Abstract: A detection system and associated detection method for detecting an arcing phenomenon in a chamber are provided. In the chamber, a plurality of semiconductor chips are manufactured on at least one wafer. The detection system includes at least one optical sensor and a control circuit. Being configured for detecting the intensity of the light signal in the chamber, the at least one optical sensor is placed in the chamber. Accordingly, the optical sensor generates a plurality of intensity detected results, wherein the light signal continuously lasts in the chamber while the plurality of semiconductor chips are manufactured. The control circuit is in communication with the optical sensor. Then, the control circuit identifies whether the arcing phenomenon occurred according to the plurality of intensity detected results.

Abstract: A memory device comprises a stack of linking elements including a first group of linking elements and a second group of linking elements different than the first group of linking elements. Interlayer connectors in a first plurality of interlayer connectors are connected to respective linking elements in the first group of linking elements. Interlayer connectors in a second plurality of interlayer connectors are connected to linking elements in the second group of linking elements. Patterned conductor lines in a first layer of patterned conductor lines are coupled to respective interlayer connectors in the first plurality of interlayer connectors. Patterned conductor lines in a second layer of patterned conductor lines disposed higher than the first layer of patterned conductor lines are coupled to respective interlayer connectors in the second plurality of interlayer connectors.

Abstract: A semiconductor device for electric discharge protection is disclosed. In one aspect, the semiconductor device includes a substrate having a p-type doping. The semiconductor device includes a first well and a second well having an n-type doping and arranged spaced apart within a surface layer of the substrate, and a third well having a p-type doping and arranged in the surface layer of the substrate between the first well and the second well. The semiconductor device further includes an emitter region and a base contact region having a p-type doping and arranged within a surface layer of the first well, and a collector region having a p-type doping. The collector region is arranged at least partly within a surface layer of the third well and such that it overlaps both of the first well and the second well. An integrated circuit including a semiconductor device is also provided.

Abstract: A semiconductor device for electric discharge protection is disclosed. In one aspect, the semiconductor device includes a substrate having a p-type doping. The semiconductor device includes a first well and a second well having an n-type doping and arranged spaced apart within a surface layer of the substrate, and a third well having a p-type doping and arranged in the surface layer of the substrate between the first well and the second well. The semiconductor device further includes an emitter region and a base contact region having a p-type doping and arranged within a surface layer of the first well, and a collector region having a p-type doping. The collector region is arranged at least partly within a surface layer of the third well and such that it overlaps both of the first well and the second well. An integrated circuit including a semiconductor device is also provided.

Abstract: A 3D stacking semiconductor device and a manufacturing method thereof are provided. The method includes using a set of N etch masks for creating O different numbers of removed layers in the conductive layers and the insulating layers for forming landing areas on the conductive layers in the contact region, each mask including mask and etch regions, N being an integer equal to or larger than 2, O being an integer larger than 2, 2N-1<O?2N; and removing a portion of the conductive layers and the insulating layers to create etched depths extending from a surface layer to the corresponding landing areas on the conductive layers; wherein the etched depths of corresponding etching steps are 1P, 2P and nP layers of the stacking structures, n being an integer equal to or larger than 3, and P being an integer equal to or larger than 1.

Abstract: A method for manufacturing a multi-layer structure is provided. The method includes following steps. First, a stack of alternate conductive layers and insulating layers is formed on a substrate, and the stack includes a multi-layer area and a contact area adjacent to the multi-layer area. Next, a plurality of first openings are formed in the contact area. Then, a conductive connecting structure is formed on the stack and into the first openings. Thereafter, the stack is patterned. The conductive connecting structure continuously extends on the contact area and into the first openings to maintain an electrical connection among the conductive layers while the stack is patterned.

Abstract: A memory structure is provided. The memory structure comprises M array regions and N contact regions. M is an integer ?2. N is an integer ?M. Each array region is coupled to at least one contact region. Each contact region comprises a stair structure and a plurality of contacts. The stair structure comprises alternately stacked conductive layers and insulating layers. Each contact is connected to one conductive layer of the stair structure. Two array regions which are adjacent to each other are spatially separated by two contact regions, which are coupled to the two array regions, respectively.

Abstract: A 3D stacking semiconductor device and a manufacturing method thereof are provided. The method includes using a set of N etch masks for creating O different numbers of removed layers in the conductive layers and the insulating layers for forming landing areas on the conductive layers in the contact region, each mask including mask and etch regions, N being an integer equal to or larger than 2, O being an integer larger than 2, 2N-1<O?2N; and removing a portion of the conductive layers and the insulating layers to create etched depths extending from a surface layer to the corresponding landing areas on the conductive layers; wherein the etched depths of corresponding etching steps are 1P, 2P and nP layers of the stacking structures, n being an integer equal to or larger than 3, and P being an integer equal to or larger than 1.

Abstract: A 3D semiconductor device is provided, including several memory layers vertically stacked on a substrate, an upper selection layer formed on the memory layers, a lower selection layer formed above the substrate, several strings formed vertically to the memory layers and the substrate, several bit lines parallel to each other and disposed above the substrate. The memory layers are parallel to each other, and the strings are electrically connected to the upper selection layer and the lower selection layer. The bit lines are positioned under the memory layers.

