Abstract: An invention is provided for a CMP apparatus that enhances removal rate uniformity. The CMP apparatus includes a polishing belt disposed below a carrier head that is capable of applying a wafer to the polishing belt. Also included is a platen disposed below the polishing belt. The platen includes a circular shim section disposed on the top surface of the platen. The circular shim section is higher than the top surface of the platen. When using this configuration, increasing pressure to the backside of the polishing belt decreases the edge removal rate of the wafer. Conversely, decreasing pressure to the backside of the polishing belt increases the edge removal rate of the wafer.

Abstract: A number of methods and systems for overcoming stiction are provided. The systems include electro-mechanical systems capable of exerting a variety of forces upon areas prone to stiction. The systems can be MEMS arrays or other types of devices where stiction related forces occur. The methods include a variety of ways of causing movement in areas prone to stiction forces. Such movement can be vibrational in nature and is sufficient to overcome stiction, allowing a trapped element to be moveed to a desired location.

Abstract: A number of methods and systems for overcoming stiction are provided. The systems include electromechanical systems capable of exerting a variety of forces upon areas prone to stiction. The systems can be MEMS arrays or other types of devices where stiction related forces occur. The methods include a variety of ways of causing movement in areas prone to stiction forces. Such movement can be vibrational in nature and is sufficient to overcome stiction, allowing a trapped element to be moveed to a desired location.

Abstract: A number of methods and systems for overcoming stiction are provided. The systems include electromechanical systems capable of exerting a variety of forces upon areas prone to stiction. The systems can be MEMS arrays or other types of devices where stiction related forces occur. The methods include a variety of ways of causing movement in areas prone to stiction forces. Such movement can be vibrational in nature and is sufficient to overcome stiction, allowing a trapped element to be moveed to a desired location.

Abstract: A number of methods and systems for overcoming stiction are provided. The systems include electromechanical systems capable of exerting a variety of forces upon areas prone to stiction. The systems can be MEMS arrays or other types of devices where stiction related forces occur. The methods include a variety of ways of causing movement in areas prone to stiction forces. Such movement can be vibrational in nature and is sufficient to overcome stiction, allowing a trapped element to be moveed to a desired location.

Abstract: An engine control system comprising a host processor in operative communication with a data bus and a plurality of peripheral devices for communicating engine operating parameters. Each of the peripheral devices include a first and second transaction register for storing communication parameters for each of the corresponding plurality of peripheral devices. The control system also includes a queued port rate register (QRR) including a memory unit in operative communication with the plurality of peripheral devices for storing data for transmission to the plurality of peripheral devices in accordance with the first and second transaction registers. The system further includes a peripheral counter in operative communication with each of the plurality of peripheral devices. The peripheral counter is adapted to interrogate each of the plurality of peripheral devices and, when data has been written to one of the peripheral devices, update the peripheral device according to the memory unit data.

Abstract: In a polishing machine for simultaneous double-sided polishing of workpieces between upper and lower polish tables, the upper polish table has a hollow center telescopically receiving in a drive hub supported from below. The upper polish plate is suspended by a lifting rod from a double-ended main lifting cylinder having upper and lower ends secured to a frame extending from the lower polish table.

Abstract: A magentron sputtering apparatus includes a rotatable magnet which is either concave or convex. For one magnet structure, at least a portion of the centerline of the magnet lies along a curve defined by ##EQU1## where .xi.(r) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.

Abstract: A polishing machine includes a platform assembly mounted within three support columns. The platform assembly includes fluidically pressurized bladders for urging the upper polish plate toward and away from the lower polish plate. In one embodiment a movable support column is suspended from an overlying frame. The support column is engaged with the upper polish plate so as to selectively raise and lower the platform assembly. In another embodiment, the platform is raised and lowered by threaded shafts so as to engage and thereby displace the upper polish plate.

Abstract: A polishing machine includes a platform assembly slidably mounted on three support columns. The platform assembly includes first and second platforms captively joined together so as to be slidably movable toward and away from each other. A lift plate is supported above the uppermost platform by a coil spring and an upper polish plate is suspended from the lift plate by a supporting element which passes through the platform assembly. Drive shafts are suspended from an overlying superstructure and engage the upper platform so as to selectively raise and lower the platform assembly and the upper polish plate. The spring allows adjustment of the pressure applied by the upper polish plate.

Abstract: Disclosed is a low cost computer tomographic (CT) scanner system specifically designed for radiation therapy treatment planning. A 512-channel photo-diode array with digitizing electronics converts image intensifier optical projection data directly into digital signals and has a dynamic range on the order of 100,000:1. The new simulator includes a rotating gantry, an X-ray generator with radiographic and fluoroscopic modes and a therapy style patient support assembly. Results on head and body size phantoms indicate that the simulator X-ray generator and image intensifier tube (IIT) with multi-channel photo-detector can produce photon statistic limited CT images. Software and hardware compensation methods are described which minimize geometrical distortions. Low noise, high input impedance electronics are employed which are phase-locked to the line frequency.

