Abstract: There is provided a manufacturing method for a cured substance, which makes it possible to obtain a cured substance having excellent breaking elongation, a manufacturing method for a laminate, including the manufacturing method for a cured substance, a manufacturing method for a semiconductor device, including the manufacturing method for a cured substance or the manufacturing method for a laminate, and there is provided a treatment liquid that is used in the manufacturing method for a cured substance. The manufacturing method for a cured substance includes a film forming step of applying a resin composition containing a precursor of a cyclization resin onto a base material to form a film, a treatment step of bringing a treatment liquid into contact with the film, and a heating step of heating the film after the treatment step, in which the treatment liquid contains at least one compound selected from the group consisting of a basic compound having an amide group and a base generator having an amide group.

Abstract: A substrate processing system includes a vacuum transfer module, a substrate processing module, an atmospheric transfer module, a load-lock module, at least one substrate transfer robot disposed in the vacuum transfer module and the atmospheric transfer module, and having at least one end effector, and a controller configured to control a particle removal operation. The particle removal operation includes transferring said at least one end effector in any one of the vacuum transfer module, the substrate processing module, the load-lock module, and the atmospheric transfer module in a state where at least one charging member that is charged is placed on said at least one end effector.

Abstract: A manufacturing method for a cured substance includes a film forming step of applying a specific photosensitive resin composition onto a base material to form a film, an exposure step of selectively exposing the film, a development step of developing the exposed film with a developer to form a pattern, a treatment step of bringing a treatment liquid into contact with the pattern, and a heating step of heating the pattern after the treatment step, in which at least one of the developer or the treatment liquid contains at least one compound selected from the group consisting of a base and a base generator.

Abstract: A leg opening angle changing member includes an insertion portion arranged between a leg attaching portion of a base of a stand and the proximal end of a leg of the stand, and an attachment portion attached to the leg attaching portion or the proximal end of the leg. The leg opening angle changing member is attached to the leg attaching portion or the proximal end of the leg by means of the attachment portion. The leg opening angle changing member is configured to change the leg opening angle to an opening angle smaller than an opening angle of the leg in a fully opened state by arranging the insertion portion between the leg attaching portion and the proximal end of the leg in a state in which the leg opening angle changing member is attached to the leg attaching portion or the proximal end of the leg.

Abstract: A cleaning method for a by-product including a refractory material or a metal compound includes a reforming process and an etching process. In the reforming process, a surface of the by-product is reformed using nitrogen-containing gas and hydrogen-containing gas. In the etching process, the reformed surface is etched using halogen-containing gas and inert gas.

Abstract: A coating is formed on a surface of a base material of a furnace, and includes a base layer and a sliding material layer that is formed on a surface of the base layer and contains an oxide ceramic and a compound having a layered crystal structure. The sliding material layer causes the collided ashes to be slipped and facilitates the drop off of the adhered ashes. The base material forms a heat transfer tube or a wall surface of the furnace. The coating is also applied to a coal gasification furnace, a pulverized coal fired boiler, a combustion apparatus, or a reaction apparatus containing a furnace.

Abstract: Provided are a water electrolysis method and a water electrolysis device in which mixing of the generated hydrogen and oxygen is greatly reduced and which have a high electrolysis efficiency, while being simplified in structure. In the water electrolysis method and water electrolysis device, water is electrolyzed by supplying water to the cathode side of an electrolytic membrane including a solid polymer membrane provided with a catalyst layer on a surface thereof and creating a potential difference between both surfaces of the electrolytic membrane. The temperature-controlled water is supplied only to the cathode side of the electrolytic membrane, while controlling the difference in pressure between both surfaces of the electrolytic membrane to 50 kPa or less.

Abstract: There is provided a manufacturing method for a thermal conductive layer, with which a thermal conductive layer having a thermal diffusivity of 3.0×10?7 m2s?1 or more is manufactured on a support by using a composition for forming a thermal conductive layer, the composition containing a resin, a filler, and a solvent and having a concentration of solid contents of less than 90% by mass, the manufacturing method including a discharge step of discharging the composition toward the support; and a solvent amount reduction step of reducing a solvent amount in the composition such that a first solvent amount reduction time taken after the composition is discharged until the concentration of solid contents in the composition reaches 90% by mass on the support is 10 seconds or more for each position on the support.

Abstract: The hi-hat attachment includes an upper unit, a lower unit, and an operation lever. The lower unit includes a regulation unit that regulates the maximum fall position of the lower unit. The regulation unit is configured to adjust the maximum fall position of the lower unit.

Abstract: In order to provide a working machine capable of suppressing an increase in size, a working machine that rotates a working tool with motive power of a motor includes a transmission mechanism that transmits a rotational force of the motor to the working tool, a front case in which the transmission mechanism is disposed, a holding tool that is attached to the front case so as to protrude from an outer surface of the case and is gripped by a worker, and an attaching hole which is provided in the front case and to which the holding tool is attached, and the attaching hole penetrates the front case in plan view intersecting with an axis that is a rotation center of the working tool.

