Patents by Inventor Mitsuhiro Okada

Mitsuhiro Okada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240079937
    Abstract: The present invention provides a core block for a motor and a method for producing the core block, which can be efficiently produced and in which the size of a plastic region with poor properties that is formed on an electromagnetic steel sheet of the core block is reduced. This core block for a motor comprises electromagnetic steel sheets laminated on each other, said core block being obtained by carrying out an edge part forming process using electrical energy or optical energy to form the whole or part of the circumferences of edge parts of the electromagnetic steel sheets of the core block and carrying out press working to punch the electromagnetic steel sheets before or after the edge part forming process that uses electrical energy or optical energy.
    Type: Application
    Filed: February 9, 2022
    Publication date: March 7, 2024
    Applicant: FANUC CORPORATION
    Inventors: Takuya MAEDA, Shingo OKADA, Mitsuhiro YASUMURA
  • Patent number: 11764506
    Abstract: A connector pair includes a first connector, and a second connector electrically connected to the first connector. The first connector includes a first electrical contact part provided with a graphene film on a metal base material. The second connector includes a second electrical contact part electrically connected to the first connector via the graphene film. A contact area between the first electrical contact part and the second electrical contact part is smaller than an area of the graphene film coating the metal base material.
    Type: Grant
    Filed: January 26, 2021
    Date of Patent: September 19, 2023
    Assignee: YAZAKI CORPORATION
    Inventors: Toshitaka Kubo, Kazuhiko Seki, Mitsuhiro Okada, Kazuto Hatakeyama, Kenji Koga, Tetsuo Shimizu, Nan Ye, Hiroki Kawai
  • Patent number: 11732357
    Abstract: A substrate processing method in substrate processing apparatus comprises repeating cycle including: supplying source gas into process container causing the source gas to be adsorbed to substrate; exhausting excess source gas from the process container; supplying reaction gas into the process container causing the reaction gas to react with the source gas; and exhausting excess reaction gas, wherein at least one of a gap width between placement stage and member forming processing space between the member and the stage and degree of opening of pressure adjustment valve in at least one of the supplying the source gas and the supplying the reaction gas is smaller than at least one of a gap width between the stage and the member and the degree of opening of the pressure adjustment valve in at least one of the exhausting the excess source gas and the exhausting the excess reaction gas, respectively.
    Type: Grant
    Filed: June 4, 2020
    Date of Patent: August 22, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tsuyoshi Takahashi, Mitsuhiro Okada, Yasushi Fujii, Yu Nunoshige, Shinji Kawasaki, Hirotaka Kuwada, Toshio Takagi
  • Patent number: 11651671
    Abstract: To be capable of efficiently transmitting appropriate information on the motion improvement to a person in motion. A motion evaluation system includes a sensor unit, an information processing device, and an information presentation device. The information processing device includes a communication device, a storage device, and an arithmetic device.
    Type: Grant
    Filed: April 26, 2021
    Date of Patent: May 16, 2023
    Assignee: Hitachi, Ltd.
    Inventors: Takuto Sato, Takehiro Niikura, Mitsuhiro Okada, Hiroki Ohashi, Takayuki Akiyama, Katsuyuki Nakamura, Mohammad Osamh Adel Al-Naser, Sheraz Ahmed
  • Publication number: 20230117525
    Abstract: A square type battery includes a cover that is provided with a terminal and is formed in a substantially rectangle, a case main body that is formed in a substantially rectangular parallelopiped and that includes two pairs of opposed side surfaces connected to a peripheral edge part of the cover, and an electrode body that is accommodated inside the case main body and that is connected to the terminal. At least a first side surface among the two pairs of opposed side surfaces is pinched toward an inward of the case main body. The first side surface and a second side surface opposed to the first side surface abut the electrode body.
    Type: Application
    Filed: October 14, 2022
    Publication date: April 20, 2023
    Inventors: Hitoshi Maeda, Mitsuhiro Okada, Hiroshi Takabayashi
  • Publication number: 20230080232
    Abstract: A technique is provided which reduces an external load, such as vibration and impact, applied on a boundary between an electrode body and an electrical collector tab. The herein disclosed secondary battery includes an electrode body, a case main body, and a cover. The cover includes an electrical collector terminal attached via an insulating material. The electrode body includes an electrical collector tab. The electrical collector tab includes an extension part that extends from the electrode body, and a branch part that extends from a tip end area of the extension part in a direction different from the extension part. The branch part includes a portion joined to the electrical collector terminal.
    Type: Application
    Filed: September 14, 2022
    Publication date: March 16, 2023
    Inventor: Mitsuhiro OKADA
  • Patent number: 11600490
    Abstract: There is provided a method of forming a silicon film, which includes: a film forming step of forming the silicon film on a base, the silicon film having a film thickness thicker than a desired film thickness; and an etching step of reducing the film thickness of the silicon film by supplying an etching gas containing bromine or iodine to the silicon film.
