Abstract: A technique is disclosed that allows alignment of substrates on a run-to-run basis by using the position data of one or more previously aligned substrates to determine a setpoint of a pre-alignment process for one or more subsequent substrates. The setpoint may also be determined on the basis of a predefined characteristic of the substrates to be aligned.

Abstract: The invention provides a method and apparatus for reducing the variance of critical dimensions in a semiconductor device, by providing a method and apparatus for measuring lens and reticle error and then providing a method and apparatus for compensating for the error. The critical dimension of a die is measured and used to create a critical dimension function CD(x,y), where y is the direction of scan and x is perpendicular to the direction of scan, for a stepper scanner. CD(x,y) is used to determine the energy distribution E(x,y). E(x,y) is separated into orthogonal functions E(x) and E(y). Changes in the exposure energy or Gray filters or other means are used to compensate for the changes in E(x) and E(y).

Abstract: In a method for structuring a photolithographic layer a first pattern is ated on a first plane light modulator. The first plane light modulator comprises a plurality of picture elements, and the first pattern is defined by a prescribed number of addressed picture elements. Then a second pattern is created on a second plane light modulator. The second plane light modulator comprises a plurality of picture elements, and the second pattern has a first region of addressed picture elements, which matches the first pattern or part thereof, and immediately adjacent to this a second region of addressed picture elements. Finally the first and the second pattern are imaged onto a region to be exposed of the layer to be structured.

Abstract: The system comprises a latent image detection device comprising an alignment device which uses non-actinic radiation (10) and which is intended for aligning the mask pattern with respect to the substrate (3) and is designed for detecting the measure of coincidence of a mask alignment feature and a substrate alignment feature (8). The alignment device is provided with a radiation-sensitive detection system (6) which is connected to an electronic signal circuit in which the amplitude of the radiation incident on the detection system is determined, which originates from a latent image, formed in the photosensitive layer, of a mask feature, in which a spatial frequency occurs which is approximately equal to the useful resolving power of the projection lens system and considerably greater than the resolving power of the alignment device.