Abstract: A device for sensing the linear axial displacement of an actuator comprises, in one embodiment, a movable, elongated magnet coupled to the actuator and a fixed Hall sensor. A one-dimensional bearing for the magnet is designed to receive bearing forces in a direction radial to the axial direction by permitting a displacement and pivoting movement of the magnet around the one-dimensional bearing. Arranging the Hall sensor in the region of the one-dimensional bearing ensures that the spacing or gap between the magnet and the Hall sensor remains constant, even in case of a pivoting and/or radial movement of the actuator and of the magnet connected thereto along the full length of displacement of the actuator. Accordingly, the results in sensing the linear displacement of the actuator are not adversely affected by admissible deflections of the actuator from the axial direction of linear displacement.

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, ?n, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm.

Abstract: Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.

Abstract: An impeller for a fuel pump for supplying fuel to an automotive engine from a fuel tank includes an impeller body having a substantially disk shape with opposing first and second faces and an outer circumference. The impeller body defines a rotational axis extending therethrough perpendicular to the first and second faces. A plurality of radially outwardly extending vanes extend from the outer circumference of the impeller body and are spaced circumferentially about the impeller body. Each of the vanes includes a first half extending from the outer circumference adjacent the first face and a second half extending from the outer circumference adjacent the second face. The second halves are rotationally shifted about the rotational axis relative to the first halves. The vanes are spaced un-evenly and in a non-repeating pattern about the outer circumference of the impeller body.

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction.

Abstract: The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen.

Abstract: A component for the transmission of light of high energy density with a wavelength between 250 nm and 400 nm is made of synthetic, high-purity fused vitreous silica having a hydroxyl ion content in the range between 50 ppm and 1200 ppm and an under-stoichiometric content of oxygen for the achievement of a minimal transmission variation in the transmission of the light.

Abstract: The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen.

Abstract: A shock wave generator for the fragmentation of concrements, having a light-pulse-transmiting light guide and a converter arranged at the distal light guide end and having an ionization surface which, when a light pulse impinges, initiates a shock wave in the surrounding fluid, as well as having a shock wave outlet zone. In order to increase its efficiency and durability, the generator is constructed such that the ionization surface extends obliquely sloped with respect to the beaming axis of the impinging light pulse and the shock wave outlet zone is arranged in the direct shock wave beaming area of the ionization surface, thereby permitting a largely unhindered, low-loss propagation for the shock wave to the application point.