Abstract: The subject matter of this invention relates to block copolymers (BCPs) and, more particularly, to block copolymers capable of self-assembly into nanoparticles for the delivery of hydrophobic cargos. The BCPs include a hydrophobic block that contains a thioether functional group that is susceptible to oxidation, transforming the solubility of the block from hydrophobic to hydrophilic, thereby releasing the hydrophobic cargo of the nanoparticle.

Abstract: Methods of forming nanoporous materials are described herein that include forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. The method generally includes forming a reaction mixture comprising a formaldehyde, a solvent, a primary aromatic diamine, and a diamine having a primary amino group and a secondary amino group, the secondary amino group having a base-reactive substituent, and heating the reaction mixture to a temperature of between about 50 deg C. and about 150 deg C. to form a polymer. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.

Abstract: This disclosure describes new compositions and methods related to photoresponsive poly(hexahydrotriazines) and related polymers. In an embodiment, a method of patterning a substrate includes forming a liquid poly(hemiaminal) material by a process that includes forming a reaction mixture comprising a polar solvent, paraformaldehyde, and an aminobenzene compound having photoreactive groups, and heating the reaction mixture at a temperature up to 50° C. The method further includes applying the liquid poly(hemiaminal) material to a substrate; patterning the liquid poly(hemiaminal) material with UV light; and curing the liquid poly(hemiaminal) material to form a cured poly(hexahydrotriazine) polymer.

Abstract: In an embodiment, a polymeric material includes a plurality of hemiaminal units bonded together by a first linkage and a second linkage, wherein the first linkage is thermally stable and resistant to bases and the second linkage is thermally degradable and degradable by a base. In another embodiment, a method of forming nanoporous materials includes forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.

Abstract: Condensation polymers are prepared by agitating a mixture comprising glyoxal, a monomer comprising two or three primary aromatic amine groups, an organic solvent, and water at a temperature between 20° C. and 100° C. The resulting solution can be applied to a surface of a substrate, forming an initial film. Curing the initial film layer using two or more heating steps, wherein one of the heat steps is performed at a temperature of 150° C. to 250° C., produces a cured film layer. Depending on the relative amounts of glyoxal and monomer used, the film layer can contain predominantly high Tg imine-containing units or predominantly lower Tg aminal-containing units. All film layers were highly resistant to the solvent used to prepare the polymer. The Tg of the polymer can be about 190° C. to greater than 300° C.

Abstract: A lithographic patterning method includes forming a multi-layer patterning material film stack on a semiconductor substrate, the patterning material film stack including a resist layer formed over one or more additional layers, and forming a metal-containing top coat over the resist layer. The method further includes exposing the multi-layer patterning material film stack to patterning radiation through the metal-containing top coat to form a desired pattern in the resist layer, removing the metal-containing top coat, developing the pattern formed in the resist layer, etching at least one underlying layer in accordance with the developed pattern, and removing remaining portions of the resist layer. The metal-containing top coat can be formed, for example, by atomic layer deposition or spin-on deposition over the resist layer, or by self-segregation from the resist layer.

Abstract: Methods, compounds, and compositions described herein generally relate to hemiaminal organogel networks (HDCNs) and methods of forming HDCNs. In some embodiments, a hemiaminal organogel has a plurality of first polymers, each having a first end and a second end, a plurality of second polymers, each having a first end and a second end, and a plurality of trivalent aminal-hemiaminal linkages. The first end of each polymer of the plurality of first polymers may be covalently bonded to a first trivalent aminal-hemiaminal linkage. The second end of each polymer of the plurality of first polymers may be covalently bonded to a second trivalent aminal-hemiaminal linkage. The first end of each polymer of the plurality of second polymers may be covalently bonded to one of the plurality of trivalent aminal-hemiaminal linkages. The second end of each polymer of the plurality of second polymers may be non-covalently bonded.

Abstract: Methods and compositions related to chemically active hexahydrotriazine inorganic-organic hybrid coatings are described. The coatings have affinity for sulfur compounds, and thus may bind or capture sulfur containing contaminants and gases. The coatings have organosilicon containing functional groups and segments, and may also contain silica particles, which cumulatively enhances adhesion, abrasion resistance and further provides steric barriers to gaseous diffusion. The coatings have utility as protective barrier coatings in the field of electronics.

Abstract: A composition, comprising a poly(methylene lactide) polymer covalently linked to a hexahydrotriazine unit or a hemiaminal unit, and methods of making such a composition, are described herein. In one embodiment, the poly(methylene lactide) polymer comprises a plurality of poly(methylene lactide) chains, and at least a portion of the poly(methylene lactide) chains are cross-linked by one or more of the hexahydrotriazine units, the hemiaminal units, or a combination thereof.