Abstract: A bumpless fan-out chip stacking structure includes a first die disposed on the substrate, a first dielectric layer conformally covering on the first die, a first RDL disposed on the first dielectric layer, a first via plug electrically connecting the first die to the first RDL, a first capping layer conformally covering on the first RDL, a second die attached on the first capping layer, a second dielectric layer conformally covering on the second die, a second RDL disposed on the second dielectric layer, a second via plug electrically connecting the second die to the second RDL, a second capping layer conformally covering on the second RDL, a patterned conductive layer disposed on the second capping layer and an interlayer connection structure electrically connecting the patterned conductive layer to the first RDL and the second RDL respectively.

Abstract: A memory device is disclosed. The memory device includes a memory array. The memory array includes a main memory block and an extra memory block. The memory array includes a main bit line and an extra bit line. A ratio of a quantity of the extra memory block to a quantity of the main memory block is a block quantity ratio A. A ratio of a quantity of the extra bit line to a quantity of the main bit line is a bit line quantity ratio B. The block quantity ratio A is larger than the bit line quantity ratio B.

Abstract: A memory device is disclosed. The memory device includes a memory array. The memory array includes a main memory block and an extra memory block. The memory array includes a main bit line and an extra bit line. A ratio of a quantity of the extra memory block to a quantity of the main memory block is a block quantity ratio A. A ratio of a quantity of the extra bit line to a quantity of the main bit line is a bit line quantity ratio B. The block quantity ratio A is larger than the bit line quantity ratio B.

Abstract: A memory structure is provided. The memory structure includes a substrate, an array portion disposed on the substrate, a periphery portion disposed on the array portion, and a plurality of contacts connecting the array portion to the periphery portion.

Abstract: A semiconductor structure and a manufacturing method of the same are provided. The semiconductor structure includes a stack structure, an etching stop layer, and a conductive structure. The stack structure includes a plurality of conductive layers and a plurality of insulating layers stacked interlacedly. The etching stop layer is formed on a sidewall of the stack structure. An energy gap of the etching stop layer is larger than 6 eV. The conductive structure is electrically connected to at least one of the conductive layers.

Abstract: A method for manufacturing a multi-layer structure is provided. The method includes following steps. First, a stack of alternate conductive layers and insulating layers is formed on a substrate, and the stack includes a multi-layer area and a contact area adjacent to the multi-layer area. Next, a plurality of first openings are formed in the contact area. Then, a conductive connecting structure is formed on the stack and into the first openings. Thereafter, the stack is patterned. The conductive connecting structure continuously extends on the contact area and into the first openings to maintain an electrical connection among the conductive layers while the stack is patterned.

Abstract: A connector structure for electrically contacting with a conductive layer disposed on a substrate is provided. The connector structure comprises a conductive connecting element disposed on the substrate. The conductive connecting element comprises a connecting part and an extending part. The connecting part has a bottom portion electrically contacting with the conductive layer. The extending part laterally extends outwards from a top portion of the connecting part, and the extending part and the connecting part are respectively formed of different materials.

Abstract: A three-dimensional semiconductor device includes a multi-layered stack structure with memory layers parallel to each other and separated by interlayer insulation layers; and memory cell structures formed at each memory layer by arranging in a multi-row and multi-column array. One memory cell structure includes a memory material layer; a selector layer formed at an outer surface of the memory material layer and connected to the memory material layer; a first electrode layer formed at an outer surface of the selector layer and electrically connected to the selector layer; and a second electrode layer formed at an inner surface of the memory material layer and connected to the memory material layer, wherein the second electrode layer penetrates the multi-layered stack structure. Each memory layer includes a conductive layer electrically connecting the first electrode layer and the conductive layer electrically connects the adjacent memory cell structures.

Abstract: A memory repairing method and a memory device applying the same are disclosed, wherein the method comprises steps as follows: A memory device comprising at least one page having a plurality of cell strings is firstly provided. A regular data pattern is then provided to block at least two of the plurality of cell strings, and the blocked cells strings are marked as inaccessible.

Abstract: A 3D semiconductor device is provided, including several memory layers vertically stacked on a substrate, an upper selection layer formed on the memory layers, a lower selection layer formed above the substrate, several strings formed vertically to the memory layers and the substrate, several bit lines parallel to each other and disposed above the substrate. The memory layers are parallel to each other, and the strings are electrically connected to the upper selection layer and the lower selection layer. The bit lines are positioned under the memory layers.

Abstract: A memory structure includes N array regions and N page buffers coupled to the N array regions, respectively. N is an integer?2. Each of the N array regions includes a 3D array of a plurality of memory cells. The memory cells have a lateral distance d between two adjacent memory cells on a horizontal cell plane of the 3D array. Each of the N array regions further includes a plurality of conductive lines. The conductive lines are disposed over and coupled to the 3D array. The conductive lines have a pitch p, and p/d=? to ½. The N array regions and the N page buffers are arranged on one line along an extension direction of the conductive lines. M array regions of the N array regions are configured to operate simultaneously. M is an integer. M/N=½ or 1.