Patents by Inventor Shivkumar Chiruvolu

Shivkumar Chiruvolu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8435477
    Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: May 7, 2013
    Assignee: NanoGram Corporation
    Inventors: Nobuyuki Kambe, Shivkumar Chiruvolu
  • Publication number: 20130105806
    Abstract: Silicon nanoparticle inks provide a basis for the formation of desirable materials. Specifically, composites have been formed in thin layers comprising silicon nanoparticles embedded in an amorphous silicon matrix, which can be formed at relatively low temperatures. The composite material can be heated to form a nanocrystalline material having crystals that are non-rod shaped. The nanocrystalline material can have desirable electrical conductive properties, and the materials can be formed with a high dopant level. Also, nanocrystalline silicon pellets can be formed from silicon nanoparticles deposited form an ink in which the pellets can be relatively dense although less dense than bulk silicon. The pellets can be formed from the application of pressure and heat to a silicon nanoparticle layer.
    Type: Application
    Filed: November 1, 2011
    Publication date: May 2, 2013
    Inventors: Guojun Liu, Shivkumar Chiruvolu, Weidong Li, Uma Srinivasan
  • Patent number: 8404771
    Abstract: Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: March 26, 2013
    Assignee: NanoGram Corporation
    Inventors: Hui Du, Shivkumar Chiruvolu, Ang-Ling Chu
  • Patent number: 8399878
    Abstract: Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silica particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: March 19, 2013
    Assignee: NanoGram Corporation
    Inventors: Henry Hieslmair, Shivkumar Chiruvolu, Hui Du
  • Publication number: 20120318168
    Abstract: Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silica particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
    Type: Application
    Filed: August 27, 2012
    Publication date: December 20, 2012
    Inventors: Henry Hieslmair, Shivkumar Chiruvolu, Hui Du
  • Patent number: 8314176
    Abstract: Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification.
    Type: Grant
    Filed: December 31, 2009
    Date of Patent: November 20, 2012
    Assignee: NanoGram Corporation
    Inventors: Hui Du, Shivkumar Chiruvolu, Ang-Ling Chu
  • Publication number: 20120289637
    Abstract: Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification.
    Type: Application
    Filed: July 26, 2012
    Publication date: November 15, 2012
    Inventors: Hui Du, Shivkumar Chiruvolu, Ang-Ling Chu
  • Publication number: 20120244060
    Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
    Type: Application
    Filed: January 13, 2010
    Publication date: September 27, 2012
    Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
  • Patent number: 8263423
    Abstract: Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
    Type: Grant
    Filed: July 26, 2011
    Date of Patent: September 11, 2012
    Assignee: NanoGram Corporation
    Inventors: Henry Hieslmair, Shivkumar Chiruvolu, Hui Du
  • Publication number: 20120193769
    Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.
    Type: Application
    Filed: May 23, 2011
    Publication date: August 2, 2012
    Inventors: Guojun Liu, Uma Srinivasan, Shivkumar Chiruvolu
  • Patent number: 8119233
    Abstract: Functional composite materials comprise elemental inorganic particles within an organic matrix. The elemental inorganic materials generally comprise elemental metal, elemental metalloid, alloys thereof, or mixtures thereof. In alternative or additional embodiments, the inorganic particles can comprise a metal oxide, a metalloid oxide, a combination thereof or a mixture thereof. The inorganic particles can have an average primary particle size of no more than abut 250 nm and a secondary particle size in a dispersion when blended with the organic matrix of no more than about 2 microns. The particles can be substantially unagglomerated within the composite. The organic binder can be a functional polymer such as a semiconducting polymer. The inorganic particles can be surface modified, such as with a moiety having an aromatic functional group for desirable interactions with a semiconducting polymer. Appropriate solution based methods can be used for forming the composite from dispersions of the particles.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: February 21, 2012
    Assignee: NanoGram Corporation
    Inventors: Shivkumar Chiruvolu, Vladimir K. Dioumaev, Nobuyuki Kambe, Hui Du
  • Publication number: 20120012032
    Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 19, 2012
    Inventors: Xiangxin Bi, Nobuyuki Kambe, Craig R. Horne, James T. Gardner, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, William E. McGovern, Pierre J. DeMascarel, Robert B. Lynch
  • Publication number: 20110318905
    Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.
