Method and apparatus for processing semiconductor work pieces
A processing apparatus for semiconductor work pieces and related methodology is disclosed and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations positioned therein and wherein the rotatable processing stations each process a semiconductor work piece.
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This application claims priority from Chinese Patent Application Serial No. 200510028563.2, and which was filed on Aug. 5, 2005.
TECHNICAL FIELDThe present apparatus relates to a method and apparatus for processing semiconductor work pieces, and more specifically to an apparatus which includes multiple processing chambers for processing a plurality of semiconductor work pieces, and multiple processing stations within each of the multiple processing chambers.
BACKGROUND OF THE INVENTIONPresently, two types of semiconductor processing systems are employed for fabricating semiconductor work pieces. The first type of system is a batch processing system; while the second type of system which is commonly used processes single semiconductor work pieces. In batch processing systems, semiconductor work pieces are typically oriented in either a horizontal or vertical orientation, and are thereafter processed at the same time.
Although single piece semiconductor processing systems have many advantages including producing uniform semiconductor products, they also have numerous shortcomings including low throughput; high overhead operating costs; and problems achieving uniform heating of the semiconductor work pieces that are being processed. These long recognized problems associated with single piece processing devices have yet to be overcome.
Attempts have been made to address the problems associated with the prior art batch processing systems. For example, in U.S. Pat. No. 5,855,681, a batch processing system is described, and which includes multiple processing chambers. Each of the processing chambers includes multiple processing stations. In this prior art device, the processing chambers can process multiple semiconductor work pieces at one time.
While these and other devices have worked with some degree of success, there are shortcomings that have detracted from their usefulness. For example, one of the biggest problems associated with batch processing systems lies principally with insuring uniformity during the processing of the respective semiconductor work pieces. In this regard, when batch processing a plurality of semiconductor work pieces, the multiple semiconductor work pieces are placed in the same chamber. Consequently, differences in heat and gas flow in the processing chamber may cause non-uniform processing of the several semiconductor work pieces. To overcome the problems associated with non-uniform processing, several solutions have been proposed. For example, and referring now to
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While many of the difficulties associated with prior art batch processing devices utilized heretofore can be remedied by means of the prior art devices shown in
Therefore, a semiconductor processing apparatus which avoids the shortcomings attendant with the prior art practices and methodology utilized heretofore is the subject matter of the present application.
SUMMARY OF THE INVENTIONA first aspect of the present invention relates to a processing apparatus for semiconductor work pieces which includes a processing chamber having an internal cavity and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece.
Another aspect of the present invention relates to a processing apparatus for semiconductor work pieces, and which includes a chamber defining an internal cavity; a plurality of rotatable and heated processing stations received in the internal cavity, and which are each operable to process a semiconductor work piece; and wherein at least two of the processing stations rotate in a substantially synchronous fashion so as to facilitate the substantially uniform processing of the semiconductor work pieces; and a motor drivingly coupled to the at least two of the rotatable and heated processing stations, and which facilitates the synchronous rotation of the at least two processing stations.
Another aspect of the present invention relates to a processing apparatus for semiconductor work pieces and which includes a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece; a platform rotation mechanism individually cooperating with each of the rotatable processing stations, and positioned below each of the processing stations, and wherein the platform rotation mechanism rotates and heats the respective processing stations, and wherein the respective processing stations each define a passageway which extends therethrough, and which will accommodate electrical signal inputs; and a sealing member is borne by the processing chamber, and which facilitates the formation of an airtight environment within the internal cavity of the processing chamber.
Still another aspect of the present invention relates to a processing apparatus for semiconductor work pieces and which includes a processing chamber having an internal cavity and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece, and wherein each of the plurality of rotatable processing stations can move upwardly, downwardly and/or rotate relative to the processing chamber; sealing assemblies mounted on the processing chamber and which maintain the internal cavity of the processing chamber substantially sealed while the rotatable processing stations move upwardly, downwardly and rotate; and a cooling apparatus for cooling the sealing assemblies to facilitate the proper operation of the sealing assemblies.
Still another aspect of the present invention relates to a method for processing semiconductor work pieces which includes the steps of providing a processing chamber having an internal cavity; providing a plurality of processing stations within the internal cavity of the processing chamber; positioning individual semiconductor work pieces on each of the individual processing stations; and rotating and heating the individual processing stations so as to facilitate the effective processing of the semiconductor work pieces within the internal cavity of the processing chamber.
