Abstract: In an inspection apparatus for inspecting an inspection target device formed on an inspection object, the inspection target device is a back-illuminated imaging device into which light is incident from a rear surface opposite to a side of a wiring layer. The inspection apparatus includes a stage having the inspection object placed such that the inspection object faces the rear surface. The stage includes a light transmitter made of a light-transmissive material. The inspection object is placed on the light transmitter below which a light illuminator is disposed. The light illuminator includes a flat light guide plate having a facing surface facing the inspection object. A light source is provided laterally outside the light guide plate configured to diffuse light emitted from the light source incident from a side end surface of the light guide plate, and to emit the light as planar light from the facing surface.

Abstract: This inspection apparatus is for inspecting an inspection subject device. The inspection subject device is formed on an object to be inspected, and is a reverse-side irradiation-type imaging device into which light enters from the reverse side opposite to the side where a wiring layer is provided. This inspection apparatus has: a placement table having a transparent surface on which the object to be inspected is placed; a light irradiation mechanism that is provided in the placement table and that irradiates the to-be-inspected object placed on the placement table with light through the placement surface; and an acquisition unit that acquires in-plane distribution of illuminance of light from the placement table.

Abstract: A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition shield plate which is provided in the chamber so as to form a sputtering space between the target holder and the substrate holder, and prevents a sputter particle from adhering to an inner wall of the chamber, a reactive gas introduction pipe configured to introduce a reactive gas into the sputtering space, an inert gas introduction port which introduces an inert gas into a space that falls outside the sputtering space and within the chamber, and a shielding member which prevents a sputter particle from the target mounted on the target holder from adhering to an introduction port of the reactive gas introduction pipe upon sputtering.

Abstract: A method of preparing a vehicle control system having an intended function by using at least two ECUs is provided. One of the at least two ECUs is used for adaptively incorporating a modified portion of the intended function of the vehicle control system through re-design in a short period, while the rest of the ECUs in the vehicle control system sustain and support an unchanging portion of the intended function of the vehicle control system.

Abstract: An apparatus includes a process chamber, a substrate holder arranged in the process chamber, a first shield provided on the peripheral portion of the substrate holder, and a second shield provided inside the process chamber. The internal space of the process chamber is partitioned into an outer space and a process space to process the substrate, by at least the first shield, the second shield, and the substrate holder. The substrate holder can be driven along a driving direction perpendicular to a substrate holding surface. The length, in a direction parallel to the driving direction, of a minimum gap portion having a minimum size in a direction perpendicular to the driving direction between the first and second shields does not change even if the substrate holder is driven in the driving direction.

Abstract: A method of preparing a vehicle control system having an intended function by using at least two ECUs is provided. One of the at least two ECUs is used for adaptively incorporating a modified portion of the intended function of the vehicle control system through re-design in a short period, while the rest of the ECUs in the vehicle control system sustain and support an unchanging portion of the intended function of the vehicle control system.

Abstract: An apparatus includes a process chamber, a substrate holder arranged in the process chamber, a first shield provided on the peripheral portion of the substrate holder, and a second shield provided inside the process chamber. The internal space of the process chamber is partitioned into an outer space and a process space to process the substrate, by at least the first shield, the second shield, and the substrate holder. The substrate holder can be driven along a driving direction perpendicular to a substrate holding surface. The length, in a direction parallel to the driving direction, of a minimum gap portion having a minimum size in a direction perpendicular to the driving direction between the first and second shields does not change even if the substrate holder is driven in the driving direction.

Abstract: A method of preparing a vehicle control system having an intended function by using at least two ECUs is provided. One of the at least two ECUs is used for adaptively incorporating a modified portion of the intended function of the vehicle control system through re-design in a short period, while the rest of the ECUs in the vehicle control system sustain and support an unchanging portion of the intended function of the vehicle control system.

Abstract: A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition shield plate which is provided in the chamber so as to form a sputtering space between the target holder and the substrate holder, and prevents a sputter particle from adhering to an inner wall of the chamber, a reactive gas introduction pipe configured to introduce a reactive gas into the sputtering space, an inert gas introduction port which introduces an inert gas into a space that falls outside the sputtering space and within the chamber, and a shielding member which prevents a sputter particle from the target mounted on the target holder from adhering to an introduction port of the reactive gas introduction pipe upon sputtering.

Abstract: A method of preparing a vehicle control system having an intended function by using at least two ECUs is provided. One of the at least two ECUs is used for adaptively incorporating a modified portion of the intended function of the vehicle control system through re-design in a short period, while the rest of the ECUs in the vehicle control system sustain and support an unchanging portion of the intended function of the vehicle control system.

Abstract: A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition shield plate which is provided in the chamber so as to form a sputtering space between the target holder and the substrate holder, and prevents a sputter particle from adhering to an inner wall of the chamber, a reactive gas introduction pipe configured to introduce a reactive gas into the sputtering space, an inert gas introduction port which introduces an inert gas into a space that falls outside the sputtering space and within the chamber, and a shielding member which prevents a sputter particle from the target mounted on the target holder from adhering to an introduction port of the reactive gas introduction pipe upon sputtering.

Abstract: A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition shield plate which is provided in the chamber so as to form a sputtering space between the target holder and the substrate holder, and prevents a sputter particle from adhering to an inner wall of the chamber, a reactive gas introduction pipe configured to introduce a reactive gas into the sputtering space, an inert gas introduction port which introduces an inert gas into a space that falls outside the sputtering space and within the chamber, and a shielding member which prevents a sputter particle from the target mounted on the target holder from adhering to an introduction port of the reactive gas introduction pipe upon sputtering.

Abstract: A sputtering apparatus includes a target holder which is placed in a vacuum vessel and can hold a target configured to deposit a film on a substrate, a substrate holder which can mount the substrate, a first shield member which is disposed in a vicinity of the substrate holder, and configured to form a closed state in which the substrate holder and the target holder are shielded from each other, or an open state in which the substrate holder and the target holder are opened to each other, a first opening/closing driving unit adapted to open/close the first shield member to enter the open state or the closed state, a second shield member, having an annular-shaped, disposed on the surface of the substrate holder and an outer peripheral portion of the substrate, and a driving unit adapted to move the substrate holder in order to bring the substrate holder, on which the second shield member is disposed, close to the first shield member in the closed state.

Abstract: A substrate heating apparatus having a heating unit for heating a substrate placed in a process chamber which can be evacuated includes a suscepter which is installed between the heating unit and a substrate, and on which the substrate is mounted, and a heat receiving member which is installed to oppose the suscepter with the substrate being sandwiched between them, and receives heat from the heating unit via the suscepter. A ventilating portion which allows a space formed between the heat receiving member and substrate to communicate with a space in the process chamber is formed.

Abstract: A sputtering apparatus includes a target holder which is placed in a vacuum vessel and can hold a target configured to deposit a film on a substrate, a substrate holder which can mount the substrate, a first shield member which is disposed in a vicinity of the substrate holder, and configured to form a closed state in which the substrate holder and the target holder are shielded from each other, or an open state in which the substrate holder and the target holder are opened to each other, a first opening/closing driving unit adapted to open/close the first shield member to enter the open state or the closed state, a second shield member, having an annular-shaped, disposed on the surface of the substrate holder and an outer peripheral portion of the substrate, and a driving unit adapted to move the substrate holder in order to bring the substrate holder, on which the second shield member is disposed, close to the first shield member in the closed state.

Abstract: A substrate heating apparatus having a heating unit for heating a substrate placed in a process chamber which can be evacuated includes a suscepter which is installed between the heating unit and a substrate, and on which the substrate is mounted, and a heat receiving member which is installed to oppose the suscepter with the substrate being sandwiched between them, and receives heat from the heating unit via the suscepter. A ventilating portion which allows a space formed between the heat receiving member and substrate to communicate with a space in the process chamber is formed.

Abstract: A method of preparing a vehicle control system having an intended function by using at least two ECUs is provided. One of the at least two ECUs is used for adaptively incorporating a modified portion of the intended function of the vehicle control system through re-design in a short period, while the rest of the ECUs in the vehicle control system sustain and support an unchanging portion of the intended function of the vehicle control system.

Abstract: An integrated vehicle control system includes various functionalized networks, such as power train group, vehicle motion group, and power source group, each including a plurality of ECUs connected via an individual communication line. A managing ECU in each network determines operation directives to be supplied to individual ECUs belonging to its own network based on information obtained from these individual ECUs as well as information obtained from other ECUs of different networks via a host communication line L4. The determined operation directives are transmitted to corresponding ECUs to cause respective individual ECUs to operate subordinately according to the given operation directives, thereby realizing a collective control of specific functions. The managing ECU also executes abnormality detection processing for detecting abnormality occurring in the integrated vehicle control system.

Abstract: A vehicle LAN is formed of networks of ECUs with each network controlling a specific basic system of the vehicle such as the power train, and each network including a supervisory ECU with the supervisory ECUs able to mutually communicate via a high-level communication line. Each supervisory ECU coordinates the control operations of its own network, based on status information from that network and on control requests transmitted from other networks, so that only small amounts of data need be transferred within the system.

Abstract: A vehicle agent system controls operation of relevant in-vehicle devices as execution of a practical response for acting for a driver. When a command is inputted by the driver or a notification is inputted from an in-vehicle network, an assumed response is selected from driver information stored in a RAM, based on the command or the notification. The selected assumed response including parameters is presented to the driver. When the driver inputs a command for permitting the selected assumed response or the driver inputs no command for a predetermined period, the selected assumed response is determined to be the practice response. When the driver inputs modification, the selected assumed response is modified into the practical response.