Adiabatic plate for substrate processing appratus
Latest KOKUSAI ELECTRIC CORPORATION Patents:
- METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, GAS SUPPLY METHOD, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
- COATING METHOD, PROCESSING APPARATUS, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM, SUBSTRATE PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium
- Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
- SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM
Description
Claims
The ornamental design for an adiabatic plate for substrate processing appratus, as shown and described.
Referenced Cited
Patent History
Patent number: D981972
Type: Grant
Filed: Sep 21, 2021
Date of Patent: Mar 28, 2023
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Shinya Morita (Toyama), Seiyo Nakashima (Toyama), Satoru Murata (Toyama)
Primary Examiner: Shawn T Gingrich
Assistant Examiner: Caleb M Baker
Application Number: 29/808,582
Type: Grant
Filed: Sep 21, 2021
Date of Patent: Mar 28, 2023
Assignee: KOKUSAI ELECTRIC CORPORATION (Tokyo)
Inventors: Shinya Morita (Toyama), Seiyo Nakashima (Toyama), Satoru Murata (Toyama)
Primary Examiner: Shawn T Gingrich
Assistant Examiner: Caleb M Baker
Application Number: 29/808,582
Classifications
Current U.S. Class:
Semiconductor, Transistor Or Integrated Circuit (24) (D13/182)