Patents by Inventor Minoru Inoue

Minoru Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090099384
    Abstract: The present invention provides a method of remedying deterioration of an insulating film which, during the remedial treatment of an insulating film deteriorated by plasma treatment, does not leave residual remedial agent on the wiring material such as the copper wiring layer, can be conducted using a dry process, and exhibits excellent applicability to mass production. The insulating film that has been deteriorated by plasma treatment is brought into contact with a remedial agent composed of a compound with a molecular structure having at least one of a nitro group and a carbonyl group, and at least one of a hydrocarbon group and a hydrogen group.
    Type: Application
    Filed: April 18, 2007
    Publication date: April 16, 2009
    Inventors: Shuji Nagano, Satoshi Hasaka, Minoru Inoue, Toshinori Shibata
  • Publication number: 20080160777
    Abstract: A cleaning method for a processing chamber of semiconductor substrates is provided which is capable of rapidly removing deposits and accretions generated inside the chamber of processing semiconductor substrates of a high-dielectric-constant oxide and of preventing any reaction product depositing. The cleaning method for a processing chamber of semiconductor substrates includes activating a mixed gases which contains a halogenated gas and either an oxygen-contained gas or an oxidizing gas during a plasma treatment or a heating treatment in order to etch off the deposits or accretions.
    Type: Application
    Filed: December 22, 2005
    Publication date: July 3, 2008
    Inventors: Kouichi Ono, Tomohiro Kitagawa, Minoru Inoue, Masanori Oosawa
  • Publication number: 20080128833
    Abstract: A high-dielectric-constant film including hafnium, wherein the above-mentioned high-dielectric-constant film includes deuterium at a ratio higher than the ratio of deuterium to hydrogen present in nature. In a field-effect transistor provided with the high-dielectric-constant film including hafnium, the interface state density at the interface between a silicon substrate and a gate dielectric film decreases and carrier mobility in the gate dielectric film increases. In the present invention, a high-dielectric-constant constant second dielectric film, which is a thin film including hafnium such as HfSiON or HfAlOx and including deuterium at a ratio higher than the ratio of deuterium to hydrogen present in nature, is used as the gate dielectric film of the field-effect transistor.
    Type: Application
    Filed: August 25, 2005
    Publication date: June 5, 2008
    Inventors: Takaaki Kawahara, Kazuyoshi Torii, Minoru Inoue, Satoshi Hasaka
  • Publication number: 20070215402
    Abstract: A bridge-shaped frame member is disposed on a front side frame in front of a suspension tower so as to extend vertically and stride over a No. 4 mount. Accordingly, there can be provided a vehicle front body structure that can attain a proper energy absorption of the front side frame with its axial compression can be attained at a vehicle crash.
    Type: Application
    Filed: February 22, 2007
    Publication date: September 20, 2007
    Inventors: Shin Sasaki, Minoru Inoue, Takahiro Aonuma, Hiroaki Fujii
  • Publication number: 20030196728
    Abstract: An object of the present invention is to provide a nonchromate metallic surface-treating agent capable of achieving the corrosion resistance and adhesion with a coating film equal to a chromium phosphate surface-treating agent.
    Type: Application
    Filed: April 23, 2003
    Publication date: October 23, 2003
    Inventors: Satoshi Nishimura, Tomoyuki Kanda, Masayuki Kamimura, Minoru Inoue
  • Patent number: 6329456
    Abstract: A coating resin composition is able to form a coating film having not only high hardness and weatherability but also high toughness, and can be cured both at room temperature and by heating curing, and further which is good at storage stability. The coating resin composition consists essentially of a silica-dispersed oligomer solution of organosilane prepared by partially hydrolyzing a hydrolyzable organosilane represented by a formula R1nSiX4−n, in colloidal silica dispersed in an organic solvent, water or a mixture thereof, and an acrylic resin which is a copolymer of acrylate or methacrylate represented by a formula, CH2═CR2(COOR3), and a curing catalyst. This composition is used by separating the components into two solutions and then mixing thereof as required. A resin-coated article comprises a cured resin layer of the coating resin composition on the surface of a substrate.
    Type: Grant
    Filed: May 17, 2000
    Date of Patent: December 11, 2001
    Assignees: Matsushita Electric Works, Ltd., Toshiba Silicone Co., Ltd.
