Abstract: Provided is a honeycomb structure that is divided by a porous partition wall 3, as well as that is formed of a plurality of cells 5 acting as a through channel of a fluid. An insertion hole 9 in which a sensor can be inserted is formed in an end face of the honeycomb structure, and a breakage prevention means 17 is provided on an inner circumference or in the proximity of the insertion hole. According to this honeycomb structure, it is possible to provide a honeycomb structure or a honeycomb filter in which a temperature, an oxygen concentration and the like of the honeycomb structure can be directly measured; a temperature control of the honeycomb structure, being a base member can be easily made, and various sensors in accordance with applications of OBD measurement, measurement of an oxygen concentration, an NOx concentration and the like can be attached; and further, canning is easy to be conducted, and the durability of various attached sensors can be improved.

Abstract: A semiconductor apparatus according to the present invention with a semiconductor element implemented on an insulated substrate comprises: a substrate front surface electrode formed on a front surface side of the insulated substrate and connected with an element electrode of the semiconductor element; a substrate back surface electrode formed on a back surface side of the insulated substrate and electrically connected with the substrate front surface electrode; and a plurality of connection electrodes, extending in a thickness direction of the insulated substrate from one side to the other side of a front surface and a back surface thereof, for electrically connecting the substrate front surface electrode with the substrate back surface electrode, where the substrate front surface electrode or the substrate back surface electrode is formed to have a plane pattern separated for each of the plurality of connection electrodes.

Abstract: A light-emitting device includes: a substrate; a light-emitting section provided on an upper surface of the substrate, the light-emitting section including an LED chip and a sealing resin containing fluorescent material covering the LED chip; and a silicon oxide insulating film provided between the substrate and the light-emitting section, the silicon oxide insulating film being formed directly on an upper surface of the substrate or an alumina insulating film, the sealing resin containing fluorescent material formed directly on an upper surface of the silicon oxide insulating film so as to cover the LED chip. Thus, this invention provides the light-emitting device capable of making the sealing resin difficult to be separated from the substrate and a method for manufacturing the light-emitting device.

Abstract: A mask pattern verifying method include obtaining first information about a hot spot from design data of a mask pattern, obtaining second information about the mask pattern actually formed on a photo mask, and determining a measuring spot of the mask pattern actually formed on the photo mask, based on the first and second information.

Abstract: A stereoscopic imaging optical system is provided, which forms two optical images having no mutual interference, side-by-side, on a rectangle image sensor, and which is applicable to an interchangeable-lens type digital camera system. The stereoscopic imaging optical system includes a first lens system and a second lens system which are arranged in parallel, and a field diaphragm arranged on the object side relative to these lens systems. The first lens system and the second lens system form optical images of an object on a first imaging area and a second imaging area, respectively. The field diaphragm has an aperture arranged in front of the first lens system and the second lens system. The field diaphragm blocks only a portion of a light beam incident on the first lens system, which portion enters the second imaging area, and blocks only a portion of a light beam incident on the second lens system, which portion enters the first imaging area.

Abstract: A zoom lens system comprising a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit having negative optical power, and a fifth lens unit having positive optical power, wherein the third lens unit includes at least one lens element having positive optical power and at least one lens element having negative optical power, at least the first to third lens units are moved along an optical axis in zooming so that air spaces between the respective lens units vary, thereby performing magnification change, a lens unit positioned on the image side relative to an aperture diaphragm is moved along the optical axis in focusing, and the conditions: 8.1<fG1/Ir<10.4 and Z=fT/fW?9.

Abstract: A zoom lens system comprising a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit having negative optical power, and a fifth lens unit having positive optical power, wherein the third lens unit includes at least one lens element having positive optical power and at least one lens element having negative optical power, at least the first to third lens units are moved along an optical axis in zooming so that air spaces between the respective lens units vary, thereby performing magnification change, a lens unit positioned on the image side relative to an aperture diaphragm is moved along the optical axis in focusing, and the conditions: 4.0<D/Ir<5.3 and Z=fT/fW?9.

Abstract: A method for manufacturing an electronic component embedded connector includes a first step for fixing a terminal to a fixing means; a second step for fixing electronic components to the fixing means; a third step for cutting connecting sections of the terminal fixed to the fixing means; a fourth step for connecting the electronic components fixed to the fixing means, to the terminal in which the connecting sections are cut off; and a fifth step for covering a section of the terminal other than terminal sections, and the electronic components by an insulating cover.

Abstract: An object is to provide: a zoom lens system that has a reduced overall length, a high resolution, and a variable magnification ratio as high as 9 or greater and that is satisfactorily adaptable for wide-angle image taking where the view angle at a wide-angle limit is 70° or greater; an imaging device employing this zoom lens system; and a thin and compact camera. The zoom lens system has a plurality of lens units each consisting of at least one lens element, and, in order from the object side to the image side, comprises a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit and a fifth lens unit. In zooming from a wide-angle limit to a telephoto limit at the time of image taking, at least the first lens unit and the second lens unit move in an optical axis direction, while the fourth lens unit and the fifth lens unit are each consists of one lens element.

Abstract: An object is to provide: a zoom lens system that has a reduced overall length, a high resolution, and a variable magnification ratio as high as 9 or greater and that is satisfactorily adaptable for wide-angle image taking where the view angle at a wide-angle limit is 70° or greater; an imaging device employing this zoom lens system; and a thin and compact camera. The zoom lens system has a plurality of lens units each consisting of at least one lens element, and, in order from the object side to the image side, comprises a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit and a fifth lens unit. In zooming from a wide-angle limit to a telephoto limit at the time of image taking, at least the first lens unit and the second lens unit move in an optical axis direction, while the fourth lens unit and the fifth lens unit are each consists of one lens element.

