodiment of the present invention, a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side is analyzed. An atomic force microscope is scanned across a thinned portion of the back side. The microscope responds to an electrical characteristic, such as a logic state, coupled from circuitry via the insulator portion of the die over which the microscope is being scanned. The response of the microscope to the die is detected and used to detect an electrical characteristic of the die.

Abstract: Analysis of a flip-chip type IC die having SOI structure is enhanced via analysis and repair of the die that make possible analysis that would typically result in the die being in a state of disrepair. According to an example embodiment of the present invention, a focused ion beam (FIB) is directed at a back side of a flip-chip die having a circuitry in a circuit side opposite a back side, wherein the circuitry including silicon on insulator (SOI) structure. The FIB is used to remove a selected portion of substrate including a portion of the insulator of the SOI structure from the die. The removed substrate exposes an insulator region in the die, and a signal is coupled from circuitry in the die via the exposed insulator region and used to analyze the die. Material is deposited in the exposed region and the selected portion of the die that had been removed is reconstructed.

Abstract: A system and method for analyzing an integrated circuit device involves generating a magnetic field in circuitry forming a power grid within the integrated circuit device. The magnetic field generator is switched off, and the charge on the power grid dissipates through internal device structures to ground. This decay of the charged power grid is detected and evaluated to assess the quality or consistency of the power distribution grid. Faulty power grids will have a decay pattern that differs from high quality power grids.

Abstract: According to an example embodiment, the present invention is directed to a system and method for analyzing an integrated circuit. A laser is directed to the back side of an integrated circuit and causes local heating, which generates acoustic energy in the circuit. The acoustic energy propagation in the integrated circuit is detected via at least two detectors. Using the detected acoustic energy from the detectors, at least one circuit defect is detected and located.

Abstract: According to an example embodiment of the present invention, a defect detection approach involves detecting the existence of defects in an integrated circuit as a function of acoustic energy. Acoustic energy propagating through the device is detected. A parameter including information such as amplitude, frequency, phase, or a spectrum is developed from the detected energy and correlated to a particular defect in the device.

Abstract: According to an example embodiment, a laser is directed at a target region of a powered semiconductor device via the back side of the device, and active circuitry is selectively excited. In response to the excited circuitry, target circuitry is monitored and a degree of integrity of the operation of the semiconductor device is determined, for example, by detecting the output s/phase characteristics or by monitoring passive emissions from the device. The invention is particularly advantageous in connection with post-manufacture failure analysis.

Abstract: Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by accessing the circuitry within the die from the back side without breaching the thin insulator layer of the SOI structure. According to an example embodiment of the present invention, a portion of substrate is removed from the back side of a semiconductor die having a SOI structure and a backside opposite circuitry in a circuit side. Electrical connection is made to a portion of the circuitry within the die via a capacitive coupling arrangement. The electrical connection is used to obtain an electrical measurement correlated with circuitry logic states of the die that is used for analysis.

Abstract: Analysis of a semiconductor die having silicon-on-insulator (SOI) structure is enhanced by capacitively coupling a signal to the die. According to an example embodiment of the present invention, a die having a thinned back side is analyzed by capacitively coupling an input signal through the insulator portion of the SOI structure and effecting a state change to circuitry in the die. The state change is used to evaluate a characteristic of the die, such as by detecting a response to the state change. The ability to force such a state change is helpful for evaluating dies having SOI structure, and is particularly useful for evaluation techniques that require or benefit from maintaining the insulator portion of the SOI structure intact.

Abstract: According to an example embodiment of the present invention, an electronic circuit is formed upon a front side surface of a semiconductor device having a back side opposite the front side. At least one layer of antireflective material is formed within substrate in the semiconductor device. The circuit is stimulated and a response is analyzed. The use of the antireflective layer reduces interference generated by reflections and improves the ability to analyze the circuit.

Abstract: A system and method provides for effective analysis of an integrated circuit having silicon on insulator (SOI) structure. According to one example embodiment of the present invention, the system includes a system (e.g., a nanomachining arrangement) adapted to remove a selected portion of the backside of a semiconductor device having SOI structure, and to electrically isolate a selected portion of circuitry on the SOI semiconductor device circuitry side. The isolated circuitry then is analyzed.

Abstract: An integrated circuit manufacturing approach involves using a solar cell and facilitating post-manufacturing analysis. According to an example embodiment of the present invention, a solar cell is formed in an integrated circuit device and coupled to target circuitry in the device. The solar cell is activated and provides power to the target circuitry. In response to the solar cell providing power to the target circuitry, the integrated circuit is analyzed.

Abstract: Defect detection for post-manufacturing analysis of an integrated circuit die is enhanced via a method and system that use IR thermography to detect defects in circuitry within the die. According to an example embodiment of the present invention, substrate is removed from an integrated circuit die and a target region is exposed. A portion of the target region is heated with an infrared (IR) laser beam, and the die is imaged using IR thermography. The image is compared with a reference image, and damage to the integrated circuit is detected therefrom.