    Inventors: Junko Okibe, Minoru Inoue, Motoaki Haruna, Ayumu Yasuda, Takeshi Sunaga, Yasuyo Iwabuchi, Norio Sato
  • Patent number: 6303229
    Abstract: The present invention provides a process for forming a hydrophilic inorganic coated film on a surface of a base material, the process comprising the steps of: (1) preparing an inorganic coating composition which contains, as a major component, a silicone resin obtained by hydrolyzing and condensation-polymerizing only the tetra-functional alkoxysilane represented by the formula: Si(OR)4 [wherein R represents an alkyl group having carbon atoms up to and including 7 or an aryl group], and has a total solid content of not more than 5% by weight; (2) applying the inorganic coating composition to a surface of the base material to form a coated layer; and (3) drying and curing the coated layer to form a cured coated film having a thickness of 0.01 to 0.5 &mgr;m. The hydrophilic inorganic coated film formed by the process of the present invention is highly hydrophilic just after the film is formed, even in the case that it is not irradiated with ultraviolet rays.
    Type: Grant
    Filed: December 8, 1999
    Date of Patent: October 16, 2001
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Koichi Takahama, Minoru Inoue, Junko Ikenaga, Shoichi Nakamoto
  • Patent number: 6292532
    Abstract: A fluorescent X-ray analyzing apparatus capable of being used as either a wavelength dispersive type or an energy dispersive type is provided, with which the analysis can be performed quickly and accurately. The fluorescent X-ray analyzing apparatus includes a detecting unit for detecting and analyzing fluorescent X-ray (5) emitted from at least one target area (1a) of a sample (1) to be analyzed as a result of excitation of such target area (1a) with a primary X-ray (3). The detecting unit includes a wavelength dispersive type detecting unit (6) including a spectroscope (8) and a first detector (9), and an energy dispersive type detecting unit (11) including a second detector (12) of an energy dispersive type.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: September 18, 2001
    Assignee: Rigaku Industrial Corporation
    Inventors: Naoki Kawahara, Takashi Shoji, Takashi Misonoo, Kouichi Aoyagi, Akira Arake, Takashi Sakamoto, Minoru Inoue, Yasujiro Yamada
  • Publication number: 20010008696
    Abstract: The present invention provides a process for forming a hydrophilic inorganic coated film on a surface of a base material, the process comprising the steps of: (1) preparing an inorganic coating composition which contains, as a major component, a silicone resin obtained by hydrolyzing and condensation-polymerizing only the tetra-functional alkoxysilane represented by the formula: Si(OR)4 [wherein R represents an alkyl group having carbon atoms up to and including 7 or an aryl group], and has a total solid content of not more than 5% by weight; (2) applying the inorganic coating composition to a surface of the base material to form a coated layer; and (3) drying and curing the coated layer to form a cured coated film having a thickness of 0.01 to 0.5 &mgr;m. The hydrophilic inorganic coated film formed by the process of the present invention is highly hydrophilic just after the film is formed, even in the case that it is not irradiated with ultraviolet rays.
    Type: Application
    Filed: December 8, 1999
    Publication date: July 19, 2001
    Inventors: KOICHI TAKAHAMA, MINORU INOUE, JUNKO IKENAGA, SHOICHI NAKAMOTO
  • Patent number: 6221498
    Abstract: An antifouling silicone emulsion coating-composition comprising following components (A), (B), (C) and (D), an amount of the component (C) incorporated being in the range of 5 to 80% by weight relative to the total solid contents in the composition: (A) partially hydrolyzed organosiloxane with a weight-average molecular weight of 600 to 5,000 (determined using a polystyrene calibration curve), represented by the average formula (I): R2aSiOb(OR1)c(OH)d wherein R1 and R2 represent a monovalent hydrocarbon group; a, b, c and d are numerals satisfying the following relationships: a+2b+c+d=4, 0≦a<3, 0<b<2, 0<c<4, and 0<d<4; (B) nonionic or anionic surface active agent; (C) photo-semiconductor; and (D) water.
    Type: Grant
    Filed: January 11, 1999
    Date of Patent: April 24, 2001
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Koichi Takahama, Takeyuki Yamaki, Minoru Inoue, Akiharu Goto, Junko Ikenaga, Hirotsugu Kishimoto
  • Patent number: 6090873
    Abstract: A coating resin composition is able to form a coating film having not only high hardness and weatherability but also high toughness, and can be cured both at room temperature and by heating curing, and further which is good at storage stability.The coating resin composition consists essentially of a silica-dispersed oligomer solution of organosilane prepared by partially hydrolyzing a hydrolyzable organosilane represented by a formula R.sup.1.sub.n SiX.sub.4-n, in colloidal silica dispersed in an organic solvent, water or a mixture thereof, and an acrylic resin which is a copolymer of acrylate or methacrylate represented by a formula, CH.sub.2 .dbd.CR.sup.2 (COOR.sup.3), and a curing catalyst. This composition is used by separating the components into two solutions and then mixing thereof as required. A resin-coated article comprises a cured resin layer of the coating resin composition on the surface of a substrate.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: July 18, 2000
    Assignees: Matsushita Electric Works, Ltd., Toshiba Silicone Co. Ltd.
