Abstract: A semiconductor manufacturing apparatus includes a chamber, a reaction-gas inlet, a gas exhaust port, a rotation unit, a semiconductor wafer holder, a heater, and a purge-gas inlet. The wafer holder includes a first hold region to hold the semiconductor wafer and a second hold region held by the rotation unit. The second hold region surrounds the first hold region. The level of the first hold region and the level of the second hold region differ. A plurality of ventholes is provided to the first hold region so that the ventholes are just below a sidewall of the semiconductor wafer held by the first hold region.

Abstract: In operating the carbon monoxide removal reactor or the fuel reforming system, there is provided a technique for removing carbon monoxide in a stable manner for an extended period of time. In a method of removing carbon monoxide including an introducing step of introducing a reactant gas including mixture gas and an oxidizer added thereto to a carbon monoxide removal reactor forming in its casing a catalyst layer comprising a carbon monoxide removal catalyst for removing carbon monoxide contained in the mixture gas and an removing step of removing the carbon monoxide by causing the oxidizer to react with the mixture gas on the carbon monoxide removal catalyst, in said introducing step, the reactant gas of 100° C. or lower is introduced to the carbon monoxide removal reactor.

Abstract: In a process for manufacturing a semiconductor device comprising heating a wiring board on which a chip and an uncured adhesive layer are laminated for curing the adhesive layer, the improvement includes performing a statically pressurizing step before the adhesive layer is cured, in which step the wiring board on which the chip and the uncured adhesive layer are laminated is subjected to a static pressure greater than atmospheric pressure by not less than 0.05 MPa. According to the process, voids are easily eliminated irrespective of the design of the wiring board, and the adhesive is prevented from curling up on the chip.

Abstract: In operating the carbon monoxide removal reactor or the fuel reforming system, there is provided a technique for removing carbon monoxide in a stable manner for an extended period of time. In a method of removing carbon monoxide including an introducing step of introducing a reactant gas including mixture gas and an oxidizer added thereto to a carbon monoxide removal reactor forming in its casing a catalyst layer comprising a carbon monoxide removal catalyst for removing carbon monoxide contained in the mixture gas and a removing step of removing the carbon monoxide by causing the oxidizer to react with the mixture gas on the carbon monoxide removal catalyst, in said introducing step, the reactant gas of 100° C. or lower is introduced to the carbon monoxide removal reactor.

Abstract: A distance measuring device (1) is included of a feature point detecting element (31) for detecting a set of feature points from a plurality of images (2) picked up at a plurality of places (a, b) by a pickup element, a change detecting element (33) for detecting relative changes among images with respect to the detected set of the feature points, and a first specifying element (8) for specifying rotation quantities of the image pickup element among the places in accordance with the detected changes. Here, the feature point detecting element detects a set of points (P1, P2, P3, P4) composing lines (310, 320) that belong to a stationary object and that are substantially perpendicular to the optical axis of the image pickup element as a set of feature points.

Abstract: A separator for use in a fuel cell has an iron-based hydrous oxide film formed on a passive film of a peripheral surface except a gas channel of a separator substrates of SUS by cathodic electrolysis treatment in an alkaline solution and further a resin layer of an electrodeposited water-soluble resin formed on the iron-based hydrous oxide film.

Abstract: A semiconductor sealing resin sheet is composed of a supporting sheet and a sealing resin layer releasably laminated on the supporting sheet, wherein the sealing resin layer has a thermosetting property, the elastic modulus of the sealing resin layer before thermosetting is 1.0×103 to 1.0×104 Pa, the melt viscosity 120° C. of the sealing resin layer before thermosetting is 100 to 200 Pa·s, and the time required for the melt viscosity to reach its minimum value is 60 sec or less when the sealing resin layer before thermosetting is kept at a constant temperature of 120° C.

Abstract: In operating the carbon monoxide removal reactor or the fuel reforming system, there is provided a technique for removing carbon monoxide in a stable manner for an extended period of time. In a method of removing carbon monoxide including an introducing step of introducing a reactant gas including mixture gas and an oxidizer added thereto to a carbon monoxide removal reactor forming in its casing a catalyst layer comprising a carbon monoxide removal catalyst for removing carbon monoxide contained in the mixture gas and a removing step of removing the carbon monoxide by causing the oxidizer to react with the mixture gas on the carbon monoxide removal catalyst, in said introducing step, the reactant gas of 100° C. or lower is introduced to the carbon monoxide removal reactor.

Abstract: A magnetron sputtering apparatus includes: a target provided in a sputtering chamber; a susceptor opposed to the target; a high-frequency power supply connected to the susceptor; a plate provided outside the sputtering chamber and coaxial with a central axis of the target; a rotary motion mechanism configured to rotate the plate about the central axis; S-pole magnets placed on one side of the plate with their S-pole end directed to the target; and first and second N-pole magnets placed on the one side of the plate with their N-pole end directed to the target. The first N-pole magnets are placed along a circle coaxial with the plate and opposed to an outer peripheral vicinity of the target. The S-pole magnets are placed inside the first N-pole magnets and along a circle coaxial with the plate. The second N-pole magnets are placed inside the S-pole magnets and along a circle coaxial with the plate.

