Patents by Inventor Sang-Won Kang

Sang-Won Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180248810
    Abstract: A playout delay adjustment method includes: adjusting a playout delay surplus based on a difference value between a first playout delay obtained in a first scheme and a second playout delay obtained in a second scheme and determining an adaptation type of a current frame according to whether a previous frame is an active frame; and when the determined adaptation type is signal-based adaptation, performing time scale modification (TSM) according to an adaptation scheme determined according to a comparison result between the first playout delay and the second playout delay and a comparison result between a target delay and the first playout delay.
    Type: Application
    Filed: September 5, 2016
    Publication date: August 30, 2018
    Applicants: SAMSUNG ELECTRONICS CO., LTD., INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Ho-sang SUNG, Sang-won KANG, Jong-hyun KIM, Eun-mi OH, Yaxing LI, Kyung-hun JUNG
  • Patent number: 10045995
    Abstract: The present invention relates to an epidithiodioxopiperazine derivative represented by the following Chemical Formula 1 or its reduced derivative; a method for preparing a compound represented by Chemical Formula 1 having improved intracellular permeability and mimicking the activity of 2-Cys-Prx in its reduced form in the cells; a pharmaceutical composition for preventing or treating vascular diseases comprising an epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient; a drug delivery device for local administration including the pharmaceutical composition; and a pharmaceutical composition for inhibiting melanoma metastasis comprising the epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: August 14, 2018
    Assignee: EWHA University Industry-Collaboration Foundation
    Inventors: Sang Won Kang, Dong Hoon Kang, Doo Jae Lee
  • Patent number: 10008366
    Abstract: Embodiments of the present disclosure generally provide improved methods for processing substrates with improved process stability, increased mean wafers between clean, and/or improved within wafer uniformity. One embodiment provides a method for seasoning one or more chamber components in a process chamber. The method includes placing a dummy substrate in the process chamber, flowing a processing gas mixture to the process chamber to react with the dummy substrate and generate a byproduct on the dummy substrate, and annealing the dummy substrate to sublimate the byproduct while at least one purge conduit of the process chamber is closed.
    Type: Grant
    Filed: September 8, 2016
    Date of Patent: June 26, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Sang Won Kang, Nicholas Celeste, Dmitry Lubomirsky, Peter Hillman, Douglas Brenton Hayden, Dongqing Yang
  • Patent number: 9932670
    Abstract: A method and apparatus for removing deposition products from internal surfaces of a processing chamber, and for preventing or slowing growth of such deposition products. A halogen containing gas is provided to the chamber to etch away deposition products. A halogen scavenging gas is provided to the chamber to remove any residual halogen. The halogen scavenging gas is generally activated by exposure to electromagnetic energy, either inside the processing chamber by thermal energy, or in a remote chamber by electric field, UV, or microwave. A deposition precursor may be added to the halogen scavenging gas to form a deposition resistant film on the internal surfaces of the chamber. Additionally, or alternately, a deposition resistant film may be formed by sputtering a deposition resistant metal onto internal components of the processing chamber in a PVD process.
    Type: Grant
    Filed: January 7, 2014
    Date of Patent: April 3, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Jie Su, Lori D. Washington, Sandeep Nijhawan, Olga Kryliouk, Jacob Grayson, Sang Won Kang, Dong Hyung Lee, Hua Chung
  • Publication number: 20170363640
    Abstract: Provided are a composition for diagnosing vascular disease including an agent measuring a level of interleukin 12 receptor ?2 protein in the blood, and a kit for diagnosing vascular disease including the same. Further, provided is a method for diagnosing vascular disease, the method including the step of measuring a level of interleukin 12 receptor ?2 protein in a blood sample separated from an individual suspected of having vascular disease. Furthermore, provided are a composition for preventing or treating vascular disease including an interleukin 12 receptor ?2 activity inhibitor, and a method of screening a therapeutic agent for vascular disease, the method including the step of treating smooth muscle cells with a test agent for vascular disease treatment and measuring an expression level of interleukin 12 receptor ?2.
