Patents by Inventor Mitsuhiro Okada
Mitsuhiro Okada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240079937Abstract: The present invention provides a core block for a motor and a method for producing the core block, which can be efficiently produced and in which the size of a plastic region with poor properties that is formed on an electromagnetic steel sheet of the core block is reduced. This core block for a motor comprises electromagnetic steel sheets laminated on each other, said core block being obtained by carrying out an edge part forming process using electrical energy or optical energy to form the whole or part of the circumferences of edge parts of the electromagnetic steel sheets of the core block and carrying out press working to punch the electromagnetic steel sheets before or after the edge part forming process that uses electrical energy or optical energy.Type: ApplicationFiled: February 9, 2022Publication date: March 7, 2024Applicant: FANUC CORPORATIONInventors: Takuya MAEDA, Shingo OKADA, Mitsuhiro YASUMURA
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Patent number: 11764506Abstract: A connector pair includes a first connector, and a second connector electrically connected to the first connector. The first connector includes a first electrical contact part provided with a graphene film on a metal base material. The second connector includes a second electrical contact part electrically connected to the first connector via the graphene film. A contact area between the first electrical contact part and the second electrical contact part is smaller than an area of the graphene film coating the metal base material.Type: GrantFiled: January 26, 2021Date of Patent: September 19, 2023Assignee: YAZAKI CORPORATIONInventors: Toshitaka Kubo, Kazuhiko Seki, Mitsuhiro Okada, Kazuto Hatakeyama, Kenji Koga, Tetsuo Shimizu, Nan Ye, Hiroki Kawai
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Patent number: 11732357Abstract: A substrate processing method in substrate processing apparatus comprises repeating cycle including: supplying source gas into process container causing the source gas to be adsorbed to substrate; exhausting excess source gas from the process container; supplying reaction gas into the process container causing the reaction gas to react with the source gas; and exhausting excess reaction gas, wherein at least one of a gap width between placement stage and member forming processing space between the member and the stage and degree of opening of pressure adjustment valve in at least one of the supplying the source gas and the supplying the reaction gas is smaller than at least one of a gap width between the stage and the member and the degree of opening of the pressure adjustment valve in at least one of the exhausting the excess source gas and the exhausting the excess reaction gas, respectively.Type: GrantFiled: June 4, 2020Date of Patent: August 22, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Tsuyoshi Takahashi, Mitsuhiro Okada, Yasushi Fujii, Yu Nunoshige, Shinji Kawasaki, Hirotaka Kuwada, Toshio Takagi
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Patent number: 11651671Abstract: To be capable of efficiently transmitting appropriate information on the motion improvement to a person in motion. A motion evaluation system includes a sensor unit, an information processing device, and an information presentation device. The information processing device includes a communication device, a storage device, and an arithmetic device.Type: GrantFiled: April 26, 2021Date of Patent: May 16, 2023Assignee: Hitachi, Ltd.Inventors: Takuto Sato, Takehiro Niikura, Mitsuhiro Okada, Hiroki Ohashi, Takayuki Akiyama, Katsuyuki Nakamura, Mohammad Osamh Adel Al-Naser, Sheraz Ahmed
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Publication number: 20230117525Abstract: A square type battery includes a cover that is provided with a terminal and is formed in a substantially rectangle, a case main body that is formed in a substantially rectangular parallelopiped and that includes two pairs of opposed side surfaces connected to a peripheral edge part of the cover, and an electrode body that is accommodated inside the case main body and that is connected to the terminal. At least a first side surface among the two pairs of opposed side surfaces is pinched toward an inward of the case main body. The first side surface and a second side surface opposed to the first side surface abut the electrode body.Type: ApplicationFiled: October 14, 2022Publication date: April 20, 2023Inventors: Hitoshi Maeda, Mitsuhiro Okada, Hiroshi Takabayashi
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Publication number: 20230080232Abstract: A technique is provided which reduces an external load, such as vibration and impact, applied on a boundary between an electrode body and an electrical collector tab. The herein disclosed secondary battery includes an electrode body, a case main body, and a cover. The cover includes an electrical collector terminal attached via an insulating material. The electrode body includes an electrical collector tab. The electrical collector tab includes an extension part that extends from the electrode body, and a branch part that extends from a tip end area of the extension part in a direction different from the extension part. The branch part includes a portion joined to the electrical collector terminal.Type: ApplicationFiled: September 14, 2022Publication date: March 16, 2023Inventor: Mitsuhiro OKADA
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Patent number: 11600490Abstract: There is provided a method of forming a silicon film, which includes: a film forming step of forming the silicon film on a base, the silicon film having a film thickness thicker than a desired film thickness; and an etching step of reducing the film thickness of the silicon film by supplying an etching gas containing bromine or iodine to the silicon film.Type: GrantFiled: December 4, 2020Date of Patent: March 7, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Mitsuhiro Okada, Tatsuya Miyahara, Keisuke Fujita