These and other aspects of the present invention will become readily apparent hereinafter.
BRIEF DESCRIPTION OF THE DRAWINGSPreferred embodiments of the invention are described below with reference to the following accompanying drawings.
This disclosure of the invention is submitted in furtherance of the constitutional purposes of the U.S. Patent Laws “to promote the progress of science and useful arts” (Article 1, Section 8).
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The processing apparatus of the present invention includes a first support member which is generally indicated by the numeral 70, and which is mounted to the drive shaft receiving bracket 60, and which supports at least two processing stations 32. As seen by reference to
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The present invention 40 further includes a second outer shell which is generally indicated by the numeral 200, and which cooperates with, and is generally coaxially aligned relative to the first outer shell 170. The second outer shell has a first end 201 which is juxtaposed relative to the second or lower end 172 of the first outer shell, and is affixed thereto by conventional fasteners. Further, the second outer shell has an opposite, second end 202. Still further, the second outer shell has an inside facing surface 203, and an outside facing surface 204. Still further, a longitudinally disposed passageway 205 is defined by the inside facing surface 203, and extends between the first and second ends 201 and 202. This passageway is substantially coaxially aligned relative to the longitudinally disposed passageway 175 which is defined by the first outer shell 170. As best illustrated in the drawings, it will be appreciated that the sprocket belt roller 130 is disposed in predetermined spaced relation relative to the second end 202. As earlier described, rotational force imparted to the sprocket belt roller 130 is operable to impart rotational movement to the rotatable shaft 100 so that it may freely rotate within the passageway 175. As best seen by reference to
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The operation of the described embodiment of the present invention is believed to be readily apparent and is briefly summarized at this point.
In its broadest aspect, the present processing apparatus for semiconductor work pieces of the present invention 40 comprises a processing chamber 31 having an internal cavity 33, and which further has a plurality of rotatable processing stations 32 positioned in the internal cavity 33. Each of the respective rotatable processing stations 32 process individual semiconductor work pieces 87. As earlier described, a platform rotation mechanism 220 individually cooperates with each of the rotatable processing stations 32; and an electrical motor 221 is coupled to at least two rotatable processing stations 32 so as to drive the respective processing station in a synchronous fashion. As seen in
Another aspect of the present invention relates to a processing apparatus for semiconductor work pieces 40 which comprises a processing chamber 31 having an internal cavity 33 and which has a plurality of rotatable processing stations 32 located within the internal cavity 33. The respective processing stations 32 are each operable to process a semiconductor work piece 87. The plurality of rotatable processing stations 32 can move upwardly, downwardly and/or rotate relative to the processing chamber 31. The present invention 40 further comprises a sealing assembly such as the bellow seal 160, and the magnetic sealing components 181, and which maintain the internal cavity 33 of the processing chamber 31 substantially sealed while the rotatable processing stations 32 move upwardly, downwardly and rotate. Still further, the processing apparatus 40 further comprises a cooling apparatus for cooling the sealing assemblies to facilitate the proper operation of the sealing assemblies. In this regard, the cooling apparatus includes a first coolant passageway 111; a second coolant passageway 182; the first and second ring gaps 211 and 212, respectively; as well as the externally mounted conduit 187 which is operable to direct a source of coolant which facilitates the cooling of various assemblies within the apparatus 40, and further inhibits heat related damage to the seals of the processing chamber 30.
The present invention also relates to a method for processing semiconductor work pieces 87 which comprises a first step of providing a processing chamber 31 having an internal cavity 33; and providing a plurality of processing stations 32 within the internal cavity 33 of the processing chamber. The methodology further includes another step of positioning individual semiconductor work pieces 87 on each of the individual processing stations 32; and rotating and heating the individual processing stations 32 so as to facilitate the effective processing of the semiconductor work pieces 87 within the internal cavity 33 of the processing chamber 32. As earlier disclosed, the method includes another step whereby the plurality of processing stations 32 are synchronously rotated.
As will be recognized from the foregoing, a first outer shell 170, and second outer shell 200, can be made into a unitary structure. Further, the first coolant passageway 111, and second coolant passageway 182, which are joined together in fluid flowing relation by the external conduit 187, provides a convenient means whereby the coolant circulation path may be lengthened. This facilitates the efficient utilization of the coolant. Further, the present invention provides only one coolant inlet 213 which provides the source of coolant to the present structure. This is an extremely efficient design, and further reduces the cost of manufacturing same.
