Patents by Inventor Rohit Mishra
Rohit Mishra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20130288474Abstract: Methods for fabricating dual damascene interconnect structures are provided herein. In some embodiments, a method for fabricating a dual damascene interconnect structure may include etching a via into a substrate through a first photoresist layer; patterning a second photoresist layer atop the substrate to define a trench pattern, wherein the via is aligned within the trench pattern, and wherein a portion of undeveloped photoresist remains in the via after patterning; and etching the trench into the substrate to form a dual damascene pattern in the substrate.Type: ApplicationFiled: April 27, 2012Publication date: October 31, 2013Applicant: APPLIED MATERIALS, INC.Inventors: ROHIT MISHRA, JAYAGATAN R. VIJAYEN, KHALID M. SIRAJUDDIN, BRAD EATON, MADHAVA RAO YALAMANCHILI
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Publication number: 20130005152Abstract: Embodiments described herein generally relate to a substrate processing system and related methods, such as an etching/deposition method. The method comprises (A) depositing a protective layer on a first layer disposed on a substrate in an etch reactor, wherein a plasma source power of 4,500 Watts or greater is applied while depositing the protective layer, (B) etching the protective layer in the etch reactor, wherein the plasma source power of 4,500 Watts or greater is applied while etching the protective layer, and (C) etching the first layer in the etch reactor, wherein the plasma source power of 4,500 Watts or greater is applied while etching the first layer, wherein a time for the depositing a protective layer (A) comprises less than 30% of a total cycle time for the depositing a protective layer (A), the etching the protective layer (B), and the etching the first layer (C).Type: ApplicationFiled: May 25, 2012Publication date: January 3, 2013Applicant: Applied Materials, Inc.Inventors: JIVKO DINEV, Saravjeet Singh, Khalid M. Sirajuddin, Tong Liu, Puneet Bajaj, Rohit Mishra, Sonal A. Srivastava, Madhava Rao Yalamanchili, Ajay Kumar
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Patent number: 8309446Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel processing sequence to form a solar cell device. In one embodiment, the methods include forming a doping layer on a back surface of a substrate, heating the doping layer and substrate to cause the doping layer diffuse into the back surface of the substrate, texturing a front surface of the substrate after heating the doping layer and the substrate, forming a dielectric layer on the back surface of the substrate, removing portions of the dielectric layer from the back surface to from a plurality of exposed regions of the substrate, and depositing a metal layer over the back surface of the substrate, wherein the metal layer is in electrical communication with at least one of the plurality of exposed regions on the substrate, and at least one of the exposed regions has dopant atoms provided from the doping layer.Type: GrantFiled: July 16, 2009Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Yonghwa Chris Cha, Kapila P. Wijekoon, Hongbin Fang
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Patent number: 8214219Abstract: A speech communications system for a vehicle includes a microphone system provided in the vehicle interior in order to detect audio information. An interaction manager provides grammar information to a speech recognizer. The speech recognizer provides speech recognition results to the interaction manager. An acoustic echo canceller eliminates portions of the audio information detected by the microphone system. A sound localizer determines a sound source location in the vehicle interior. A method of operating a speech communications system in a vehicle is also provided. An interruptible text-to-speech operation provides a speech output to a user. Voice information is requested from the user for a maximum number of times if insufficient voice information or no voice information is provided in response to the speech output provided by the interruptible text-to-speech operation. The dialog context of an unfinished speech interaction is saved.Type: GrantFiled: September 15, 2006Date of Patent: July 3, 2012Assignee: Volkswagen of America, Inc.Inventors: Ramon Prieto, Rohit Mishra
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Patent number: 8207005Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using novel methods to form the active doped region(s) and the metal contact structure of the solar cell device. In one embodiment, the methods include the steps of depositing a dielectric material that is used to define the boundaries of the active regions and/or contact structure of a solar cell device. Various techniques may be used to form the active regions of the solar cell and the metal contact structure.Type: GrantFiled: March 7, 2011Date of Patent: June 26, 2012Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Kapila P. Wijekoon, Yonghwa Chris Cha, Tristan Holtam, Vinay Shah
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Patent number: 8183081Abstract: Embodiments of the invention generally provide a high efficiency solar cell using a novel processing sequence to form a solar cell device. In one embodiment, the methods include forming one or more layers on a backside of a solar cell substrate prior to the texturing process to prevent attack of the backside surface of the substrate. In one embodiment, the one or more layers are a metalized backside contact structure that is formed on the backside of the solar cell substrate. In another embodiment, the one or more layers are a chemical resistant dielectric layer that is formed over the backside of the solar cell substrate.Type: GrantFiled: July 16, 2009Date of Patent: May 22, 2012Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Yonghwa Chris Cha, Kapila P. Wijekoon, Hongbin Fang
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Patent number: 8129212Abstract: Methods for surface texturing a crystalline silicon substrate are provided. In one embodiment, the method includes providing a crystalline silicon substrate, wetting the substrate with an alkaline solution comprising a wetting agent, and forming a textured surface with a structure having a depth about 1 ?m to about 10 ?m on the substrate. In another embodiment, a method of performing a substrate texture process includes providing crystalline silicon substrate, pre-cleaning the substrate in a HF aqueous solution, wetting the substrate with a KOH aqueous solution comprising polyethylene glycol (PEG) compound, and forming a textured surface with a structure having a depth about 3 ?m to about 8 ?m on the substrate.Type: GrantFiled: March 23, 2009Date of Patent: March 6, 2012Assignee: Applied Materials, Inc.Inventors: Kapila Wijekoon, Rohit Mishra, Michael P Stewart, Timothy Weidman, Hari Ponnekanti, Tristan R. Holtam
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Publication number: 20110272008Abstract: Embodiments of the invention generally provide methods for forming a multilayer rear surface passivation layer on a solar cell substrate. The method includes forming a silicon oxide sub-layer having a net charge density of less than or equal to 2.1×1011 Coulombs/cm2 on a rear surface of a p-type doped region formed in a substrate comprising semiconductor material, the rear surface opposite a light receiving surface of the substrate and forming a silicon nitride sub-layer on the silicon oxide sub-layer. Embodiments of the invention also include a solar cell device that may be manufactured according methods disclosed herein.Type: ApplicationFiled: May 5, 2011Publication date: November 10, 2011Applicant: APPLIED MATERIALS, INC.Inventors: Hemant P. Mungekar, Mukul Agrawal, Michael P. Stewart, Timothy W. Weidman, Rohit Mishra, Sunhom Paak
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Publication number: 20110272625Abstract: Methods for surface texturing a crystalline silicon substrate are provided. In one embodiment, the method includes providing a crystalline silicon substrate, wetting the substrate with an alkaline solution comprising a wetting agent, and forming a textured surface with a structure having a depth about 1 ?m to about 10 ?m on the substrate. In another embodiment, a method of performing a substrate texture process includes providing crystalline silicon substrate, pre-cleaning the substrate in a HF aqueous solution, wetting the substrate with a KOH aqueous solution comprising polyethylene glycol (PEG) compound, and forming a textured surface with a structure having a depth about 3 ?m to about 8 ?m on the substrate.Type: ApplicationFiled: July 13, 2011Publication date: November 10, 2011Inventors: Kapila Wijekoon, Rohit Mishra, Michael P. Stewart, Timothy Weidman, Hari Ponnekanti, Tristan R. Holtam
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Publication number: 20110240114Abstract: The present invention generally provides a method of forming a high quality passivation layer over a p-type doped region to form a high efficiency solar cell device. Embodiments of the present invention may be especially useful for preparing a surface of a boron doped region formed in a silicon substrate. In one embodiment, the methods include exposing a surface of the solar cell substrate to a plasma to clean and modify the physical, chemical and/or electrical characteristics of the surface and then deposit a charged dielectric layer and passivation layer thereon.Type: ApplicationFiled: March 14, 2011Publication date: October 6, 2011Applicant: Applied Materials, Inc.Inventors: Michael P. Stewart, Mukul Agrawal, Rohit Mishra, Hemant P. Mungekar, Timothy Weidman
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Publication number: 20110183458Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using novel methods to form the active doped region(s) and the metal contact structure of the solar cell device. In one embodiment, the methods include the steps of depositing a dielectric material that is used to define the boundaries of the active regions and/or contact structure of a solar cell device. Various techniques may be used to form the active regions of the solar cell and the metal contact structure.Type: ApplicationFiled: March 7, 2011Publication date: July 28, 2011Inventors: Timothy W. WEIDMAN, Rohit Mishra, Michael P. Stewart, Kapila P. Wijekoon, Yonghwa Chris Cha, Tristan Holtam, Vinay Shah
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Patent number: 7951637Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using novel methods to form the active doped region(s) and the metal contact structure of the solar cell device. In one embodiment, the methods include the steps of depositing a dielectric material that is used to define the boundaries of the active regions and/or contact structure of a solar cell device. Various techniques may be used to form the active regions of the solar cell and the metal contact structure.Type: GrantFiled: August 27, 2009Date of Patent: May 31, 2011Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Kapila P. Wijekoon, Yonghwa Chris Cha, Tristan Holtam, Vinay Shah
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Publication number: 20110104850Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using novel methods to form the active region(s) and the metal contact structure of a solar cell device. In one embodiment, the methods include the use of various etching and patterning processes that are used to define point contacts through a blanket dielectric layer covering a surface of a solar cell substrate. The method generally includes depositing an etchant material that enables formation of a desired pattern in a dielectric layer through which electrical contacts to the solar cell device can be formed.Type: ApplicationFiled: January 5, 2011Publication date: May 5, 2011Inventors: Timothy W. WEIDMAN, Rohit MISHRA