Abstract: A medical infusion pump (10) for delivering liquids to a patient includes an elastomeric pump chamber (140) contractable between a refill position and a discharge position. An inlet valve (122) is operatively associated with an elastomeric inlet (142) supplying liquid to the pump chamber (140). The inlet valve (122) is selectively positionable in an open position permitting and a closed position preventing flow of liquid between the inlet (142) and the pump chamber (142). An outlet valve (124) is operatively associated with an elastomeric outlet (144) which conveys liquid from the pump chamber (140). The outlet valve (124) is selectively positionable in an open position permitting and a closed position preventing flow of liquid between the outlet (144) and pump chamber (140). A pump motor (256) and associated plunger (120) contracts and expands the pump chamber (140) between the refill position and the discharge position.

Abstract: A remotely programmable infusion system for administering liquid to a patient includes an infusion pump unit having a pump for infusing liquids operated by means of a control including a programmed processing unit and a memory chip. The processing unit operates in accordance with delivery program data stored in the memory circuit for executing an infusion delivery sequence. An output circuit is operatively disposed between the processing unit and the pump unit to control operation of the pump unit in accordance with the infusion delivery sequence. A wireless data communication circuit is operatively connected to the control for transmitting and receiving data.

Abstract: A medical infusion pump (10) using a pump chamber cassette (86) has a housing (20,22) defining a pump chamber cassette receptacle (84) and a pump driving mechanism (250) for propelling liquid through the pump chamber cassette. A door (50) holds the pump chamber cassette (86) within the cassette receptacle (84) in an operative position relative to the driving mechanism (250). The cassette includes an elastomeric conduit (132), a frame (134) and clips (146,148) for attaching the elastomeric conduit (132) to the frame (134) for holding the elastomeric conduit (132) in a select position relative to the pump driving mechanism (250) of the infusion pump upon placement of the cassette (86) in an operative position relative to the pump driving mechanism (250).

Abstract: A medical infusion pump (10) including an improved electric motor assembly (256). The medical infusion pump (10) includes a pumping mechanism (250) and a pump chamber (132) in an operative position with respect to the pumping mechanism (250), the pumping mechanism (250) manipulating the pump chamber (132) to pump liquid through the pump chamber. An electric motor (256) having a rotatable drive shaft (316) is operably linked to the pump driving mechanism (250) and the pump driving mechanism (250) pumps a select amount of liquid through the pump chamber (132) on each rotation of the electric motor drive shaft (316). The improved electric motor assembly (256) includes a motor having a portion of a drive shaft (388) extending therefrom. A magnet (392) is attached to the extending portion of the drive shaft for rotation with the drive shaft.

Abstract: A sputter magnetron ion source for producing an intense plasma in a cathode container which ionizes a high and substantial percentage of the sputter cathode material and means for extracting the ions of the cathode material in a beam. The ion extraction means is implemented by a magnetic field cusp configuration with a null region adjacent to the open end of the cathode container. Ions so produced are able to be directed at right angles to a substrate being coated for efficient via filling.

Abstract: System and method for digitally generating a pulse width modulated (PWM) signal with dither based on a command signal, the signal having a pulse width proportional to the command signal. In the preferred embodiment, the PWM signal with proportional dither energizes a load, such as a variable force solenoid, with a desired electrical current. The system includes a base signal generator for generating a base signal having a pulse width which is based on a command signal representing the desired electrical current. The system also includes a dither signal generator for digitally generating a dither signal having a pulse width proportional to the command signal, and a summer for combining the base signal and the dither signal to obtain the pulse width modulated signal with proportional dither.

Abstract: A water washed air scrubber in which the contaminated air is first directed toward the surface of a bath of water and cleaning agent at relatively high velocity to create adequate turbulence to achieve a scrubbing action to remove a majority of the contaminate, and thereafter passed through a filter to remove any remaining liquid and/or contaminate.

Abstract: A magnetron sputter source providing a predetermined erosion distribution over the surface of a sputter target material is described. When the distribution is uniform, close coupling of the sputter target with the substrate to be coated is achieved, resulting in improved collection efficiency of the sputtered material by the wafer and improved film thickness uniformity. Elimination of erosion grooves provide for greater target consumption and longer target life. The cathode magnetron sputter source includes a rotating magnet assembly of a specific shape and a specific magnetic strength provides the desired erosion distribution. The target may be dished to improve uniformity near the periphery of the wafer.The resulting magnetron cathode is used for the deposition of thin films. Further applications of uniform magnetron erosion or preselected erosion include uniform or preselected magnetron sputter etch or reactive ion etch and concurrent deposition and etch.