Patents by Inventor Roelof van Zwol

Roelof van Zwol has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of and preventing focal plane anomalies in the focal plane of a projection system
    Patent number: 7068349
    Abstract: To reduce and prevent local field anomalies created localized thinning of the coating of optical elements in the apparatus. The projection system is flood exposed to an intense beam of radiation for a substantial period of time. As the rate of thinning of the coating decreases with time, a uniform coating results.
    Type: Grant
    Filed: April 23, 2004
    Date of Patent: June 27, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Ingrid Minnaert-Janssen, Johannes Jacobus Matheus Baselmans, Frits Jurgen Van Hout, Peter Van Oorschot, Christian Wagner, Adriaan Roelof Van Zwol, Roderik Willem Van Es, Petrus Augustinus Marie Van Der Wielen, Hubrecht Lodewijk Van Ginneken
  • Method of and preventing focal plane anomalies in the focal plane of a projection system
    Publication number: 20040263811
    Abstract: To reduce and prevent local field anomalies created localized thinning of the coating of optical elements in the apparatus. The projection system is flood exposed to an intense beam of radiation for a substantial period of time. As the rate of thinning of the coating decreases with time, a uniform coating results.
    Type: Application
    Filed: April 23, 2004
    Publication date: December 30, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ingrid Minnaert-Janssen, Johannes Jacobus Matheus Baselmans, Frits Jurgen Van Hout, Peter Van Oorschot, Christian Wagner, Adriaan Roelof Van Zwol, Roderik Willem Van Es, Petrus Augustinus Marie Van Der Wielen, Hubrecht Lodewijk Van Ginneken