Abstract: There are provided a substrate holder that holds a plurality of substrates, a reaction tube that houses the substrate holder, a gas supplier that has a plurality of supply holes corresponding one-to-one to the plurality of substrates and supplies gas to the plurality of substrates, and a plurality of plates provided in substantially parallel to the plurality of substrates, in which at least part of each of the plurality of plates is disposed between the gas supplier and the substrate holder.

Abstract: A negative-balanced isolated pelvic perfusion method, in which a drug is administered into the closed pelvis while keeping the volume of suction from the vein larger than that of injection into the artery, does not require allogeneic blood transfusion. A perfusion device is for recovering a liquid containing a drug and/or blood from a tube connecting to the inferior vena cava and for injecting the liquid obtained into a tube connecting to the artery, provided with a unit for closing the inside of the pelvis by including a unit for blocking the artery from the heart to the pelvis, a unit for blocking the inferior vena cava from the pelvis to the heart, and a unit for blocking a blood flow from the pelvis to the lower limbs. The perfusion device is provided with a pelvic perfusion unit equipped with a reservoir, an autotransfusion unit, and a dialysis unit.

Abstract: There is provided a technique capable of reducing a tilt of a nozzle. According to one aspect of the technique, there is provided a substrate processing apparatus including: a process vessel constituted by a reaction tube and a manifold supporting the reaction tube from thereunder and in which a substrate is processed; a nozzle through which a process gas is supplied to the substrate; a metal adapter configured to hold the nozzle vertically in the process vessel; a support base arranged below the metal adapter and fixed to the manifold; and a fixing bolt engaging with the support base and screwed into the metal adapter.

Abstract: A substrate processing apparatus includes a reaction tube defining a substrate processing chamber; a gas inlet provided at a lower portion of the reaction tube to supply a process gas; a first buffer unit for temporarily retaining the process gas, the first buffer unit at a first side of an inner surface of the reaction tube and includes a plurality of gas supply holes; and a gas outlet provided at a second side of the inner surface of the reaction tube opposite to the first side, to exhaust the process gas from the process chamber. The gas supply holes are provided from an upper end portion of the first buffer unit to a lower end portion of the first buffer unit, and the process gas is supplied through the plurality of gas supply holes into the process chamber, passes through the process chamber, and exhausted through the gas outlet.

Abstract: A guidewire has a distal-most end portion that retains its desired shape. The guidewire includes a first brazing member joining a distal end of a core shaft to a distal end of an outer coil, and a second brazing member provided adjacent to and on a proximal side of the first brazing member. The guidewire also includes an outer coil surrounding an outer periphery of the core shaft, and an inner coil provided between the outer coil and the core shaft. The second brazing member is provided between the outer coil and the inner coil, but is not provided between the inner coil and the core shaft. The melting point of the first brazing member is higher than the melting point of the second brazing member.

Abstract: A gas supply structure capable of suppressing damage to a structure provided in a reaction tube and made of the non-metallic material such as quartz includes: a gas supply nozzle through which a process gas is supplied into a process chamber in a reaction tube via an opening; a first seal provided so as to cover at least a gap between the opening of the reaction tube and the gas supply nozzle; a holder connected to the gas supply nozzle so as to provide a gap between the gas supply nozzle and the holder; an adapter connected to the holder; a first fixing structure configured to hold the holder and the adapter; and a second seal provided so as to cover at least a gap between the gas supply nozzle and the adapter and maintain a space between the gas supply nozzle and the adapter in an airtight state.

Abstract: Described herein is a technique capable of suppressing an air atmosphere from entering a process chamber. According to one aspect thereof, there is provided a substrate processing apparatus including: a substrate support configured to support a substrate; a process chamber having a first space where the substrate is processed; an exhaust part configured to exhaust atmosphere of the first space; and a gas supply system including: a gas introduction pipe configured to supply gas to the first space; a process gas transfer pipe configured to communicate with the gas introduction pipe; a joint part configured to cover an adjacent part provided adjacent to the gas introduction pipe and the process gas transfer pipe in a second space outside the first space, and configured to fix the gas introduction pipe with the process gas transfer pipe; and a pressure adjustment part provided between the adjacent part and the second space.

Abstract: Described herein is a technique capable of reducing a difference in processing results between substrates. According to one aspect of the technique, there is provided a reaction tube having a process chamber; a gas introduction portion provided at a lower end; a first supplier provided along a side surface to face a substrate processing region; and a preheating portion provided lower than the substrate processing region, the preheating portion including: a first preheating portion extending in a direction from the gas introduction portion toward a ceiling; and a second preheating portion extending in a direction perpendicular to the above direction, wherein the preheating portion connects the gas introduction portion with the first supplier by combining the first preheating portion and the second preheating portion.

Abstract: A negative-balanced isolated pelvic perfusion method, in which a drug is administered into the closed pelvis while keeping the volume of suction from the vein larger than that of injection into the artery, does not require allogeneic blood transfusion. A perfusion device is for recovering a liquid containing a drug and/or blood from a tube connecting to the inferior vena cava and for injecting the liquid obtained into a tube connecting to the artery, provided with a unit for closing the inside of the pelvis by including a unit for blocking the artery from the heart to the pelvis, a unit for blocking the inferior vena cava from the pelvis to the heart, and a unit for blocking a blood flow from the pelvis to the lower limbs. The perfusion device is provided with a pelvic perfusion unit equipped with a reservoir, an autotransfusion unit, and a dialysis unit.

Abstract: Described herein is a technique capable of suppressing an air atmosphere from entering a process chamber. According to one aspect thereof, there is provided a substrate processing apparatus including: a substrate support configured to support a substrate; a process chamber having a first space where the substrate is processed; an exhaust part configured to exhaust atmosphere of the first space; and a gas supply system including: a gas introduction pipe configured to supply gas to the first space; a process gas transfer pipe configured to communicate with the gas introduction pipe; a joint part configured to cover an adjacent part provided adjacent to the gas introduction pipe and the process gas transfer pipe in a second space outside the first space, and configured to fix the gas introduction pipe with the process gas transfer pipe; and a pressure adjustment part provided between the adjacent part and the second space.

Abstract: A substrate treatment apparatus includes: a reaction tube including a substrate treatment region in which a substrate is treated; and a furnace opening member disposed in a lower portion of the reaction tube. The reaction tube includes a flange formed to protrude outward in the lower portion of the reaction tube, and an extension portion formed to extend downward from a lower end of the flange, the extension portion being formed to have a thickness larger than a thickness of the reaction tube at a position corresponding to the substrate treatment region, and being configured to cover an inner circumferential surface of the furnace opening member. An inner surface of the extension portion protrudes more inward than an inner surface of the reaction tube at the position corresponding to the substrate treatment region.