Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device to move through a projection area of each of the optical columns to measure a beam of each of the optical columns.

Abstract: An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method.

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

Abstract: A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate.

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.

Abstract: A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.

Abstract: A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract: A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

Abstract: A lithographic apparatus having a substrate table constructed to hold a substrate and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may include a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may be provided with an actuator to move the optical column or part thereof with respect to the substrate. The optical column may be arranged to project at least two of the plurality of beams onto the target portion of the substrate via a same lens of a plurality of lenses of the projection system.

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device to move through a projection area of each of the optical columns to measure a beam of each of the optical columns.

Abstract: A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Abstract: A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.

Abstract: A place station for a pick-and-place machine, comprising: a place stage assembly comprising a place stage for supporting a substrate; a covering for providing a clean environment at the substrate, the covering comprising a first opening in a first face of the covering through which a placement operation may be performed to a limited area of the substrate; wherein the place stage and the covering are mounted for relative movement to allow the opening to achieve a selected relative position over the substrate.

Abstract: A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal polynomial or an orthonormal polynomial representation.

Abstract: A pick-and-place machine, comprising: a pick station; a place station; a pick/place head for transporting a die from the pick station along a transport path to the place station; wherein the machine further comprises a die-face processing means, comprising an inspection unit and/or a cleaning unit, operable to process a face of the die on the transport path.