Patents by Inventor Noriaki Hamaya

Noriaki Hamaya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190264317
    Abstract: An yttrium fluoride spray material contains Y5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20190264315
    Abstract: An yttrium fluoride spray material contains Y5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20190264316
    Abstract: An yttrium fluoride spray material contains YO5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: May 9, 2019
    Publication date: August 29, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Patent number: 10137597
    Abstract: A sprayed article is prepared by thermally spraying ceramic particles of rare earth oxide or fluoride or metal particles of W, Mo or Ta onto an outer or inner surface of a cylindrical carbon substrate to form a sprayed coating, and burning out the carbon substrate, thus leaving the ceramic or metal-base sprayed coating of cylindrical shape having a wall thickness of 0.5-5 mm.
    Type: Grant
    Filed: October 8, 2014
    Date of Patent: November 27, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Ryoji Iida, Noboru Yamamoto
  • Publication number: 20180319039
    Abstract: A sprayed article is prepared by thermally spraying ceramic particles of rare earth oxide or fluoride or metal particles of W, Mo or Ta onto an outer or inner surface of a cylindrical carbon substrate to form a sprayed coating, and burning out the carbon substrate, thus leaving the ceramic or metal-base sprayed coating of cylindrical shape having a wall thickness of 0.5-5 mm.
    Type: Application
    Filed: July 30, 2018
    Publication date: November 8, 2018
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Ryoji Iida, Noboru Yamamoto
  • Publication number: 20170292182
    Abstract: An yttrium fluoride sprayed coating having a thickness of 10-500 ?m, an oxygen concentration of 1-6 wt %, and a hardness of 350-470 HV is deposited on a substrate surface. The yttrium fluoride sprayed coating exhibits excellent corrosion resistance in a halogen-base gas atmosphere or halogen-base gas plasma atmosphere, functions to protect the substrate from damage by acid penetration during acid cleaning, and minimizes particle generation from a reaction product and due to spall-off from the coating.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 12, 2017
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Yasushi Takai
  • Publication number: 20170253955
    Abstract: An yttrium-base sprayed coating is obtained by thermally spraying yttrium oxide, yttrium fluoride or yttrium oxyfluoride onto a substrate to form a coating of 10-500 ?m thick, and chemically cleaning the coating with a cleaning liquid of organic acid, inorganic acid or a mixture thereof until the population of particles with a size of up to 300 nm becomes no more than 5 particles/mm2 of the coating surface. The yttrium-base sprayed coating exhibits high corrosion resistance even in a halogen gas plasma atmosphere and prevents yttrium-base particles from spalling off during etching treatment.
    Type: Application
    Filed: May 22, 2017
    Publication date: September 7, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20170114440
    Abstract: An yttrium fluoride spray material contains Y5O4F7 and YF3, and has an average particle size of 10-60 ?m and a bulk density of 1.2-2.5 g/cm3. The Y5O4F7 and YF3 in the yttrium fluoride spray material consist of 30 to 90% by weight of Y5O4F7 and the balance of YF3. A sprayed coating of yttrium oxyfluoride is obtained by atmospheric plasma spraying of the spray material.
    Type: Application
    Filed: October 21, 2016
    Publication date: April 27, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Publication number: 20170029628
    Abstract: An yttrium-base sprayed coating is obtained by thermally spraying yttrium oxide, yttrium fluoride or yttrium oxyfluoride onto a substrate to form a coating of 10-500 ?m thick, and chemically cleaning the coating with a cleaning liquid of organic acid, inorganic acid or a mixture thereof until the population of particles with a size of up to 300 nm becomes no more than 5 particles/mm2 of the coating surface. The yttrium-base sprayed coating exhibits high corrosion resistance even in a halogen gas plasma atmosphere and prevents yttrium-base particles from spalling off during etching treatment.
    Type: Application
    Filed: July 27, 2016
    Publication date: February 2, 2017
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Patent number: 9551059
    Abstract: A powder comprising rare earth element fluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, a bulk density of 0.8-1.5 g/cm3, and a carbon content of 0.1-0.5 wt % is amenable to atmospheric plasma spraying. An article obtained by spraying the rare earth fluoride spray powder to a substrate undergoes few partial color changes and performs well even when used in a halogen gas plasma.
