Patents by Inventor Nobuhiro Miki

Nobuhiro Miki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Brazing flux of stable suspension for aluminum material
    Patent number: 4923530
    Abstract: A brazing flux for aluminum material having superior suspension stability whose melting composition of the flux is composed of four elements of MxAlFyOz (where: x=0.5 to 2.0, y=1.5 to 4.8 and z=0.1 to 1.0), and a method of producing a brazing flux in which an amorphous aluminum hydroxide is employed as an aluminum raw material to prepare the flux.
    Type: Grant
    Filed: May 9, 1989
    Date of Patent: May 8, 1990
    Inventors: Nobuhiro Miki, Toshiro Fukudome, Takesi Kaibori
  • Method for preventing anhydrous potassium fluoride from solidification
    Patent number: 4806332
    Abstract: A method for preventing anhydrous potassium fluoride from solidification by causing the anhydrous potassium fluoride to absorb carbon dioxide gas.
    Type: Grant
    Filed: December 28, 1987
    Date of Patent: February 21, 1989
    Assignee: Hashimoto Chemical Industries Co., Ltd.
    Inventor: Nobuhiro Miki
  • Surface treating composition for micro processing
    Patent number: 4795582
    Abstract: A surface treating composition for micro processing which comprises a mixture of hydrofluoric acid, ammonium fluoride solution and water, and at least one compound selected from the group of surfactants consisting of aliphatic carboxylic acids, salts of aliphatic carboxylic acids, aliphatic amines and aliphatic alcohols.
    Type: Grant
    Filed: September 21, 1987
    Date of Patent: January 3, 1989
    Assignee: Hashimoto Chemical Industries Co., Ltd.
    Inventors: Tadahiro Ohmi, Nobuhiro Miki, Hirohisa Kikuyama
  • Process for purifying hydrogen fluoride
    Patent number: 4668497
    Abstract: A process for purifying hydrogen fluroide characterized by adding fluorine to hydrogen fluoride containing at least one element selected from the group consisting of boron, silicon, phosphorus, sulfur, chlorine and arsenic, and/or at least one compound of these elements, reacting the fluorine with said element and/or said compound and distilling the resulting mixture.
    Type: Grant
    Filed: December 24, 1985
    Date of Patent: May 26, 1987
    Assignee: Hashimoto Chemical Industries Co., Ltd.
    Inventor: Nobuhiro Miki