    Inventors: Junko Okibe, Minoru Inoue, Motoaki Haruna, Ayumu Yasuda, Takeshi Sunaga, Yasuyo Iwabuchi, Norio Sato
  • Patent number: 6025077
    Abstract: A composition of the present invention comprises organosiloxane partial hydrolyzate represented by a formula R.sub.2.sup.a SiO.sub.b (OR.sup.1).sub.c (OH).sub.d and having a weight-average molecular weight of 600-5,000 in polystylene conversion, (B) colloidal silica, (C) emulsifying agent and (D) water. Its manufacturing method comprises, for example, a step of mixing the mixed (A), (B) and (D) constituents with the (C) constituent, whereby the composition of silicone emulsion coating material which is stable as an emulsion for a long term and capable of being hardened at low temperatures and as heated and forming a hardened film excellent in the weatherability, durability and so on, as well as its manufacturing method can be provided.
    Type: Grant
    Filed: May 26, 1998
    Date of Patent: February 15, 2000
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Takeyuki Yamaki, Minoru Inoue, Kazuo Seto, Hideya Ariga, Akihiko Ohashi
  • Patent number: 5976743
    Abstract: An electrophotographic photoreceptor having a charge transporting layer excellent in the abrasion resistance, stain resistance (toner releasability) and corona resistance, having a long life and also having excellent processability. An electrophotographic photoreceptor comprising a conductive substrate having thereon a charge generating layer containing a photoconductive material in a transparent resin cured product and at least one charge transporting layer containing a charge transporting material in a transparent resin cured product in this order, wherein the transparent resin cured product in the outermost layer of said at least one charge transporting layer is a cured product of silicone resin and contains a linear polysiloxanediol in an amount of 1 to 100 parts per 100 parts by weight of all silicone solids contents exclusive of the polysiloxanediol.
    Type: Grant
    Filed: January 28, 1998
    Date of Patent: November 2, 1999
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Takeyuki Yamaki, Minoru Inoue
  • Patent number: 5902851
    Abstract: The present invention provides a resinous composition for foul releasing coat adhesion containing a silica dispersed oligomer solution of an organosilane, an acrylic resin, a straight-chain polysiloxane diol, a silanol group-containing polyorganosiloxane and a curing catalyst, and an article coated therewith.
    Type: Grant
    Filed: April 14, 1997
    Date of Patent: May 11, 1999
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Takeyuki Yamaki, Akiharu Gotoh, Minoru Inoue
  • Patent number: 5895711
    Abstract: A heat-fixing roll is coated with a hardened silicone coating composition containing such materials (1A) and (1B) or (2A) through (2D) as follows:(1A) organosiloxane consisting of a hydrolyzed condensation polymer of 20-200 parts by weight of silicon compound Si(OR.sup.1).sub.4 and colloidal silica, 100 parts by weight of silicon compound R.sub.2 Si(OR.sup.1).sub.3, and 0-60 parts by weight of silicon compound R.sub.2 Si(OR.sup.1).sub.2 (R.sup.1 and R.sup.2 being monovalent hydrocarbon radicals), with the weight average molecular weight controlled to be more than 800 in polystyrene conversion, and(1B) a straight-chain polysiloxanediol HO(R.sup.3.sub.2 SiO).sub.n H (R.sup.3 being a monovalent hydrocarbon radical, and n.gtoreq.3); or(2A) a silica dispersed oligomer solution of organosilane prepared by partially hydrolyzing a hydrolyzable organosilane R.sup.4.sub.m SiX.sub.4-m (R.sup.
    Type: Grant
    Filed: November 10, 1997
    Date of Patent: April 20, 1999
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Takeyuki Yamaki, Minoru Inoue
  • Patent number: D464068
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: October 8, 2002
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Takeshi Asaka, Minoru Inoue, Shinichiro Shiba
  • Patent number: D465799
    Type: Grant
    Filed: August 27, 2001
    Date of Patent: November 19, 2002
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Takeshi Asaka, Minoru Inoue, Shinichiro Shiba
  • Patent number: D477008
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: July 8, 2003
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Takeshi Asaka, Minoru Inoue, Shinichiro Shiba
  • Patent number: D417880
    Type: Grant
    Filed: November 17, 1998
    Date of Patent: December 21, 1999
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Yuki Wani, Toshinobu Miyazawa, Tomoyuki Kawamura, Keiichi Iizuka, Minoru Inoue
  • Patent number: D420028
    Type: Grant
    Filed: November 18, 1998
    Date of Patent: February 1, 2000
    Assignee: Olympus Optical Co., Ltd.
    Inventors: Yuki Wani, Toshinobu Miyazawa, Tomoyuki Kawamura, Keiichi Iizuka, Minoru Inoue