Patents by Inventor Shoji Yoshikawa
Shoji Yoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8053726Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.Type: GrantFiled: July 1, 2008Date of Patent: November 8, 2011Assignees: Ebara Corporation, Kabushiki Kaisha ToshibaInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
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Publication number: 20110104830Abstract: A substrate inspection apparatus 1-1 (FIG.Type: ApplicationFiled: January 6, 2011Publication date: May 5, 2011Applicant: EBARA CORPORATIONInventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
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Patent number: 7928382Abstract: An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.Type: GrantFiled: August 10, 2006Date of Patent: April 19, 2011Assignee: Ebara CorporationInventors: Masahiro Hatakeyama, Shoji Yoshikawa, Kenichi Suematsu, Tsutomu Karimata, Nobuharu Noji
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Patent number: 7928378Abstract: A substrate inspection apparatus 1-1 (FIG.Type: GrantFiled: June 30, 2008Date of Patent: April 19, 2011Assignee: Ebara CorporationInventors: Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji, Takeshi Murakami, Masahiro Hatakeyama, Mamoru Nakasuji, Hirosi Sobukawa, Shoji Yoshikawa, Shin Oowada, Mutsumi Saito
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Patent number: 7888642Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.Type: GrantFiled: August 8, 2008Date of Patent: February 15, 2011Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nabuharu Noji, Tohru Satake, Masahiro Hatakeyama, Kenji Watanabe, Takao Kato, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima
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Publication number: 20110024623Abstract: An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.Type: ApplicationFiled: October 6, 2010Publication date: February 3, 2011Applicant: EBARA CORPORATIONInventors: Masahiro HATAKEYAMA, Shoji YOSHIKAWA, Kenichi SUEMATSU, Tsutomu KARIMATA, Nobuharu NOJI
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Patent number: 7829871Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechType: GrantFiled: July 22, 2008Date of Patent: November 9, 2010Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Tsutomu Karimata, Shin Oowada, Shoji Yoshikawa, Mutsumi Saito
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Publication number: 20100237243Abstract: A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.Type: ApplicationFiled: May 27, 2010Publication date: September 23, 2010Applicant: EBARA CORPORATIONInventors: Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Toshifumi Kimba, Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Kenichi Suematsu, Yutaka Tabe, Ryo Tajima, Keiichi Tohyama
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Patent number: 7745784Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: GrantFiled: June 25, 2007Date of Patent: June 29, 2010Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mitsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura
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Patent number: 7741601Abstract: A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.Type: GrantFiled: March 11, 2008Date of Patent: June 22, 2010Assignee: Ebara CorporationInventors: Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Toshifumi Kimba, Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Kenichi Suematsu, Yutaka Tabe, Ryo Tajima, Keiichi Tohyama
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Patent number: 7601972Abstract: An inspection apparatus and a semiconductor device manufacturing method using the same. The inspection apparatus is used for defect inspection, line width measurement, surface potential measurement or the like of a sample such as a wafer. In the inspection apparatus, a plurality of charged particles is delivered from a primary optical system to the sample, and secondary charged particles emitted from the sample are separated from the primary optical system and introduced through a secondary optical system to a detector. Irradiation of the charged particles is conducted while moving the sample. Irradiation spots of the charged particles are arranged by N rows along a moving direction of the sample and by M columns along a direction perpendicular thereto. Every row of the irradiation spots of the charged particles is shifted successively by a predetermined amount in a direction perpendicular to the moving direction of the sample.Type: GrantFiled: October 9, 2007Date of Patent: October 13, 2009Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi
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Patent number: 7599052Abstract: A defect marking device includes a flaw inspection device which has a plurality of light-receiving parts that identify reflected lights coming from an inspection plane of a metal strip under two or more of optical conditions different from each other; a signal processing section that judges the presence/absence of surface flaw on the inspection plane based on a combination of reflected light components identified under these optical conditions different from each other; and a marking device which applies marking that indicates information relating to the flaw on the surface of the metal strip.Type: GrantFiled: August 13, 2008Date of Patent: October 6, 2009Assignee: NKK CorporationInventors: Mitsuaki Uesugi, Shoji Yoshikawa, Masaichi Inomata, Tsutomu Kawamura, Takahiko Oshige, Hiroyuki Sugiura, Akira Kazama, Tsuneo Suyama, Yasuo Kushida, Shuichi Harada, Hajime Tanaka, Osamu Uehara, Shuji Kaneto, Masahiro Iwabuchi, Kozo Harada, Shinichi Tomonaga, Shigemi Fukuda
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Publication number: 20090224151Abstract: An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.Type: ApplicationFiled: August 10, 2006Publication date: September 10, 2009Applicant: EBARA CORPORATIONInventors: Masahiro Hatakeyama, Shoji Yoshikawa, Kenichi Suematsu, Tsutomu Karimata, Nobuharu Noji
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Patent number: 7569838Abstract: An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.Type: GrantFiled: February 7, 2008Date of Patent: August 4, 2009Assignees: Ebara Corporation, Kabushiki Kaisha ToshibaInventors: Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa, Tsutomu Karimata, Mamoru Nakasuji, Masahiro Hatakeyama, Takeshi Murakami, Yuichiro Yamazaki, Ichirota Nagahama, Takamitsu Nagai, Kazuyoshi Sugihara
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Publication number: 20090101816Abstract: A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.Type: ApplicationFiled: March 11, 2008Publication date: April 23, 2009Applicant: EBARA CORPORATIONInventors: Nobuharu Noji, Tohru Satake, Hirosi Sobukawa, Toshifumi Kimba, Masahiro Hatakeyama, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Kenichi Suematsu, Yutaka Tabe, Ryo Tajima, Keiichi Tohyama
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Publication number: 20090086209Abstract: A defect marking device includes a flaw inspection device which has a plurality of light-receiving parts that identify reflected lights coming from an inspection plane of a metal strip under two or more of optical conditions different from each other; a signal processing section that judges the presence/absence of surface flaw on the inspection plane based on a combination of reflected light components identified under these optical conditions different from each other; and a marking device which applies marking that indicates information relating to the flaw on the surface of the metal strip.Type: ApplicationFiled: August 13, 2008Publication date: April 2, 2009Applicant: NKK CorporationInventors: Mitsuaki Uesugi, Shoji Yoshikawa, Masaichi Inomata, Tsutomu Kawamura, Takahiko Oshige, Hiroyuki Sugiura, Akira Kazama, Tsuneo Suyama, Yasuo Kushida, Shuichi Harada, Hajime Tanaka, Osamu Uehara, Shuji Kaneto, Masahiro Iwabuchi, Kozo Harada, Shinichi Tomonaga, Shigemi Fukuda
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Publication number: 20090050822Abstract: The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.Type: ApplicationFiled: June 25, 2007Publication date: February 26, 2009Applicant: EBARA CORPORATIONInventors: Mamoru Nakasuji, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa, Tsutomu Karimata, Shoji Yoshikawa, Toshifumi Kimba, Shin Oowada, Mutsumi Saito, Muneki Hamashima, Toru Takagi, Naoto Kihara, Hiroshi Nishimura
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Publication number: 20090039262Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.Type: ApplicationFiled: August 8, 2008Publication date: February 12, 2009Applicant: EBARA CORPORATIONInventors: Mamoru NAKASUJI, Nobuharu NOJI, Tohru SATAKE, Masahiro HATAKEYAMA, Kenji WATANABE, Takao KATO, Hirosi SOBUKAWA, Tsutomu KARIMATA, Shoji YOSHIKAWA, Toshifumi KIMBA, Shin OOWADA, Mutsumi SAITO, Muneki HAMASHIMA
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Publication number: 20090032708Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.Type: ApplicationFiled: July 1, 2008Publication date: February 5, 2009Applicants: EBARA CORPORATION, KABUSHIKI KAISHA TOSHIBAInventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
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Patent number: 7479634Abstract: An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an E×B separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample.Type: GrantFiled: March 6, 2007Date of Patent: January 20, 2009Assignee: Ebara CorporationInventors: Mamoru Nakasuji, Takao Kato, Kenji Watanabe, Shoji Yoshikawa, Tohru Satake, Nobuharu Noji