Abstract: A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.

Abstract: A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.

Abstract: The invention includes multi-station workpiece processors, methods of processing semiconductor workpieces within multi-station workpiece processors, and methods of moving semiconductor workpieces within multi-station workpiece processors. In one implementation, a multi-station workpiece processor includes a processing chamber comprising multiple stations for processing individual workpieces. A pedestal is associated with individual of the stations. The pedestals are mounted for selective vertical up movement within the chamber to contact a workpiece and for selective vertical down movement within the chamber to be displaced from a workpiece. The pedestals respectively comprise an upper surface upon which an individual workpiece is received during processing within the chamber. At least one workpiece engagement arm is associated with individual of the pedestals.

Abstract: The invention includes multi-station workpiece processors, methods of processing semiconductor workpieces within multi-station workpiece processors, and methods of moving semiconductor workpieces within multi-station workpiece processors. In one implementation, a multi-station workpiece processor includes a processing chamber comprising multiple stations for processing individual workpieces. A pedestal is associated with individual of the stations. The pedestals are mounted for selective vertical up movement within the chamber to contact a workpiece and for selective vertical down movement within the chamber to be displaced from a workpiece. The pedestals respectively comprise an upper surface upon which an individual workpiece is received during processing within the chamber. At least one workpiece engagement arm is associated with individual of the pedestals.

Abstract: A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.

Abstract: An ion beam absorbing apparatus for an ion implanter comprises an ion absorber for absorbing ions in an ion beam generated by the ion implanter, and support means for supporting the ion absorber and adapted for connection with the ion implanter, so that when so connected, the ion absorber can intercept the ion beam and absorb ions not intercepted by a target to be implanted with beam ions. The support means is further adapted for supporting the ion absorber in a plurality of different positions which can be selected so that respective different parts of the ion absorber intercept the ion beam.