Abstract: A method for manufacturing a semiconductor and an apparatus for measuring slurry quality. The apparatus includes a plurality of slurry supply devices, a plurality of semiconductor processing devices, and an in-line monitoring system. The slurry supply devices have slurry supply lines. The semiconductor processing devices receive slurry from each of the slurry supply devices through the slurry supplying lines to perform semiconductor processing. The in-line monitoring system includes a plurality of sampling lines diverging from the plurality of slurry supplying lines. The particle sizes of the slurry are measured through each of the sampling lines. The monitoring system maintains the slurry quality in real time to increase yield from CMP (chemical-mechanical polishing).

Abstract: A backlight assembly of an LCD is provided. The backlight assembly includes a lamp for generating a light, a light guide plate disposed at a side of the lamp, for guiding the light, and a diffusion sheet and a prism sheet disposed on the light guide plate, for enhancing efficiency of the light outputted from the light guide plate, wherein the prism sheet comprises a body part and a plurality of protrusion parts each having a concavely inclined surface formed on the body part.

Abstract: The apparatus for decomposing PFCs includes an external electrode unit which is coupled to a reference voltage and which defines a flow space for the flow of the PFCs, and an internal electrode unit which is located within the flow space of the external electrode unit so as to define a reaction space between the internal electrode unit and the external electrode unit. The apparatus is also equipped with a voltage supply unit which applies an alternating voltage to the internal electrode unit which is of sufficient voltage and frequency to generate an electron beam within the reaction space which is capable of decomposing the PFCs.

Abstract: The apparatus for decomposing PFCs includes an external electrode unit which is coupled to a reference voltage and which defines a flow space for the flow of the PFCs, and an internal electrode unit which is located within the flow space of the external electrode unit so as to define a reaction space between the internal electrode unit and the external electrode unit. The apparatus is also equipped with a voltage supply unit which applies an alternating voltage to the internal electrode unit which is of sufficient voltage and frequency to generate an electron beam within the reaction space which is capable of decomposing the PFCs.

Abstract: An apparatus for supplying a chemical solution includes a mother tank storing a chemical solution, an intermediate tank disposed in a higher position than the mother tank with a first height difference (h), and the intermediate tank is adapted to receive a fixed amount of chemical solution from the mother tank. The apparatus further includes a bubbling tank disposed in a higher position than the intermediate tank with a second height difference (h?) and the bubbling tank is adapted to receive the fixed amount of the chemical solution from the intermediate tank.

Abstract: Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Continuous X-rays are incident into the crystal and reflection intensities of the X-rays reflected from the crystal with different orders of reflections are measured based on Bragg's law, thereby measuring reflectivity of X-rays with different orders of reflections.

Abstract: A separator sheet for manufacturing an electric double layer capacitor, and a method for manufacturing the electric double layer capacitor using the same, are provided. According to an embodiment, the separator sheet for manufacturing the electric double layer capacitor comprises: a plurality of separators; and a resin film holding the plurality of separators, wherein the separators are disposed in the resin film at a predetermined interval.

Abstract: A cyclone used in a separator apparatus includes a body and a vortex finder. The body includes an inlet passageway, a cylindrical passageway connected to the inlet passageway, and a conical passageway connected to the cylindrical passageway. The cylindrical passageway has an upper end through which first particles in a fluid are exhausted, and a lower end. The conical passageway has an upper end connected to the lower end of the cylindrical passageway, and an opened lower end through which second particles having a specific gravity greater than that of the first particle are exhausted. The vortex finder is connected to the upper end of the cylindrical passageway. A first exhaust passageway is vertically formed in the vortex finder so that the first particles spirally ascend through the first exhaust passageway from the cylindrical passageway.

Abstract: A prism sheet of a liquid crystal display (LCD) includes a body part made of a transparent resin material; and a plurality of intaglio-type optical unit structures arranged on the body part, each of the optical unit structures having an intaglio-type or a relief type polyhedron inside of a rectangular structure thereof, a center of the intaglio portion forming a line, not a dot.

Abstract: An apparatus for a semiconductor device includes: a chamber; a susceptor in the chamber; a plurality of heating-blocks on the susceptor; a lift pin assembly through the susceptor; a substrate holder over the susceptor, the substrate holder having a plurality of through holes corresponding to the plurality of heating-blocks; and a shaft combined with the substrate holder-through the susceptor.

Abstract: A gas injector for supplying gas into a reaction chamber, in which a substrate is placed, including a main supply tube extending through the reaction chamber such that an outlet end of the main supply tube is positioned in the interior of the reaction chamber, branch tubes branched from the outlet end of the main supply tube, and injector port members connected to respective outlet ends of the branch tubes. Gas from an external gas supply source is supplied into the main supply tube. Each injector port member has a plurality of nozzle holes. Since gas is distributed through the branch tubes, and is then injected through the nozzle holes provided at each injector port member, it is possible to achieve uniform gas injection, and thus, to achieve an improvement in process uniformity.

Abstract: A gas valve assembly for a deposition apparatus includes: a driving shaft including a plurality of gas supply paths therein; a housing surrounding the driving shaft and including a plurality of through holes therein; a plurality of magnetic seal pairs between the driving shaft and the housing, the plurality of magnetic seal pairs including a magnetic fluid; and a leakage-preventing means between the driving shaft and the housing, the leakage-preventing means preventing a leakage of the magnetic fluid.

Abstract: The apparatus for decomposing PFCs includes an external electrode unit which is coupled to a reference voltage and which defines a flow space for the flow of the PFCs, and an internal electrode unit which is located within the flow space of the external electrode unit so as to define a reaction space between the internal electrode unit and the external electrode unit. The apparatus is also equipped with a voltage supply unit which applies an alternating voltage to the internal electrode unit which is of sufficient voltage and frequency to generate an electron beam within the reaction space which is capable of decomposing the PFCs.

Abstract: A method of reducing PFC emissions during a semiconductor manufacturing process that includes a set of sub-processes each of which produces at least one PFC includes the steps of exhausting PFC's produced by each sub-process to a common line to form a combined exhaust stream, treating the combined exhaust stream from each sub-process using a separate PFC abatement system, combining the treated exhaust streams to form a combined treated stream, and wet scrubbing the combined treated stream.

Abstract: A method of reducing PFC emissions during a semiconductor manufacturing process that includes a set of sub-processes each of which produces at least one PFC includes the steps of exhausting PFC's produced by each sub-process to a common line to form a combined exhaust stream, treating the combined exhaust stream from each sub-process using a separate PFC abatement system, combining the treated exhaust streams to form a combined treated stream, and wet scrubbing the combined treated stream.

Abstract: Disclosed is an X-ray tube for generating X-rays linearly focused in a vertical or horizontal direction in accordance with the orientation of a filament used. The X-ray tube includes a linear filament arranged at a cathode included in the X-ray tube, the linear filament serving to allow an anode included in the X-ray tube to generate line-focused X-rays. The X-ray tube according to the present invention can be applied to a calibration for X-ray spectroscopes, or various applications requiring line-focused X-rays.