Patents by Inventor Sascha Bleidistel
Sascha Bleidistel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110019169Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: ApplicationFiled: October 1, 2010Publication date: January 27, 2011Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Boris Bittner, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati
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Publication number: 20100290024Abstract: The invention relates to a method-for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: ApplicationFiled: July 14, 2010Publication date: November 18, 2010Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Patent number: 7830611Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: GrantFiled: January 9, 2008Date of Patent: November 9, 2010Assignee: Carl Zeiss SMT AGInventors: Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati, Boris Bittner
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Publication number: 20100265478Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: ApplicationFiled: June 28, 2010Publication date: October 21, 2010Applicant: CARL ZEISS SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Bärbel Schwaer, Olaf Rogalsky, Arif Kazi
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Publication number: 20100231883Abstract: A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.Type: ApplicationFiled: March 19, 2010Publication date: September 16, 2010Applicant: CARL ZEISS SMT AGInventors: Aurelian Dodoc, Sascha Bleidistel, Olaf Conradi, Arif Kazi
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Patent number: 7782440Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: GrantFiled: November 17, 2005Date of Patent: August 24, 2010Assignee: Carl Zeiss SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
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Patent number: 7777963Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: GrantFiled: May 24, 2006Date of Patent: August 17, 2010Assignee: Carl Zeiss SMT AGInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Publication number: 20100128367Abstract: A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.Type: ApplicationFiled: March 13, 2009Publication date: May 27, 2010Applicant: CARL ZEISS SMT AGInventors: Mariella Beckenbach, Klaus Rief, Andreas Bertele, Benjamin Sigel, Sascha Bleidistel, Wolfgang Hummel, Andreas Frommeyer, Toralf Gruner, Jochen Schwaer, Baerbel Schwaer, Thomas Schletterer, Artur Hoegele, Armin Schoeppach
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Publication number: 20100073655Abstract: An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.Type: ApplicationFiled: December 1, 2009Publication date: March 25, 2010Applicant: CARL ZEISS SMT AGInventors: Aurelian Dodoc, Albrecht Ehrmann, Sascha Bleidistel
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Publication number: 20100060988Abstract: The disclosure relates to a correction light device for the irradiation of optical elements of an optical arrangement, in particular a lens, such a microlithography lens having a correction light, which include at least one correction light source and at least one mirror arrangement that deflects the light from the correction light source in the beam path to the optical element such that at least part of at least one surface of at least one optical element of the optical arrangement are irradiated in a locally and/or temporally variable fashion. The correction light strikes the surface of the optical element at a flat angle such that the obtuse angle between the optical axis of the optical arrangement at the location of the optical element and the correction light beam is less than or equal to 105°.Type: ApplicationFiled: September 23, 2009Publication date: March 11, 2010Applicant: CARL ZEISS SMT AGInventors: Sascha Bleidistel, Manfred Maul
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Publication number: 20090225297Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.Type: ApplicationFiled: February 23, 2009Publication date: September 10, 2009Applicant: CARL ZEISS SMT AGInventors: Sascha Bleidistel, Bernhard Geuppert
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Publication number: 20080309904Abstract: An optical system of a microlithographic projection exposure apparatus contains a module, which can be fitted in the optical system and removed from it as a unit. The module contains a cavity which can be completely filled with a liquid and hermetically sealed, and a concavely curved optical surface which bounds the cavity at the top during operation of the projection exposure apparatus. This makes it possible to fill the module outside the optical system. The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.Type: ApplicationFiled: August 8, 2008Publication date: December 18, 2008Inventors: Aurelian Dodoc, Albrecht Ehrmann, Sascha Bleidistel
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Publication number: 20080310029Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.Type: ApplicationFiled: May 24, 2006Publication date: December 18, 2008Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Heiko Feldmann, Gerald Richter, Sascha Bleidistel, Andreas Frommeyer, Toralf Gruner, Wolfgang Hummel
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Publication number: 20080239503Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.Type: ApplicationFiled: January 9, 2008Publication date: October 2, 2008Applicant: CARL ZEISS SMT AGInventors: Olaf Conradi, Sascha Bleidistel, Markus Hauf, Wolfgang Hummel, Arif Kazi, Baerbel Schwaer, Jochen Weber, Hubert Holderer, Payam Tayebati, Boris Bittner
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Publication number: 20080186467Abstract: There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.Type: ApplicationFiled: November 19, 2007Publication date: August 7, 2008Applicant: Carl Zeiss SMT AGInventors: Stefan Hembacher, Bernhard Gellrich, Jens Kugler, Sascha Bleidistel
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Publication number: 20080170217Abstract: An optical system of a microlithographic projection exposure apparatus (10) contains a module (50; 150), which can be fitted in the optical system and removed from it as a unit. The module contains a cavity (42; 142) which can be completely filled with a liquid (34; 134) and hermetically sealed, and a concavely curved optical surface (S) which bounds the cavity at the top during operation of the projection exposure apparatus (10). This makes it possible to fill the module outside the optical system, The module can be tilted there so that no air bubble, which prevents complete filling, can form below the concavely curved optical surface.Type: ApplicationFiled: May 13, 2006Publication date: July 17, 2008Applicant: CARL ZEISS SMT AGInventors: Aurelian Dodoc, Albrecht Ehrmann, Sascha Bleidistel
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Publication number: 20080106711Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: ApplicationFiled: November 17, 2005Publication date: May 8, 2008Applicant: CARL ZEISS SMT AGInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
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Publication number: 20060018045Abstract: A mirror arrangement for reflecting electromagnetic radiation, the mirror arrangement comprising: a substrate having a mirror side facing towards the radiation to be reflected and a back side opposite to the mirror side, wherein a mirror surface is provided on the mirror side and wherein an actuator arrangement for generating a deformation of the substrate is mounted on the back side of the substrate, wherein the actuator arrangement comprises at least one active layer having an areal adhering contact with a portion of the back side of the substrate; wherein the at least one active layer has a first layer thickness at a first location within the portion and a second layer thickness at a second location disposed at a distance from the first location within the portion, wherein the first layer thickness differs from the second layer thickness by more than 1%; and wherein the at least one active layer comprises at least one of a ferroelectric material, a piezoelectric material, a magnetostrictive material, an elType: ApplicationFiled: October 25, 2004Publication date: January 26, 2006Applicant: Carl Zeiss SMT AGInventors: Timo Moeller, Martin Ross-Messemer, Frank Hoeller, Sascha Bleidistel