Patents by Inventor Nir Merry
Nir Merry has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8104951Abstract: Methods and apparatus for measuring substrate uniformity is provided. The invention includes placing a substrate in a thermal processing chamber, rotating the substrate while the substrate is heated, measuring a temperature of the substrate at a plurality of radial locations as the substrate rotates, correlating each temperature measurement with a location on the substrate, and generating a temperature contour map for the substrate based on the correlated temperature measurements. Numerous other aspects are provided.Type: GrantFiled: July 30, 2007Date of Patent: January 31, 2012Assignee: Applied Materials, Inc.Inventors: Wolfgang Aderhold, Andreas G. Hegedus, Nir Merry
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Publication number: 20110277689Abstract: Methods and apparatus for processing substrates are disclosed herein. The process chamber includes a chamber body, a substrate support pedestal, a pump port and a gas injection funnel. The chamber body has an inner volume and the substrate support pedestal is disposed in the inner volume of the chamber body. The pump port is coupled to the inner volume and is disposed off-center from a central axis of the substrate support pedestal. The pump port provides azimuthally non-uniform pumping proximate to a surface of the substrate support pedestal and creates localized regions of high pressure and low pressure within the inner volume during use. The gas injection funnel is disposed in a ceiling of the chamber body and opposite the substrate support pedestal. The gas injection funnel is offset from the central axis of the substrate support pedestal and is disposed in a region of low pressure.Type: ApplicationFiled: July 26, 2011Publication date: November 17, 2011Inventors: Nir Merry, Son T. Nguyen
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Publication number: 20110041764Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: ApplicationFiled: November 3, 2010Publication date: February 24, 2011Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah
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Patent number: 7833351Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: GrantFiled: June 26, 2006Date of Patent: November 16, 2010Assignee: Applied Materials, Inc.Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah
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Publication number: 20100265988Abstract: Methods and apparatus for precise substrate cool down control are provided. Apparatus for measuring temperature of substrates may include a cool down plate to support a substrate; a sensor to provide data corresponding to a temperature of the substrate when disposed on the cool down plate; and a computer coupled to the sensor to determine the temperature of the substrate from the sensor data. A method for measuring the temperature of a substrate may include providing a substrate to be cooled to a chamber having a cool down plate disposed therein, a sensor to provide data corresponding to a temperature of the substrate, and a computer coupled to the sensor; sensing a first temperature of the substrate after a predetermined first time interval has elapsed; comparing the first temperature to a predetermined temperature; and determining whether the first temperature is greater than, equal to, or less than the predetermined temperature.Type: ApplicationFiled: April 12, 2010Publication date: October 21, 2010Applicant: APPLIED MATERIALS, INC.Inventors: JACOB NEWMAN, DINESH KANAWADE, HENRY BARANDICA, NIR MERRY
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Publication number: 20100261040Abstract: Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on the substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of alternative processes that expose substrates to energy of varying forms.Type: ApplicationFiled: April 13, 2010Publication date: October 14, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Majeed A. Foad, Nir Merry
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Publication number: 20100224130Abstract: A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.Type: ApplicationFiled: May 13, 2010Publication date: September 9, 2010Inventors: Jacob Smith, Alexander Tam, R. Suryanarayanan Iyer, Sean Seutter, Binh Tran, Nir Merry, Adam Brailove, Robert Shydo, JR., Robert Andrews, Frank Roberts, Theodore Smick, Geoffrey Ryding
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Publication number: 20100173495Abstract: Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence.Type: ApplicationFiled: March 16, 2010Publication date: July 8, 2010Inventors: Randhir Thakur, Steve G. Ghanayem, Joseph Yudovsky, Aaron Webb, Adam Alexander Brailove, Nir Merry, Vinay K. Shah, Andreas G. Hegedus
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Patent number: 7748542Abstract: Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors.Type: GrantFiled: August 31, 2005Date of Patent: July 6, 2010Assignee: Applied Materials, Inc.Inventors: Joseph Yudovsky, Robert C. Cook, Nir Merry
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Publication number: 20100133257Abstract: Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.Type: ApplicationFiled: November 4, 2009Publication date: June 3, 2010Applicant: Applied Materials, Inc.Inventors: Khurshed Sorabji, Joseph M. Ranish, Wolfgang Aderhold, Aaron M. Hunger, Blake R. Koelmel, Alexander N. Lerner, Nir Merry
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Publication number: 20100116205Abstract: Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.Type: ApplicationFiled: November 7, 2008Publication date: May 13, 2010Inventors: Jacob Newman, Dinesh Kanawade, Miriam Schwartz, Nir Merry, Michael Thomas Haag
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Publication number: 20100111511Abstract: Embodiments of the invention generally contemplate an apparatus and method for monitoring and controlling the temperature of a substrate during processing. One embodiment of the apparatus and method takes advantage of an infrared camera to obtain the temperature profile of multiple regions or the entire surface of the substrate and a system controller to calculate and coordinate in real time an optimized strategy for reducing any possible temperature non-uniformity found on the substrate during processing.Type: ApplicationFiled: October 31, 2008Publication date: May 6, 2010Inventors: Nir Merry, Stephen Moffatt, Kailash Patalay, David Keith Carlson