Abstract: A manufacturing method of a semiconductor device according to the present invention comprises: laminating a surface protective sheet to a circuit surface side of a wafer formed with grooves which divide each circuit wherein an adhesive film is adhered on the circuit surface of the wafer; reducing the thickness of the wafer and finally dividing the wafer into individual chips by grinding a back face of the wafer; picking up individual chips together with the adhesive film; die-bonding said individual chip to predetermined position of a chip mounting substrate via said adhesive film; fixing the chip to the chip mounting substrate by heating the die-bonded chip having the adhesive film; and applying a static pressure larger than an ambient pressure by 0.05 MPa or more to a stacked body including the adhesive film one or more times, at any point between adhering the wafer to the adhesive film and fixing the chip to the chip mounting substrate.

Abstract: In operating the carbon monoxide removal reactor or the fuel reforming system, there is provided a technique for removing carbon monoxide in a stable manner for an extended period of time. In a method of removing carbon monoxide including an introducing step of introducing a reactant gas including mixture gas and an oxidizer added thereto to a carbon monoxide removal reactor forming in its casing a catalyst layer comprising a carbon monoxide removal catalyst for removing carbon monoxide contained in the mixture gas and a removing step of removing the carbon monoxide by causing the oxidizer to react with the mixture gas on the carbon monoxide removal catalyst, in said introducing step, the reactant gas of 100° C. or lower is introduced to the carbon monoxide removal reactor.

Abstract: A polymerizable liquid crystal composition of the present invention includes a compound including a repeated unit represented by a general formula (I) (wherein R1, R2, R3, and R4 each independently represents a hydrogen atom, a halogen atom, or a hydrocarbon group having 1 to 20 carbon atoms, and one or more of hydrogen atoms in the hydrocarbon group may be substituted by the halogen atoms.), in which a weight average molecular weight is 100 or more.

Abstract: The adhesive composition according to the present invention is characterized by including an acrylic copolymer (A), an epoxy thermosetting resin (B) and a compound (C) having a functional group which can react with an epoxy group and having an unsaturated hydrocarbon group. According to the present invention, the high package reliability can be achieved even when exposed to severe reflow conditions in a package in which a thin semiconductor chip is mounted.

Abstract: A separator for use in a fuel cell has an iron-based hydrous oxide film formed on a passive film of a peripheral surface except a gas channel of a separator substrates of SUS by cathodic electrolysis treatment in an alkaline solution and further a resin layer of an electrodeposited water-soluble resin formed on the iron-based hydrous oxide film.

Abstract: The present invention has been achieved reflecting such situation, and its object is to provide a manufacturing method of a semiconductor device capable of continuously performing the mounting process which applies a so-called DBG process and a flip chip bonding method, and can contribute to simplify the manufacturing process and to improve the reliability with no void in the product.

Abstract: A carbon monoxide removing catalyst such as a ruthenium supporting catalyst is provided for removing, through oxidation thereof, carbon monoxide from an alcohol reformed gas containing hydrogen and carbon monoxide to be supplied to a fuel cell. For its activation, the catalyst is caused to contact an inactive gas or a hydrogen-containing inactive gas consisting of less than 50 volume % of hydrogen gas and the remaining volume of inactive gas, thereby to avoid poisoning of the electrode of the fuel cell with carbon monoxide.

Abstract: Both converted image data obtained upon conversion of rearward image data taken by a camera by an imaging converting unit, and auxiliary display line data generated by an OSD creating unit are outputted as display image data on a display device. As a result, converted rearward images and auxiliary display lines are displayed superimposed on the display element. An operator displays the rearward images during conversion while utilizing the auxiliary display lines on the display screen to perform rotation processing, parallel movement processing, and skew processing until the image appears in a desired position.

Abstract: A vehicular display device adjustment method including an imaging step of taking an image of the periphery of a vehicle by imaging element, an image storing step of temporarily storing in an image storing element peripheral image data based on the peripheral image of the vehicle taken by the imaging element, a setting step of setting an adjustment mode for adjusting the display state of display element, a display control step of giving priority to the peripheral image based on the peripheral image data stored in the memory over the peripheral image taken in the imaging step in accordance with the adjustment mode set and displaying on the display element the peripheral image based on the peripheral image data stored in the memory, and an adjustment step of adjusting the display state of the display element based on the peripheral image.

Abstract: A distance measuring device (1) is included of a feature point detecting element (31) for detecting a set of feature points from a plurality of images (2) picked up at a plurality of places (a, b) by a pickup element, a change detecting element (33) for detecting relative changes among images with respect to the detected set of the feature points, and a first specifying element (8) for specifying rotation quantities of the image pickup element among the places in accordance with the detected changes. Here, the feature point detecting element detects a set of points (P1, P2, P3, P4) composing lines (310, 320) that belong to a stationary object and that are substantially perpendicular to the optical axis of the image pickup element as a set of feature points.

Abstract: An image correcting device (1) is include of a feature point detecting element (3, 4 and 5) for detecting sets of feature points (QA0, QA1, . . . ) from a plurality of images (2) picked up at a plurality of places (a, b) by a pickup element, a change detecting element (7) for detecting relative changes among images with respect to the detected sets of the feature points, and a first specifying element (8) for specifying rotation quantities of the image pickup element among the places in accordance with the detected changes. The feature point detecting element detects set of points belonging to a plane-like stationary object (310) as sets of feature points.