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Patent number: 11551933Abstract: According to one embodiment of the present disclosure, there is provided a substrate processing method including: providing a substrate; forming a seed layer on a surface of the substrate by heating a stage on which the substrate is placed to a first temperature and supplying a first source gas to the substrate; and forming a metal-containing film by heating the stage on which the substrate is placed to a second temperature and supplying a second source gas and a first reducing gas to the substrate on which the seed layer is formed.Type: GrantFiled: February 4, 2020Date of Patent: January 10, 2023Assignee: TOKYO ELECTRON LIMITEDInventors: Mitsuhiro Okada, Yasushi Fujii
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Publication number: 20220415661Abstract: A plasma processing apparatus includes a chamber having a gas inlet and a gas outlet; a plasma generator; and a controller configured to cause: (a) providing a substrate including a silicon-containing film and a mask formed on the film; (b) etching the silicon-containing film through the mask to the first depth, thereby forming a recess in the silicon-containing film; (c) forming a protection film at least on the mask and a side wall of the recess formed on the silicon-containing film after (a); and (d) etching the silicon containing film through the mask to a second depth, the second depth being greater than the first depth.Type: ApplicationFiled: September 5, 2022Publication date: December 29, 2022Applicant: Tokyo Electron LimitedInventors: Akinobu KAKIMOTO, Yoshinobu HAYAKAWA, Satoshi MIZUNAGA, Yasuhiro HAMADA, Mitsuhiro OKADA
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Publication number: 20220415660Abstract: A processing apparatus includes a chamber having a gas inlet and a gas outlet; a plasma generator; and a controller configured to cause: (a) etching a silicon-containing film to a first depth with a first plasma in the chamber, thereby forming a recess in the silicon-containing film; (b) forming a protection film on a side wall of the recess with a second plasma in the chamber, the protection film having a first thickness at an upper portion of the recess and a second thickness at a lower portion of the recess, the second thickness being smaller than the first thickness; and (c) etching the silicon-containing film to a second depth with the third plasma in the chamber, the second depth being greater than the first depth.Type: ApplicationFiled: September 5, 2022Publication date: December 29, 2022Applicant: Tokyo Electron LimitedInventors: Akinobu KAKIMOTO, Yoshinobu HAYAKAWA, Satoshi MIZUNAGA, Yasuhiro HAMADA, Mitsuhiro OKADA
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Publication number: 20220407166Abstract: An electricity storage device includes: an electrode body including at least one positive electrode plate, at least one negative electrode plate, and a separator. an insulating holder that is formed by folding a sheet made of an insulating material and accommodates therein the electrode body; an outer case which has an opening and accommodates therein the electrode body with the insulating holder and an electrolyte; and a sealing plate. The outer case has a bottom plate part and a plurality of side walls standing from the bottom plate part, and the opening is formed in a position to face the bottom plate part. The insulating holder has a plurality of side surface parts respectively facing the plurality of side walls, and a bottom surface part that faces the bottom plate part. At least one of the side surface parts or the bottom surface part has a bellow-folded structure.Type: ApplicationFiled: November 12, 2020Publication date: December 22, 2022Inventors: Hitoshi MAEDA, Mitsuhiro OKADA, Hiroshi TAKABAYASHI
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Publication number: 20220399620Abstract: A terminal structure to be adopted for a power storage device including an outer case that has an opening, includes: a sealing plate sealing the opening; a terminal member inserted into a terminal hole formed in the sealing plate and electrically connected to an electrode; and a first insulating member arranged between the sealing plate and the terminal member, and arranged on an outer surface side of the sealing plate facing an outer side of the power storage device. The terminal member has a first extended part extending further outward than an outer periphery of the terminal hole on the outer side of the power storage device. A first protruding part or a second recessed part provided to the first insulating member and a first recessed part or a second protruding part provided to the sealing plate or to the first extended part fit with each other.Type: ApplicationFiled: November 12, 2020Publication date: December 15, 2022Inventors: Mitsuhiro OKADA, Hitoshi MAEDA, Hiroshi TAKABAYASHI
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Patent number: 11474505Abstract: A work support system is capable of avoiding situations where a worker performs erroneous work. The system includes an identification unit which identifies a target of an inquiry from a worker based on a video acquired by an imaging device, a selection unit which selects determination model information corresponding to each of one or more targets of inquiry identified by the identification unit from a storage unit storing determination model information to be used in a determination model. A determination unit determines whether each of the targets of inquiry is correct by using each of the determination models in which the determination model information, which was selected by the selection unit, corresponding to each of the one or more targets of inquiry identified by the identification unit, has been set in the determination model. An output unit outputs a determination result of the determination unit.Type: GrantFiled: December 11, 2020Date of Patent: October 18, 2022Assignee: HITACHI, LTD.Inventors: Takayuki Akiyama, Mitsuhiro Okada