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Publication number: 20100080904Abstract: Methods and apparatus for processing substrates are disclosed herein. The process chamber includes a chamber body, a substrate support pedestal, a pump port and a gas injection funnel. The chamber body has an inner volume and the substrate support pedestal is disposed in the inner volume of the chamber body. The pump port is coupled to the inner volume and is disposed off-center from a central axis of the substrate support pedestal. The pump port provides azimuthally non-uniform pumping proximate to a surface of the substrate support pedestal and creates localized regions of high pressure and low pressure within the inner volume during use. The gas injection funnel is disposed in a ceiling of the chamber body and opposite the substrate support pedestal. The gas injection funnel is offset from the central axis of the substrate support pedestal and is disposed in a region of low pressure.Type: ApplicationFiled: September 29, 2008Publication date: April 1, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Nir Merry, Son T. Nguyen
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Publication number: 20100047049Abstract: A wafer buffering system is provided herein. In some embodiments, a wafer buffering system may include a frame having a vertical shaft disposed therethrough; two storage platforms, coupled to the frame on either side thereof, each to receive a wafer carrier thereon; and a transfer mechanism coupled to the vertical shaft and capable of vertical movement therealong and lateral movement along an x-axis extending in either direction from the frame at least sufficient to move over the two storage platforms. The transfer mechanism may further include a telescoping fork arm capable of laterally extending in a first direction and in a second direction corresponding to lateral positions of the two storage platforms on either side of the frame.Type: ApplicationFiled: August 22, 2008Publication date: February 25, 2010Applicant: APPLIED MATERIALS, INC.Inventors: NIR MERRY, Jacob Newman
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Publication number: 20090004405Abstract: An apparatus and method for uniform heating and gas flow in a batch processing chamber are provided. The apparatus includes a quartz chamber body, removable heater blocks which surround the quartz chamber body, an inject assembly coupled to one side of the quartz chamber body, and a substrate boat having removable susceptors. In one embodiment, the boat may be configured with a plurality of susceptors to control substrate heating during batch processing.Type: ApplicationFiled: June 29, 2007Publication date: January 1, 2009Inventors: Nir Merry, Joseph Yudovsky
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Publication number: 20080219824Abstract: Embodiments of multiple substrate transfer robots and substrate processing systems have been disclosed herein. In some embodiments, a multiple substrate transfer robot is provided and may include an arm capable of extending along a horizontal direction; and a wrist coupled to the arm and having a plurality of blades coupled thereto, each blade configured to horizontally support a substrate thereupon and vertically disposed with respect to each of the other blades. In some embodiments, a substrate processing system is provided and may include a substrate processing chamber having a plurality of susceptors, wherein each susceptor is vertically disposed and capable of holding a semiconductor substrate; and a substrate transfer robot having a plurality of blades for transferring a plurality of substrates to and from the processing chamber, each blade configured to horizontally support a substrate thereupon and vertically disposed with respect to each of the other blades.Type: ApplicationFiled: March 14, 2008Publication date: September 11, 2008Applicant: APPLIED MATERIALS, INC.Inventors: JACOB NEWMAN, Dinesh Kanawade, Nir Merry
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Publication number: 20080220150Abstract: The present invention generally provides an apparatus and method for processing and transferring substrates in an epitaxial deposition chamber. Embodiments of the invention described herein are adapted to maximize chamber throughput and improve film deposition uniformity. In one embodiment, two substrates are processed simultaneously using radiant heating of the substrates in a cold wall, low pressure chemical vapor deposition reactor.Type: ApplicationFiled: March 5, 2007Publication date: September 11, 2008Inventors: Nir Merry, Balasubramanyam Chandrasekhar
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Publication number: 20080025368Abstract: Methods and apparatus for measuring substrate uniformity is provided. The invention includes placing a substrate in a thermal processing chamber, rotating the substrate while the substrate is heated, measuring a temperature of the substrate at a plurality of radial locations as the substrate rotates, correlating each temperature measurement with a location on the substrate, and generating a temperature contour map for the substrate based on the correlated temperature measurements. Numerous other aspects are provided.Type: ApplicationFiled: July 30, 2007Publication date: January 31, 2008Inventors: WOLFGANG ADERHOLD, Andreas Hegedus, Nir Merry
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Publication number: 20070295274Abstract: A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.Type: ApplicationFiled: June 26, 2006Publication date: December 27, 2007Inventors: Aaron Webb, Adam Brailove, Joseph Yudovsky, Nir Merry, Andrew Constant, Efrain Quiles, Michael R. Rice, Gary J. Rosen, Vinay K. Shah
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Publication number: 20070059128Abstract: Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors.Type: ApplicationFiled: August 31, 2005Publication date: March 15, 2007Inventors: Joseph Yudovsky, Robert Cook, Nir Merry