    Type: Grant
    Filed: December 4, 2020
    Date of Patent: March 7, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Mitsuhiro Okada, Tatsuya Miyahara, Keisuke Fujita
  • Patent number: 11551933
    Abstract: According to one embodiment of the present disclosure, there is provided a substrate processing method including: providing a substrate; forming a seed layer on a surface of the substrate by heating a stage on which the substrate is placed to a first temperature and supplying a first source gas to the substrate; and forming a metal-containing film by heating the stage on which the substrate is placed to a second temperature and supplying a second source gas and a first reducing gas to the substrate on which the seed layer is formed.
    Type: Grant
    Filed: February 4, 2020
    Date of Patent: January 10, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Mitsuhiro Okada, Yasushi Fujii
  • Publication number: 20220415661
    Abstract: A plasma processing apparatus includes a chamber having a gas inlet and a gas outlet; a plasma generator; and a controller configured to cause: (a) providing a substrate including a silicon-containing film and a mask formed on the film; (b) etching the silicon-containing film through the mask to the first depth, thereby forming a recess in the silicon-containing film; (c) forming a protection film at least on the mask and a side wall of the recess formed on the silicon-containing film after (a); and (d) etching the silicon containing film through the mask to a second depth, the second depth being greater than the first depth.
    Type: Application
    Filed: September 5, 2022
    Publication date: December 29, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Akinobu KAKIMOTO, Yoshinobu HAYAKAWA, Satoshi MIZUNAGA, Yasuhiro HAMADA, Mitsuhiro OKADA
  • Publication number: 20220415660
    Abstract: A processing apparatus includes a chamber having a gas inlet and a gas outlet; a plasma generator; and a controller configured to cause: (a) etching a silicon-containing film to a first depth with a first plasma in the chamber, thereby forming a recess in the silicon-containing film; (b) forming a protection film on a side wall of the recess with a second plasma in the chamber, the protection film having a first thickness at an upper portion of the recess and a second thickness at a lower portion of the recess, the second thickness being smaller than the first thickness; and (c) etching the silicon-containing film to a second depth with the third plasma in the chamber, the second depth being greater than the first depth.
    Type: Application
    Filed: September 5, 2022
    Publication date: December 29, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Akinobu KAKIMOTO, Yoshinobu HAYAKAWA, Satoshi MIZUNAGA, Yasuhiro HAMADA, Mitsuhiro OKADA
  • Publication number: 20220407166
    Abstract: An electricity storage device includes: an electrode body including at least one positive electrode plate, at least one negative electrode plate, and a separator. an insulating holder that is formed by folding a sheet made of an insulating material and accommodates therein the electrode body; an outer case which has an opening and accommodates therein the electrode body with the insulating holder and an electrolyte; and a sealing plate. The outer case has a bottom plate part and a plurality of side walls standing from the bottom plate part, and the opening is formed in a position to face the bottom plate part. The insulating holder has a plurality of side surface parts respectively facing the plurality of side walls, and a bottom surface part that faces the bottom plate part. At least one of the side surface parts or the bottom surface part has a bellow-folded structure.
    Type: Application
    Filed: November 12, 2020
    Publication date: December 22, 2022
    Inventors: Hitoshi MAEDA, Mitsuhiro OKADA, Hiroshi TAKABAYASHI
  • Publication number: 20220399620
    Abstract: A terminal structure to be adopted for a power storage device including an outer case that has an opening, includes: a sealing plate sealing the opening; a terminal member inserted into a terminal hole formed in the sealing plate and electrically connected to an electrode; and a first insulating member arranged between the sealing plate and the terminal member, and arranged on an outer surface side of the sealing plate facing an outer side of the power storage device. The terminal member has a first extended part extending further outward than an outer periphery of the terminal hole on the outer side of the power storage device. A first protruding part or a second recessed part provided to the first insulating member and a first recessed part or a second protruding part provided to the sealing plate or to the first extended part fit with each other.
    Type: Application
    Filed: November 12, 2020
    Publication date: December 15, 2022
    Inventors: Mitsuhiro OKADA, Hitoshi MAEDA, Hiroshi TAKABAYASHI
  • Patent number: 11474505
    Abstract: A work support system is capable of avoiding situations where a worker performs erroneous work. The system includes an identification unit which identifies a target of an inquiry from a worker based on a video acquired by an imaging device, a selection unit which selects determination model information corresponding to each of one or more targets of inquiry identified by the identification unit from a storage unit storing determination model information to be used in a determination model. A determination unit determines whether each of the targets of inquiry is correct by using each of the determination models in which the determination model information, which was selected by the selection unit, corresponding to each of the one or more targets of inquiry identified by the identification unit, has been set in the determination model. An output unit outputs a determination result of the determination unit.
    Type: Grant
    Filed: December 11, 2020
    Date of Patent: October 18, 2022
    Assignee: HITACHI, LTD.
