Abstract: A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

Abstract: An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Abstract: Diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The diffraction gratings and waveguides may include a transmissive layer and a metal layer. The diffraction grating may comprises a blazed grating.

Abstract: Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

Abstract: A method of fabricating a blazed diffraction grating comprises providing a master template substrate and imprinting periodically repeating lines on the master template substrate in a plurality of master template regions. The periodically repeating lines in different ones of the master template regions extend in different directions. The method additionally comprises using at least one of the master template regions as a master template to imprint at least one blazed diffraction grating pattern on a grating substrate.

Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.

Abstract: Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Abstract: A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

Abstract: A method of fabricating a shadow mask includes depositing a chrome etch mask layer on a substrate. The substrate includes a silicon handle wafer, a buried oxide layer, a single crystal silicon layer, and a backside oxide layer. The method also includes forming a patterning layer including a pattern on the chrome etch mask layer, etching the chrome etch mask layer using the patterning layer to transfer the pattern in the patterning layer into the chrome etch mask layer, and etching the pattern of the chrome etch mask layer into the single crystal silicon layer. The method further includes patterning the backside oxide layer, etching the silicon handle wafer using the patterned backside oxide layer, removing the buried oxide layer, and removing remaining portions of the patterned chrome etch mask layer and the patterning layer.

Abstract: A head-mounted, near-eye display system comprises a stack of waveguides having integral spacers separating the waveguides. The waveguides may each include diffractive optical elements that are formed simultaneously with the spacers by imprinting or casting. The spacers are disposed on one or more major surfaces of the waveguides and define a distance between immediately adjacent waveguides. Adjacent waveguides may be bonded using adhesives on the spacers. The spacers may fit within indentations of overlying waveguides. In some cases, the spacers may form one or more walls of material substantially around a perimeter of an associated waveguide. Vent holes may be provided in the walls to allow gas flow into and out from an interior volume defined by the spacers. Debris trapping structures may be provided between two walls of spacers to trap and prevent debris from entering into the interior volume.

Abstract: An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

Abstract: A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.

Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.

Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.

Abstract: A method of depositing a variable thickness material includes providing a substrate and providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent the substrate and performing a plasma deposition process on the substrate to deposit the variable thickness material. A layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.

Abstract: An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Abstract: An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Abstract: Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

Abstract: A method of depositing a variable thickness material includes providing a substrate and providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent the substrate and performing a plasma deposition process on the substrate to deposit the variable thickness material. A layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.

Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.