    Type: Application
    Filed: August 10, 2017
    Publication date: December 21, 2017
    Inventors: Sang Won Kang, Dong Hoon Kang
  • Patent number: 9765090
    Abstract: The present invention relates to an epidithiodioxopiperazine derivative represented by the following Chemical Formula 1 or its reduced derivative; a method for preparing a compound represented by Chemical Formula 1 having improved intracellular permeability and mimicking the activity of 2-Cys-Prx in its reduced form in the cells; a pharmaceutical composition for preventing or treating vascular diseases comprising an epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient; a drug delivery device for local administration including the pharmaceutical composition; and a pharmaceutical composition for inhibiting melanoma metastasis comprising the epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient.
    Type: Grant
    Filed: May 23, 2014
    Date of Patent: September 19, 2017
    Assignee: EWHA UNIVERSITY-INDUSTRY COLLABORATION FOUNDATION
    Inventors: Sang Won Kang, Dong Hoon Kang, Doo Jae Lee
  • Publication number: 20170239261
    Abstract: The present invention relates to an epidithiodioxopiperazine derivative represented by the following Chemical Formula 1 or its reduced derivative; a method for preparing a compound represented by Chemical Formula 1 having improved intracellular permeability and mimicking the activity of 2-Cys-Prx in its reduced form in the cells; a pharmaceutical composition for preventing or treating vascular diseases comprising an epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient; a drug delivery device for local administration including the pharmaceutical composition; and a pharmaceutical composition for inhibiting melanoma metastasis comprising the epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient.
    Type: Application
    Filed: February 23, 2017
    Publication date: August 24, 2017
    Inventors: Sang Won KANG, Dong Hoon KANG, Doo Jae LEE
  • Publication number: 20170154632
    Abstract: A quantization device includes: a trellis-structured vector quantizer which quantizes a first error vector between an N-dimensional (here, “N” is two or more) subvector and a first predictive vector; and an inter-frame predictor which generates a first predictive vector from the quantized N-dimensional subvector, wherein the inter-frame predictor uses a predictive coefficient comprising an N×N matrix and performs an inter-frame prediction using the quantized N-dimensional subvector of a previous stage.
    Type: Application
    Filed: May 7, 2015
    Publication date: June 1, 2017
    Applicants: SAMSUNG ELECTRONICS CO., LTD., INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Ho-sang SUNG, Sang-won KANG, Jong-hyun KIM, Eun-mi OH
  • Patent number: 9659753
    Abstract: A plasma source includes a first electrode and a second electrode having respective surfaces, and an insulator that is between and in contact with the electrodes. The electrode surfaces and the insulator surface substantially define a plasma cavity. The insulator surface defines one or more grooves configured to prevent deposition of material in a contiguous form on the insulator surface. A method of generating a plasma includes introducing one or more gases into a plasma cavity defined by a first electrode, a surface of an insulator that is in contact with the first electrode, and a second electrode that faces the first electrode. The insulator surface defines one or more grooves where portions of the insulator surface are not exposed to a central region of the cavity. The method further includes providing RF energy across the first and second electrodes to generate the plasma within the cavity.
    Type: Grant
    Filed: August 7, 2014
    Date of Patent: May 23, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Tae Cho, Sang Won Kang, Dongqing Yang, Raymond W. Lu, Peter Hillman, Nicholas Celeste, Tien Fak Tan, Soonam Park, Dmitry Lubomirsky
  • Publication number: 20170069463
    Abstract: Embodiments of the present disclosure generally provide improved methods for processing substrates with improved process stability, increased mean wafers between clean, and/or improved within wafer uniformity. One embodiment provides a method for seasoning one or more chamber components in a process chamber. The method includes placing a dummy substrate in the process chamber, flowing a processing gas mixture to the process chamber to react with the dummy substrate and generate a byproduct on the dummy substrate, and annealing the dummy substrate to sublimate the byproduct while at least one purge conduit of the process chamber is closed.
    Type: Application
    Filed: September 8, 2016
    Publication date: March 9, 2017
    Inventors: Sang Won KANG, Nicholas CELESTE, Dmitry LUBOMIRSKY, Peter HILLMAN, Douglas Brenton HAYDEN, Dongqing YANG
  • Publication number: 20170000452
    Abstract: The present invention relates to a head and neck simulation phantom device for simulating the head and neck of a body, the phantom device including: a flat type first plate having a first insertion groove formed on one surface thereof; a flat type second plate disposed to come into contact with the other surface of the first plate and having a second insertion groove formed on the contacted surface with the other surface of the first plate in such a manner as to correspond to the first insertion groove; and a plurality of teeth simulants inserted into the first insertion groove and the second insertion groove and for simulating the teeth of the body.
    Type: Application
    Filed: April 2, 2015
    Publication date: January 5, 2017
    Inventors: TAE SUK SUH, MIN YOUNG LEE, JI YEON PARK, JEONG WOO LEE, JOON YONG CHOI, SANG WON KANG, HAE JIN PARK
  • Publication number: 20160335801
    Abstract: Various embodiments of the present invention may comprise: a display unit for displaying a screen corresponding to a virtual reality mode; and a control unit for sensing an interrupt due to occurrence of at least one event, changing event-related information related to the occurred event to a form corresponding to the virtual reality mode, and controlling the changed event-related information to be displayed on the screen operated corresponding to the virtual reality mode. In addition, other embodiments are possible for the various embodiments of the present invention.
    Type: Application
    Filed: January 6, 2015
    Publication date: November 17, 2016
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Yeong-Seong YOON, Sang-Won KANG, Jin-Goo LEE, Seong-Hoon CHOI, Woo-Suk CHOI
  • Publication number: 20160275959
    Abstract: A method of generating a wideband signal may include estimating a high-band spectrum parameter from a reconstructed narrowband signal based on a combination of at least two mapping schemes; estimating a high-band excitation signal based on the reconstructed narrowband signal; generating a high-band signal based on the estimated high-band spectrum parameter and the estimated high-band excitation signal; and generating a wideband signal by synthesizing the reconstructed narrowband signal with the high-band signal.
    Type: Application
    Filed: November 3, 2014
    Publication date: September 22, 2016
    Applicants: SAMSUNG ELECTRONICS CO., LTD., INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY ERICA CAMPUS
    Inventors: Ki-hyun CHOO, Sang-won KANG, Ho-sang SUNG, Eun-mi OH, Jong-geun JEON, Yaxing LI
  • Publication number: 20160222031
    Abstract: The present invention relates to an epidithiodioxopiperazine derivative represented by the following Chemical Formula 1 or its reduced derivative; a method for preparing a compound represented by Chemical Formula 1 having improved intracellular permeability and mimicking the activity of 2-Cys-Prx in its reduced form in the cells; a pharmaceutical composition for preventing or treating vascular diseases comprising an epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient; a drug delivery device for local administration including the pharmaceutical composition; and a pharmaceutical composition for inhibiting melanoma metastasis comprising the epidithiodioxopiperazine compound or its derivatives or pharmaceutically acceptable salts thereof as an active ingredient.
    Type: Application
    Filed: May 23, 2014
    Publication date: August 4, 2016
    Applicant: EWHA University-Industry Collaboration Foundation
    Inventors: Sang Won KANG, Dong Hoon KANG, Doo Jae LEE
  • Publication number: 20160063767
    Abstract: According to an embodiment of the present disclosure, a method and an electronic device for providing a Virtual Reality (VR) service by the electronic device are provided. The method includes: determining whether the electronic device is connected with a Head-Mounted Device (HMD); if the electronic device is connected with the HMD, determining whether a user is wearing the HMD while the electronic device is connected with the HMD; and if the user is wearing the HMD while the electronic device is connected with the HMD, switching an operation mode of the electronic device to a first operation mode in which the electronic device provides the VR service to the user.
    Type: Application
    Filed: September 2, 2015
    Publication date: March 3, 2016
    Inventors: Jin-Goo LEE, Sang-Won KANG, Woo-Suk CHOI, Chi-Hyun CHO
  • Publication number: 20160042920
    Abstract: A plasma source includes a first electrode and a second electrode having respective surfaces, and an insulator that is between and in contact with the electrodes. The electrode surfaces and the insulator surface substantially define a plasma cavity. The insulator surface defines one or more grooves configured to prevent deposition of material in a contiguous form on the insulator surface. A method of generating a plasma includes introducing one or more gases into a plasma cavity defined by a first electrode, a surface of an insulator that is in contact with the first electrode, and a second electrode that faces the first electrode. The insulator surface defines one or more grooves where portions of the insulator surface are not exposed to a central region of the cavity. The method further includes providing RF energy across the first and second electrodes to generate the plasma within the cavity.
    Type: Application
    Filed: August 7, 2014
    Publication date: February 11, 2016
    Applicant: Applied Materials, Inc.
    Inventors: TAE CHO, Sang Won Kang, Dongqing Yang, Raymond W. Lu, Peter Hillman, Nicholas Celeste, Tien Fak Tan, Soonam Park, Dmitry Lubomirsky
  • Patent number: 9196795
    Abstract: Methods of epitaxy of gallium nitride, and other such related films, and light emitting diodes on patterned sapphire substrates, and other such related substrates, are described.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: November 24, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Jie Su, Tuoh-Bin Ng, Olga Kryliouk, Sang Won Kang, Jie Cui
  • Patent number: 9166098
    Abstract: There is provided a nitride semiconductor light emitting device including an active layer of a multi quantum well structure, the nitride semiconductor light emitting device including: a substrate; and a buffer layer, an n-type nitride semiconductor layer, an active layer and a p-type nitride semiconductor layer sequentially stacked on the substrate, wherein the active layer is formed of a multi quantum well structure where a plurality of barrier layers and a plurality of well layers are arranged alternately with each other, and at least one of the plurality of barrier layers includes a first barrier layer including a p-doped barrier layer doped with a p-dopant and an undoped barrier layer.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: October 20, 2015
    Assignees: Samsung Electronics Co., Ltd., Gwangju Institute of Science and Technology
    Inventors: Sang Won Kang, Seong Ju Park, Min Ki Kwon, Sang Jun Lee, Joo Young Cho, Yong Chun Kim, Sang Heon Han, Dong Ju Lee, Jeong Tak Oh, Je Won Kim
  • Patent number: 9102942
    Abstract: The present invention relates to a pharmaceutical composition for preventing or treating diseases related to abnormal proliferation of cells, comprising a cytoplasmic heat shock protein (Hsp)60 kDa inhibitor as an active ingredient, and to a screening method and a kit using the composition. According to the present invention, substances which inhibit expression of cytoplasmic Hsp 60 genes or inhibit activity of cytoplasmic Hsp 60 or inhibit binding between cytoplasmic Hsp 60 and IKK protein prevent interaction between cytoplasmic Hsp 60 and IKK complexes to make NF-?B path inactive, and thus induce apoptosis. Therefore, the substances can be valuably used in preventing or treating diseases related to abnormal proliferation of cells, such as cancer, inflammatory diseases or hyperproliferative vascular diseases.
    Type: Grant
    Filed: February 7, 2011
    Date of Patent: August 11, 2015
    Assignee: Ewha University—Industry Collaboration Foundation
    Inventors: Sang Won Kang, Soo Young Lee
  • Publication number: 20140367696
    Abstract: Methods of epitaxy of gallium nitride, and other such related films, and light emitting diodes on patterned sapphire substrates, and other such related substrates, are described.
    Type: Application
    Filed: June 25, 2014
    Publication date: December 18, 2014
    Inventors: Jie Su, Tuoh-Bin Ng, Olga Kryliouk, Sang Won Kang, Jie Cui