    Type: Application
    Filed: March 23, 2011
    Publication date: December 29, 2011
    Inventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
  • Publication number: 20110281390
    Abstract: Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
    Type: Application
    Filed: July 26, 2011
    Publication date: November 17, 2011
    Inventors: Henry Hieslmair, Shivkumar Chiruvolu, Hui Du
  • Publication number: 20110256377
    Abstract: Photovoltaic elements can be formed by in-motion processing of a silicon ribbon. In some embodiments, only a single surface of a silicon ribbon is processed in-motion. In other embodiments both surfaces of a silicon ribbon is processed in-motion. In-motion processing can include, but is not limited to, formation of patterned or uniform doped regions within or along the silicon ribbon as well as the formation of patterned or uniform dielectric layers and/or electrically conductive elements on the silicon ribbon. After performing in-motion processing, additional processing steps can be performed after the ribbon is cut into portions. Furthermore, post-cut processing can include, but is not limited to, the formation of solar cells, photovoltaic modules, and solar panels.
    Type: Application
    Filed: November 17, 2010
    Publication date: October 20, 2011
    Inventors: Shivkumar Chiruvolu, Neeraj Pakala, Scott Ferguson, Kieran Drain
  • Patent number: 7993947
    Abstract: Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: August 9, 2011
    Assignee: NanoGram Corporation
    Inventors: Henry Hieslmair, Shivkumar Chiruvolu, Hui Du
  • Patent number: 7972691
    Abstract: Successful dispersion approaches are described for the formation of dispersion of dry powders of inorganic particles. In some embodiments, it is desirable to form the dispersion in two processing steps in which the particles are surface modified in the second processing step. Composites can be formed using the well dispersed particles to form improved inorganic particle-polymer composites. These composites are suitable for optical applications and for forming transparent films, which can have a relatively high index or refraction. In some embodiments, water can be used to alter the surface chemistry of metal oxide particles.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: July 5, 2011
    Assignee: NanoGram Corporation
    Inventors: Shivkumar Chiruvolu, Hui Du, Nobuyuki Kambe
  • Publication number: 20110135928
    Abstract: Submicron powders of metal silicon nitrides and metal silicon oxynitrides are synthesized using nanoscale particles of one or more precursor materials using a solid state reaction. For example, nanoscale powders of silicon nitride are useful precursor powders for the synthesis of metal silicon nitride and metal silicon oxynitride submicron powders. Due to the use of the nanoscale precursor materials for the synthesis of the submicron phosphor powders, the product phosphors can have very high internal quantum efficiencies. The phosphor powders can comprise a suitable dopant activator, such as a rare earth metal element dopant.
    Type: Application
    Filed: September 16, 2010
    Publication date: June 9, 2011
    Applicant: NANOGRAM CORPORATION
    Inventors: Padmanabha R. Ravilisetty, Shivkumar Chiruvolu, Nobuyuki Kambe, Abhishek Jaiswal
  • Publication number: 20110120537
    Abstract: High quality silicon inks are used to form polycrystalline layers within thin film solar cells having a p-n junction. The particles deposited with the inks can be sintered to form the silicon film, which can be intrinsic films or doped films. The silicon inks can have a z-average secondary particle size of no more than about 250 nm as determined by dynamic light scattering on an ink sample diluted to 0.4 weight percent if initially having a greater concentration. In some embodiments, an intrinsic layer can be a composite of an amorphous silicon portion and a crystalline silicon portion.
    Type: Application
    Filed: September 21, 2010
    Publication date: May 26, 2011
    Inventors: Goujun Liu, Clifford M. Morris, Igor Altman, Uma Srinivasan, Shivkumar Chiruvolu
  • Publication number: 20110109688
    Abstract: Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
    Type: Application
    Filed: January 21, 2011
    Publication date: May 12, 2011
    Inventors: Henry Hieslmair, Shivkumar Chiruvolu, Hui Du