Patents by Inventor Sascha Bleidistel

Sascha Bleidistel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8811568
    Abstract: The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°.
    Type: Grant
    Filed: November 13, 2013
    Date of Patent: August 19, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Manfred Maul
  • Publication number: 20140204356
    Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.
    Type: Application
    Filed: January 17, 2014
    Publication date: July 24, 2014
    Inventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
  • Patent number: 8786826
    Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the ac-tuators is arranged in a node of at least one natural vibration mode of the optical element.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: July 22, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Ulrich Schoenhoff, Juergen Fischer
  • Patent number: 8773638
    Abstract: A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
    Type: Grant
    Filed: March 19, 2010
    Date of Patent: July 8, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Aurelian Dodoc, Sascha Bleidistel, Olaf Conradi, Arif Kazi
  • Patent number: 8767176
    Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.
    Type: Grant
    Filed: March 21, 2011
    Date of Patent: July 1, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber
  • Patent number: 8760744
    Abstract: The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°.
    Type: Grant
    Filed: September 23, 2009
    Date of Patent: June 24, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Manfred Maul
  • Publication number: 20140078567
    Abstract: The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°.
    Type: Application
    Filed: November 13, 2013
    Publication date: March 20, 2014
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Manfred Maul
  • Patent number: 8614843
    Abstract: The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°.
    Type: Grant
    Filed: September 23, 2009
    Date of Patent: December 24, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Manfred Maul
  • Publication number: 20130182264
    Abstract: A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.
    Type: Application
    Filed: March 7, 2013
    Publication date: July 18, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Jochen Hetzler, Sascha Bleidistel, Toralf Gruner, Joachim Hartjes
  • Publication number: 20120320353
    Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
    Type: Application
    Filed: August 20, 2012
    Publication date: December 20, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Sascha Bleidistel, Bernhard Geuppert
  • Patent number: 8319944
    Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: November 27, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
  • Patent number: 8269948
    Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: September 18, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Bernhard Geuppert
  • Publication number: 20120218536
    Abstract: A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.
    Type: Application
    Filed: March 19, 2012
    Publication date: August 30, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Sascha Bleidistel, Toralf Gruner, Christoph Zaczek, Ralf Mueller
  • Patent number: 8212991
    Abstract: An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: July 3, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Aurelian Dodoc, Albrecht Ehrmann, Sascha Bleidistel
  • Publication number: 20120069310
    Abstract: The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of the optical element. The optical correction arrangement also includes a mechanism for dissipating the thermal energy introduced into the optical element by the at least one irradiation mechanism. The disclosure furthermore relates to a projection exposure apparatus for semiconductor lithography including an optical correction arrangement according to the disclosure.
    Type: Application
    Filed: November 4, 2011
    Publication date: March 22, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Sascha Bleidistel, Olaf Conradi, Arif Kazi
  • Publication number: 20120026479
    Abstract: There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.
    Type: Application
    Filed: September 9, 2011
    Publication date: February 2, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Stefan Hembacher, Bernhard Gellrich, Jens Kugler, Sascha Bleidistel
  • Patent number: 8027023
    Abstract: There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.
    Type: Grant
    Filed: November 19, 2007
    Date of Patent: September 27, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Hembacher, Bernhard Gellrich, Jens Kugler, Sascha Bleidistel
  • Publication number: 20110194089
    Abstract: An optical system has an aperture device having a multiplicity of aperture elements for the delimitation of the cross section of a ray bundle running through the optical system. The aperture device has a first aperture element, which is pivotable about a first rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a first aperture opening delimited by a first aperture edge. The aperture device also has at least one second aperture element, which is pivotable about a second rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a second aperture opening delimited by a second aperture edge. The second aperture opening is smaller than the first aperture opening. The aperture elements pivoted into the engagement position form an effective aperture opening.
    Type: Application
    Filed: February 4, 2011
    Publication date: August 11, 2011
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Benjamin Sigel, Sascha Bleidistel
  • Patent number: 7990622
    Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
    Type: Grant
    Filed: October 1, 2010
    Date of Patent: August 2, 2011
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
  • Publication number: 20110181852
    Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.
    Type: Application
    Filed: March 21, 2011
    Publication date: July 28, 2011
    Applicant: CARL ZEISS SMT GmbH
    Inventors: Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber