Abstract: A water disinfection chamber includes one or more UVC LEDs. The chamber is constructed of Teflon or employs a Teflon PTFE liner to increase UV reflections through the volume of the chamber. LEDs are positioned in specific locations to both provide maximum UV intensity in the main fluid flow path and an angle to allow enough reflections to fill the chamber with UV light to disinfect the fluid flowing through the chamber. The chamber is scalable in size and in the number of LEDs employed including the number of rings where LEDs are located.

Abstract: A water disinfection system preferably includes a battery compartment, a control printed circuit board (PCB) to manage several parameters including timing, voltage rate, and user-interface. A high voltage power supply is coupled to a set of electrodes to cause an electric discharge. The electric discharge results in a series of reactions in the water that eliminate bacteria and viruses, dissolves organic material, and oxidizes inorganic compounds.

Abstract: A water disinfection chamber includes one or more UVC LEDs. The chamber is constructed of Teflon or employs a Teflon PTFE liner to increase UV reflections through the volume of the chamber. LEDs are positioned in specific locations to both provide maximum UV intensity in the main fluid flow path and an angle to allow enough reflections to fill the chamber with UV light to disinfect the fluid flowing through the chamber. The chamber is scalable in size and in the number of LEDs employed including the number of rings where LEDs are located.

Abstract: A water disinfection system preferably includes a battery compartment, a control printed circuit board (PCB) to manage several parameters including timing, voltage rate, and user-interface. A high voltage power supply is coupled to a set of electrodes to cause an electric discharge. The electric discharge results in a series of reactions in the water that eliminate bacteria and viruses, dissolves organic material, and oxidizes inorganic compounds.

Abstract: A water container or bottle with integrated disinfection preferably includes a battery compartment, a control printed circuit board (PCB) to manage several parameters including timing, voltage rate, and user-interface. A high voltage power supply is coupled to a set of electrodes to cause an electric discharge. The electric discharge results in a series of reactions in the water that eliminate bacteria and viruses, dissolves organic material, and oxidizes inorganic compounds.

Abstract: A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.

Abstract: A water container or bottle with integrated disinfection preferably includes a battery compartment, a control printed circuit board (PCB) to manage several parameters including timing, voltage rate, and user-interface. A high voltage power supply is coupled to a set of electrodes to cause an electric discharge. The electric discharge results in a series of reactions in the water that eliminate bacteria and viruses, dissolves organic material, and oxidizes inorganic compounds.

Abstract: A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.

Abstract: A chamber top for a processing chamber is provided. The chamber top includes a first plasma source oriented horizontally over the chamber top and a second plasma source oriented horizontally over the chamber top. The second plasma source is arranged concentrically around the first plasma source. Also included is a first plurality of ferrites encircling the first plasma source and a second plurality of ferrites encircling the second plasma source. A first primary winding is disposed around an outer circumference of the first plasma source and a second primary winding disposed around an outer circumference of the second plasma source. The first and second primary windings pass through the respective plurality of ferrites. A plurality of outlets is disposed on a lower portion of the first and second plasma sources, and the plurality of outlets is oriented between adjacent ones of the first and second plurality of ferrites.

Abstract: A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.

Abstract: A method to construct a high current electronic device such as an inductor or a transformer with a single or multi-layer PCB with split traces and/or laminated bus bars and a high current electronic device built according to these methods. Traces are set-up with cross-overs to ensure the length of all traces is equal to maintain good current sharing. Then, PCBs or bus bars are stacked to provide the turns required for the inductor. Cooling plates are provided to cool the structure which is in turn encapsulated in a potting material.

Abstract: A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.

Abstract: A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.

Abstract: A method to provide high resolution power control in SCR based power supplies utilizing dithering designed to introduce perturbations in the control signal to the power supply controller or firing circuit+, and to thereby control the output of the power supply with increased resolution.

Abstract: A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.

Abstract: A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.

Abstract: A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.

Abstract: A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.

Abstract: Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed.

Abstract: A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse.