Patents by Inventor Shuqiang Yang
Shuqiang Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200041712Abstract: A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.Type: ApplicationFiled: October 8, 2019Publication date: February 6, 2020Applicant: Magic Leap, Inc.Inventors: Christophe Peroz, Mauro Melli, Vikramjit Singh, David Jurbergs, Jeffrey Dean Schmulen, Zongxing Wang, Shuqiang Yang, Frank Y. Xu, Kang Luo, Marlon Edward Menezes, Michael Nevin Miller
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Publication number: 20200033604Abstract: Display devices include waveguides with in-coupling optical elements that mitigate re-bounce of in-coupled light to improve overall in-coupling efficiency and/or uniformity. A waveguide receives light from a light source and/or projection optics and includes an in-coupling optical element that in-couples the received light to propagate by total internal reflection in a propagation direction within the waveguide. Once in-coupled into the waveguide the light may undergo re-bounce, in which the light reflects off a waveguide surface and, after the reflection, strikes the in-coupling optical element. Upon striking the in-coupling optical element, the light may be partially absorbed and/or out-coupled by the optical element, thereby effectively reducing the amount of in-coupled light propagating through the waveguide.Type: ApplicationFiled: July 23, 2019Publication date: January 30, 2020Inventors: Jeffrey Dean Schmulen, Neal Paul Ricks, Samarth Bhargava, Kevin Messer, Victor Kai Liu, Matthew Grant Dixon, Xiaopei Deng, Marlon Edward Menezes, Shuqiang Yang, Vikramjit Singh, Kang Luo, Frank Y. Xu
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Patent number: 10527865Abstract: A method of fabricating a diffractive structure with varying diffractive element depth includes providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent a substrate. The substrate comprises an etch mask corresponding to the diffractive structure. The method further includes exposing the substrate to an etchant, etching the substrate to form diffractive elements adjacent the first region having a first depth, and etching the substrate to form diffractive elements adjacent the second region having a second depth less than the first depth.Type: GrantFiled: November 6, 2018Date of Patent: January 7, 2020Assignee: Magic Leap, Inc.Inventors: Shuqiang Yang, Vikramjit Singh, Kang Luo, Nai-Wen Pi, Frank Y. Xu
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Patent number: 10481317Abstract: A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.Type: GrantFiled: August 22, 2017Date of Patent: November 19, 2019Assignee: Magic Leap, Inc.Inventors: Christophe Peroz, Mauro Melli, Vikramjit Singh, David Jurbergs, Jeffrey Dean Schmulen, Zongxing Wang, Shuqiang Yang, Frank Y. Xu, Kang Luo, Marlon Edward Menezes, Michael Nevin Miller
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Publication number: 20190302611Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.Type: ApplicationFiled: March 18, 2019Publication date: October 3, 2019Inventors: Vikramjit Singh, Kang Luo, Michael Nevin Miller, Shuqiang Yang, Frank Y. Xu
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Publication number: 20190137777Abstract: A method of fabricating a diffractive structure with varying diffractive element depth includes providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent a substrate. The substrate comprises an etch mask corresponding to the diffractive structure. The method further includes exposing the substrate to an etchant, etching the substrate to form diffractive elements adjacent the first region having a first depth, and etching the substrate to form diffractive elements adjacent the second region having a second depth less than the first depth.Type: ApplicationFiled: November 6, 2018Publication date: May 9, 2019Applicant: Magic Leap, Inc.Inventors: Shuqiang Yang, Vikramjit Singh, Kang Luo, Nai-Wen Pi, Frank Y. Xu
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Publication number: 20190129178Abstract: A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.Type: ApplicationFiled: October 25, 2018Publication date: May 2, 2019Inventors: Roy Patterson, Chulwoo Oh, Ravi Kumar Komanduri, Charles Scott Carden, Michael Nevin Miller, Vikramjit Singh, Shuqiang Yang
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Patent number: 10274823Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.Type: GrantFiled: September 15, 2017Date of Patent: April 30, 2019Assignee: Molecular Imprints, Inc.Inventors: Vikramjit Singh, Kang Luo, Michael Nevin Miller, Shuqiang Yang, Frank Y. Xu
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Publication number: 20190121239Abstract: An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.Type: ApplicationFiled: October 19, 2018Publication date: April 25, 2019Inventors: Vikramjit Singh, Michael Nevin Miller, Frank Y. Xu, Shuqiang Yang
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Publication number: 20180107110Abstract: Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.Type: ApplicationFiled: September 15, 2017Publication date: April 19, 2018Inventors: Vikramjit Singh, Kang Luo, Michael Nevin Miller, Shuqiang Yang, Frank Y. Xu
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Publication number: 20180059297Abstract: A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.Type: ApplicationFiled: August 22, 2017Publication date: March 1, 2018Applicant: Magic Leap, Inc.Inventors: Christophe Peroz, Mauro Melli, Vikramjit Singh, David Jurbergs, Jeffrey Dean Schmulen, Zongxing Wang, Shuqiang Yang, Frank Y. Xu, Kang Luo, Marlon Edward Menezes, Michael Nevin Miller
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Patent number: 9196765Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.Type: GrantFiled: May 19, 2015Date of Patent: November 24, 2015Assignee: MOLECULAR IMPRINTS, INC.; BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEMInventors: Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
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Publication number: 20150255640Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.Type: ApplicationFiled: May 19, 2015Publication date: September 10, 2015Inventors: Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
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Patent number: 9070803Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.Type: GrantFiled: May 11, 2011Date of Patent: June 30, 2015Assignee: Molecular Imprints, Inc.Inventors: Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
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Patent number: 8961800Abstract: Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.Type: GrantFiled: August 11, 2010Date of Patent: February 24, 2015Assignees: Board of Regents, The University of Texas System, Molecular Imprints, Inc.Inventors: Sidlgata V. Sreenivasan, Shuqiang Yang, Frank Y. Xu, Vikramjit Singh
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Patent number: 8802747Abstract: A lithography method for forming nanoparticles includes patterning sacrificial material on a multilayer substrate. In some cases, the pattern is transferred to or into a removable layer of the multilayer substrate, and functional material is disposed on the removable layer of the multilayer substrate and solidified. At least a portion of the functional material is then removed to expose protrusions of the removable layer, and pillars of the functional material are released from the removable layer to yield nanoparticles. In other cases, the multilayer substrate includes the functional material, and the pattern is transferred to or into a removable layer of the multilayer substrate. The sacrificial layer is removed, and pillars of the functional material are released from the removable layer to yield nanoparticles.Type: GrantFiled: January 31, 2011Date of Patent: August 12, 2014Assignee: Molecular Imprints, Inc.Inventors: Frank Y. Xu, Sidlgata V. Sreenivasan, Shuqiang Yang
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Publication number: 20140021167Abstract: Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.Type: ApplicationFiled: September 9, 2013Publication date: January 23, 2014Applicants: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM, MOLECULAR IMPRINTS, INC.Inventors: Sidlgata V. Sreenivasan, Shuqiang Yang, Frank Y. Xu, Dwayne L. LaBrake
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Patent number: 8529778Abstract: Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.Type: GrantFiled: November 12, 2009Date of Patent: September 10, 2013Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas SystemInventors: Sidlgata V. Sreenivasan, Shuqiang Yang, Frank Y. Xu, Dwayne L. LaBrake
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Publication number: 20110277827Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.Type: ApplicationFiled: May 11, 2011Publication date: November 17, 2011Applicants: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM, MOLECULAR IMPRINTS, INC.Inventors: Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
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Publication number: 20110180127Abstract: Fabricating a solar cell stack includes forming a nanopatterned polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopatterned polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopatterned first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopatterned first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopatterned first surface. Electron donor material is deposited on the nanopatterned first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer.Type: ApplicationFiled: January 28, 2011Publication date: July 28, 2011Applicant: MOLECULAR IMPRINTS, INC.Inventors: Fen Wan, Shuqiang Yang, Frank Y. Xu, Weijun Liu, Edward Brian Fletcher, Sidlgata V. Sreenivasan, Michael N. Miller, Darren D. Donaldson