Patents by Inventor Pieter Willem Herman De Jager
Pieter Willem Herman De Jager has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190011841Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.Type: ApplicationFiled: December 13, 2016Publication date: January 10, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman DE JAGER, Coen Adrianus VERSCHUREN, Erwin Paul SMAKMAN, Erwin JOhn VAN ZWET, Wouter Frans Willem MULCKHUYSE, Pieter VERHOEFF, Robert Albertus Johannes VAN DER WERF
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Publication number: 20190004435Abstract: A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.Type: ApplicationFiled: December 14, 2016Publication date: January 3, 2019Applicant: ASML Netherlands B.V.Inventors: Pieter Willem Herman DE JAGER, Robert Albertus Johannes VAN DER WERF, Michaƫl Josephus Evert VAN DE MOOSDIJK, Pascale Anne MAURY
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Patent number: 10103508Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.Type: GrantFiled: May 19, 2017Date of Patent: October 16, 2018Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
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Publication number: 20180081278Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.Type: ApplicationFiled: October 20, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO
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Patent number: 9823576Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.Type: GrantFiled: January 27, 2014Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Dries Smeets, Arno Jan Bleeker, Christopher James Lee, Pieter Willem Herman De Jager, Heine Melle Mulder, Rudy Jan Maria Pellens
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Patent number: 9823572Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: GrantFiled: June 17, 2014Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Andrey Alexandrovich Nikipelov, Olav Waldemar Vladimir Frijns, Gosse Charles De Vries, Erik Roelof Loopstra, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Rilpho Ludovicus Donker, Han-Kwang Nienhuys, Borgert Kruizinga, Wouter Joep Engelen, Otger Jan Luiten, Johannes Antonius Gerardus Akkermans, Leonardus Adrianus Gerardus Grimminck, Vladimir Litvinenko
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Publication number: 20170264071Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.Type: ApplicationFiled: May 19, 2017Publication date: September 14, 2017Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op 'T Root
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Patent number: 9728931Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.Type: GrantFiled: November 27, 2014Date of Patent: August 8, 2017Assignee: ASML Netherlands B.V.Inventors: Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Gosse Charles De Vries, Olav Waldemar Vladimir Frijns, Leonardus Adrianus Gerardus Grimminck, Andelko Katalenic, Johannes Antonius Gerardus Akkermans, Erik Loopstra, Wouter Joep Engelen, Petrus Rutgerus Bartraij, Teis Johan Coenen, Wilhelmus Patrick Elisabeth Maria Op'T Root
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Patent number: 9645502Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.Type: GrantFiled: March 7, 2012Date of Patent: May 9, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Johannes Onvlee, Lucas Henricus Johannes Stevens, Sander Frederik Wuister, Nikolay Nikolaevich Iosad
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Patent number: 9482963Abstract: A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.Type: GrantFiled: December 2, 2011Date of Patent: November 1, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Wouter Frans Willem Mulckhuyse, Pieter Willem Herman De Jager, Erwin John Van Zwet
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Publication number: 20160301180Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.Type: ApplicationFiled: November 27, 2014Publication date: October 13, 2016Applicant: ASML Netherlands B.V.Inventors: Andrey Alexandrovich NIKIPELOV, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Johannes Antonius Gerardus AKKERMANS, Erik LOOPSTRA, Wouter Joep ENGELEN, Petrus Rutgerus BARTRAIJ, Teis Johan COENEN, Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
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Publication number: 20160266498Abstract: An exposure apparatus including: a substrate holder constructed to hold a substrate; a modulator, including a plurality of VECSELs or VCSELs to emit electromagnetic radiation, configured to expose an exposure area of a target portion to a plurality of beams of the radiation modulated according to a desired pattern, and a projection system configured to project the modulated beams onto the target portion and having an array of optical elements to receive the plurality of beams, the projection system configured to move the array of optical elements with respect to the plurality of VECSELs or VCSELs during exposure of the exposure area, wherein the movement involves rotation and/or the movement causes the beams to displace.Type: ApplicationFiled: October 10, 2014Publication date: September 15, 2016Applicant: ASML Netherlands B.V.Inventors: Pieter Willem Herman DE JAGER, Robert Albertus Johannes VAN DER WERF
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Publication number: 20160225477Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.Type: ApplicationFiled: September 24, 2014Publication date: August 4, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich BANINE, Peturs Rutgerus BARTRAIJ, Ramon Pascal VAN GORKOM, Lucas Johannes Peter AMENT, Pieter Willem Herman DE JAGER, Gosse Charles DE VRIES, Rilpho Ludovicus DONKER, Wouter Joep ENGELEN, Olav Waldemar Vladimir FRIJNS, Leonardus Adrianus Gerardus GRIMMINCK, Andelko KATALENIC, Erik Roelof LOOPSTRA, Han-Kwang NIENHUYS, Andrey Alexandrovich NIKIPELOV, Michael Jozef Mathijs RENKENS, Franciscus Johannes Joseph JANSSEN, Borgert KRUIZINGA
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Patent number: 9372412Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.Type: GrantFiled: August 28, 2015Date of Patent: June 21, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Erik Christiaan Fritz
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Publication number: 20160147161Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.Type: ApplicationFiled: June 17, 2014Publication date: May 26, 2016Inventors: Andrey Alexandrovich NIKIPELOV, Olav Waldemar Vladimir FRIJNS, Gosse Charles DE VRIES, Erik Roelof LOOPSTRA, Vadim Yevgenyevich BANINE, Pieter Willem Herman DE JAGER, Rilpho Ludovicus DONKER, Han-Kwang NIENHUYS, Borgert KRUIZINGA, Wouter Joep ENGELEN, Otger Jan LUITEN, Johannes Antonius Gerardus AKKERMANS, Leonardus Adrianus Gerardus GRIMMINCK, Vladimir LITVINENKO
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Patent number: 9335638Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.Type: GrantFiled: August 22, 2013Date of Patent: May 10, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Pieter Willem Herman De Jager, Vadim Yevgenyevich Banine, Jozef Petrus Henricus Benschop, Cheng-Qun Gui, Johannes Onvlee, Erwin John Van Zwet
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Patent number: 9316926Abstract: A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.Type: GrantFiled: November 15, 2011Date of Patent: April 19, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Hendrik De Man
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Patent number: 9235140Abstract: A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.Type: GrantFiled: February 18, 2011Date of Patent: January 12, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Erik Christiaan Fritz
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Publication number: 20150370177Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.Type: ApplicationFiled: August 28, 2015Publication date: December 24, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Erwin John VAN ZWET, Pieter Willem Herman DE JAGER, Johannes ONVLEE, Erik Christiaan FRITZ
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Patent number: 9134630Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.Type: GrantFiled: February 2, 2011Date of Patent: September 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Erwin John Van Zwet, Pieter Willem Herman De Jager, Johannes Onvlee, Erik Christiaan Fritz