Abstract: A photomask is washed and at least one physical amount of transmittance and phase difference of the photomask, dimension of a pattern, height of the pattern and a sidewall shape of the pattern is measured. After this, the two-dimensional shape of a borderline pattern previously determined for the photomask is measured. Lithography tolerance is derived by performing a lithography simulation for the measured two-dimensional shape by use of the measured physical amount. Then, whether the photomask can be used or not is determined based on the derived lithography tolerance.

Abstract: The method of cleaning a mask of an embodiment includes irradiating a mask film having a mask pattern on a substrate with an energy radiation and heightening a temperature of the mask film than that of the substrate.

Abstract: A zoom lens system, in order from an object side to an image side, comprising a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, and subsequent lens units including a fourth lens unit having optical power, wherein any one of the first lens unit, the second lens unit, the third lens unit, and the subsequent lens units includes a lens element having a reflecting surface that bends a light beam incident from an object, wherein in zooming from a wide-angle limit to a telephoto limit at the time of image taking, the first lens unit and the third lens unit do not move along an optical axis, and wherein the condition is satisfied: 1.42<nd4ave<1.58 (nd4ave is an average of refractive indices to the d-line of the lens elements constituting the fourth lens unit), an imaging device and a camera are provided.

Abstract: A mask defect inspecting method comprises preparing detection sensitivities of defects on a plurality of portions of a mask pattern on a photomask, the detection sensitivities being determined according to influences of the defects upon a wafer, and inspecting defects on the plurality of portions based on the detection sensitivities.

Abstract: A zoom lens system, in order from an object side to an image side, comprising a first lens unit having negative optical power, a second lens unit having positive optical power, and at least one subsequent lens unit having optical power, wherein in zooming from a wide-angle limit to a telephoto limit, the lens units are moved along an optical axis such that an air space between at least any two lens units among the lens units should vary, so that variable magnification is achieved, wherein the first lens unit includes a lens element having a reflecting surface for bending a light beam incident from the object, and wherein the condition is satisfied: 0.20<|fG1|/fT<0.52 (fT/fW?4.0, fG1 is a composite focal length of the first lens unit, and each of fT and fW is a focal length of the entire system at a telephoto limit or a wide-angle limit), an imaging device and a camera are provided.

Abstract: In a trench shape measuring apparatus, a substrate having a trench pattern extending in a predetermined trench direction on a measurement area is held by a holding part. A light emission part applies illumination light to the measurement area and reflected light of the illumination light from the measurement area is spectrally dispersed by a diffraction grating of a spectroscope, to acquire a measured spectral reflectance. Since the diffraction grating is arranged so that an angle formed between a direction on the substrate corresponding to a grating direction of the diffraction grating and the trench direction becomes 45 degrees, even if an oscillation direction of the reflected light from the substrate is limited by influence of the trench pattern, it is possible to accurately obtain a spectral reflectance of the measurement area without influence of polarization of the reflected light and obtain a depth of the trench pattern with accuracy.

Abstract: An object is to provide: a zoom lens system that has a reduced overall length, a high resolution, and a variable magnification ratio as high as 9 or greater and that is satisfactorily adaptable for wide-angle image taking where the view angle at a wide-angle limit is 70° or greater; an imaging device employing this zoom lens system; and a thin and compact camera. The zoom lens system has a plurality of lens units each consisting of at least one lens element, and, in order from the object side to the image side, comprises a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit and a fifth lens unit. In zooming from a wide-angle limit to a telephoto limit at the time of image taking, at least the first lens unit and the second lens unit move in an optical axis direction, while the fourth lens unit and the fifth lens unit are each consists of one lens element.

Abstract: An object is to provide: a zoom lens system that has a reduced overall length, a high resolution, and a variable magnification ratio as high as 9 or greater and that is satisfactorily adaptable for wide-angle image taking where the view angle at a wide-angle limit is 70° or greater; an imaging device employing this zoom lens system; and a thin and compact camera. The zoom lens system has a plurality of lens units each consisting of at least one lens element, and, in order from the object side to the image side, comprises a first lens unit having positive optical power, a second lens unit having negative optical power, a third lens unit having positive optical power, a fourth lens unit and a fifth lens unit. In zooming from a wide-angle limit to a telephoto limit at the time of image taking, at least the first lens unit and the second lens unit move in an optical axis direction, while the fourth lens unit and the fifth lens unit are each consists of one lens element.

Abstract: An image-taking lens unit includes: a variable magnification optical system for forming an optical image of an object with a variable magnification; and an image sensor for converting the optical image into an electrical signal. The image-taking lens unit changes the shape thereof between a photographing state and a non-photographing state. The variable magnification optical system has a plurality of lens groups for performing magnification variation by changing intervals therebetween and a reflective surface for bending an optical axis. At least one of the plurality of lens groups is a movable group that moves during magnification variation. The reflective surface is kept in fixed position during magnification variation or focusing. In transition from the photographing state to the non-photographing state, at least the reflective surface moves so that at least part of the movable group is stored into a space left after the movement of the reflective surface.

Abstract: A pattern evaluation method for evaluating a mask pattern includes generating desired wafer pattern data corresponding to the evaluation position of a mask pattern, generating mask pattern contour data based on an image of the mask pattern, and performing a lithography/simulation process based on the mask pattern contour data and generating predicted wafer pattern data when the mask pattern is transferred to a wafer. Further, it includes deriving positional offset between the mask pattern contour data and mask pattern data, correcting a positional error between the desired wafer pattern data and the predicted wafer pattern data based on the positional offset, and comparing the desired wafer pattern data with the predicted wafer pattern data with the positional error corrected.