    Inventors: Takayuki Akiyama, Mitsuhiro Okada
  • Patent number: 11424143
    Abstract: Provided is a heat insulation structure used for a vertical heat treatment apparatus that performs a heat treatment on a substrate. The vertical heat treatment apparatus includes: a processing container having a double tube structure including an inner tube and an outer tube closed upward, the processing container having an opening at a lower end thereof; a gas supply section and exhaust section provided on a lower side of the processing container; a lid configured to introduce or discharge the substrate into or from the opening and to open/close the opening; and a heating section provided to cover the processing container from an outside. The heat insulation structure is provided between the inner tube and the outer tube.
    Type: Grant
    Filed: March 11, 2019
    Date of Patent: August 23, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Koji Yoshii, Tatsuya Yamaguchi, Hiroyuki Hayashi, Mitsuhiro Okada, Satoshi Takagi, Toshihiko Takahashi, Masafumi Shoji, Kazuya Kitamura
  • Patent number: 11267970
    Abstract: An asphalt modifier comprising a polyolefin-based copolymer comprising an ethylene-derived monomer unit and a monomer unit having an epoxy group is disclosed. The content of the monomer unit having an epoxy group is 13% by mass or more based on the mass of the polyolefin-based copolymer.
    Type: Grant
    Filed: May 22, 2018
    Date of Patent: March 8, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Susumu Mori, Yusuke Asai, Mitsuhiro Okada
  • Patent number: 11251034
    Abstract: There is provided a film forming method comprising an organic substance removal step of removing an organic substance adhering to an oxide film generated on a surface of a base by supplying a hydrogen-containing gas and an oxygen-containing gas to the base; an oxide film removal step of removing the oxide film formed on the surface of the base after the organic substance removal step; and a film forming step of forming a predetermined film on the surface of the base after the oxide film removal step.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: February 15, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroyuki Hayashi, Rui Kanemura, Satoshi Takagi, Mitsuhiro Okada
  • Publication number: 20210384071
    Abstract: A method of manufacturing a semiconductor device includes: planarizing a surface of a substrate having a conductive material embedded in a first hole so as to expose the conductive material embedded in the first hole, wherein the first hole is formed in a region which is on an insulating film laminated on the substrate and is surrounded by a spacer film; laminating a mask film on the surface of the substrate; forming a second hole in the mask film such that at least a portion of an upper surface of the conductive material embedded in the first hole is exposed; embedding the conductive material in the second hole; and removing the mask film.
    Type: Application
    Filed: August 19, 2021
    Publication date: December 9, 2021
    Inventors: Kazuo KIBI, Shigetsugu FUJITA, Kenji SUZUKI, Mitsuhiro OKADA
  • Publication number: 20210335114
    Abstract: To be capable of efficiently transmitting appropriate information on the motion improvement to a person in motion. A motion evaluation system includes a sensor unit, an information processing device, and an information presentation device. The information processing device includes a communication device, a storage device, and an arithmetic device.
    Type: Application
    Filed: April 26, 2021
    Publication date: October 28, 2021
    Inventors: Takuto SATO, Takehiro NIIKURA, Mitsuhiro OKADA, Hiroki OHASHI, Takayuki AKIYAMA, Katsuyuki NAKAMURA, Mohammad OSAMH ADEL AL-NASER, Sheraz AHMED
  • Publication number: 20210294311
    Abstract: A work support system is capable of avoiding situations where a worker performs erroneous work. The system includes an identification unit which identifies a target of an inquiry from a worker based on a video acquired by an imaging device, a selection unit which selects determination model information corresponding to each of one or more targets of inquiry identified by the identification unit from a storage unit storing determination model information to be used in a determination model. A determination unit determines whether each of the targets of inquiry is correct by using each of the determination models in which the determination model information, which was selected by the selection unit, corresponding to each of the one or more targets of inquiry identified by the identification unit, has been set in the determination model. An output unit outputs a determination result of the determination unit.
    Type: Application
    Filed: December 11, 2020
    Publication date: September 23, 2021
    Inventors: Takayuki AKIYAMA, Mitsuhiro OKADA
  • Publication number: 20210253789
    Abstract: Disclosed is a polycarbonate resin composition containing (a) an aromatic polycarbonate, (b) a polyester, and (c) a polymer having an epoxy group. The following requirements are satisfied. (1) A content of the (a) aromatic polycarbonate is 75% by mass or more based on a mass of the polycarbonate resin composition. (2) A mass ratio of a content of the (c) polymer having an epoxy group with respect to a content of the (b) polyester is 0.8 or more. (3) A content of a sum of the (b) polyester and the (c) polymer having an epoxy group is 25 parts by mass or less with respect to 100 parts by mass of the (a) aromatic polycarbonate.
    Type: Application
    Filed: May 22, 2019
    Publication date: August 19, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Sho KITAGAWA, Mitsuhiro OKADA