Therefore it will be seen that the present invention provides a convenient means for processing semiconductor work pieces in a manner not possible heretofore. The present invention further avoids many of the shortcomings attendant with the prior art practices and processes utilized heretofore, and effectively processes a multiplicity of semiconductor work pieces in an efficient and highly advantageous manner.
In compliance with the statute, the invention has been described in language more or less specific as to structural and methodical features. It is to be understood, however, that the invention is not limited to the specific features shown and described, since the means herein disclosed comprise preferred forms of putting the invention into effect. The invention is, therefore, claimed in any of its forms or modifications within the proper scope of the appended claims appropriately interpreted in accordance with the doctrine of equivalents.
Claims
1. A processing apparatus for semiconductor work pieces, comprising:
- a processing chamber having an internal cavity and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece.
2. A processing apparatus as claimed in claim 1, and further comprising:
- a platform rotation mechanism individually cooperating with each of the rotatable processing stations.
3. A processing apparatus as claimed in claim 2, and further comprising:
- a motor mounted on the platform rotation mechanisms and which. is drivingly coupled to at least two of the processing station so as to drive the respective processing station in a synchronous fashion.
4. A processing apparatus as claimed in claim 3, and wherein the motor is drivingly coupled to the respective processing stations by a continuous belt.
5. A processing apparatus as claimed in claim 4, and further comprising:
- a belt roller borne by each of the respective processing station, and wherein the continuous belt transmits force from the motor to the belt roller so as to cause rotation of the respective processing stations.
6. A processing apparatus as claim 5, and wherein the continuous belt has an undulating drive surface, and wherein the belt roller further comprises a sprocket belt roller which is operable to matingly and drivingly engage the undulating drive surface of the continuous belt.
7. A processing apparatus as claimed in claim 2, and wherein the plurality of processing stations include four rotatable processing stations, and wherein the processing apparatus further comprises a motor which synchronously drives two adjacent processing stations.
8. A processing apparatus as claimed in claim 1, and further comprising:
- a first support member mounted adjacent to the processing chamber and which supports at least two processing stations; and
- a first motor drivingly coupled to the first support member and operable to selectively and simultaneously move the at least two processing stations along a substantially vertical path of travel.
9. A processing apparatus as claimed in claim 8, and further comprising:
- a first sensor borne by the first support member and which indicates the position of the first support member.
10. A processing apparatus as claimed in claim 8, and further comprising:
- a worm drive mounted on the first support member and drivingly coupled to the first motor, and which further transmits force from the first motor to the first support member.
11. A processing apparatus as claimed in claim 1, and further comprising:
- a plurality of lift pins moveably mounted on each of the processing stations, and which are operable to reciprocally move upwardly and downwardly relative to each of the processing stations.
12. A processing apparatus as claimed in claim 11, and further comprising:
- a second support member mounted adjacent to the processing chamber, and wherein the second support member cooperates within the plurality of lift pins to move the respective lift pins upwardly and downwardly relative to the respective processing stations; and
- a second motor drivingly coupled to the second support member and operable to selectively move the second support member so as to cause the upward and downward movement of the respective lift pins in each of the respective processing stations.
13. A processing apparatus as claimed in claim 12, and further comprising:
- a second sensor borne by the second support member and which facilitates the positioning of the plurality of lift pins within a given range of travel relative to the respective processing stations.
14. A processing apparatus as claimed in claim 1 and further comprising:
- a first support member mounted adjacent to the processing chamber and which supports at least two processing stations;
- a first motor drivingly coupled to the first support member and operable to selectively and simultaneously move the at least two processing stations along a substantially vertical path of travel;
- a plurality of lift pins moveably mounted on each processing station, and which are operable to reciprocally move upwardly and downwardly relative to each of the processing stations;
- a second support member mounted adjacent to the processing chamber, and cooperating with the plurality of lift pins to move the respective lift pins upwardly and downwardly relative to the respective processing stations;
- a second motor drivingly coupled to the second support member and operable to selectively move the second support member so as to cause the upward and downward movement of the respective lift pins in each of the respective processing stations;
- a vertically oriented rail defining vertically oriented rail slots, and which is mounted on the processing chamber; and
- rail slot engagement members individually mounted on each of the first and second support members and which are matingly received in each of the vertically oriented rail slots, and which guide the first and second support members along a substantially vertically oriented path of travel.
