Patents by Inventor Naoto Fukuda

Naoto Fukuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vapor deposition system and vapor deposition method
    Publication number: 20060283382
    Abstract: There is provided a device or a method including a flow path switching unit which switches a first flow path for releasing the vapor deposition material evaporated from a vapor depositing source from the same into a chamber, and a second flow path for causing the vapor deposition material evaporated from the vapor depositing source to flow from the vapor depositing source through a transfer path into a recovery container. The vapor deposition system or the vapor deposition method is capable of reducing an amount of a vapor deposition material consumed without being deposited on an object not to be processed during non-vapor deposition.
    Type: Application
    Filed: June 14, 2006
    Publication date: December 21, 2006
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toshiaki Yoshikawa, Naoto Fukuda