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Patent number: 7888168Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using novel methods to form the active region(s) and the metal contact structure of a solar cell device. In one embodiment, the methods include the use of various etching and patterning processes that are used to define point contacts through a blanket dielectric layer covering a surface of a solar cell substrate. The method generally includes depositing an etchant material that enables formation of a desired pattern in a dielectric layer through which electrical contacts to the solar cell device can be formed.Type: GrantFiled: November 19, 2008Date of Patent: February 15, 2011Assignee: Applied Materials, Inc.Inventors: Timothy W. Weidman, Rohit Mishra
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Patent number: 7877257Abstract: A method and system to parameterize a spoken language dialog system, includes providing a storage area to store at least one parameter value, integrating a subcomponent with at least one module of the spoken language dialog system, and configuring the subcomponent to access the at least one parameter value and to adjust an operation or output of the module based on the at least one parameter value.Type: GrantFiled: September 28, 2005Date of Patent: January 25, 2011Assignees: Robert Bosch Corporation, Volkswagen of AnmericaInventors: Hauke Schmidt, Carsten Bergmann, Fuliang Weng, Rohit Mishra, Badri Raghunathan
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Publication number: 20100055822Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using novel methods to form the active doped region(s) and the metal contact structure of the solar cell device. In one embodiment, the methods include the steps of depositing a dielectric material that is used to define the boundaries of the active regions and/or contact structure of a solar cell device. Various techniques may be used to form the active regions of the solar cell and the metal contact structure.Type: ApplicationFiled: August 27, 2009Publication date: March 4, 2010Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Kapila P. Wijekoon, Yonghwa Chris Cha, Tristan Holtam, Vinay Shah
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Publication number: 20100051085Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel processing sequence to form a solar cell device. Methods of forming the high efficiency solar cell may include the use of a prefabricated back plane that is bonded to the metalized solar cell device to form an interconnected solar cell module. Solar cells most likely to benefit from the invention including those having active regions comprising single or multicrystalline silicon with both positive and negative contacts on the rear side of the cell.Type: ApplicationFiled: August 27, 2009Publication date: March 4, 2010Inventors: Timothy W. Weidman, Charles Gay, Hsiu-Wu (Jason) Guo, Rohit Mishra, Kapila P. Wijekoon, Hemant Mungekar
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Publication number: 20100015751Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel processing sequence to form a solar cell device. In one embodiment, the methods include the use of various etching and patterning processes that are used to define active regions of the device and regions where the device and/or contact structure is to be located on a surface of a solar cell substrate. The method generally includes the steps of forming one or more layers on a backside of a solar cell substrate to prevent attack of the backside surface of the substrate, and provide a stable supporting surface, when the front side regions of a solar cell are formed. In one embodiment, the one or more layers are a metalized backside contact structure that is formed on the backside of the solar cell substrate. In another embodiment, the one or more layers are a chemical resistant dielectric layer that is formed over the backside of the solar cell substrate.Type: ApplicationFiled: July 16, 2009Publication date: January 21, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Yonghwa Chris Cha, Kapila P. Wijekoon, Hongbin Fang
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Publication number: 20100015756Abstract: Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel processing sequence to form a solar cell device. In one embodiment, the methods include forming a doping layer on a back surface of a substrate, heating the doping layer and substrate to cause the doping layer diffuse into the back surface of the substrate, texturing a front surface of the substrate after heating the doping layer and the substrate, forming a dielectric layer on the back surface of the substrate, removing portions of the dielectric layer from the back surface to from a plurality of exposed regions of the substrate, and depositing a metal layer over the back surface of the substrate, wherein the metal layer is in electrical communication with at least one of the plurality of exposed regions on the substrate, and at least one of the exposed regions has dopant atoms provided from the doping layer.Type: ApplicationFiled: July 16, 2009Publication date: January 21, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Timothy W. Weidman, Rohit Mishra, Michael P. Stewart, Yonghwa Chris Cha, Kapila P. Wijekoon, Hongbin Fang
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Publication number: 20090280597Abstract: Methods for surface texturing a crystalline silicon substrate are provided. In one embodiment, the method includes providing a crystalline silicon substrate, wetting the substrate with an alkaline solution comprising a wetting agent, and forming a textured surface with a structure having a depth about 1 ?m to about 10 ?m on the substrate. In another embodiment, a method of performing a substrate texture process includes providing crystalline silicon substrate, pre-cleaning the substrate in a HF aqueous solution, wetting the substrate with a KOH aqueous solution comprising polyethylene glycol (PEG) compound, and forming a textured surface with a structure having a depth about 3 ?m to about 8 ?m on the substrate.Type: ApplicationFiled: March 23, 2009Publication date: November 12, 2009Inventors: Kapila Wijekoon, Rohit Mishra, Michael P. Stewart, Timothy Weidman, Hari Ponnekanti, Tristan R. Holtam