Patents by Inventor Shoji Yoshikawa
Shoji Yoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11260996Abstract: A lunar orbiting satellite system executes orbit planning of assigning a function (positioning, communication, and flashing) to an artificial satellite (AS) depending on a relative position of the AS to the moon at a time when the moon and the AS are observed from an input point on the earth, and correcting the relative position, which changes in accordance with the moon revolution period. The system includes: a satellite orbit planner which assigns a function to each ASs forming an AS group flying around the moon depending on a relative position of each ASs to the moon at a time when the moon and ASs are observed from an input point on the earth, and set a target orbit according to the function; and a satellite controller which causes the each ASs to execute control based on the function to implement switching of the function.Type: GrantFiled: May 30, 2017Date of Patent: March 1, 2022Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Naoki Imamura, Shoji Yoshikawa, Kenro Mitsuda, Kazushi Sekine, Kana Tsuneishi, Mitsuhiro Yamazumi
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Publication number: 20210078733Abstract: A lunar orbiting satellite system executes orbit planning of assigning a function (positioning, communication, and flashing) to an artificial satellite (AS) depending on a relative position of the AS to the moon at a time when the moon and the AS are observed from an input point on the earth, and correcting the relative position, which changes in accordance with the moon revolution period. The system includes: a satellite orbit planner which assigns a function to each ASs forming an AS group flying around the moon depending on a relative position of each ASs to the moon at a time when the moon and ASs are observed from an input point on the earth, and set a target orbit according to the function; and a satellite controller which causes the each ASs to execute control based on the function to implement switching of the function.Type: ApplicationFiled: May 30, 2017Publication date: March 18, 2021Applicant: Mitsubishi Electric CorporationInventors: Naoki IMAMURA, Shoji YOSHIKAWA, Kenro MITSUDA, Kazushi SEKINE, Kana TSUNEISHI, Mitsuhiro YAMAZUMI
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Patent number: 10446404Abstract: Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.Type: GrantFiled: January 17, 2018Date of Patent: October 15, 2019Assignee: EBARA CORPORATIONInventors: Ryo Tajima, Masahiro Hatakeyama, Kenichi Suematsu, Kiwamu Tsukamoto, Kenji Watanabe, Shoji Yoshikawa, Shinichi Okada, Kenji Terao
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Patent number: 10157722Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.Type: GrantFiled: June 28, 2016Date of Patent: December 18, 2018Assignee: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Yoshihiko Naito, Yasushi Toma, Tsutomu Karimata, Takehide Hayashi, Kiwamu Tsukamoto, Tatsuya Kohama, Noboru Kobayashi
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Patent number: 10074510Abstract: An inspection system includes a TDI sensor that integrates amounts of secondary charged particles or electromagnetic waves along a predetermined direction at every timing at which a transfer clock is inputted and sequentially transfers the amounts of secondary charged particles or electromagnetic waves so integrated, and a deflector which deflects, based on a difference between an actual position and a target position of the inspection target, the secondary charged particles or electromagnetic waves directed towards the TDI sensor in a direction in which the difference is offset. The target position is set into something like a step-and-riser shape in which the target position is kept staying in the same position by a predetermined period of time that is equal to or shorter than a period of time from an input of the transfer clock to an input of the following transfer clock and thereafter rises by a predetermined distance.Type: GrantFiled: August 8, 2014Date of Patent: September 11, 2018Assignee: EBARA CORPORATIONInventors: Kenichi Suematsu, Shoji Yoshikawa
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Publication number: 20180233374Abstract: Provided is a method of adjusting an electron-beam irradiated area in an electron beam irradiation apparatus that deflects an electron beam with a deflector to irradiate an object with the electron beam, the method including: emitting an electron beam while changing an irradiation position on an adjustment plate by controlling the deflector in accordance with an electron beam irradiation recipe, the adjustment plate detecting a current corresponding to the emitted electron beam; acquiring a current value detected from the adjustment plate; forming image data corresponding to the acquired current value; determining whether the electron-beam irradiated area is appropriate based on the formed image data; and updating the electron beam irradiation recipe when the electron-beam irradiated area is determined not to be appropriate.Type: ApplicationFiled: January 17, 2018Publication date: August 16, 2018Inventors: Ryo TAJIMA, Masahiro HATAKEYAMA, Kenichi SUEMATSU, Kiwamu TSUKAMOTO, Kenji WATANABE, Shoji YOSHIKAWA, Shinichi OKADA, Kenji TERAO
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Patent number: 9852878Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.Type: GrantFiled: June 23, 2015Date of Patent: December 26, 2017Assignee: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Kenichi Suematsu, Ryo Tajima, Kiwamu Tsukamoto, Kenji Terao, Shoji Yoshikawa
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Patent number: 9601302Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.Type: GrantFiled: July 30, 2015Date of Patent: March 21, 2017Assignee: EBARA CORPORATIONInventors: Shoji Yoshikawa, Kiwamu Tsukamoto, Takeshi Murakami, Masahiro Hatakeyama, Tsutomu Karimata
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Publication number: 20160307726Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.Type: ApplicationFiled: June 28, 2016Publication date: October 20, 2016Applicant: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Yoshihiko Naito, Yasushi Toma, Tsutomu Karimata, Takehide Hayashi, Kiwamu Tsukamoto, Tatsuya Kohama, Noboru Kobayashi