15. A processing apparatus as claimed in claim 1, and further comprising:
- a heating component associated with each of the processing stations, and which provides substantially uniform heat energy to each of the processing stations.
16. A processing apparatus as claimed in claim 2, and wherein each of the processing stations comprise:
- a shaft having a proximal and a distal end; and
- a belt roller mounted on the distal end of the shaft.
17. A processing apparatus for semiconductor work pieces, comprises:
- a processing chamber having an internal cavity, and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece;
- a platform rotation mechanism individually cooperating with each of the rotatable processing stations, and positioned below each of the processing stations, and wherein the platform rotation mechanism rotates and heats the respective processing stations, and wherein the respective processing stations each defines a passageway which extends therethrough, and which will accommodate a plurality of electrical signal inputs; and
- a sealing member mounted on the processing station and sealably engaging the processing chamber, and which facilitates the formation of an airtight environment within the internal cavity of the processing chamber.
18. A processing apparatus as claimed in claim 17, and wherein each of the processing stations comprise:
- a shaft having a proximal and a distal end; and
- a belt roller mounted on the distal end of the shaft, and wherein rotation of the belt roller imparts rotational motion to the associated shaft.
19. A processing apparatus as claimed in claim 18, and further comprising:
- a hub mounted on the distal end of the shaft, and wherein the belt roller is mounted to the hub; and
- a signal amplifier electrically coupled to the hub.
20. A processing apparatus as claimed in claim 18, and further comprising:
- a resistor wire borne by each of the processing stations, and which, when energized, emits heat energy;
- a support conduit cooperating with and extending longitudinally outwardly relative to, the shaft of the respective processing stations, and wherein the shaft defines a longitudinally disposed passageway extending therethrough; and
- an electrical conduit extending through the support conduit, and the shaft, and which is electrically coupled to the resistor wire, and wherein the electrical conduit delivers electricity to the resistor wire to energize same.
21. A processing apparatus as claimed in claim 20, and further comprising:
- a temperature detection apparatus mounted within the support conduit and which measures a surface temperature of the respective processing stations.
22. A processing apparatus as claimed in claim 20, and wherein the processing chamber has a bottom surface, and wherein the processing apparatus further comprises:
- a bellows seal having opposite first and second ends, and a longitudinal passageway which extends between the first and second ends, and wherein the first end is supported on the bottom surface of the processing chamber, and wherein the support conduit extends through the bellows seal; and
- a sealing member positioned between the bellows seal and the bottom surface of the processing chamber so as to sealably mount the bellows seal to the bottom surface.
23. A processing apparatus as claimed in claim 22, and further comprising:
- a first outer shell having first and second ends, and which further has a passageway which extends between the first and second ends, and wherein the second end of the bellows seal is sealably mounted to the first end of the first outer shell, and wherein the shaft of the respective processing stations extend into the passageway of the first outer shell and is rotatable relative thereto; and
- a bearing mounted adjacent to the first end of the first outer shell and which receives the shaft of the respective processing stations so as to facilitate the rotation of the processing stations.
24. A processing apparatus as claimed in claim 23, and further comprising:
- a sealing component positioned between the first outer shell and the bellows seal so as to substantially sealably secure the bellows seal to the first outer shell.
25. A processing apparatus as claimed in claim 23, and further comprising:
- a magnetic sealing component positioned between the first end of the first outer shell and the shaft so as to substantially sealably secure the shaft to the first outer shell while the shaft rotates relative to the first outer shell.
26. A processing apparatus as claimed in claim 20, and wherein the support conduit and the shaft are sealably affixed to one another by fasteners, and wherein a sealing component is positioned between the support conduit and the shaft.
27. A processing apparatus as claimed in claim 26, and further comprising:
- a connecting block having opposite sides and which defines a passageway extending therethrough, and wherein the shaft is substantially coaxially aligned relative to the passageway of the connecting block and sealably mounted to one side thereof, and wherein the support conduit is substantially coaxially aligned relative to the passageway defined by the connecting block and is further sealably mounted to the opposite side of the connecting block, and wherein a sealing member is positioned between both the support conduit, and the shaft; and the adjoining connecting block.
28. A processing apparatus as claimed in claim 23, and wherein the proximal end of the shaft is engaged by the bearing, and wherein the proximal end of the shaft defines, at least in part, a first coolant passageway which facilitates the cooling of the sealing component which cooperates with the shaft.
29. A processing apparatus as claimed in claim 28, and wherein the first outer shell further defines a second coolant passageway which facilitates the cooling of the sealing component which cooperates with the shaft.
30. A processing apparatus as claimed in claim 29, and wherein the first and second coolant passageways are coupled in fluid flowing relation by way of an external conduit.
31. A processing apparatus as claimed in claim 30, and wherein the first coolant passageway has a first intake end, and an opposite, second, exhaust end, and wherein a source of coolant is supplied to the first intake end.
32. A processing apparatus as claimed in claim 31, and wherein the first coolant passageway further comprises:
- a first cooling slot which is positioned near, and which circumscribes, at least in part, the proximal end of the shaft, and which is further disposed in cooling relation relative to the sealing component which cooperates with the shaft;
- a first portion of the first coolant passageway which extends longitudinally along the shaft and which has a first end which is coupled in fluid flowing relation relative to the first cooling slot, and an opposite second end, and wherein a first aperture is formed in the shaft at the second end of the first portion; and
- a second portion of the first coolant passageway which extends longitudinally along the shaft, and which has a first end which is coupled in fluid flowing relation relative to the first cooling slot, and an opposite second end, and wherein a second aperture is formed in the shaft at the second end of the second portion.
33. A processing apparatus as claimed in claim 32, and further comprising:
- a second outer shell having opposite first and second ends, and which further defines a passageway which extends longitudinally thereof and between the first and second ends, and wherein first end of the second outer shell is mounted on, and is substantially coaxially aligned relative to, the second end of the first outer shell, and wherein the shaft extends through the second outer shell and is rotatable relative thereto; and
- a plurality of sealing components which are received in the passageway which is defined by the second outer shell, and which sealingly couple the shaft to the second outer shell, and wherein first and second ring gaps are defined between adjacent sealing components, the shaft, and the second, outer shell.
34. A processing apparatus as claimed in claim 33, and wherein the first aperture formed in the shaft, and located at the second end of the first portion of the first coolant passageway is located within the first ring gap, and wherein a coolant inlet is coupled in fluid flowing relation relative to the first ring gap, and wherein a source of coolant enters the coolant inlet, travels along the first ring gap, and then enters the first portion of the first coolant passageway by way of the first aperture.
35. A processing apparatus as claimed in claim 34, and wherein the second aperture formed in the shaft, and which is located at the second end of the second portion of the first coolant passageway is located within the second ring gap, and wherein the external conduit has a first end which is coupled in fluid flowing relation relative to the second ring gap, and an opposite second end which is coupled in fluid flowing relation relative to the second coolant passageway, and wherein the coolant leaving the first portion of the first coolant passageway travels along the first cooling slot and then passes into the second portion of the first coolant passageway, and wherein the coolant exits the second portion of the first coolant passageway by way of the second aperture, and then travels along the second ring gap, and wherein the coolant exits the second ring gap and enters into the first end of the external conduit, and wherein the coolant exits the second end of the external conduit and enters into the second coolant passageway.
36. A processing apparatus as claimed in claim 35, and wherein the second coolant passageway comprises:
- a second coolant slot which is positioned near, and which further circumscribes, at least in part, the first end of the first outer shell, and which is further disposed in spaced relation relative to the first coolant slot, and wherein the second coolant slot has a first, intake end, and a second, exhaust end, and wherein the second end of the external conduit is coupled in fluid flowing relation relative to the first end of the second coolant slot; and
- an external exhaust conduit coupled to the second end of the second coolant slot, and which exhausts the coolant to ambient.
37. A processing apparatus for semiconductor work pieces, comprising:
- a processing chamber having an internal cavity and which has a plurality of rotatable processing stations within the internal cavity, and which are each operable to process a semiconductor work piece, and wherein each of the plurality of rotatable processing stations can move upwardly, downwardly and/or rotate relative to the processing chamber;
- sealing assemblies mounted on the processing chamber and which maintain the internal cavity of the processing chamber substantially sealed while the rotatable processing stations move upwardly, downwardly, and rotate; and
- a cooling apparatus for cooling the sealing assemblies to facilitate the proper operation of the sealing assemblies.