Abstract: Method and apparatus for controlling metals in a liquid are described. The liquid is contacted with a hexahydrotriazine and/or a hemiaminal material, and metal is adsorbed from the liquid onto the material. The hexahydrotriazine and/or hemiaminal material may be made from a diamine and an aldehyde.

Abstract: A lithographic patterning method includes forming a multi-layer patterning material film stack on a semiconductor substrate, the patterning material film stack including a resist layer formed over one or more additional layers, and forming a metal-containing top coat over the resist layer. The method further includes exposing the multi-layer patterning material film stack to patterning radiation through the metal-containing top coat to form a desired pattern in the resist layer, removing the metal-containing top coat, developing the pattern formed in the resist layer, etching at least one underlying layer in accordance with the developed pattern, and removing remaining portions of the resist layer. The metal-containing top coat can be formed, for example, by atomic layer deposition or spin-on deposition over the resist layer, or by self-segregation from the resist layer.

Abstract: Polyhemiaminal (PHA) and polyhexahydrotriazine (PHT) materials are modified by 1,4 conjugate addition chemical reactions to produce a variety of molecular architectures comprising pendant groups and bridging segments. The materials are formed by a method that includes heating a mixture comprising solvent(s), paraformaldehyde, aromatic amine groups, aliphatic amine Michael donors, and Michael acceptors, such as acrylates. The reaction mixtures may be used to prepare polymer pre-impregnated materials and composites containing PHT matrix resin.

Abstract: Polyhemiaminal (PHA) and polyhexahydrotriazine (PHT) materials are modified by 1,4 conjugate addition chemical reactions to produce a variety of molecular architectures comprising pendant groups and bridging segments. The materials are formed by a method that includes heating a mixture comprising solvent(s), paraformaldehyde, aromatic amine groups, aliphatic amine Michael donors, and Michael acceptors, such as acrylates. The reaction mixtures may be used to prepare polymer pre-impregnated materials and composites containing PHT matrix resin.

Abstract: Materials and methods are described herein that include forming a porous polymer network with antimicrobial and antifouling properties. The antifouling portion may be a polymer, such as polyethylene glycol, and the antimicrobial portion may be a metal, or a different cationic species, such as a quaternary ammonium salt. The method generally includes forming a reaction mixture comprising a formaldehyde, a bridging group, and moieties with antifouling and antimicrobial properties.

Abstract: The subject matter of this invention relates to block copolymers (BCPs) and, more particularly, to block copolymers capable of self-assembly into nanoparticles for the delivery of hydrophobic cargos. The BCPs include a hydrophobic block that contains a thioether functional group that is susceptible to oxidation, transforming the solubility of the block from hydrophobic to hydrophilic, thereby releasing the hydrophobic cargo of the nanoparticle.

Abstract: Methods of forming nanoporous materials are described herein that include forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. The method generally includes forming a reaction mixture comprising a formaldehyde, a solvent, a primary aromatic diamine, and a diamine having a primary amino group and a secondary amino group, the secondary amino group having a base-reactive substituent, and heating the reaction mixture to a temperature of between about 50 deg C. and about 150 deg C. to form a polymer. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.

Abstract: This disclosure describes new compositions and methods related to photoresponsive poly(hexahydrotriazines) and related polymers.

Abstract: Silica-based organogels, including aerogels, incorporating hexahydrotriazine and/or hemiaminal species are described. These organo-silica gel materials can have applications as insulating materials. In a particular example, an aerogel includes silica groups and a hexahydrotriazine moiety with at least one nitrogen atom that is covalently linked to a silica group. Methods of making such silica-based organogels are also described.

Abstract: Methods of forming nanoporous materials are described herein that include forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. The method generally includes forming a reaction mixture comprising a formaldehyde, a solvent, a primary aromatic diamine, and a diamine having a primary amino group and a secondary amino group, the secondary amino group having a base-reactive substituent, and heating the reaction mixture to a temperature of between about 50 deg C. and about 150 deg C. to form a polymer. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.

Abstract: Materials which react with (“scavenge”) sulfur compounds, such as hydrogen sulfide and mercaptans, are useful for limiting sulfur-induced corrosion. Surface-modified particles incorporating a hexahydrotriazine moiety are disclosed and used as sulfur scavengers. These surface-modified particles are used a filter media in fixed filter systems and as additives to fluids including sulfur compounds. The hexahydrotriazine moiety can react with sulfur compounds in such a manner as to bind sulfur atoms to the surface-modified particles, thus allowing removal of the sulfur atoms from fluids such as crude oil, natural gas, hydrocarbon combustion exhaust gases, sulfur polluted air and water. The surface-modified particles may, in general, be sized to allow separation of the particles from the process fluid by sedimentation, size-exclusion filtration or the like.