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Patent number: 9406480Abstract: A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.Type: GrantFiled: January 14, 2015Date of Patent: August 2, 2016Assignee: EBARA CORPORATIONInventors: Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Toshifumi Kimba, Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Kenichi Suematsu, Yutaka Tabe, Ryo Tajima, Keiichi Tohyama
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Patent number: 9368314Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical systems; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.Type: GrantFiled: June 30, 2014Date of Patent: June 14, 2016Assignee: EBARA CORPORATIONInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
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Publication number: 20150371813Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.Type: ApplicationFiled: June 23, 2015Publication date: December 24, 2015Inventors: Masahiro HATAKEYAMA, Kenichi SUEMATSU, Ryo TAJIMA, Kiwamu TSUKAMOTO, Kenji TERAO, Shoji YOSHIKAWA
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Publication number: 20150340193Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.Type: ApplicationFiled: July 30, 2015Publication date: November 26, 2015Inventors: Shoji YOSHIKAWA, Kiwamu TSUKAMOTO, Takeshi MURAKAMI, Masahiro HATAKEYAMA, Tsutomu KARIMATA
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Patent number: 9134261Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.Type: GrantFiled: April 21, 2014Date of Patent: September 15, 2015Assignee: EBARA CORPORATIONInventors: Shoji Yoshikawa, Kiwamu Tsukamoto, Takeshi Murakami, Masahiro Hatakeyama, Tsutomu Karimata
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Patent number: 9105445Abstract: An inspection system includes a primary optical system configured to irradiate a charged particle or an electromagnetic wave as a beam, a movable unit configured to hold an inspection target and move the target through a position where the beam is irradiated, and a TDI sensor configured to integrate an amount of secondary charged particles in a predetermined direction to sequentially transfer the integrated amount. The secondary charged particles are obtained by irradiating the beam onto the target while moving the movable unit in the predetermined direction. The inspection system further includes a prevention module configured to prevent an arrival of the beam at the target side or an arrival of the secondary charged particles at the TDI sensor during a time period from one transfer to the following transfer after the elapse of a predetermined length of time from the one transfer and until the following transfer.Type: GrantFiled: March 20, 2014Date of Patent: August 11, 2015Assignee: EBARA CORPORATIONInventors: Ryo Tajima, Kenichi Suematsu, Shoji Yoshikawa
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Publication number: 20150122993Abstract: A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.Type: ApplicationFiled: January 14, 2015Publication date: May 7, 2015Applicant: EBARA CORPORATIONInventors: Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Toshifumi Kimba, Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Kenichi Suematsu, Yutaka Tabe, Ryo Tajima, Keiichi Tohyama
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Publication number: 20150097116Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.Type: ApplicationFiled: December 16, 2014Publication date: April 9, 2015Inventors: Masahiro HATAKEYAMA, Yasushi TOMA, Shoji YOSHIKAWA, Kiwamu TSUKAMOTO
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Publication number: 20150041646Abstract: An inspection system includes a TDI sensor that integrates amounts of secondary charged particles or electromagnetic waves along a predetermined direction at every timing at which a transfer clock is inputted and sequentially transfers the amounts of secondary charged particles or electromagnetic waves so integrated, and a deflector which deflects, based on a difference between an actual position and a target position of the inspection target, the secondary charged particles or electromagnetic waves directed towards the TDI sensor in a direction in which the difference is offset. The target position is set into something like a step-and-riser shape in which the target position is kept staying in the same position by a predetermined period of time that is equal to or shorter than a period of time from an input of the transfer clock to an input of the following transfer clock and thereafter rises by a predetermined distance.Type: ApplicationFiled: August 8, 2014Publication date: February 12, 2015Inventors: Kenichi Suematsu, Shoji Yoshikawa
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Patent number: 8946631Abstract: A substrate is irradiated by primary electrons and secondary electrons generated from the substrate are detected by a detector. A reference die is placed on the stage to obtain a pattern matching template image including feature coordinates of the reference die. A pattern matching is performed with an arbitrary die in a row or column including the reference die using the template image to obtain feature coordinates of the arbitrary die. An angle of misalignment is calculated between the direction of the row or column including the reference die and one of the directions of movement of the substrate on the basis of the feature coordinates of the arbitrary die and those of the reference die. The stage is rotated to correct the angle of misalignment to conform the direction of the row or column including the reference die with the one of the directions of movement of the substrate.Type: GrantFiled: January 15, 2014Date of Patent: February 3, 2015Assignee: Ebara CorporationInventors: Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Toshifumi Kimba, Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Kenichi Suematsu, Yutaka Tabe, Ryo Tajima, Keiichi Tohyama
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Patent number: 8946629Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.Type: GrantFiled: April 22, 2014Date of Patent: February 3, 2015Assignee: Ebara CorporationInventors: Masahiro Hatakeyama, Yasushi Toma, Shoji Yoshikawa, Kiwamu Tsukamoto