Adiabatic plate for substrate processing appratus

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Description

FIG. 1 is a front, top and right side perspective view of an adiabatic plate for substrate processing appratus showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a bottom plan view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a right side elevational view thereof; and,

FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2.

Claims

The ornamental design for an adiabatic plate for substrate processing appratus, as shown and described.

Referenced Cited
U.S. Patent Documents
D547147 July 24, 2007 Tran
D615937 May 18, 2010 Sato
D654883 February 28, 2012 Honma
D654884 February 28, 2012 Honma
D655257 March 6, 2012 Honma
D655259 March 6, 2012 Honma
D916037 April 13, 2021 Okajima
D924823 July 13, 2021 Saiki et al.
20040256284 December 23, 2004 Nanjo
Patent History
Patent number: D981972
Type: Grant
Filed: Sep 21, 2021
Date of Patent: Mar 28, 2023
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Shinya Morita (Toyama), Seiyo Nakashima (Toyama), Satoru Murata (Toyama)
Primary Examiner: Shawn T Gingrich
Assistant Examiner: Caleb M Baker
Application Number: 29/808,582