    Type: Grant
    Filed: April 20, 2015
    Date of Patent: January 24, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Takao Maeda, Yasushi Takai
  • Patent number: 9404171
    Abstract: A rare earth oxide-containing sprayed plate is prepared by thermally spraying a rare earth oxide on a support to a thickness of up to 5 mm and peeling the sprayed coating from the support. Thin plates of rare earth oxide ceramics can be prepared without molding, firing and sintering steps.
    Type: Grant
    Filed: May 19, 2008
    Date of Patent: August 2, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Koji Nakamura, Ryoji Iida
  • Publication number: 20150361540
    Abstract: A spray material comprising rare earth element oxyfluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, and a bulk density of 0.8-2 g/cm3, and containing not more than 0.5 wt % of carbon and 3-15 wt % of oxygen is suitable for air plasma spraying. An article having a sprayed coating of rare earth element oxyfluoride has high resistance against plasma etching and a long lifetime.
    Type: Application
    Filed: August 24, 2015
    Publication date: December 17, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Yasushi Takai
  • Publication number: 20150225832
    Abstract: A powder comprising rare earth element fluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, a bulk density of 0.8-1.5 g/cm3, and a carbon content of 0.1-0.5 wt % is amenable to atmospheric plasma spraying. An article obtained by spraying the rare earth fluoride spray powder to a substrate undergoes few partial color changes and performs well even when used in a halogen gas plasma.
    Type: Application
    Filed: April 20, 2015
    Publication date: August 13, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Takao Maeda, Yasushi Takai
  • Publication number: 20150099075
    Abstract: A sprayed article is prepared by thermally spraying ceramic particles of rare earth oxide or fluoride or metal particles of W, Mo or Ta onto an outer or inner surface of a cylindrical carbon substrate to form a sprayed coating, and burning out the carbon substrate, thus leaving the ceramic or metal-base sprayed coating of cylindrical shape having a wall thickness of 0.5-5 mm.
    Type: Application
    Filed: October 8, 2014
    Publication date: April 9, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Ryoji Iida, Noboru Yamamoto
  • Publication number: 20140057078
    Abstract: A spray material comprising rare earth element oxyfluoride particles having an aspect ratio of up to 2, an average particle size of 10-100 ?m, and a bulk density of 0.8-2 g/cm3, and containing not more than 0.5 wt % of carbon and 3-15 wt % of oxygen is suitable for air plasma spraying. An article having a sprayed coating of rare earth element oxyfluoride has high resistance against plasma etching and a long lifetime.
    Type: Application
    Filed: August 21, 2013
    Publication date: February 27, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Noriaki Hamaya, Yasushi Takai
  • Patent number: 8337956
    Abstract: A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: December 25, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihiko Tsukatani, Takao Maeda, Junichi Nakayama, Hirofumi Kawazoe, Masaru Konya, Noriaki Hamaya, Hajime Nakano
  • Publication number: 20120088034
    Abstract: A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Application
    Filed: December 20, 2011
    Publication date: April 12, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Toshihiko Tsukatani, Takao Maeda, Junichi Nakayama, Hirofumi Kawazoe, Masaru Konya, Noriaki Hamaya, Hajime Nakano
  • Patent number: 8138060
    Abstract: A wafer has a rare earth oxide layer disposed, typically sprayed, on a substrate. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: March 20, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihiko Tsukatani, Takao Maeda, Junichi Nakayama, Hirofumi Kawazoe, Masaru Konya, Noriaki Hamaya, Hajime Nakano
  • Patent number: 7816013
    Abstract: A wafer has a rare earth fluoride coating disposed, typically sprayed on a substrate as an outermost layer, the rare earth fluoride being selected from lanthanoid fluorides, yttrium fluoride, and scandium fluoride. It is useful as a dummy wafer in a plasma etching or deposition system.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: October 19, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihiko Tsukatani, Masaru Konya, Noriaki Hamaya, Hajime Nakano, Takao Maeda
  • Publication number: 20100112231
    Abstract: A graphite-silicon carbide composite comprises a graphite substrate and a silicon carbide layer formed thereon and comprising silicon carbide particles in fused and contact bonded state. The composite has excellent oxidation resistance and finds a wide range of application as heat resistant material. The method of forming a silicon carbide layer on graphite surface is simple and consistent.
    Type: Application
    Filed: January 8, 2010
    Publication date: May 6, 2010
    Inventors: Hirofumi FUKUOKA, Susumu Ueno, Mikio Aramata, Toshio Okada, Noriaki Hamaya, Takao Maeda