Patents by Inventor Russell T. Herrin
Russell T. Herrin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11021364Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: July 10, 2018Date of Patent: June 1, 2021Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Patent number: 10906803Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: June 21, 2019Date of Patent: February 2, 2021Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Publication number: 20190315619Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: ApplicationFiled: June 21, 2019Publication date: October 17, 2019Inventors: Russell T. HERRIN, Jeffrey C. MALING, Anthony K. STAMPER
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Patent number: 10414646Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: October 18, 2017Date of Patent: September 17, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Patent number: 10173889Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) cavity includes forming a first sacrificial cavity layer over a wiring layer and substrate. The method further includes forming an insulator layer over the first sacrificial cavity layer. The method further includes performing a reverse damascene etchback process on the insulator layer. The method further includes planarizing the insulator layer and the first sacrificial cavity layer. The method further includes venting or stripping of the first sacrificial cavity layer to a planar surface for a first cavity of the MEMS.Type: GrantFiled: October 16, 2014Date of Patent: January 8, 2019Assignee: GLOBALFOUNDRIES INC.Inventors: Russell T. Herrin, Christopher V. Jahnes, Anthony K. Stamper, Eric J. White
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Publication number: 20180319652Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: ApplicationFiled: July 10, 2018Publication date: November 8, 2018Inventors: Russell T. HERRIN, Jeffrey C. MALING, Anthony K. STAMPER
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Patent number: 10093537Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: October 23, 2017Date of Patent: October 9, 2018Assignee: International Business Machines CorporationInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Publication number: 20180057357Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: ApplicationFiled: October 23, 2017Publication date: March 1, 2018Inventors: Russell T. HERRIN, Jeffrey C. MALING, Anthony K. STAMPER
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Publication number: 20180050903Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: ApplicationFiled: October 18, 2017Publication date: February 22, 2018Inventors: Russell T. HERRIN, Jeffrey C. MALING, Anthony K. STAMPER
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Patent number: 9890039Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: July 18, 2016Date of Patent: February 13, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Patent number: 9862598Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: August 31, 2015Date of Patent: January 9, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Patent number: 9815690Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: July 18, 2016Date of Patent: November 14, 2017Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Patent number: 9764944Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: August 31, 2015Date of Patent: September 19, 2017Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Patent number: 9493343Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: August 31, 2015Date of Patent: November 15, 2016Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Publication number: 20160325982Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: ApplicationFiled: July 18, 2016Publication date: November 10, 2016Inventors: Russell T. HERRIN, Jeffrey C. MALING, Anthony K. STAMPER
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Publication number: 20160325983Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: ApplicationFiled: July 18, 2016Publication date: November 10, 2016Inventors: Russell T. HERRIN, Jeffrey C. MALING, Anthony K. STAMPER
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Patent number: 9406472Abstract: Planar cavity Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structure are provided. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity having a planar surface using a reverse damascene process.Type: GrantFiled: December 21, 2010Date of Patent: August 2, 2016Assignee: GLOBALFOUNDRIES INC.Inventors: Dinh Dang, Thai Doan, George A. Dunbar, III, Zhong-Xiang He, Russell T. Herrin, Christopher V. Jahnes, Jeffrey C. Maling, William J. Murphy, Anthony K. Stamper, John G. Twombly, Eric J. White
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Patent number: 9397174Abstract: A structure that provides a diffusion barrier between two doped regions. The structure includes a diffusion barrier including a semiconductor layer comprising a first doped region and a second doped region; and a diffusion barrier separating the first doped region and the second doped region, wherein the diffusion barrier comprises a doped portion and a notch above the doped portion.Type: GrantFiled: October 17, 2014Date of Patent: July 19, 2016Assignee: GLOBALFOUNDRIES INC.Inventors: John J. Ellis-Monaghan, Jeffrey P. Gambino, Russell T. Herrin, Laura J. Schutz, Steven M. Shank
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Patent number: 9330856Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: GrantFiled: December 23, 2010Date of Patent: May 3, 2016Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Russell T. Herrin, Jeffrey C. Maling, Anthony K. Stamper
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Publication number: 20160060099Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.Type: ApplicationFiled: August 31, 2015Publication date: March 3, 2016Inventors: Russell T. HERRIN, Jeffrey C. MALING, Anthony K. STAMPER