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Patent number: 11424143Abstract: Provided is a heat insulation structure used for a vertical heat treatment apparatus that performs a heat treatment on a substrate. The vertical heat treatment apparatus includes: a processing container having a double tube structure including an inner tube and an outer tube closed upward, the processing container having an opening at a lower end thereof; a gas supply section and exhaust section provided on a lower side of the processing container; a lid configured to introduce or discharge the substrate into or from the opening and to open/close the opening; and a heating section provided to cover the processing container from an outside. The heat insulation structure is provided between the inner tube and the outer tube.Type: GrantFiled: March 11, 2019Date of Patent: August 23, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Koji Yoshii, Tatsuya Yamaguchi, Hiroyuki Hayashi, Mitsuhiro Okada, Satoshi Takagi, Toshihiko Takahashi, Masafumi Shoji, Kazuya Kitamura
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Patent number: 11267970Abstract: An asphalt modifier comprising a polyolefin-based copolymer comprising an ethylene-derived monomer unit and a monomer unit having an epoxy group is disclosed. The content of the monomer unit having an epoxy group is 13% by mass or more based on the mass of the polyolefin-based copolymer.Type: GrantFiled: May 22, 2018Date of Patent: March 8, 2022Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Susumu Mori, Yusuke Asai, Mitsuhiro Okada
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Patent number: 11251034Abstract: There is provided a film forming method comprising an organic substance removal step of removing an organic substance adhering to an oxide film generated on a surface of a base by supplying a hydrogen-containing gas and an oxygen-containing gas to the base; an oxide film removal step of removing the oxide film formed on the surface of the base after the organic substance removal step; and a film forming step of forming a predetermined film on the surface of the base after the oxide film removal step.Type: GrantFiled: February 21, 2019Date of Patent: February 15, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Hiroyuki Hayashi, Rui Kanemura, Satoshi Takagi, Mitsuhiro Okada
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Publication number: 20210384071Abstract: A method of manufacturing a semiconductor device includes: planarizing a surface of a substrate having a conductive material embedded in a first hole so as to expose the conductive material embedded in the first hole, wherein the first hole is formed in a region which is on an insulating film laminated on the substrate and is surrounded by a spacer film; laminating a mask film on the surface of the substrate; forming a second hole in the mask film such that at least a portion of an upper surface of the conductive material embedded in the first hole is exposed; embedding the conductive material in the second hole; and removing the mask film.Type: ApplicationFiled: August 19, 2021Publication date: December 9, 2021Inventors: Kazuo KIBI, Shigetsugu FUJITA, Kenji SUZUKI, Mitsuhiro OKADA
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Publication number: 20210335114Abstract: To be capable of efficiently transmitting appropriate information on the motion improvement to a person in motion. A motion evaluation system includes a sensor unit, an information processing device, and an information presentation device. The information processing device includes a communication device, a storage device, and an arithmetic device.Type: ApplicationFiled: April 26, 2021Publication date: October 28, 2021Inventors: Takuto SATO, Takehiro NIIKURA, Mitsuhiro OKADA, Hiroki OHASHI, Takayuki AKIYAMA, Katsuyuki NAKAMURA, Mohammad OSAMH ADEL AL-NASER, Sheraz AHMED
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Publication number: 20210294311Abstract: A work support system is capable of avoiding situations where a worker performs erroneous work. The system includes an identification unit which identifies a target of an inquiry from a worker based on a video acquired by an imaging device, a selection unit which selects determination model information corresponding to each of one or more targets of inquiry identified by the identification unit from a storage unit storing determination model information to be used in a determination model. A determination unit determines whether each of the targets of inquiry is correct by using each of the determination models in which the determination model information, which was selected by the selection unit, corresponding to each of the one or more targets of inquiry identified by the identification unit, has been set in the determination model. An output unit outputs a determination result of the determination unit.Type: ApplicationFiled: December 11, 2020Publication date: September 23, 2021Inventors: Takayuki AKIYAMA, Mitsuhiro OKADA
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Publication number: 20210253789Abstract: Disclosed is a polycarbonate resin composition containing (a) an aromatic polycarbonate, (b) a polyester, and (c) a polymer having an epoxy group. The following requirements are satisfied. (1) A content of the (a) aromatic polycarbonate is 75% by mass or more based on a mass of the polycarbonate resin composition. (2) A mass ratio of a content of the (c) polymer having an epoxy group with respect to a content of the (b) polyester is 0.8 or more. (3) A content of a sum of the (b) polyester and the (c) polymer having an epoxy group is 25 parts by mass or less with respect to 100 parts by mass of the (a) aromatic polycarbonate.Type: ApplicationFiled: May 22, 2019Publication date: August 19, 2021Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Sho KITAGAWA, Mitsuhiro OKADA