38. A processing apparatus as claimed in claim 37, and further comprising:
- a bellows seal having opposite first and second ends, and which further has a passageway which extends between the first and second ends, and wherein the processing chamber has a bottom surface, and the first end of the bellows is sealably secured to the bottom surface of the processing chamber; and
- an elastic sealing member sealably cooperating with the bellows seal.
39. A processing apparatus as claimed in claim 38, and further comprising:
- a first outer shell having first and second ends, and which further has a passageway which extends between the first and second ends, and wherein the second end of the bellows is sealably mounted to the first end of the outer shell;
- a shaft extending into the passageway of the outer shell and which is further rotatable relative thereto; and
- a magnetic sealing component mounted on the first outer shell and sealably cooperating with the shaft so as to sealably secure the shaft for rotatable motion relative to first outer shell and the bellows seal.
40. A processing apparatus as claimed in claim 39, and further comprising:
- a sealing component positioned between the first end of the first outer shell, and the second end of the bellows, so as to facilitate the sealing of the bellows to the first outer shell.
41. A processing apparatus as claimed in claim 37, and wherein the cooling apparatus comprises, at least in part, water cooling conduits, and wherein one of the water cooling conduits comprises an externally mounted conduit.
42. A processing apparatus as claimed in claim 41, and wherein the cooling apparatus further comprises:
- a first coolant passageway which is formed in the shaft, and which is positioned, at least in part near the sealing component; and
- a second coolant passageway which is formed, in the first outer shell, and which is positioned, at least in part, near the sealing component, and wherein the first and second coolant passageways are coupled in fluid flowing relation one relative to the other by way of the externally mounted conduit.
43. A processing apparatus as claimed in claim 42, and further comprising:
- a second outer shell having opposite first and second ends, and which further has a passageway which extends longitudinally thereof, and between the first and second ends, and wherein first end of the second outer shell is mounted on, and is substantially coaxially aligned relative to, the second end of the first outer shell, and wherein the shaft extends through the second outer shell and is rotatable relative thereto; and
- a plurality of sealing components which are received in the passageway of the second outer shell and which sealingly couple the shaft to the second outer shell, and wherein first and second ring gaps are defined between adjacent sealing components, the shaft, and the second, outer shell.
44. A processing apparatus as claimed in claim 43, and further comprising:
- an external coolant source coupled in fluid flowing relation relative to the first ring gap, and wherein the first ring gap and the first coolant passageway are coupled in fluid flowing relation, and wherein the source of the external coolant enters the first coolant passageway after first passing along the first ring gap.
45. A processing apparatus as claimed in claim 44, and wherein at least one of the water cooling conduits is an external conduit having opposite first and second ends, and wherein the first coolant passageway is coupled in fluid flowing relation relative to the second ring gap, and wherein the external conduit has a first end coupled in fluid flowing relation relative to the second ring gap, and the second end of the external conduit is coupled in fluid flowing relation relative to the second coolant passageway, and wherein coolant in the first coolant passageway passes by means of the external conduit to the second coolant passageway.
46. A method for processing semiconductor work pieces, comprising:
- providing a processing chamber having an internal cavity;
- providing a plurality of processing stations within the internal cavity of the processing chamber;
- positioning individual semiconductor work pieces on each of the individual processing stations; and
- rotating and heating the individual processing stations so as to facilitate the effective processing of the semiconductor work pieces within the internal cavity of the processing chamber.
47. A method as claimed in claim 46, and wherein the plurality of processing stations are synchronously rotated.
48. A processing apparatus for semiconductor work pieces, comprising:
- a chamber defining an internal cavity;
- a plurality of rotatable and heated processing stations received in the internal cavity, and which are each operable to process a semiconductor work piece; and wherein at least two of the processing stations rotate in a substantially synchronous fashion so as to facilitate the substantially uniform processing of the semiconductor work pieces; and
- a motor drivingly coupled to the at least two of the rotatable and heated processing stations, and which facilitates the synchronous rotation of the at least two processing stations.
Type: Application
Filed: May 24, 2006
Publication Date: Feb 8, 2007
Applicant:
Inventors: AiHua Chen (Shanghai), Ryoji Todaka (Shanghai), Gerald Yin (Shanghai)
Application Number: 11/441,291
International Classification: H01L 21/00 (20060101);