Abstract: An imaging element according to an embodiment of the present disclosure includes: a sensor substrate having a light-receiving region in which a plurality of light-receiving elements are arranged and a peripheral region provided around the light-receiving region; a sealing member disposed to be opposed to one surface of the sensor substrate; a resin layer that attaches the sensor substrate and the sealing member to each other; and an excavated part provided in the peripheral region of the one surface of the sensor substrate, and in which the resin layer is embedded, with the resin layer having one or a plurality of gaps inside the excavated part in a plan view.

Abstract: A cleaning recipe creation method includes: an etching process of, for each of predetermined combinations of temperatures and pressures, etching a metal compound stacked on a test substrate loaded into a chamber by using a cleaning gas supplied into the chamber; a measurement process of measuring an etching rate of the metal compound for each of the combinations of the temperatures and the pressures; and a creation process of, based on the etching rate of the metal compound measured for each of the combinations of the temperatures and the pressures, creating a cleaning recipe including the combinations of the temperatures and the pressures in which the etching rate is equal to or higher than a predetermined etching rate.

Abstract: The hi-hat attachment includes an upper unit, a lower unit, and an operation lever. The lower unit includes a regulation unit that regulates the maximum fall position of the lower unit. The regulation unit is configured to adjust the maximum fall position of the lower unit.

Abstract: A display device includes a liquid crystal display (LCD) panel, a rear frame, a light guide plate, and a light emitting diode (LED) substrate. The LED substrate includes a first substrate portion, a second substrate portion, a plurality of LEDs mounted to the first substrate portion, and a power connector mounted to the second substrate portion. The first substrate portion extends in a first direction along a first side of the light guide plate that faces the first sidewall of the rear frame. The second substrate portion extends in a second direction along a second side of the light guide plate that faces the second sidewall of the rear frame. A backlight unit for a display device includes a light guide plate and a LED substrate.

Abstract: A display device includes a liquid crystal display (LCD) panel, a rear frame, a light guide plate, and a light emitting diode (LED) substrate. The LED substrate includes a first substrate portion, a second substrate portion, a plurality of LEDs mounted to the first substrate portion, and a power connector mounted to the second substrate portion. The first substrate portion extends in a first direction along a first side of the light guide plate that faces the first sidewall of the rear frame. The second substrate portion extends in a second direction along a second side of the light guide plate that faces the second sidewall of the rear frame. A backlight unit for a display device includes a light guide plate and a LED substrate.

Abstract: A lighting device includes: a light source including a light emitting element that emits light having an emission peak wavelength in a wavelength range of 500 nm or less; and first, second and third fluorescent substances on which light emitted from the light emitting element is incident, wherein the first fluorescent substance absorbs at least light emitted from the light emitting element to emit light having a emission peak wavelength in a wavelength range of 500 nm to 580 nm, the second fluorescent substance absorbs at least light emitted from the first fluorescent substance to emit light having a emission peak wavelength in a wavelength range of 580 nm to 750 nm, and the third fluorescent substance absorbs light having a wavelength range of 500 nm or less to emit light having a emission peak wavelength in a wavelength range of 600 nm to 750 nm.

Abstract: A cleaning method for a by-product including a refractory material or a metal compound includes a reforming process and an etching process. In the reforming process, a surface of the by-product is reformed using nitrogen-containing gas and hydrogen-containing gas. In the etching process, the reformed surface is etched using halogen-containing gas and inert gas.

Abstract: A coating is formed on a surface of a base material 11 of a furnace, and includes a base layer 12 and a sliding material layer 13 that is formed on a surface of the base layer 12 and contains an oxide ceramic and a compound having a layered crystal structure. The sliding material layer 13 causes the collided ashes to be slipped and facilitates the drop off of the adhered ashes. The base material 11 forms a heat transfer tube or a wall surface of the furnace. The coating is also applied to a coal gasification furnace, a pulverized coal fired boiler, a combustion apparatus, or a reaction apparatus containing a furnace.

Abstract: A lighting device includes: a light source including a light emitting element that emits light having an emission peak wavelength in a wavelength range of 500 nm or less; and first, second and third fluorescent substances on which light emitted from the light emitting element is incident, wherein the first fluorescent substance absorbs at least light emitted from the light emitting element to emit light having a emission peak wavelength in a wavelength range of 500 nm to 580 nm, the second fluorescent substance absorbs at least light emitted from the first fluorescent substance to emit light having a emission peak wavelength in a wavelength range of 580 nm to 750 nm, and the third fluorescent substance absorbs light having a wavelength range of 500 nm or less to emit light having a emission peak wavelength in a wavelength range of 600 nm to 750 nm.

Abstract: An abnormality occurrence presumption apparatus which presumes the occurrence of an abnormality in a telescopic cover attached to a machine tool performs supervised learning on the basis of a feature amount extracted from a physical quantity acquired during an operation of the machine tool and information related to an abnormality occurring in the telescopic cover, and stores the result of the learning. The abnormality occurrence presumption apparatus presumes an abnormality that may occur in the telescopic cover during the operation of the machine tool on the basis of the result of the learning and the feature amount extracted from the physical quantity.